• Journal of the Korean Electrochemical Society
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• v.5 no.2
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• pp.57-61
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• 2002

In this study, the effect of ammonium chloride on the electrodeposition of CoP magnetic alloy film was investigated. The correlation between the electrodeposition condition and the magnetic properties was tried to elucidate by the electro- analytical tests such as cyclic voltammetry. It was observed that the magnetic properties of the films were varied extensively with the ammonium chloride contents in the solution. The reason why the magnetic properties of the films were varied with the addition of ammonium chloride was thought that the addition of ammonium chloride controlled the electrocrystallization of CoP kinetically by charge transfer and increased the grain size and the orientation factor. This may cause the variation of the magnetic properties of CoP films.

• Journal of the Korean Vacuum Society
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• v.12 no.S1
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• pp.104-106
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• 2003

In this study, the electronic structures and physical properties of Ni$_2$MnGa alloy films and their dependence on the order-disorder structural transitions were investigated. The results show that the ordered films behave nearly the same as the bulk $Ni_2$MnGa alloy, including the martensitic transformation at 200 K. Unexpectedly, the disordering in $Ni_2$MnGa alloy films does not lead to any appreciable magnetic ordering down to 4 K. An annealing of the disordered films restores the ordered structure with an almost full recovery of the magnetic and the transport properties of the ordered $Ni_2$MnGa alloy films. A possible explanation of the disappearance of magnetic moment in the disordered film is given by using the ab initio first-principles electronic-structure calculations.

• Journal of the Korean Vacuum Society
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• v.7 no.s1
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• pp.1-6
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• 1998

The influence of the order-disorder structural transition on the magnetic and mageto-optical, and transport properties of Fe-Al and Co-Al alloy films has been investigated. The disordered states in the alloy films were prepared by vapor quenching deposition on glass substrates cooled by liquid nitrogen. The experimental study of the magento-optical properties of the ordered and disordered Fe-Al and Co-Al alloy films has been carried out in 1.05-5.0 eV energy range at room temperature. The transport properties have been measured in 2-300K temperature range with and without magnetic field of 0.5T. The influence of the order-disorder structural transition on the magnetic and magneto-optical properties was discussed by using the effective medium approximation and the structural defect approach. That on the temperature dependence of the resistivity was analyzed in a framework of the partial localization of the electronic states and the variable range hopping conductivity.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07a
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• pp.155-159
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• 2003

Polycrystalline $Ti_{1-x}Co_xO_2$ thin films on $SiO_2$ (200 nm)/Si (100) substrates were prepared using liquid-delivery metalorganic chemical vapor deposition. Microstructures and ferromagnetic properties were investigated as a function of doped Co concentration. Ferromagnetic behaviors of polycrystalline films were observed at room temperature, and the magnetic and structural properties strongly depended on the Co distribution, which varied widely with doped Co concentration. The annealed $Ti_{1-x}Co_xO_2$ thin films with $x{\leq}0.05$ showed a homogeneous structure without any clusters, and pure ferromagnetic properties of thin films are only attributed to the $Ti_{1-x}Co_xO_2$ (TCO) phases. On the other hand, in case of thin films above x=0.05, Co clusters formed in a homogeneous $Ti_{1-x}Co_xO_2$ Phase, and the overall ferromagnetic (FM) properties depended on both $FM_{TCO}$ and $FM_{Co}$. Co clusters with about 10nm-150nm size decreased the value of Mr (the remanent magnetization) and increased the saturation magnetic field.

• Proceedings of the Korean Vacuum Society Conference
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• 2003.08a
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• pp.79-79
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• 2003

• Proceedings of the Korean Vacuum Society Conference
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• 2007.08a
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• pp.148-148
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• 2007

• Journal of Magnetics
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• v.3 no.1
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• pp.31-35
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• 1998

Metal/cobalt ferrite composite thin films with the saturation magnetization (M_s$)of~580 emu/cm3 and the coercivity(Hc) of 1700 Oe were prepared by the reactive sputtering. With increasing substrate temperature, Ms of the thin films increased, while Hc of the thin films decrease. This sttributed to the precipitation of $Co_xFe_{1-x}(x {\appro}x0.62)$ metal phase in the thin films. The metal phase showed the BCC structure ($a_0$=2.89 $\AA$) and Im3m space group. Also, the cobalt ferrite phase was identified as$ CoFe_2O_4$ with a cubic structure ($a_0=8.39 $\AA$$) and a space group of Fd3m. For the higher cobalt content than the stoichiometric composition,$ Co_{37.8}Fe_{62.2}$, the thin films with high Ms and Hc could be obtained in the wide substrate temperature range (200-40$0^{\circ}C$).

• Journal of the Korean Vacuum Society
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• v.12 no.S1
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• pp.100-103
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• 2003

The magnetoresistance (MR) of $La_{1-\chi}S_{\chi}CoO_{3-\delta}$ films prepared by pulsed-laser deposition were investigated in order to clarify the magnetotransport properties around the metal-insulator transition. For the films in the metallic state ($\chi$ > 0.25), the MR(T) manifests a small peak at the Curie temperature due to the spin-disorder scattering. The transition of the film into the insulating state ($\chi\;\leq$ 0.25) is accompanied by an essential growth of the MR and results in a significant increase in the MR(T) with decreasing temperature, due to a phase separation into the ferromagnetic-metal clusters and the insulating matrix.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.167-167
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• 2011

Magnetic random access memory (MRAM) is one of the prospective semiconductor memories for next generation. It has the excellent features including nonvolatility, fast access time, unlimited read/write endurance, low operating voltage, and high storage density. MRAM consists of magnetic tunnel junction (MTJ) stack and complementary metal-oxide semiconductor (CMOS). The MTJ stack is composed of various magnetic materials, metals, and a tunneling barrier layer. For the successful realization of high density MRAM, the etching process of magnetic materials should be developed. Among various magnetic materials, FePt has been used for pinned layer of MTJ stack. The previous etch study of FePt magnetic thin films was carried out using $CH_4/O_2/NH_3$. It reported only the etch characteristics with respect to the variation of RF bias powers. In this study, the etch characteristics of FePt thin films have been investigated using an inductively coupled plasma reactive ion etcher in various etch chemistries containing $CH_4$/Ar and $CH_4/O_2/Ar$ gas mixes. TiN thin film was employed as a hard mask. FePt thin films are etched by varying the gas concentration. The etch characteristics have been investigated in terms of etch rate, etch selectivity and etch profile. Furthermore, x-ray photoelectron spectroscopy is applied to elucidate the etch mechanism of FePt thin films in $CH_4$/Ar and $CH_4/O_2/Ar$ chemistries.

• Proceedings of the Korean Magnestics Society Conference
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• 2003.06a
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• pp.21-21
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• 2003

Microstructure and magnetic transport phenomina in rf sputtered AlN/Co type ten-layered discontinuous films of nanoscaled [AlN (3 nm)/Co (t nm)]...$\sub$10/ with t$\sub$Co/=1.0∼2.0 nm have been investigated. The microstructure and tunneling magnetic resistance of the samples are strongly dependent on the thickness of Co layer. Negative tunneling magneto-resistance due to the spin-dependent transport has been observed along the current-in-plane configuration in the samples having the Co layers below 1.6 nm thick. When the thickness of Co layer was less than 1,2 nm, randomly oriented granular Co particles were completely isolated and embedded in amorphous AlN matrix, and the films showed the superparamagnetic behavior with a high MR value of Δ$\rho$/$\rho$$\sub$0/=1.8 %. As t$\sub$Co/ increases, a transition from the regime of co-existence of superparamagnetic and ferromagnetic behaviors to ferromagnetic behavior was observed. Tunneling barrier called "decay length for tunneling" for the films having the thickness of Co layer from 1.4 to 1.6 nm was measured to be ranged from 0.004 to 0.021 ${\AA}$$\^$-1/.