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http://dx.doi.org/10.3938/jkps.73.1279

Deposition of Fine Linewidth Silver Layer using a Modified Laser-induced Forward Transfer Technique  

Cheon, Jonggyu (Department of Materials Science and Engineering, Inha University)
Nguyen, Manh-Cuong (Department of Materials Science and Engineering, Inha University)
Nguyen, An Hoang-Thuy (Department of Materials Science and Engineering, Inha University)
Choi, Sujin (Department of Materials Science and Engineering, Inha University)
Ji, Hyung-Min (Department of Materials Science and Engineering, Inha University)
Kim, Sang-Woo (Department of Materials Science and Engineering, Inha University)
Yu, Kyoung-Moon (Department of Materials Science and Engineering, Inha University)
Kim, Jin-Hyun (Department of Materials Science and Engineering, Inha University)
Cho, Seong-Yong (Department of Materials Science and Engineering, Inha University)
Choi, Rino (Department of Materials Science and Engineering, Inha University)
Publication Information
Journal of the Korean Physical Society / v.73, no.9, 2018 , pp. 1279-1282 More about this Journal
Abstract
This paper reports the deposition of a metal line using a multilayer stack and laser-induced forward transfer (LIFT) using a low cost continuous wave blue laser with a wavelength of 450 nm. The donor structure was composed of a light-to-heat (LTH) layer, a release layer, and a transfer layer in series. Amorphous silicon as the LTH layer absorbs photon energy and converts it to heat. A release layer was melted so that a silver transfer layer would be transferred to the receiver substrate. The transferred silver layer showed reasonable physical and electrical characteristics. A low cost fine linewidth metal layer could be achieved using this modified LIFT technique and blue laser.
Keywords
Laser-Induced Forward Transfer; Light absorb layer; 450 nm wavelength continuous laser;
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