• Title/Summary/Keyword: Material removal amount

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Machining Performance of Optical Glass with Magnetorheological Fluid Jet Polishing (MR 유체 제트 연마를 이용한 광학유리의 가공성능)

  • Kim, Won-Woo;Kim, Wook-Bae
    • Journal of the Korean Society for Precision Engineering
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    • v.28 no.8
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    • pp.929-935
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    • 2011
  • As a deterministic finishing process for the optical parts having complex surface, machining performance of the magnetorheological(MR) fluid jet polishing of optical glass are studied and compared with a general water jet polishing. First, design of the jet polishing system which has the special electromagnet-nozzle unit for stabilizing the slurry jet based on MR fluid and the change of jet shape as magnetic field is applied are explained. Second, for the BK7 glass, machining spot and its cross section profile are analyzed and the unique effect of MR fluid jet polishing is shown. Third, both material removal depth and surface roughness are explored in order to investigate the polishing performance of MR fluid jet. With the same ceria abrasives and amount in the polishing slurries, MR fluid jet shows superior machining performance compared to water jet and the difference of material removal mechanism and its resulting performance are described.

Manufacture of Novel Composites Synthesized with Ferromagnetic and Nano-Sized Prussian Blue and D eriving Optimum Conditions (강자성체와 나노사이즈의 프러시안 블루가 합성된 새로운 형태의 복합체 제조 및 최적의 적용 조건 도출)

  • Jong Kyu Kim
    • Korean Journal of Materials Research
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    • v.33 no.4
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    • pp.151-158
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    • 2023
  • In this study, a new type of composite material combined with carbonyl iron, a relatively strong ferromagnetic material, was prepared to overcome the current application limitations of Prussian blue, which is effective in removing radioactive cesium. The surface of the prepared composite was analyzed using SEM and XRD, and it was confirmed that nano-sized Prussian Blue was synthesized on the particle surface. In order to evaluate the cesium removal ability, 0.2 g of the composite prepared for raw cesium aquatic solution at a concentration of 5 ㎍ was added and reacted, resulting in a cesium removal rate of 99.5 %. The complex follows Langmuir's adsorption model and has a maximum adsorption amount (qe) of 79.3 mg/g. The Central Composite Design (CCD) of the Response Surface Method (RSM) was used to derive the optimal application conditions of the prepared composite. The optimal application conditions achieved using Response optimization appeared at a stirring speed of pH 7, 17.6 RPM. The composite manufactured through this research is a material that overcomes the Prussian Blue limit in powder form and is considered to be excellent economically and environmentally when applied to a cesium removal site.

Graphic Simulation of Material Removal Process Using Bounding Box and Base Plane (기준평면과 경계상자를 이용한 NC 절삭과정의 그래픽 시뮬레이션)

  • 이철수;박광렬
    • Korean Journal of Computational Design and Engineering
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    • v.2 no.3
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    • pp.161-174
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    • 1997
  • In this paper, the techniques for graphic simulation of material removal process are described. The concepts of the bounding box and base plane are proposed. With these concepts, a real-time shaded display of a Z-map model being milled by a cutting tool following an NC path can be implemented very efficiently. The base planes make it possible to detect the visible face of Z-map model effectively. And the bounding box of tool sweep volume provides minimum area of screen to be updated. The proposed techniques are suitable for implementation in raster graphic device and need a few memories and a small amount of calculation. Proposed method is written in C and executable on MS-Windows95 and Window-NT.

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Effect of the welding residual stress redistribution on impact absorption energy (재분포된 용접잔류응력이 충격흡수에너지에 미치는 영향)

  • Yang, Zhaorui;Lee, Youngseog
    • Journal of Welding and Joining
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    • v.33 no.1
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    • pp.72-79
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    • 2015
  • Evaluation of fracture toughness of welded structures has a significant influence on the structural design. However the residual stresses is redistributed while the welded structures is cut for preparing specimens. This study investigated an effect of the welding residual stress redistribution on the impact absorption energy of Charpy specimen. SA516Gr70 steel plate by at the flux cored arc welding (FCAW) and gas tungsten arc welding(GTAW) was cutting. Specimens for Charpy impact testing were taken from the welded plate. Two material removal mechanisms (wire cutting and water jet) were used to make the specimens. Welding residual stress and redistribution residual stress were measured using the XRD (X-Ray Diffraction) method. The amount of redistribution of residual stress depends on the different material removal mechanism. Redistribution of residual stress of reduced the impact absorption energy by 15%.

Selective Adsorption Properties of Carbonyl Compounds in Cigarette Mainstream Smoke by Hydrazine Impregnated Adsorbent (Hydrazine 첨착 흡착제에 의한 담배 주류연 중 카보닐 화합물의 선택 흡착 특성)

  • Park Jin-Won;Rhee Moon-Soo;Lee John-Tae;Hwang Keon-Joong;Hwang Taek-Sung
    • Journal of the Korean Society of Tobacco Science
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    • v.27 no.2
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    • pp.178-188
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    • 2005
  • To use the filter materials for selective removal of carbonyl compounds in cigarette mainstream smoke, hydrazine such as 2,4-dinitrophenylhydrazine and dansylhydraznie impregnated adsorbents were prepared with perchloric acid or phosphoric acid as a accelerator in hydrazone formation reaction. The change of morphology of adsorbents in various of impregnator were investigated by SEM. Impregnation amount caused by reaction time, acid type and impregnation reagent, and the adsorption properties of carbonyl compounds in cigarette mainstream smoke were investigated. Amounts of impregnation was increased as increasing reaction time. The removal amount for vapor phase carbonyl compounds by 2,4-DNPH impregnated adsorbent was higher than that of dansylhydrazine impregnated adsorbent. The selectivity of 2,4-DNPH impregnated polyacrylic type adsorbent was superior to those of other adsorbents. This results indicated that the 2,4-DNPH impregnated polyacrylic adsorbent was applicable to cigarette filter material because of its fast reactivity and porosity.

Fundamental Studies on the Calcium Precipitation for the Reuse of Wastewater Containing Phosphate (칼슘 침전처리에 의한 인산폐수 재사용에 관한 연구)

  • Kim Yaung-Im;Kim Dong-Su
    • Resources Recycling
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    • v.12 no.4
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    • pp.38-43
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    • 2003
  • Phosphate is an essential material for the growth of organisms. However. since relatively small amount is required. a large amount of phosphate is abandoned in wastes and wastewater. which contaminate the ecological environment including aquatic system. Purpose of this study is to treat especially high concentrated phosphate wastewater by use of calcium precipitation method. The pH range considered was from 6 to 12 and the maximum removal of phosphate was attained at pH 12. The con-centration of phosphate was observed to decrease rapidly until a half amount of calcium ion to its equivalent for the formation of calcium phosphate precipitate was added. which resulted in the decrease of the remaining concentration of phosphate down to 0.0027 mM. The effect of fluoride ion was examined and the concentration ratio between the phosphate and fluoride ion did not have any significant influence on the removal efficiency of phosphate. The effect of pH was also investigated. With the increasing of the pH in solution, the removal rate of phosphate was increased. Also it was investigated that the effect of fluoride on the phosphate removal was not significant.

A Study on Kinematical Modeling and Analysis of Double Side Wafer Polishing Process (실리콘 웨이퍼 양면 연마 공정의 기구학적 모델링과 해석에 관한 연구)

  • Lee, Sang-Jik;Jeong, Suk-Hoon;Lee, Hyun-Seop;Park, Sun-Joon;Kim, Young-Min;Jeong, Hae-Do
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.485-485
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    • 2009
  • Double side polishing process has been used for various industrial applications, such as polishing of semiconductor substrates and flat panel display glasses. In wafer manufacturing, double side polishing process is applied to improve wafer flatness and to minimize particle generation from wafers in device manufacturing processes, which is recognized as one of the most important processes. Whereas the kinematical modeling and analysis results of single side polishing, extensively used for chemical-mechanical polishing (CMP) in device manufacturing, are well investigated, the studies in conjunction with double side polishing are barely carried out, due to the complication of polishing system and the uncertainty of wafer motion in the carrier. This paper suggests the derivation of kinematical model with consideration of carrier and wafer motion in double side polishing, and then presents the effect of kinematical parameters on material removal amount and its non-uniformity. The kinematical analysis results help to understand the double side polishing process and to control the polishing results.

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Micro-computed tomographic evaluation of canal retreatments performed by undergraduate students using different techniques

  • Silva, Emmanuel Joao Nogueira Leal;Belladonna, Felipe Goncalves;Carapia, Marianna Fernandes;Muniz, Brenda Leite;Rocha, Mariana Santoro;Moreira, Edson Jorge Lima
    • Restorative Dentistry and Endodontics
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    • v.43 no.1
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    • pp.5.1-5.9
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    • 2018
  • Objectives: This study evaluated the amount of remaining root canal filling materials after retreatment procedures performed by undergraduate students using manual, rotary, and reciprocating techniques through micro-computed tomographic analysis. The incidence of instrument fracture and the instrumentation time were also evaluated. Materials and Methods: Thirty maxillary single rooted teeth were prepared with Reciproc R25 files and filled with gutta-percha and AH Plus sealer by the continuous wave of condensation technique. Then, the specimens were assigned to 3 groups (n = 10), according to the retreatment technique used: manual, rotary, and reciprocating groups, which used K-file, Mtwo retreatment file, and Reciproc file, respectively. Retreatments were performed by undergraduate students. The sample was scanned after root canal filling and retreatment procedures, and the images of the canals were examined to quantify the amount of remaining filling material. The incidence of instrument fracture and the instrumentation time were recorded. Results: Remaining filling material was observed in all specimens regardless of the technique used. The mean volume of remaining material was significantly lower in the Reciproc group than in the manual K-file and Mtwo retreatment groups (p < 0.05). The time required to achieve a satisfactory removal of canal filling material and refinement was significantly lower in the Mtwo retreatment and Reciproc groups (p < 0.05) when compared to the manual K-file group. No instrument fracture was observed in any of the groups. Conclusions: Reciproc was the most effective instrument in the removal of canal fillings after retreatments performed by undergraduate students.

Preparation of Self-detoxifying Textile for Removal of Chemical Warfare Agents (군사목적의 유해화학물질 제거용 보호복 소재 제조를 위한 섬유 후가공 처리)

  • Kim, Hanil;Choi, Ik-Sung;Park, Seong-Woo;Han, Yo-han;Kim, Sung-Hun;Park, Hyun-Bae;Min, Mun-hong
    • Textile Coloration and Finishing
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    • v.31 no.1
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    • pp.33-41
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    • 2019
  • In this report, nano-sized catalysts were introduced onto fabric surface to eliminate toxic chemicals assisted by physical adsorption. For chemical removal of toxic compounds, a series of zirconium-containing catalysts were synthesized and treated on fabric to catalyze the hydrolysis and oxidation of target molecules. Antimicrobial was also introduced for the research purpose to prove the compatibility of as-synthesized catalysts with other solutions. Zirconium ligated with hydroxyl group and MOF(Metal-Organic Frameworks) were exploited as catalyst for removal of toxic compounds, while zinc complex was used for an antimicrobial to culminate in a chemical shield. Once fabrics were functionalized, fabrics were washed 2 or 5 times for a washing durability test. The amount of catalyst in textile were measured by ICP-MS and weight increasing ratio of fabrics.

Effect of Current Density on Material Removal in Cu ECMP (구리 ECMP에서 전류밀도가 재료제거에 미치는 영향)

  • Park, Eunjeong;Lee, Hyunseop;Jeong, Hobin;Jeong, Haedo
    • Tribology and Lubricants
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    • v.31 no.3
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    • pp.79-85
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    • 2015
  • RC delay is a critical issue for achieving high performance of ULSI devices. In order to minimize the RC delay time, we uses the CMP process to introduce high-conductivity Cu and low-k materials on the damascene. The low-k materials are generally soft and fragile, resulting in structure collapse during the conventional high-pressure CMP process. One troubleshooting method is electrochemical mechanical polishing (ECMP) which has the advantages of high removal rate, and low polishing pressure, resulting in a well-polished surface because of high removal rate, low polishing pressure, and well-polished surface, due to the electrochemical acceleration of the copper dissolution. This study analyzes an electrochemical state (active, passive, transpassive state) on a potentiodynamic curve using a three-electrode cell consisting of a working electrode (WE), counter electrode (CE), and reference electrode (RE) in a potentiostat to verify an electrochemical removal mechanism. This study also tries to find optimum conditions for ECMP through experimentation. Furthermore, during the low-pressure ECMP process, we investigate the effect of current density on surface roughness and removal rate through anodic oxidation, dissolution, and reaction with a chelating agent. In addition, according to the Faraday’s law, as the current density increases, the amount of oxidized and dissolved copper increases. Finally, we confirm that the surface roughness improves with polishing time, and the current decreases in this process.