• 한국전산유체공학회지
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• 제17권2호
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• pp.42-52
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• 2012

Direct Numerical Simulation(DNS) of turbulent mass transfer in fully developed turbulent pipe flow has been performed to study the effect of wall boundary conditions on the concentration fields at $Re_{\tau}$=180 based on friction velocity and pipe radius. Fully developed turbulent pipe flows for Sc=0.71 are studied with two different wall boundary conditions, namely, constant mass flux and constant wall concentration. The mean concentration profiles and turbulent mass fluxes obtained from the present DNS are in good agreement with the previous numerical results currently available. To investigate the effects of wall boundary condition on the turbulent mass transfer, the mean concentration profile, root-mean-square of concentration fluctuation, turbulent mass fluxes and higher-order statistics(Skewness and Flatness factor) are compared for the two cases. Furthermore, the budgets of turbulent mass fluxes and concentration variance were computed and analyzed to elucidate the effects of wall boundary conditions on the turbulent mass transfer.

• 한국전산유체공학회지
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• 제17권3호
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• pp.59-67
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• 2012

Large Eddy Simulation(LES) of turbulent mass transfer in fully developed turbulent pipe flow has been performed to study the effect of Reynolds number on the concentration fields at $Re_{\tau}=180$, 395, 590 based on friction velocity and pipe radius. Dynamic subgrid-scale models for the turbulent subgrid-scale stresses and mass fluxes were employed to close the governing equations. Fully developed turbulent pipe flows with constant mass flux imposed at the wall are studied for Sc=0.71. The mean concentration profiles and turbulent intensities obtained from the present LES are in good agreement with the previous numerical and experimental results currently available. The effects of Reynolds number on the turbulent mass transfer are identified in the higher-order statistics(Skewness and Flatness factor) and instantaneous concentration fields. The budgets of turbulent mass fluxes and concentration variance were computed and analyzed to elucidate the effect of Reynolds number on turbulent mass transfer. Furthermore, to understand the correlation between near-wall turbulence structure and concentration fluctuation, we present an octant analysis in the vicinity of the pipe wall.

• 한국산업보건학회지
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• 제28권3호
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• pp.273-282
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• 2018

Objectives: Dustiness of nanomaterials is considered as exposure index of essential material. Research on dustiness of nanomaterial is needed to control exposure in workplaces. Method: Dustiness measurement using vortex shaker were installed in the laboratory. Nanomaterials, 1 g, was put in the glass test tube and shaked using vortex shaker. Aerosol dispersed was measured using scanning mobility particle sizer(SMPS) and optical particle counter(OPC). Mass concentration using PVC filter and cassette was measured and TEM grid sampling was conducted. Total particle concentration and size distribution were calculated. Image and chemical composition of particles in the air were observed using transmission electron microscopy and energy dispersive X-ray spectrometer. Eleven different test nanomaterials were used in the study. Results: Rank of mass concentration and particle number concentration were coincided in most cases. Rank of nanomateirals with low concentration were not coincided. Two types of fumed silica had the highest mass concentration and particle number concentration. Indium tin oxide, a mixture of indium oxide and tin oxide, had high mass concentration and particle number concentration. Indium oxide had very low mass concentration and particle number concentration. Agglomeration of nanoparticles in the air were observed in TEM analysis and size distribution. In this study, mass concentration and particle number concentration were coincided and two index can be used together. The range of dustiness in particle number concentration were too wide to measure in one method. Conclusion: Particle number concentration ranged from low concentration to high concentration depend on type of nanomaterial, and varied by preparation and amount of nanomaterial used. Further study is needed to measure dustiness of all nanomaterial as one reference method.

• Mass Spectrometry Letters
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• 제12권2호
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• pp.47-52
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• 2021

Evaluating the impurity concentrations in semiconductor thin films using time of flight secondary ion mass spectrometry (ToF-SIMS) is an effective technique. The mass interference between isotopes and matrix element in data interpretation makes the process complex. In this study, we have investigated the doping concentration of phosphorus in, phosphorus doped silicon thin film on glass using ToF-SIMS in the dynamic mode of operation. To overcome the mass interference between phosphorus and silicon isotopes, the quantitative analysis of counts to concentration conversion was done following two routes, standard relative sensitivity factor (RSF) and SIMetric software estimation. Phosphorus doped silicon thin film of 180 nm was grown on glass substrate using hot wire chemical vapor deposition technique for possible applications in optoelectronic devices. Using ToF-SIMS, the phosphorus-31 isotopes were detected in the range of 10¹~10⁴ counts. The silicon isotopes matrix element was measured from p-type silicon wafer from a separate measurement to avoid mass interference. For the both procedures, the phosphorus concentration versus depth profiles were plotted which agree with a percent difference of about 3% at 100 nm depth. The concentration of phosphorus in silicon was determined in the range of 10¹⁹~10²¹ atoms/cm³. The technique will be useful for estimating distributions of various dopants in the silicon thin film grown on glass using ToF-SIMS overcoming the mass interference between isotopes.

• Mass Spectrometry Letters
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• 제12권1호
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• pp.26-30
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• 2021

The impurity concentration is a crucial parameter for semiconductor thin films. Evaluating the impurity distribution in silicon thin film is another challenge. In this study, we have investigated the doping concentration of boron in silicon thin film using time of flight secondary ion mass spectrometry in dynamic mode of operation. Boron doped silicon film was grown on i) p-type silicon wafer and ii) borosilicate glass using hot wire chemical vapor deposition technique for possible applications in optoelectronic devices. Using well-tuned SIMS measurement recipe, we have detected the boron counts 101~104 along with the silicon matrix element. The secondary ion beam sputtering area, sputtering duration and mass analyser analysing duration were used as key variables for the tuning of the recipe. The quantitative analysis of counts to concentration conversion was done following standard relative sensitivity factor. The concentration of boron in silicon was determined 1017~1021 atoms/㎤. The technique will be useful for evaluating distributions of various dopants (arsenic, phosphorous, bismuth etc.) in silicon thin film efficiently.

• 한국전산유체공학회지
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• 제17권3호
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• pp.1-10
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• 2012

Large Eddy Simulation(LES) of turbulent mass transfer in fully developed turbulent pipe flow has been performed to study the effect of Reynolds number on the concentration fields at $Re_{\tau}=180$, 395, 590 based on friction velocity and pipe radius. Dynamic subgrid-scale models for the turbulent subgrid-scale stresses and mass fluxes were employed to close the governing equations. Fully developed turbulent pipe flows with constant mass flux imposed at the wall are studied for Sc=0.71. The mean concentration profiles and turbulent intensities obtained from the present LES are in good agreement with the previous numerical and experimental results currently available. To show the effects of Reynolds number on the turbulent mass transfer, the mean concentration profile, root-mean-square of concentration fluctuations, turbulent mass fluxes, cross-correlation coefficient, turbulent diffusivity and turbulent Schmidt number are presented.

• 한국마린엔지니어링학회:학술대회논문집
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• 한국마린엔지니어링학회 2002년도 춘계학술대회논문집
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• pp.41-47
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• 2002

A model of simultaneous heat and mass transfer process in absorption of refrigerant vapor into a lithium bromide solution of water-cooled vertical plate absorber was developed. The model can predict temperature and concentration profiles as well as the absorption heat and mass fluxes, the total heat and mass transfer rates and the heat and mass transfer coefficients. Besides, the effect of operating condition on absorption mass flux has been investigated, with the result that the absorption mass flux is increased as the inlet cooling water temperature decreases, the system pressure increases and the inlet solution concentration increases. And among the effects of operating parameters on absorption mass flux, the effect of inlet solution concentration is dominant.

• 한국미생물·생명공학회지
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• 제17권3호
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• pp.241-246
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• 1989

Quadrupole mass spectrometer를 이용한 발효 배기가스의 분석을 통해 세포의 증식을 on-line monitoring하고자 model 균주로 Candida utilis에 대해 연구하였다. Quadrupole mass spectrometer와 interface된 16-bit 개인용 컴퓨터 (IBM PC-AT)에서 산소 소비속도(OUR)와 이산화탄소 발생속도(CER)를 on-line 계산할 수 있었고 계속해서 이들 계산치로부터 세포농도와 증식속도 및 비증식속도를 계산하였다. 계산된 값들은 실험적으로 측정한 세포농도 및 비증식속도와 잘 일치함을 알 수 있었다.

• Journal of Preventive Medicine and Public Health
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• 제20권2호
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• pp.255-260
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• 1987

The digital dust indicator (Sibata P-5), one of the direct·reading instruments was evaluated for the respirable dust in the underground coal mine environments. As a reference, respirable dust was determined using three cyclones and/or impactors. All the tests were performed on aerosol in twenty underground coal mines. The coefficients of mass-relative concentration were $0.067{\pm}0.054$ (Mean$\pm$Standard deviation) (range: 0.006-0.172). The relationship between relative concentration and temperature was not significant statistically. Also, the relationship of relative concentration and relative humidity was not significant. Mass concentration and relative concentration were $5.31{\pm}5.22mg/m^3$ and $162{\pm}163$ CPM ($Mean{\pm}Standard$ deviation) respectively. The range of mass concentration was $1.22-22.69mg/m^3$; relative concentration 16-628 CPM. The relationship of mass concentration and relative concentration was not significant in these ranges.

• Mass Spectrometry Letters
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• 제3권4호
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• pp.108-111
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• 2012

An experimental study on the nascent product of the OH heterogeneous reaction with NaCl was performed under dry and wet conditions using a bead-filled flow tube system coupled to a high-pressure chemical ionization mass spectrometer. The ozone concentration in the flow tube for the atomic hydrogen removal was varied in order to control the conversion reaction of molecular chlorine into HCl for the identification of the nascent product. The mass spectrometric observation was that the $O_3$ introduction reduced the concentration HCl, while it increased the concentration of $Cl_2$ and ClO. Based on the experimental results, we suggest that the nascent product of the titled reaction is gaseous $Cl_2$, which is followed by fast conversion into HCl in presence of H. No significant difference in the concentration profile between under dry and wet (RH = 2%) conditions was observed.