• Korean Journal of Soil Science and Fertilizer
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• v.28 no.2
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• pp.105-113
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• 1995

Adsorption experiments of heavy metal cations by Fe- and Al-hydroxides was conducted to obtain clear information on their adsorption mechanisms. The adsorption isothermal curves of heavy metal cations by Fe- and Al-hydroxides conformed to Langmuir's equation. Increasing the crystallinity degree of Fe- and Al-hydroxides tended to decrease the adsorption capacity and binding energy of heavy metal cations. At the same crystallinity degree, Al-hydroxide showed higher adsorption capacity and energy for the heavy metal cations than Fe-hydroxide. The adsorption capacity and energy of heavy metal cations were directly related to CEC, specific surface area and charge density of hydroxides, and the sequence was in the order of $Cu^{+{+}}$ > $Zn^{+{+}}$ > $Cd^{+{+}}$. The adsorption mechanism of $M^{+{+}}$ form of heavy metal could be presumed as the specific adsorption of $M^{+{+}}$ and the desorption of two $H^+$ from the surface aquo($OH_2$) and/or hydroxo(-OH) group for each mole of $M^{+{+}}$ adsorbed. A ring structure between $M^{+{+}}$ and two surface aquo and/or hydroxo groups was postulated. Nonspecific adsorption involved the adsorption of $MCl^+$ and the desorption of one H+ from the surface aquo and/or hydroxo groups for each mole of $M^{+{+}}$ adsorbed. A single bond structure in which $MCl^+$ replaced one $H^+$ from the surface aquo and/or hydroxo groups was postulated. The ratio of specific to nonspecific adsorption increased with increasing pH.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.44 no.5
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• pp.8-14
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• 2007

In this paper, $HfO_2$/Hf stacked film has been applied as the gate dielectric in MOS devices. The $HfO_2$ thin film was deposited on p-type (100) silicon wafers by atomic layer deposition (ALD) using TEMAHf and $O_3$ as precursors. Prior to the deposition of the $HfO_2$ film, a thin Hf metal layer was deposited as an intermediate layer. Round-type MOS capacitors have been fabricated on Si substrates with 2000${\AA}$-thick Al or Pt top electrode. The prepared film showed the stoichiometric components. At the $HfO_2$/Si interface, both Hf-Si and Hf-Si-O bonds were observed, instead of Si-O bond. The sandwiched Hf metal layer suppressed the growing of $SiO_x$ layer so that $HfSi_xO_y$ layer was achieved. It seems that the intermediate Hf metal layer has a benefit for the enhancement of electric characteristics of gate dielectric in $HfO_2$/Si structure.

• Journal of the Korean Society of Fisheries and Ocean Technology
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• v.20 no.1
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• pp.49-59
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• 1984

Optimizing investigation of characteristics of underwater welding by a gravity type arc welding process was experimentally carried out by using six types of domestic coated welding electrodes for welding of domestic marine structural steel plates (KR Grade A-1, SWS41A, SWS41B,) in order to develop the underwater welding techniques in practical use. Main results obtained are summarized as follows: 1. The absorption speed of the coating of domestic coated lime titania type welding-electrode became constant at about 60 minutes in water and it was about 0.18%/min during initial 8 minutes of absorption time. 2. Thus, the immediate welding electrode could be used in underwater welding for such a short time in comparison with the joint strength of in-atmosphere-and on-water-welding by dry-, wet-or immediate-welding-electrode. 3. By bead appearance and X-ray inspection, ilmenite, limetitania and high titanium oxide types of electrodes were found better for underwater-welding of 10 mm KR Grade A-1 steel plates, while proper welding angle, current and electrode diameter were 6$0^{\circ}C$, above 160A and 4mm respectively under 28cm/min of welding speed. 4. The weld metal tensile strength or proof stress of underwater-welded-joints has a quadratic relationship with the heat input, and the optimal heat input zone is about 13 to 15KJ/cm for 10mm SWS41A steel plates, resulting from consideration upon both joint efficiency of above-100% and recovery of impact strength and strain. Meanwhile, the optimal heat input zone resulting from tension-tension fatigue limit above the base metal's of SWS41A plates is 16 to 19KJ/cm. Reliability of all the empirical equations reveals 95% confidence level. 6. The microstructure of the underwater welds of SES41A welded in such a zone has no weld defects such as hydrogen brittleness with supreme high hardness, since the HAZ-bond boundary area adjacent to both surface and base metal has only Hv400 max with the microstructure of fine martensite, bainite, pearlite and small amount of ferrite.

• Journal of the Korean Chemical Society
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• v.51 no.3
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• pp.265-269
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• 2007

A comparative study on crystal structures and UV-visible diffuse reflectance spectra for Nb-containing oxyfluorides was performed to probe the relationship between energy band gap and local structure. The oxyfluorides, RbSrNb2O6F, RbCaNb2O6F and RbNb2O5F are commonly composed of the corner-sharing NbO5F octahedra as structural building units. The average Nb-O(F)-Nb bond angles, which can be a measure of the structural distortion, are 158.6° for RbSrNb2O6F, 149.6° for RbCaNb2O6F and 139.5° for RbNb2O5F. As the bond angle decreases, the band gap increases: 3.48eV for RbSrNb2O6F, 3.75eV for RbCaNb2O6F and 4.03 eV for RbNb2O5F. This experimental result implies that the band gap can be controlled with a range of 0.6 eV through a variation of local structure for the Nb-containing oxyfluorides.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.397-397
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• 2013

The electrical, electronic, optical properties and the local structure of Nickel Oxide (NiO) thin film have been investigated by X-ray photoelectron spectroscopy (XPS), Reflection Electron Energy Loss Spectroscopy (REELS), UV-spectrometer,Hall Effect measurement and X-ray absorption spectroscopy (XAS). The XPS results show that the Ni 2p spectra for all films consist of $Ni2p_{3/2}$ at around 854.5 eV which indicate the presence of Ni-O bond from NiO phase and for the annealed film at temperature above $200^{\circ}C$ shows the coexist Ni oxide and Ni metal phase. The REELS spectra showed that the band gaps of the NiO thin films were abruptly decreased with increasing temperature. The values of the band gaps are consistent with the optical band gaps estimated by UV-Spectrometer. The optical transmittance spectra shows that the transparency of NiO thin films in the visible light region was deteriorated with higher temperature due to existence of $Ni^0$. Hall Effect measurement suggest that the NiO thin films prepared at relatively low temperatures (RT and $100^{\circ}C$) are suitable for fabricating p-type semiconductor which showed that the best properties was achieved at $100^{\circ}C$, such as a low resistivity of $7.49{\Omega}.cm$. It can be concluded that the annealing process plays a crucial role in converting from p type to n type semiconductor which leads to reducing electrical resistivity of NiO thin films. Furthermore, the extended X-ray absorption fine structure (EXAFS) spectrum at the Ni K-edge was used to address the local structure of NiO thin films. It was found that the thermal treatments increase the order in the vicinity of Ni atom and lead the NiO thin films to bunsenite crystal structure. Moreover, EXAFS spectra show in increasing of coordination number for the first Ni-O shell and the bond distance of Ni-O with the increase of substrate temperature.

• Journal of the Mineralogical Society of Korea
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• v.29 no.4
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• pp.209-220
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• 2016

Clay minerals are a major player to determine geochemical cycles of trace metals and carbon in the critical zone which covers the atmosphere down to groundwater aquifers. Molecular dynamics (MD) simulations can examine the Earth materials at an atomic level and, therefore, provide detailed fundamental-level insights related to physicochemical properties of clay minerals. In the current study, we have applied classical MD simulations with clayFF force field to dioctahedral clay minerals (i.e., gibbsite, kaolinite, and pyrophyllite) to analyze and compare structural parameters (lattice parameter, atomic pair distance) with experiments. We further calculated vibrational power spectra for the hydroxyls of the minerals by using the MD simulations results. The MD simulations predicted lattice parameters and interatomic distances respectively deviated less than 0.1~3.7% and 5% from the experimental results. The stretching vibrational wavenumber of the hydroxyl groups were calculated $200-300cm^{-1}$ higher than experiment. However, the trends in the frequencies among different surface hydroxyl groups of each mineral was consistent with experimental results. The angle formed by the surface hydroxyl group with the (001) plane and hydrogen bond distances of the surface hydroxyls were consistent with experimental result trends. The inner hydroxyls, however, showed results somewhat deviated from reported data in the literature. These results indicate that molecular dynamics simulations with clayFF can be a useful method in elucidating the roles of surface hydroxyl groups in the adsorption of metal ions to clay minerals.

• Korean Journal of Materials Research
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• v.3 no.5
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• pp.459-465
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• 1993

By making the inter-metal PECVD $SiO_2$ as a Si rich oxide under the SOG, the hydrogen and water related diffusants could be captured a t SI dangling bonds. This gettering process was known to prevent the device characteristics degradations related to the H, $H_20$. The basic characteristics of Si rich oxide have been studied according to changing high/low frequency power and $SiH_4/N_2O$ gas flow ratio in PECVD. As increase in low frequency power, deposition rate decreased but K.I. and compressive stress increased. Decrease of the water peaks of FTIR spectra at the wave number range of 3300~3800$\textrm{cm}^{-1}$' also indicated that intensty the films were densified. As increase in SiH, gas flow rate, deposition rate, R.I. and etch rate increased while compressive stress decreased. F'TIK spectra showed that peak intensity corresponding to Si-0-Si stretching vibration decreased and shifted to the lower wave numbers. But AES showed that Si dangl~ng bonds were increased as a result of lower Si:O(l: 1.23) ratlo inthe Si rich oxide as compared to Si : O(1 : 1.98) ratio of usual oxide.

• Korean Journal of Materials Research
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• v.8 no.6
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• pp.538-544
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• 1998

The spallation of a thermal barrier coating layer depends on the formation of brittle spinels. thermal expansion mismatch between ceramic and metal. the phase transformation of a ceramic layer and residual stress of coating layer. In this work. the formation mechanism of oxide scale formed by oxidation treatment at 90$0^{\circ}C$ was investigated in order to verify oxidation behavior at the interface between E-beam coated $Zr0_2$-7wt.% $Y_20_3$ and plasma sprayed CoNiCrAIY. Some elements distributed in the bond coating layer were selectively oxidized after oxidation. At the initial time of oxidation. AI-depletion zone and $\alpha$-$Al_O_3$,O, were formed at the bond coating layer by the AI-outward diffusion. After layer grew until critical thickness. spinels. $Cr_20$, and $C0_2CrO_4$ by outward diffusion of Co. Cr, Ni were formed. It was found that the formation of spinels may be related to the spallation of $Zr0_2$-7wt.% $Y_20_3$ during isothermal oxidation.

• The Journal of Korean Academy of Prosthodontics
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• v.39 no.3
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• pp.260-272
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• 2001

All-ceramic restorations have had a more limited life expectancy than metal ceramic restorations because of their low strength. Their relatively lower strength and resistance to fracture have restricted the use of all-ceramic crowns to anterior applications where occlusal loads are lower. But there has been increasing interest in all-ceramic restorations because patients are primarily concerned with improved esthetics. Many efforts have been made to in prove the mechanical properties of dental ceramics. This study was designed to elucidate the influence of the luting agent on the strength of the Empress 2 crown (staining technique) cemented on human teeth. Seventy extracted human permanent molar teeth were chosen. Teeth were prepared for Empress 2 crowns with milling machine on a surveyor. A dental bur was placed in the mandrel that was positioned so that the long axis of the bur was perpendicular to the surveyor base. Dimensions of the Empress 2 crown preparation were $6^{\circ}$ taper on each side, $1.5{\pm}0.1mm$ shoulder margin, and 4mm crown height. The luting cements used in this study were as follow: 1. Uncemented 2. Zinc phosphate cements (Confi-Dental) 3. Conventional glass ionomer cement : Fuji 1 (GC) 4. Resin-modified glass ionomer cements : Fuji plus (GC) 5. Adhesive cements : Panavia F (Kuralay), Variolink II (Vivadent), Choice (Bisco). Fracture test using Instron. The crowns were loaded in compressive force to evaluate the effect of these cements on the breaking strength of these all-ceramic crowns. A steel ball with a diameter of 4mm was placed on the occlusal surface and load was applied to the steel ball by a cylindrical bolt with a crosshead speed of 0.5mm per minute until fracture occurred. The fractured surface was examined using Scanning Electron Microscopic Image (SEM) to discover the correlation between fracture strength and bonding capacity. Within the limitation of this in vitro study design, the results were as follows : 1. fomentations significantly increased the fracture resistance of Empress ceramic crowns compared to control. Uncemented (206.9 N): ZPC (812.9 N): Fuji 1 (879.5 N): Fuji Plus (937.7 N): Choice (1105.4 N): Variolink II (1221.1 N): Panavia F (1445.2 N). 2. Resin luting agent, treated by a silane bond enhancing agents, yielded a significant increase in fracture resistance. In some of the Panavia F group, a fracture extended into dentin. 3. According to SEM images of fractured Empress crowns, the stronger the bond at both interfaces(crown and die), the more fracture strength was acquired.

• Current Photovoltaic Research
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• v.9 no.3
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• pp.75-83
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• 2021

The tunnel oxide passivated contact (TOPCon) structure got more consideration for development of high performance solar cells by the introduction of a tunnel oxide layer between the substrate and poly-Si is best for attaining interface passivation. The quality of passivation of the tunnel oxide layer clearly depends on the bond of SiO in the tunnel oxide layer, which is affected by the subsequent annealing and the tunnel oxide layer was formed in the suboxide region (SiO, Si₂O, Si₂O₃) at the interface with the substrate. In the suboxide region, an oxygen-rich bond is formed as a result of subsequent annealing that also improves the quality of passivation. To control the surface morphology, annealing profile, and acceleration rate, an oxide tunnel junction structure with a passivation characteristic of 700 mV or more (V_oc) on a p-type wafer could achieved. The quality of passivation of samples subjected to RTP annealing at temperatures above 900℃ declined rapidly. To improve the quality of passivation of the tunnel oxide layer, the physical properties and thermal stability of the thin layer must be considered. TOPCon silicon solar cell has a boron diffused front emitter, a tunnel-SiO_x/n⁺-poly-Si/SiN_x:H structure at the rear side, and screen-printed electrodes on both sides. The saturation currents J_o of this structure on polished surface is 1.3 fA/cm² and for textured silicon surfaces is 3.7 fA/cm² before printing the silver contacts. After printing the Ag contacts, the J_o of this structure increases to 50.7 fA/cm² on textured silicon surfaces, which is still manageably less for metal contacts. This structure was applied to TOPCon solar cells, resulting in a median efficiency of 23.91%, and a highest efficiency of 24.58%, independently. The conversion efficiency of interdigitated back-contact solar cells has reached up to 26% by enhancing the optoelectrical properties for both-sides-contacted of the cells.