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A study on the Low Resistance Aluminum-Molybdenum Alloy for stretchable metallization

스트레처블 배선용 저저항 알루미늄-몰리브데늄 합금에 대한 연구

  • Min-Jun-Yi (Department of Semiconductor Science, Engineering and Technology, Korea Aerospace University) ;
  • Jin-Won-Bae (Department of Materials Engineering, Korea Aerospace University) ;
  • Su-Yeon-Park (Department of Materials Engineering, Korea Aerospace University) ;
  • Jae-Ik-Choi (Department of Materials Engineering, Korea Aerospace University) ;
  • Geon-Ho-Kim (Cuprum Materials) ;
  • Jong-Hyun-Seo (Department of Semiconductor Science, Engineering and Technology, Korea Aerospace University)
  • 이민준 (한국항공대학교 반도체학과) ;
  • 배진원 (한국항공대학교 신소재공학과) ;
  • 박수연 (한국항공대학교 신소재공학과) ;
  • 최재익 (한국항공대학교 신소재공학과) ;
  • 김건호 (주식회사 큐프럼 머티리얼즈) ;
  • 서종현 (한국항공대학교 반도체학과)
  • Received : 2022.12.19
  • Accepted : 2023.04.27
  • Published : 2023.04.30

Abstract

Recently, investigation on metallization is a key for a stretchable display. Amorphous metal such as Ni and Zr based amorphous metal compounds are introduced for a suitable material with superelastic property under certain stress condition. However, Ni and Zr based amorphous metals have too high resistivity for a display device's interconnectors. In addition, these metals are not suitable for display process chemicals. Therefore, we choose an aluminum based amprhous metal Al-Mo as a interconnector of stretchable display. In this paper, Amorphous Forming Composition Range (AFCR) for Al-Mo alloys are calculated by Midema's model, which is between 0.1 and 0.25 molybdenum, as confirmed by X-ray diffraction (XRD). The elongation tests revealed that amorphous Al-20Mo alloy thin films exhibit superior stretchability compared to pure Al thin films, with significantly less increase in resistivity at a 10% strain. This excellent resistance to hillock formation in the Al20Mo alloy is attributed to the recessed diffusion of aluminum atoms in the amorphous phase, rather than in the crystalline phase, as well as stress distribution and relaxation in the aluminum alloy. Furthermore, according to the AES depth profile analysis, the amorphous Al-Mo alloys are completely compatible with existing etching processes. The alloys exhibit fast etch rates, with a reasonable oxide layer thickness of 10 nm, and there is no diffusion of oxides in the matrix. This compatibility with existing etching processes is an important advantage for the industrial production of stretchable displays.

Keywords

Acknowledgement

이 논문은 2022년도 정부(과학기술정보통신부)의 재원으로 한국연구재단의 지원(No.NRF-2020M3H4A1A02084895, AMLED 기반 스트레처블 디스플레이 용(用) 핵심 소재/소자 원천기술개발)과 2022년도 정부(산업통상자원부)의 재원으로 한국산업기술평가관리원의 지원을 받아 수행된 연구임 (No.20017558, 스트레처블 디스플레이용 고전도/초탄성 전극소재 및 구조체 기술개발)

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