High Density Inductively Coupled Plasma Etching of III-V Semiconductors in BCI3Ne Chemistry (BCI3Ne 혼합가스를 이용한 III-V 반도체의 고밀도 유도결합 플라즈마 식각)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.16 no.12S
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- pp.1187-1194
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- 2003