• 한국자기학회지
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• 제10권6호
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• pp.285-290
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• 2000

본 연구에서는 Hexagonal Barium Ferrite(BaM) 박막을 RF magnetron sputtering system을 이용하여 상온에서 증착한후, 85$0^{\circ}C$에서 열처리하여 결정화하였다. XRD pattern을 통해 BaM 박막의 working pressure 10 mTorr에 대한 산소분압(Po$_2$)을 0~3 mTorr가지 변화하여 알아본 결과, 1 mTorr 이하의 산소분압(Po$_2$)에서는 spinel 상과 BaM 상이 함께 형성되었으나, 1 mTorr 이상의 높은 산소분압(Po$_2$)에서는 BaM 상만이 형성되는 것을 알 수 있었다. BaM 박막의 자기적특성을 VSM을 통하여 알아본 결과 산소분압(Po$_2$)이 증가함에 따라 수직보자력은 일정하게 감소를 하였으나 포화자화값은 1 mTorr가지 증가하다 감소하였다. 열처리 시간에 따른 결정화 정도와 특성을 알아본 결과 열처리를 시작한 뒤 10분 이내에 대부분의 특성변화가 일어났으며, 그 이상의 온도에서는 커다란 변화를 일으키지 않음을 알 수 있었다.

• 한국자기학회지
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• 제11권3호
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• pp.129-133
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• 2001

본 연구에서는 TiO$_2$ 하지층이 첨가된 hexagonal barium-ferrite(BaM) 박막을 RF/DC magnetron sputtering system을 이용하여 상온에서 증착한 후, 여러 온도에서 열처리하여 결정화하였다. BaM박막에 TiO$_2$ 하지층을 첨가하여 열처리한 경우 Si와 BaM의 (006), (106), (114), (217), (2011) peak들이 사라지고 (008)의 intensity가 낮아졌으며 SiO$_2$와 (116), (302)의 peak들이 성장하였음을 XRD pattern을 통하여 알 수 있었다. BaM 박막의 자기적 특성을 VSM을 통하여 알아본 결과, 보자력, 잔류자화, 각형비 등의 자기적인 특성들은 수직에 비해 수평이 더 좋게 나타났는데, 이러한 결과로 박막면에 평행한 방향으로의 자화용이축이 존재하고 있다는 것을 알 수 있었다. SEM을 통하여 증착압력 및 열처리 시간에 따른 결정화 정도와 자기적 특성을 알아본 결과 5 mTor 보다 10 mTrr에서 더 좋게 나타났으며, 열처리를 시작한 뒤 10분 이내에 750 $^{\circ}C$ 이상에서 대부분의 특성변화가 일어났음을 알 수 있었다.

• 한국자기학회지
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• 제11권3호
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• pp.122-128
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• 2001

본 연구에서는 여러 하지층이 첨가된 hexagonal barium-ferrite(BaM) 박막을 RF/DC magnetron sputtering system을 이용하여 상온에서 증착한 후, 850 $^{\circ}C$에서 10분간 열처리하여 결정화하였다. BaM 박막에 여러 하지층을 첨가하여 고온 열처리한 경우 수평방향의 (107), (114) peak과 수직방향의 (006), (008) peak이 같이 관찰되어 결정이 random한 방향으로 성장되었다는 것을 알 수 있었다. BaM 박막의 자기적 특성을 VSM을 통하여 알아본 결과, 보자력 , 잔류자화, 각형비 등의 자기적인 특성들은 수직에 비해 수평이 좀더 좋게 나타났는데, 이러한 결과로 박막면에 평행한 방향으로의 자화용이축이 존재하고 있다는 것을 알 수 있었다. SEM과 AFM을 통하여 표면의 모양을 살펴본 결과 grain size는 박막의 두께가 두꺼워지면서 증가하였으며, 300 $\AA$ 두께에서 판상모양과 긴 모양의 grain들이 관찰되었다. 이러한 grain 모양은 박막의 두께가 600$\AA$으로 증가할 때까지 계속되는 것을 관찰하였으나, 1500$\AA$의 두께에서는 단지 긴 모양의 grain들만이 관찰되었다.

• 한국자기학회지
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• 제22권5호
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• pp.173-177
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• 2012

미크론 자성비드 검출용 바이오센서에 활용하는 GMR-SV 박막을 이온빔 스퍼터링 증착법으로 glass/Ta(5.8 nm)/NiFe(5 nm)/Cu(t nm)/NiFe(3 nm)/FeMn(12 nm)/Ta(5.8 nm)의 구조를 갖도록 증착하였다. 비자성체 Cu의 두께가 3.0 nm에서 2.2 nm까지 얇아질수록 교환결합력은 증가하였고 자기저항비는 다소 감소하였다. 비자성체의 두께가 얇으면 반강자성체의 층간 교환작용이 강자성체의 고정층뿐만 아니라 자유층의 스핀배열에도 영향을 주고 있음을 확인할 수 있었다. 또한 리소그래피 공정 과정을 거쳐 GMR-SV 소자를 제작하여 미크론 자기비드를 검출하였다. 여기서 자기비드를 떨어뜨리기 전과 후의 자기저항비, 교환결합력, 보자력은 각각 0.9%, 3Oe, 2 Oe의 값을 나타내었다. 이러한 결과로 나노 단위의 바이오센서에 활용할 수 있는 가능성을 보여주었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.100-101
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• 2012

The plasma damage free and room temperature processedthin film deposition technology is essential for realization of various next generation organic microelectronic devices such as flexible AMOLED display, flexible OLED lighting, and organic photovoltaic cells because characteristics of fragile organic materials in the plasma process and low glass transition temperatures (Tg) of polymer substrate. In case of directly deposition of metal oxide thin films (including transparent conductive oxide (TCO) and amorphous oxide semiconductor (AOS)) on the organic layers, plasma damages against to the organic materials is fatal. This damage is believed to be originated mainly from high energy energetic particles during the sputtering process such as negative oxygen ions, reflected neutrals by reflection of plasma background gas at the target surface, sputtered atoms, bulk plasma ions, and secondary electrons. To solve this problem, we developed the NBAS (Neutral Beam Assisted Sputtering) process as a plasma damage free and room temperature processed sputtering technology. As a result, electro-optical properties of NBAS processed ITO thin film showed resistivity of $4.0{\times}10^{-4}{\Omega}{\cdot}m$ and high transmittance (>90% at 550 nm) with nano- crystalline structure at room temperature process. Furthermore, in the experiment result of directly deposition of TCO top anode on the inverted structure OLED cell, it is verified that NBAS TCO deposition process does not damages to the underlying organic layers. In case of deposition of transparent conductive oxide (TCO) thin film on the plastic polymer substrate, the room temperature processed sputtering coating of high quality TCO thin film is required. During the sputtering process with higher density plasma, the energetic particles contribute self supplying of activation & crystallization energy without any additional heating and post-annealing and forminga high quality TCO thin film. However, negative oxygen ions which generated from sputteringtarget surface by electron attachment are accelerated to high energy by induced cathode self-bias. Thus the high energy negative oxygen ions can lead to critical physical bombardment damages to forming oxide thin film and this effect does not recover in room temperature process without post thermal annealing. To salve the inherent limitation of plasma sputtering, we have been developed the Magnetic Field Shielded Sputtering (MFSS) process as the high quality oxide thin film deposition process at room temperature. The MFSS process is effectively eliminate or suppress the negative oxygen ions bombardment damage by the plasma limiter which composed permanent magnet array. As a result, electro-optical properties of MFSS processed ITO thin film (resistivity $3.9{\times}10^{-4}{\Omega}{\cdot}cm$, transmittance 95% at 550 nm) have approachedthose of a high temperature DC magnetron sputtering (DMS) ITO thin film were. Also, AOS (a-IGZO) TFTs fabricated by MFSS process without higher temperature post annealing showed very comparable electrical performance with those by DMS process with $400^{\circ}C$ post annealing. They are important to note that the bombardment of a negative oxygen ion which is accelerated by dc self-bias during rf sputtering could degrade the electrical performance of ITO electrodes and a-IGZO TFTs. Finally, we found that reduction of damage from the high energy negative oxygen ions bombardment drives improvement of crystalline structure in the ITO thin film and suppression of the sub-gab states in a-IGZO semiconductor thin film. For realization of organic flexible electronic devices based on plastic substrates, gas barrier coatings are required to prevent the permeation of water and oxygen because organic materials are highly susceptible to water and oxygen. In particular, high efficiency flexible AMOLEDs needs an extremely low water vapor transition rate (WVTR) of $1{\times}10^{-6}gm^{-2}day^{-1}$. The key factor in high quality inorganic gas barrier formation for achieving the very low WVTR required (under ${\sim}10^{-6}gm^{-2}day^{-1}$) is the suppression of nano-sized defect sites and gas diffusion pathways among the grain boundaries. For formation of high quality single inorganic gas barrier layer, we developed high density nano-structured Al2O3 single gas barrier layer usinga NBAS process. The NBAS process can continuously change crystalline structures from an amorphous phase to a nano- crystalline phase with various grain sizes in a single inorganic thin film. As a result, the water vapor transmission rates (WVTR) of the NBAS processed $Al_2O_3$ gas barrier film have improved order of magnitude compared with that of conventional $Al_2O_3$ layers made by the RF magnetron sputteringprocess under the same sputtering conditions; the WVTR of the NBAS processed $Al_2O_3$ gas barrier film was about $5{\times}10^{-6}g/m^2/day$ by just single layer.

• 한국세라믹학회지
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• 제43권2호
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• pp.79-84
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• 2006

We studied the microstructure and magnetic property of the pulsed DC magnetron sputtered $Zn_{\0.8}Co_{0.2}O$ film as a function of substrate temperatures. The X-ray patterns of the $Zn_{\0.8}Co_{0.2}O$ film showed a strong (002) preferential orientation at $500^{\circ}C$. The films with a crystallite size of 23-35 nm were grown in the form of nano-sized structure and this tendency was remarkable with increasing substrate temperature. The UV-visible result showed that the $Zn_{\0.8}Co_{0.2}O$ film prepared above $300^{\circ}C$ has a high optical transmittance of over $80\%$ in the visible region. The absorption bands were observed due to sp-d interchange action by $Co^{2+}$ complex ion and dd transition in the region from 500 to 700nm. The resistivity of the film was below $10^{-1}\;\Omega-cm\;above\;300^{\circ}C$. The AGM analysis results for the all films showed the magnetic hysteresis curves of ferromagnetic nature. The low electrical resistivity and room temperature ferromagnetism of ZnCoO thin films 'deposited above $300^{\circ}C$ suggested the possibility for the application to Diluted Magnetic Semiconductors (DMSs).

• Journal of Magnetics
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• 제3권2호
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• pp.55-63
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• 1998

Magnetic and magnetostrictive properties of amorphous Sm-Fe and Sm-Fe-B thin films are systematically investigated over a wide composition range from 14.1 to 71.7 at.% Sm. The films were fabricated by rf magnetron sputtering using a composite target composed of an Fe (or Fe-B) plate and Sm chips. The amount of B added ranges from 0.3 to 0.8 at. %. The microstructure, examined by X-ray diffraction, mainly consists of an amorphous phase in the intermediate Sm content range from 20 to 45 at.%. Together with an amorphous phase, crystalline phases of Fe and Sm also exist at low and high ends of the Sm content, respectively. Well-developed in-plane anisotropy is formed over the whole compositionrange, except for the low Sm content below 15 at.% and the high Sm content above 55 at %. As the Sm content increases, the saturation magnetization decreases linearly and the coercive force tends to increase, with the exception of the low Sm content where very large magnitudes of the saturation magnetization and the coercive force are observed due to the existence of the crystalline $\alpha$-Fe phase. The coercive force is affected rather substantially by the B addition, resulting in lower values of the coercive force in the practically important Sm content range of 30 to 40 at.%. Good magnetic softness indicated by well-developed in-plane anisotropy, a square-shaped hysteresis loop and a low magnitude of the coercive force results in good magnetostrictive characteristics in both Sm-Fe-B thin films. The magnetostrictive characteristics, particularly at low magnetic fields, are further improved by the addition of B; for example, at a magnetic field of 100 Oe, the magnitude of magnetostriction is -350 ppm in a Sm-Fe thin film and it is -470 ppm in a B containing Sm-Fe thin film.

• 한국자기학회지
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• 제10권5호
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• pp.250-255
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• 2000

본 연구에서는 double rectangular spiral형 공심 인덕터를 유사 LIGA공정으로, F $e_{86.7}$Z $r_{3.3}$ $B_{4}$A $g_{6}$ 자성막을 dc magnetron sputtering법으로 각각 제조한 후 인덕터의 구조를 변화시켜, 인덕터의 임피던스 특성에 미치는 자성막의 특성 인자에 대해 연구하였다. 공심 인덕터의 전류 방향과 자성 박막의 자화 용이축이 수직일 경우 인덕터의 인덕턴스가 향상되었고, 공심 인덕터와 F $e_{86.7}$Z $r_{3.3}$ $B_{4}$A $g_{6}$ 자성막 사이 절연막이 없는 경우 자성막의 자속 집속효과가 증가하여 절연막이 있는 경우보다 인덕턴스는 높고, 저항의 증가율이 높았으며, F $e_{86.7}$Z $r_{3.3}$ $B_{4}$A $g_{6}$ 자성막의 투자율이 높을수록 인덕터의 인덕턴스에 기여하는 부분이 증가하므로 인턱턴스는 향상되었다. 또한 인덕터의 주파수 특성은 공심 인덕터의 특성에 지배적인 영향을 받으므로 인덕터의 주파수 특성을 향상시키기 위해서는 자성막의 특성보다 공심 인덕터의 특성을 향상시키는 것이 바람직하다.키는 것이 바람직하다.

• Journal of Magnetics
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• 제2권3호
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• pp.76-85
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• 1997

Magnetic and magnetostrictive properties of Tb-Fe and Tb-Fe-B thin films are systematically investigated over a wide composition range from 40.2 to 68.1 at. % Tb. The films were fabricated by rf magnetron sputtering using a composite target which consists of an Fe plate and Tb chips. The microstructure, examined by X-ray diffraction, mainly consists of an amorphous phase and, at high Tb contents, a pure Tb phase also exists. A progressive change in the direction of anisotropy from the perpendicular to in-plane occurs as the Tb content increases and the boundary at which the anisotropy change occurs shifts significantly towards to higher Tb contents with the addition of B. The saturation magnetization exhibits maxima at the Tb contents of 42 and 48 at. % for Tb-Fe and Tb-Fe-B thin films, respectively, and it is decreased by the addition of B. The coercive force, measured in the easy direction, decreases monotonically with the Tb content. Excellent magnetostrictive characteristics, particularly at low magnetic fields, are achieved in both Tb-Fe and Tb-Fe-B thin films; for example, a magnetostriction of 138 ppm is obtained in a Tb-Fe-B thin film at a magnetic field as low as 30 Oe. The excellent magnetostrictive properties of the present thin films are supported by the equally excellent magnetic softness, the coercivity below 10 Oe and a typical squared-loop shape with the saturation field as low as 1 kOe. Due to the excellent low field magnetostrictive characteristics, the present Tb-Fe based thin films are thought to be suitable for Si based microdevices.

• 한국자기학회지
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• 제14권4호
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• pp.127-130
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• 2004

본 연구는 (pd/Co)$_{N}$FeMn 구조의 다층박막을 dc 마그네트론 스퍼터링 시스템으로 증착하여 교환결합된 수직이방성에 대한 자기적 특성과 열적안정성을 조사하였다. 반강자성 FeMn 두께를 0-2lnm에서 변화시키면서 측정한 결과 Ta(1.9 nm)/(Pd(0.8nm)/Co(0.8nm)$_{5}$Mn(15nm)/Ta(1.9nm)에서 127 Oe교환바이어스세기(exchange biasing field: H$_{ex}$)를 얻었다. 그리고 이 구조에서 열적 안정성을 조사하기 위하여 온도 변화에 따른 H$_{ex}$변화를 확인한 결과, 24$0^{\circ}C$까지는 H$_{ex}$가 115 Oe에서 195 Oe까지 증가하였고, 그 이후 33$0^{\circ}C$에서 교환 결합된 수직자기이방성 곡선이 사라지는 것을 관찰하였다.