• 제목/요약/키워드: Metal line

검색결과 929건 처리시간 0.031초

Etching-free 공정 적용 Micro filling 미세 패턴 구현 연구 (Study on fine pattern with Micro filling using Etching-free process)

  • 김완규;윤영우;이성의
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2012년도 추계총회 및 학술대회 논문집
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    • pp.72-73
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    • 2012
  • Metal line을 형성하는 방법에는 그라비아 인쇄, 잉크젯 인쇄, photo 공정 후 박막 증착 공정 등을 많이 사용한다. 본 연구에서는 Micro-imprinting 공정과 DFR photo lithography 공정을 통해 음각의 미세한 pattern을 형성한 후 sputtering과 printing을 이용하여 pattern의 filling을 통해 metal line을 구현하는 것을 목표로 하였다. Pattern을 형성한 후 RIE 공정을 통해 기판 표면의 친수성 처리를 하고, SAM 공정을 통해 코팅 막의 소수성 처리를 하였다. Sputtering과 전면 프린팅 및 건조 후 strip 공정을 통해 metal line을 형성하고, 이에 대한 표면 특성과 전기적 특성을 분석하였다.

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두께가 다른 두 용접판재 성형에 있어서 블랭크 설계 및 용접선 이동에 대한 유한요소법의 역추적기법 적용 (Application of the Backward Tracing Scheme of Finite Element Method to Tailored Blank Design and Welding Line Movement in Sheet Metal Forming)

  • 구태완;최한호;강범수
    • 소성∙가공
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    • 제9권5호
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    • pp.453-462
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    • 2000
  • Tailor-welded blanks are used for forming of automobile structural skin components. The main objective of this study is to achieve weight and cost reduction in manufacturing of components. For successful application of tailor-welded blanks, design of initial welded blanks and prediction of the welding line movement are critical. The utilization of the backward tracing scheme of the finite element method shows to be desirable in design of initial welded blanks for net-shape production and in prediction of the welding line movement. First the design of the initial blank in forming of welded thick sheet with isotropy is tried, and it appears successful in obtaining a net-shape stamping product. Based on the first trial approach, the backward tracing scheme is applied to anisotropic tailored blanks. The welding line movement is also discussed.

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ABSORPTION LINE GRADIENTS IN THE BULGE OF Sa TYPE GALAXY M104

  • Sohn, Young-Jong
    • Journal of Astronomy and Space Sciences
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    • 제17권2호
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    • pp.125-132
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    • 2000
  • Long-slit spectra, covering the wavelength range 4050~5150$\AA$, have been used to investigate the radial behavior of absorption line features (G4300, Fe4383, Ca4455, Fe4531, Fe4668, and H$\beta$) along the major and minor axes of the bulge of M104. The heliocentric recession velocity of M104 has been derived as 1260$\pm$190${kms}^{-1}$. The strength of a number of metal absorption lines is decreasing with increasing radius, and the minor axis shows much steeper radial line gradients than the major axis. Line index of H$\beta$ has an opposite trend to other metal lines, i.e., increasing outward. The results in this paper imply that the properties of absorption line index distribution in M104 bulge have in many aspects similar trends to those of elliptical galaxies.

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Process Metamorphosis and On-Line FEM for Mathematical Modeling of Metal Rolling-Part II: Application

  • Zamanian, A.;Nam, S.Y.;Shin, T.J.;Hwang, S.M.
    • 소성∙가공
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    • 제28권2호
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    • pp.89-97
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    • 2019
  • In this paper, we examine the application of a new concept - on-line FE model in various metal rolling processes. This technology allows for completion of process simulation within a tiny fraction of a second without losing the high level of prediction accuracy inherent to FEM. The procedure is systematically demonstrated through the design of actual on-line models for the prediction of the width spread in horizontal rolling of the slab using a dog bone profile and horizontal rolling of the strip with a strip profile. The validity and the prediction accuracy of the on-line FE models were analyzed and discussed.

THE PROBLEMS IN THE USUAL METHOD OF CLASSIFICATION FOR METAL POOR STARS

  • Lee, Sang-Gak
    • 천문학회지
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    • 제21권2호
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    • pp.173-181
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    • 1988
  • The usual method of classification for metal poor stars is based on the normal standard stars. In this study, we show that among the sample of stars classified by this method, a systematic bias in the observed classes of metal weakness is found and, also that this method is not appropriate for classification of metal poor stars, by showing that the spectral line dependences on the temperature and pressure in the extreme metal poor stars are different from those in the normal standard stars. Therefore, we suggest that the 3-dimensional classification system, like 2-dimensional MK system, is necessary for an accurate classification of metal poor stars.

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Isotachophoretically Assisted On-Line Complexation of Trace Metal Ions in a Highly Saline Matrix for Capillary Electrophoresis

  • Kim, Ji-Hye;Choi, Ki-Hwan;Cho, Sun-Young;Riaz, Asif;Chung, Doo-Soo
    • Bulletin of the Korean Chemical Society
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    • 제33권3호
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    • pp.790-794
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    • 2012
  • Trace metal ions such as $Cd^{2+}$, $Ni^{2+}$, and $Zn^{2+}$ in a highly saline sample were subjected to on-line complexation with 4-(2-thiazolylazo) resorcinol (TAR) dissolved in a background electrolyte (BGE) under transient isotachophoresis (TITP) conditions. A long plug of the saline sample, containing the trace metal ions but devoid of TAR, was injected into a coated capillary filled with a BGE composed of 150 mM 2-(cyclohexylamino) ethanesulfonic acid (CHES) and 110 mM triethylamine (TEA) at pH 9.7. Since the electrophoretic mobility of TAR fell between the mobilities of the anionic leading electrolyte ($Cl^-$ in the sample) and the anionic terminating background electrolyte ($CHES^-$), a highly concentrated zone of TAR from the BGE was formed at the rear of the sample matrix and then the metal cations toward the cathode were swept by isotachophoretically assisted on-line complexation (IAOC) between the metal ions and the isotachophoretically stacked TAR. As a result, anionic metal-TAR complexes were formed efficiently, which satisfy the TITP conditions between $Cl^-$ and $CHES^-$. The enrichment factors of metal ions including $Cd^{2+}$ were up to 780-fold compared to a conventional CZE mode using absorbance detection. The detection limits were 17 nM, 15 nM, and 27 nM for $Ni^{2+}$, $Zn^{2+}$, and $Cd^{2+}$ in a 250 mM NaCl matrix, respectively. Our method was successfully applied to the analysis of urine samples without desalting.

수소저장합금을 이용한 열수송시스템 구성 (Composition of the heat transportation system using metal hydride)

  • 심규성;명광식;김종원;한상도
    • 한국수소및신에너지학회논문집
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    • 제10권1호
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    • pp.41-48
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    • 1999
  • 산업단지에서 손실되는 막대한 폐열을 효율적으로 회수하고 이를 인근의 배후 도시에서 활용하기 위해서는 이에 적합한 열수송기술이 필요하다. 현재 온수나 증기에 의한 열수송은 배관을 통하여 열손실 및 마찰손실 등이 발생하므로 수송거리는 3 내지 5km가 한계이다. 그러나 대부분의 공단이 도시지역에서 10km 이상 떨어져 있으므로 이들 지역에서 발생되는 폐열을 적절히 활용하기 위해서는 새로운 열수송시스템이 개발되어야 한다. 본 연구에서는 수소저장합금이 수소를 흡수 또는 방출하면서 발열반응과 흡열반응을 일으키는 특성을 이용하여 산업공단지역의 폐열로부터 수소저장합금의 수소를 방출시키고, 이 수소를 인근 도시지역에 파이프라인으로 수송한 후 필요시 또 다른 수소저장합금과 반응시켜 열을 얻을 수 있는 열수송시스템에 대하여 고찰하였다. 이 시스템에서는 난방의 목적 외에도 수소의 흡수 방출온도가 낮은 합금을 이용하여 냉열을 얻을 수도 있으며, 폐열의 저장수단으로, 또한 수소를 수송함으로서 열수송의 수단으로 활용할 수 있다. 이에 따라 수소저장합금을 이용한 열수송기술의 문제점과 열수송시스템의 구성기술에 대하여도 검토하였다.

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탄소 나노튜브가 코팅된 은 메탈-메쉬 전극의 특성 (Characteristics of Silver Metal-mesh Electrodes Coated by Carbon Nanotubes)

  • 김부종;박종설;황영진;박진석
    • 반도체디스플레이기술학회지
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    • 제14권1호
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    • pp.55-59
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    • 2015
  • This study demonstrates hybrid-type transparent electrodes for touch screen panels. The hybrid-type electrodes were fabricated by coating carbon nanotubes (CNTs) on metal meshes. To form the metal-meshes, thin films of silver (Ag) were deposited on glass substrates using the sputtering method and then patterned via photolithography to obtain mesh structures whose line width was $10{\mu}m$ and line-to-line spacing was $300{\mu}m$. CNTs were coated on Ag-meshes by using two different methods, such as spray coating and electrophoretic deposition (EPD). For the samples of a Ag-meshes and CNTs-coated Ag-meshes, their surface morphologies, electrical sheet resistances, and visible-range transmittances and reflectances were characterized and compared. The experimental results indicated that the reflectance of Ag-mesh electrodes was substantially reduced by coating of CNTs. Especially, the hybrid electrodes of Ag-meshes with EPD-coated CNTs showed excellent properties such as sheet resistance lower than $20{\Omega}/{\Box}$, transmittance higher than 90 %, and reflectance lower than 8%.

154kV 송전선로 피뢰기 설치용 아킹혼 개발 (Development of Arc-horn to be mounted on 154kV Transmission Line Arrester)

  • 민병욱;김우겸;이북창;최한열;박재웅;금의연
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2008년도 제39회 하계학술대회
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    • pp.335-336
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    • 2008
  • Overhead transmission lines are mainly crossing mountainous area. They are easily affected in weathers like typhoon, strong wind, lightning, heavy rain, or heavy snow. Sometimes these weathers cause transmission line faults. A lightning flashover is most often fault. Nowadays lightning density in KOREA is growing high and lightning flashovers occur more often. A lightning flashover on transmission line is mostly cleared by momentary operation of a circuit breaker, so power failure happens rarely. However, when both circuits trip simultaneously due to the lightning flashovers on double circuit transmission line, short time power failure and voltage drop happen. KEPCO has used transmission line arresters to avoid double circuit simultaneous trip out since 2003. And transmission line arresters cannot be installed with KEPCO's present metal fittings, so various fittings have been used for each transmission line arrester manufacturer. This paper introduces development and standardization of arc-horn and metal fittings for transmission line arrester which can be used for both existing lines and new lines in KEPCO.

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디지털 프린팅을 위한 전도성 배선에 관한 연구 (Investigation of Conductive Pattern Line for Direct Digital Printing)

  • 김용식;서상훈;이로운;김태훈;박재찬;김태구;정경진;윤관수;박성준;정재우
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.502-502
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    • 2007
  • Current thin film process using memory device fabrication process use expensive processes such as manufacturing of photo mask, coating of photo resist, exposure, development, and etching. However, direct printing technology has the merits about simple and cost effective processes because inks are directly injective without mask. And also, this technology has the advantage about fabrication of fine pattern line on various substrates such as PCB, FCPB, glass, polymer and so on. In this work, we have fabricated the fine and thick metal pattern line for the electronic circuit board using metal ink contains Ag nano-particles. Metal lines are fabricated by two types of printing methods. One is a conventional printing method which is able to quick fabrication of fine pattern line, but has various difficulties about thick and high resolution DPI(Dot per Inch) pattern lines because of bulge and piling up phenomenon. Another(Second) methods is sequential printing method which has a various merits of fabrication for fine, thick and high resolution pattern lines without bulge. In this work, conductivities of metal pattern line are investigated with respect to printing methods and pattern thickness. As a result, conductivity of thick pattern is about several un.

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