• Bulletin of the Korean Chemical Society
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• v.22 no.7
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• pp.709-715
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• 2001

We have been studied photosensitization mechanism's additive effect, of perylene 3,4,9,10-tetracarboxyl-diimide and X-phthalocyanine (charge generation materials), using the photochemical and photoelectrochemical approach. It was found that the photoreceptor on the excited state reacts with metal oxide, which creates the charge transfer on the interface of SnO2/electrolyte. In the electrode (X5P1) made of five X-phthalocyanine and single perylene 3,4,9,10-tetracarboxyldiimide layers, the cathodic photocurrent of X-phthalocyanine in the 400-600 nm region was increased by the addition of perylene 3,4,9,10-tetracarboxyldiimide. The maximum wavelength of fluorescence of perylene 3,4,9,10-tetracarboxyldiimide showed no dependence on the temperature. The addition of 4-dibenzylamino-2-methylbenzaldehyde diphenylhydrazone known as charge transport material was represented as decreasing photocurrent for X-phthalocyanine and perylene 3,4,9,10-tetracarboxyldiimide, respectively. In the electrode (X1P1) made of single X-phthalocyanine and single perylene 3,4,9,10-tetracarboxyldiimide layers, an anodic photocurrent of about 10.5 nA was generated by addition of hydroquinone at 550 nm. And the characteristic of photoinduced discharge was shown to decrease by a factor of 5 and the speed of dark decay was increased by a factor of 1.2.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.05b
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• pp.74-77
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• 2002

Ferroelectric Random Access Memory(FRAM) and MEMS applications require noble metal or refractory metal oxide electrodes. In this study, Ru thin films were etched using $O_2$+10% $CF_4$ plasma in an inductively coupled plasma(ICP) etching system. The etch rate of Ru thin films was examined as function of rf power, DC bias applied to the substrate. The enhanced etch rate can be obtained not only with increasing rf power and DC bias voltage, but also with small addition $CF_4$ gas. The selectivity of $SiO_2$ over Ru are 1.3. Radical densities of oxygen and fluorine in $CF_4/O_2$ plasma have been investigated by optical emission spectroscopy(OES). The etching profiles of Ru films with an photoresist pattern were measured by a field emission scanning electron microscope (FE-SEM). The additive gas increases the concentration of oxygen radicals, therefore increases the etch rate of the Ru thin films and enhances the etch slope. In $O_2$+10% $CF_4$ plasma, the etch rate of Ru thin films increases up to 10% $CF_4$ but decreases with increasing $CF_4$ mixing ratio.

• Journal of Surface Science and Engineering
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• v.51 no.2
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• pp.104-109
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• 2018

Fe-2 wt.%Ni alloys were fabricated by metal powder injection molding, and their oxidation behavior at $600-700^{\circ}C$ for 30 h in air was studied in order to find the effect of the small addition of Ni in the iron matrix on the high-temperature oxidation. Oxide scales that formed after oxidation consisted primarily of $Fe_2O_3$, where microscopic voids were scattered. Nickel was segregated initially at the scale/matrix interface, and later at the lower part of the $Fe_2O_3$ scale. At $600^{\circ}C$, Fe-2wt.%Ni alloys oxidized parabolically initially, and linearly after 15 h. At $650-700^{\circ}C$, they oxidized linearly from the initial period. Although Fe-2wt.%Ni alloys oxidized slower than pure iron, their oxidation rates were relatively fast.

• Journal of Korean Society of Occupational and Environmental Hygiene
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• v.30 no.3
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• pp.249-255
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• 2020

Objective: The purpose of this study was to provide technical information about the management of occupational exposure limits(OELs) for substances with completely revised ACGIH TLVs. Methods: The history of ACGIH TLVs for aluminum compounds, the reason for the complete revision of the related ACGIH TLV in 2008, and OELs for them in respective countries were reviewed. In addition, the results of a 2019 work environment assessment for aluminum compounds in Korea were reviewed. Results: In 1979, the ACGIH set up the TLVs for aluminum compounds considering types of compounds such as metal dust, pyro powders, welding fumes, soluble salts, alkyls, and aluminum oxide. However, in 2008 the ACGIH withdrew the TLVs for all types of aluminum and its compounds and adopted new TLVs for aluminum metal and insoluble compounds. This can cause confusion in many countries in the management of exposure to aluminum compounds because they adopt or refer to the ACGIH TLVs. Conclusion: Although Korea is setting occupational exposure limits by referring to the ACGIH's TLVs, it is necessary to sufficiently review whether it is necessary to accept the TLVs as they are if a TLV is completely changed, like took place with the revision of aluminum compounds in 2008.

• Corrosion Science and Technology
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• v.14 no.5
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• pp.226-231
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• 2015

In spite of highly advanced paint coating techniques, corrosion damage of marine metal and alloys increase more and more due to inherent micro-cracks and porosities in coatings formed during the coating process. Furthermore, flowing seawater conditions promote the breakdown of the protective oxide of the materials introducing more oxygen into marine environments, leading to the acceleration of corrosion. Various corrosion protection methods are available to prevent steel from marine corrosion. Cathodic protection is one of the useful corrosion protection methods by which the potential of the corroded metal is intentionally lowered to an immune state having the advantage of providing additional protection barriers to steel exposed to aqueous corrosion or soil corrosion, in addition to the coating. In the present investigation, the effect of flow velocity was examined for the determination of the optimum corrosion protection current density in cathodic protection as well as the corrosion rate of the steel. It is demonstrated from the result that the material corrosion under dynamic flowing conditions seems more prone to corrosion than under static conditions.

• Journal of Conservation Science
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• v.35 no.1
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• pp.33-40
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• 2019

During the conservation and maintenance of the birthplace center yard of President Asan Yoon Bosun, four porcelain enamel dishware were excavated from the central yard well. The glaze layer of excavated enamel was severely damaged; hence, the conservation process was done rapidly. In addition, scientific investigation and analysis were conducted to confirm the material properties of the glaze layer. It was confirmed that the outer surface was inverted and dried, while the inner surface was upright and fired during the glazing and drying process by measuring the film thickness. By examining the breakup phenomenon, the breaking up of the white enamel on the colored enamel was confirmed. This indicates that the colored glaze rose to the surface depending on the density of the colored glaze and white glaze. The investigation of the cross-section of the film confirmed that the lower layer formed according to the bonding properties with metal during the glazing process. Analysis of the constituents of the identified lower layer confirmed that there are differences between the specific components of the metal oxide of the lower layer and the surface color development of the upper layer.

• Proceedings of the Materials Research Society of Korea Conference
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• 2009.05a
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• pp.22.2-22.2
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• 2009

Currently, metal silicides become increasingly more essential part as a contact material in complimentary metal-oxide-semiconductor (CMOS). Among various silicides, NiSi has several advantages such as low resistivity against narrow line width and low Si consumption. Generally, metal silicides are formed through physical vapor deposition (PVD) of metal film, followed by annealing. Nanoscale devices require formation of contact in the inside of deep contact holes, especially for memory device. However, PVD may suffer from poor conformality in deep contact holes. Therefore, Atomic layer deposition (ALD) can be a promising method since it can produce thin films with excellent conformality and atomic scale thickness controllability through the self-saturated surface reaction. In this study, Ni thin films were deposited by thermal ALD using bis(dimethylamino-2-methyl-2-butoxo)nickel [Ni(dmamb)2] as a precursor and NH3 gas as a reactant. The Ni ALD produced pure metallic Ni films with low resistivity of 25 $\mu{\Omega}cm$. In addition, it showed the excellent conformality in nanoscale contact holes as well as on Si nanowires. Meanwhile, the Ni ALD was applied to area-selective ALD using octadecyltrichlorosilane (OTS) self-assembled monolayer as a blocking layer. Due to the differences of the nucleation on OTS modified surfaces toward ALD reaction, ALD Ni films were selectively deposited on un-coated OTS region, producing 3 ${\mu}m$-width Ni line patterns without expensive patterning process.

• Corrosion Science and Technology
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• v.18 no.1
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• pp.1-7
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• 2019

To find proper lathe machining parameters for SA182 Grade 304 stainless steel (SS), six kinds of samples with different machining surface states were prepared using a lathe. Surface morphologies and microstructures of near surface deformed layers on different samples were analysed. Surface morphologies and chemical composition of oxide films formed on different samples in simulated primary water with $100{\mu}g/L\;O_2$ at $310^{\circ}C$ were characterized. Results showed that surface roughness was mainly affected by lathe feed. Surface machining caused grain refinement at the top layer. A severely deformed layer with different thicknesses formed on all samples. In addition to high defect density caused by surface deformation, phase transformation, residual stress, and strain also affected the oxidation behaviour of SA182 Grade 304 SS in the test solution. Machining parameters used for # 4 (feed, 0.15 mm/r; back engagement, 2 mm; cutting speed, 114.86 m/min) and # 6 (feed,0.20 mm/r; back engagement, 1 mm; cutting speed, 73.01 m/min) samples were found to be proper for lathe machining of SA182 Grade 304 SS.

• The Journal of the Korea institute of electronic communication sciences
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• v.13 no.6
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• pp.1243-1248
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• 2018

Metal Powder Metallurgy is a manufacturing technology that makes unique model parts or a certain type of product by using a hardening phenomenon when a powder of metal or metal oxide is put it into a mold and compression-molded by a press and then heated and sintered at a high temperature. Powder metallurgical press equipment is mainly used to make the parts of automobile, electronic parts and so on, and most of them are manufactured using precise servo motor. The intelligent precision servo control powder molding press system which is designed and implemented in this paper has advantages of lowering the price and maintaining the precision by using the mechanical camshaft for the upper ram part and precisely controlling the lower ram part using the high precision servo system. In addition, OPC-based monitoring and process data collection systems are designed and implemented to provide scalability that can be applied to smart manufacturing management systems that utilize Big Data in the future.

• Journal of Surface Science and Engineering
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• v.56 no.2
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• pp.160-168
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• 2023

Recently, investigation on metallization is a key for a stretchable display. Amorphous metal such as Ni and Zr based amorphous metal compounds are introduced for a suitable material with superelastic property under certain stress condition. However, Ni and Zr based amorphous metals have too high resistivity for a display device's interconnectors. In addition, these metals are not suitable for display process chemicals. Therefore, we choose an aluminum based amprhous metal Al-Mo as a interconnector of stretchable display. In this paper, Amorphous Forming Composition Range (AFCR) for Al-Mo alloys are calculated by Midema's model, which is between 0.1 and 0.25 molybdenum, as confirmed by X-ray diffraction (XRD). The elongation tests revealed that amorphous Al-20Mo alloy thin films exhibit superior stretchability compared to pure Al thin films, with significantly less increase in resistivity at a 10% strain. This excellent resistance to hillock formation in the Al20Mo alloy is attributed to the recessed diffusion of aluminum atoms in the amorphous phase, rather than in the crystalline phase, as well as stress distribution and relaxation in the aluminum alloy. Furthermore, according to the AES depth profile analysis, the amorphous Al-Mo alloys are completely compatible with existing etching processes. The alloys exhibit fast etch rates, with a reasonable oxide layer thickness of 10 nm, and there is no diffusion of oxides in the matrix. This compatibility with existing etching processes is an important advantage for the industrial production of stretchable displays.