• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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• pp.77-78
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• 2006

We fabricated photonic crystals on GaAs and GaN substrates. After anodizing the aluminium thin film in electrochemical embient, the porous alumina was implemented to the mask for reactive ion beam etching process of GaAs wafer. And photonic crystals in GaN wafer were also fabricated using electron beam nano-lithography process. The coated PMMA thin film with 200 nm-thickness on GaN surface was patterned with triangular lattice and etched out the GaN surface by the inductively coupled plasma source. The fabricated GaAs and GaN photonic crystals provide the enhanced intensities of light emission for the wavelengths of 858 and 450 nm, respectively. We will present the detailed dimensions of photonic crystals from SEM and AFM measurements.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.418-418
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• 2008

The electrochemical etching of silicon in HF-based solutions is known to form various types of porous structures. Porous structures are generally classified into three categories according to pore sizes: micropore (below 2 nm in size), mesopore (2 ~ 50 nm), and macropore (above 50 nm). Recently, the formation of macropores has attracted increasing interest because of their promising characteristics for an wide scope of applications such as microelectromechanical systems (MEMS), chemical sensors, biotechnology, photonic crystals, and photovoltaic application. One of the promising applications of macropores is in the field of MEMS. Anisotropic etching is essential step for fabrication of MEMS. Conventional wet etching has advantages such as low processing cost and high throughput, but it is unsuitable to fabricate high-aspect-ratio structures with vertical sidewalls due to its inherent etching characteristics along certain crystal orientations. Reactive ion dry etching is another technique of anisotropic etching. This has excellent ability to fabricate high-aspect-ratio structures with vertical sidewalls and high accuracy. However, its high processing cost is one of the bottlenecks for widely successful commercialization of MEMS. In contrast, by using electrochemical etching method together with pre-patterning by lithographic step, regular macropore arrays with very high-aspect-ratio up to 250 can be obtained. The formed macropores have very smooth surface and side, unlike deep reactive ion etching where surfaces are damaged and wavy. Especially, to make vertical microwire or nanowire arrays (aspect ratio = over 1:100) on silicon wafer with top-down photolithography, it is very difficult to fabricate them with conventional dry etching. The electrochemical etching is the most proper candidate to do it. The pillar structures are demonstrated for n-type silicon and the formation mechanism is well explained, while such a experimental results are few for p-type silicon. In this report, In order to understand the roles played by the kinds of etching solution and mask patterns in the formation of microwire arrays, we have undertaken a systematic study of the solvent effects in mixtures of HF, dimethyl sulfoxide (DMSO), iso-propanol, and mixtures of HF with water on the structure formation on monocrystalline p-type silicon with a resistivity with 10 ~ 20 $\Omega{\cdot}cm$. The different morphological results are presented according to mask patterns and etching solutions.

• 마이크로전자및패키징학회지
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• 제12권4호통권37호
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• pp.275-280
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• 2005

나노 임프린트 (NIL)와 포토 리소그라피를 접목시킨 combined nanoimprint and photolithography (CNP) 기술을 이용하여 나노 미세 패턴을 형성하였다. 일반적인 UV-NIL 스탬프의 양각 패턴 위에 Cr 금속막을 입힌 hybrid mask mold (HMM)을 E-beam writing과 plasma etching으로 제작하였다. HMM 전면에는 친수성 물질인 $SiO_2$를 코팅하여 점착방지막 역할의 self-assembled monolayer(SAM) 형성을 용이하게 함으로써 HMM과 transfer layer의 분리를 용이하게 하여 패턴 손상을 억제하였다. 또한, transfer layer에는 일반적인 monomer resin 대신에 건식 에칭에 대한 저항력이 높은 negative PR을 사용하였다. Photo-mask 역할을 하는 HMM의 Cr 금속막이 UV를 차단하여 잔류하게 되는 PR의 비경화층(unexpected residual layer)은 간단한 현상 공정으로 제거하여 PR 잔류층이 없는 나노 미세 패턴을 transfer layer에 형성하였다.

• 한국산업보건학회지
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• 제30권2호
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• pp.109-123
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• 2020

Objectives: The aims of this study were to review the standards and key components of the standards for disposable masks in Korea, the US, EU, Japan, and China and to evaluate the appropriateness of disposable masks during a virus pandemic. Methods: We reviewed the standards in the above countries and compared their key elements for each standard. For the second purpose, systemic paper gathering using key words like 'mask', 'respirator' 'virus', and 'coronavirus' in the PubMed search engine was performed. Fifty-three papers were selected and reviewed in regard to the appropriateness of test protocols with sodium chloride(NaCl) particles for virus filtration and the effectiveness against viruses. Results: The standards for masks are largely divided into two categories: US standards and EU standards. In Korea, the Ministry of Employment and Labor adapted the EU standards for workers and the Health Masks adopted the Ministry of Employment and Labor standards by the Ministry of Food and Drug Safety. Regarding airborne viral infections, WHO emphasizes only droplet infection, while many studies have shown that small particles enter the air through coughing or sneezing, which increases the possibility of airborne infection. Compared to other particles, various factors such as airborne viability and the ability to replicate the virus in the body are further involved in the virus's airborne infection rate. Airborne infection is classified into absolute air infection, preferential air infection, and opportunistic air infection. The NaCl-certified N95 mask showed good filtration efficiency against viruses and NaCl particles were proved to be a surrogate material for viruses. From this, KF94 is also expected to be effective in blocking viruses. Conclusion: The N95 test method could be used as a surrogate test method for virus filtration. N95-class masks have been found to effectively block viral infections in the air. However, surgical or medical masks are only partially effective against airborne virus infection though they could effectively block large droplet infection. However, most studies considered in this study targeted N95 in foreign countries and studies on masks actually used in Korea are very limited, so studies on microorganisms and reuse on domestic masks should be conducted in the future.

• 한국융합학회논문지
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• 제8권4호
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• pp.273-278
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• 2017

현대의 아트메이크업은 미를 목적으로 하는 인간의 원초적 욕망이나 욕구의 논리적 사고에서 벗어나 개성화 차별화의 추세에 따라 폭넓게 전개되어지고 있으며 고객의 니즈(needs)에 맞게 다양하게 융합 접목되어지고 있다. 20세기 미술사조의 중심이 되는 입체주의는 아트메이크업을 표현하는데 있어 창의성을 기반으로 하는 좋은 소재가 된다. 이에 본 연구는 입체주의 표현기법을 아트메이크업에 융합시켜 아트마스크에 제시함으로써 새로운 디자인 발상과 표현영역을 창출해내는 데 있다. 연구방법은 선행연구와 인터넷 자료, 전문서적 등을 토대로 입체주의와 아트메이크업에 대한 고찰 후, 입체주의 표현기법을 크게 복수시점, 형태의 분할, 콜라주로 나누어 피카소의 작품을 모티브로 아트마스크에 융합 디자인한다. 이러한 연구 결과, 입체주의 표현기법이 아트메이크업에도 적용 가능하게 나타났으며 창의적인 아트메이크업 융합 디자인을 도출해내어 제시할 수 있었다. 향후 이에 따른 연구가 활발히 이루어지기를 기대해보며 본 연구가 아트메이크업 디자인 개발에 도움이 되길 바란다.

• 한국전기전자재료학회논문지
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• 제28권11호
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• pp.727-730
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• 2015

In this paper, we fabricated organic compounds detector using the MWCNT/PMMA (multi-walled carbon nanotube / polymethylmethacrylate) composite film. We used polymer film as a matrix material for the device framework, and introduced CNTs for reacting with the organic compounds resulting in changing electrical conductivity. Spray coating method was used to form the MWCNT/PMMA composite film detector, and pattern formation of the detector was done by shadow mask during the spray coating process. We investigated changes of electrical conductivity of the detector before and after the organic compounds exposure. Electrical conductivity of the detector tended to decrease after the exposure with various organic compounds such as acetone, tetrahydrofuran (THF), toluene, and dimethylformamide (DMF). Finally we conclude that organic compounds detection by the MWCNT/PMMA composite film detector was possible, and expect the feasibility of commercial MWCNT/PMMA composite film detector for various organic compounds.

• 한국전기전자재료학회논문지
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• 제25권5호
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• pp.353-360
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• 2012

As semiconductor device technology continuously shrinks, low-open area etch process prevails in front-end etch process, such as contact etch as well as one cylindrical storage (OCS) etch. To eliminate over loaded wafer processing test, it is commonly performed to emply diced small coupons at stage of initiative process development. In nominal etch condition, etch responses of whole wafer test and coupon test may be regarded to provide similar results; however, optical emission spectroscopy (OES) which is frequently utilize to monitor etch chemistry inside the chamber cannot be regarded as the same, especially etch mask is not the same material with wafer chuck. In this experiment, we compared OES data acquired from two cases of etch experiments; one with coupon etch tests mounted on photoresist coated wafer and the other with coupons only on the chuck. We observed different behaviors of OES data from the two sets of experiment, and the analytical results showed that careful investigation should be taken place in OES study, especially in coupon size etch.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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• pp.136-139
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• 2002

Previous valves have initial gap problem, high voltage or high pressure problem. In this paper, various micro valves with free floating structure have been fabricated and tested to solve the initial gap and high pressure problems. The paper presents how to etch Parylene-C which is a valve cap material without A1 mask layer. The maximum flow-rate of fabricated micro valve is$118{\mu\ell}$/min with $370{\mu}m$ orifice size and the leakage at the initial and reverse pressure is not observed.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
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• pp.141-144
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• 2003

This study proposes ZnO thin film as a piezoelectric material for SAW (surface acoustic wave) filter. The ZnO thin film with thickness $2.6{\mu}m$ was deposited (0001)-oriented sapphire by RF magnetron sputtering technique. IDTs (inter-digital transducers) electrodes were patterned upon SAW filter mask with solid finger structure unapodized using lift-off method on ZnO piezoelectric thin film. SAW propagation velocity was measured with the center frequency by HP 8753C network analyzer. A fabricated ZnO SAW filter exhibited a high propagation velocity of 5433 $^m/s$ and relatively insertion loss of -53.391dB at $\lambda=80{\mu}m$. The side-lobe attenuation of the center frequency was about 17dB. When the wavelength was $80{\mu}m$ $(\lambda/4=20{\mu}m)$, the center frequency was 67.907 MHz. $k^2$ (electromechanical coupling coefficient) was 15.84 %.

• 한국군사과학기술학회지
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• 제11권2호
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• pp.101-108
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• 2008

This study attempted to develop the technology by gaseous ozone for decontaminating building affected by a model of biological weapon agent(Bacillus subtilis spores) instead of Bacillus anthracis spore. The use of ozone is attractive method from a practical point of view of decontamination procedure since it has strong oxidation power but no residue after application. We examined the disinfection efficiency of gaseous ozone to Bacillus subtilis spores which suspension was sprayed on different material surfaces and dried. Three different types of gaseous ozone was applied : dry ozone, dry ozone with humidified air, and water bubbled wet ozone. Dry ozone(1500ppm) failed to achieve any significant inactivation for 2hrs. However, six log reduction of B. subtilis spore was achieved within 30min by 1500ppm of water bubbled wet ozone. This result shows the noticeable inactivation efficiency by gaseous ozone compared with previous studies. Good performance by wet ozone was also found for military material surface.(i.e. : gas mask hood, protective garments, army peinted metal surface).