EFFECT OF THE OXYGEN RADICAL ON ITO THIN FILM DEPOSITED AT ROOM TEMPERATURE USING IBAD(ION BEAM ASSISTED DEPOSITION) METHOD (OXYGEN ION BEAM ASSISTED DEPOSITION 법으로 유기막 위에 증착된 상온 ITO (INDIUM TIN OXIDE) 박막의 특성)
-
- Proceedings of the Materials Research Society of Korea Conference
- /
- 1999.11a
- /
- pp.140-140
- /
- 1999