• 한국반도체및디스플레이장비학회:학술대회논문집
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• 한국반도체및디스플레이장비학회 2007년도 춘계학술대회
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• pp.139-143
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• 2007

The need for technological developments of lithography equipment is urgent for the stable production in response to the rapid growth of the recent display industry. As an example, the products currently in the market face alteration problems resulting from excessive weight of the mask holder part. This is one of obstacle for the automation of the equipment. In response, the mask holder part problem has been minimized through FEM and design of experiments in order to optimize the situation with minimized Deflection and reduced mass for satisfactory replacement of the mask holder part.

• 한국철도학회:학술대회논문집
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• 한국철도학회 2010년도 춘계학술대회 논문집
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• pp.1774-1778
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• 2010

This paper introduced the appearance characteristics of the cab mask & telescopic handrail arms for the New Zealand EMU to be applied with inter-city transportation in 2010. The appearance characteristics are improvements of driver's sightline, implementation of safety zone of gangway plate by using the telescopic handrail arms, improvements of staff & female crew & ground crew's convenience. and also, during have looking the New Zealand EMU(Electric Multiple Unit), I hope that people who having the interesting of the cab mask design would be gotten help with basic knowledge.

• 대한전자공학회논문지
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• 제24권1호
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• pp.149-158
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• 1987

This paper describes the SEAS which is a 2-dimensional graphic editor for schematic circuit and IC mask layout. This system runs on general purpose computer and Tektronix 4110 series graphic terminal. With this system, user can edit schematic circuits and/or IC mask layout with 2 level hierarchy. This system supports more than 20 kinds of built-in symbol, user definable internal symbols, 60 macros, 16 function keys, 4 level on-screen menu operation and edit-in-place of cell in main drawing. And it provides editing functions such as reflection, rotation, move and copy of one or a group of elements, and modification of polygona geometry etc. To improve the excution speed, we used local memory of graphic terminal. For the portability of the program, the system is written in FORTRAN 77 programming language.

• 한국정보처리학회:학술대회논문집
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• 한국정보처리학회 2021년도 추계학술발표대회
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• pp.927-929
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• 2021

최근 펫팸족(Pet-Family)과 같이 반려동물을 가족처럼 생각하는 가구가 증가하면서 반려동물 시장이 크게 성장하고 있다. 이러한 이유로 본 논문에서는 반려동물의 객체 식별을 통한 객체 분할과 신체 좌표추정에 기반을 둔 반려동물의 행동 분류 방법을 제안한다. 이 방법은 CCTV를 통해 반려동물 영상 데이터를 수집한다. 수집된 영상 데이터는 반려동물의 인스턴스 분할을 위해 Mask R-CNN(Region Convolutional Neural Networks) 모델을 적용하고, DeepLabCut 모델을 통해 추정된 신체 좌푯값을 도출한다. 이 결과로 도출된 영상 데이터와 추정된 신체 좌표 값은 CNN(Convolutional Neural Networks)-LSTM(Long Short-Term Memory) 모델을 적용하여 행동을 분류한다. 본 모델을 바탕으로 행동을 분석 및 분류하여, 반려동물의 위험 상황과 돌발 행동에 대한 올바른 대처를 제공할 수 있는 기반을 제공할 것이라 기대한다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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• pp.119-121
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• 2003

A working prototype of a 32-inch wide-screen CRT is presented with a tube length of only 32 cm. This small length requires a '$135^{\circ}$' deflection design, which puts strong requirements upon the DY, glass and mask box design.

• 한국멀티미디어학회논문지
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• 제1권2호
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• pp.183-193
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• 1998

칼라 역 해프토닝(Color inverse half toning)은 해프토닝된 칼라 영상을 시각적으로 보다 자연스러운 연속 계조 칼라영상으로 변환해 주는 방법이다. 본 논문에서는, 칼라 채널 영상에서 나타나는 해프톤 셀 패턴을 효과적으로 제거할 수 있는 새로운 평활화 마스크를 제안하고, 이를 칼라 역 해프토닝에 활용하였다 제안한 평활화 마스크는 기존의 평활화 마스크가 잘 제거하지 못했던 해프톤 셀 패턴올 시각적으로 보다 자연스럽게 평활화할 수 있으며, 마스크의 특성이 다양한 해프톤 영상에 적합하게 자동 조정될 수 있도록 설계하였다 실험을통해, 기폰의 방법과본논문에서 제안한방법에 의한결과 영상을다양한측면에서 비교분석함으로써 제안한 평활화 마스크의 유용성올 확인하였다. 제안한 방법은 전자 출판, 칼라 팩스, 디지힐 도서관 구축 퉁과 같은 멀티미디어 분야에서 활용될 수 있다.

• 한국광학회지
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• 제13권2호
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• pp.117-122
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• 2002

홀로그래픽 필름으로 제작된 그레이스케일 마스크를 통하여 두꺼운 포토레지스트를 자외선으로 근접 노광하여 주기 300 $\mu\textrm{m}$, 두께 17 $\mu\textrm{m}$, 초점거리 2.2 mm인 10$\times$10 미소렌즈 배열을 제작하였다. 그레이스케일 마스크는 컴퓨터로 설계한 미소렌즈 배열을 필름 출력기를 이용하여 고해상도 흑백 필름에 그레이스케일로 기록 및 현상하고 이를 다시 홀로그래픽 필름에 축소복사(6.6배)하여 제작하였다. 본 제작방법은 저렴한 비용으로 100%에 가까운 fill-factor를 얻을 수 있고, 비구면 렌즈를 구현하기가 쉽다는 장점을 가진다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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• pp.948-951
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• 2005

New technology that reduces photolithography process steps from 4 to 3 in fabrication of TFT LCD is introduced. The core technology for 3mask-TFTs is the lift-off process [1], by which the PAS and PXL layer are formed simultaneously. To evaluate the stability of this lift-off process, outgases from photo resist on a substrate during ITO deposition and the quality of ITO film were analyzed and the conventional photo resist stripper machine which operates lift-off process was examined to see its ability to reduce particle problems of the machine. Through the development of total process and design for TFTs using this 3mask technology, panels in TN and IPS modes which exhibit same performances of a display using a conventional process were achieved. In addition, this process was already verified in the mass production line and now some products are being produced by the 3mask technology.

• Nuclear Engineering and Technology
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• 제53권4호
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• pp.1266-1276
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• 2021

The mask parameters of a coded aperture are critical design features when optimizing the performance of a gamma-ray camera. In this paper, experiments and Monte Carlo simulations were performed to derive the minimum detectable activity (MDA) when one seeks a real-time imaging capability. First, the impact of the thickness of the modified uniformly redundant array (MURA) mask on the image quality is quantified, and the imaging of point, line, and surface radiation sources is demonstrated using both cross-correlation (CC) and maximum likelihood expectation maximization (MLEM) methods. Second, the minimum detectable activity is also derived for real-time imaging by altering the factors used in the image quality assessment, consisting of the peak-to-noise ratio (PSNR), the normalized mean square error (NMSE), the spatial resolution (full width at half maximum; FWHM), and the structural similarity (SSIM), all evaluated as a function of energy and mask thickness. Sufficiently sharp images were reconstructed when the mask thickness was approximately 2 cm for a source energy between 30 keV and 1.5 MeV and the minimum detectable activity for real-time imaging was 23.7 MBq at 1 m distance for a 1 s collection time.

• 한국의류학회지
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• 제34권2호
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• pp.291-302
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• 2010

This study details the actual wearing conditions and favored design of ready-made pants for obese women, particularly for those in their twenties and thirties. The actual problems that customers feel and the preferred design of pants were suggested based on the survey and from the standpoint of consumers. The findings of the survey are as follows. The actual wearing conditions in the survey, 80.5% like wearing pants. The main reason to prefer pants is that pants are more convenient for social or professional work activities. The main reason to avoid wearing pants is that the pants (in general) do not mask an obese body shape. The most favored was Denim/Elastic and the second most favored was Cotton/Elastic from the survey. On average, elastic materials are preferred over non-elastic materials. The reason was the comfort in wearing and convenience in social or professional activities that could mask obesity. In terms of the style, the most favored was blue jeans and the second favored was semi-formal. A straight-silhouette is the most favored as it was able to help mask obesity. The most favored position for the waistline is 4 cm lower than the natural waistline. The most favored pant length is where the pants slightly touch the floor when they stand with shoes on. For obese women the pants development that covers the weak points of the body shape giving, which is comfortable and active are desired.