• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.128-129
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• 2008

The annealing effects of $SiO_2/Si_3N_4$ stacked tunneling dielectrics were investigated. I-V characteristics of band gap engineered tunneling gate stacks consisted of $Si_3N_4/SiO_2/Si_3N_4$(NON), $SiO_2/Si_3N_4/SiO_2$(ONO) dielectrics were evaluated and compared with $SiO_2$ single layer using the MOS(Metal-Oxide-Semiconductor) capacitor structure. The leakage currents of engineered tunneling barriers (ONO, NON stacks) are lower than that of the conventional $SiO_2$ single layer at low electrical field. Meanwhile, the engineered tunneling barriers have larger tunneling current at high electrical field and improved electrical characteristics by annealing processes than $SiO_2$ layer.

• 한국전기전자재료학회논문지
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• 제21권8호
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• pp.687-694
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• 2008

This paper is focused on the improvement of MOS device reliability related to deuterium process. The injection of deuterium into the gate oxide film was achieved through two kind of method, high-pressure annealing and low-energy implantation at the back-end of line, for the purpose of the passivation of dangling bonds at $SiO_2/Si$ interface. Experimental results are presented for the degradation of 3-nm-thick gate oxide ($SiO_2$) under both negative-bias temperature instability (NBTI) and hot-carrier injection (HCI) stresses using P and NMOSFETs. Annealing process was rather difficult to control the concentration of deuterium. Because when the concentration of deuterium is redundant in gate oxide excess traps are generated and degrades the performance, we found annealing process did not show the improved characteristics in device reliability, compared to conventional process. However, deuterium ion implantation at the back-end process was effective method for the fabrication of the deuterated gate oxide. Device parameter variations under the electrical stresses depend on the deuterium concentration and are improved by low-energy deuterium implantation, compared to conventional process. Our result suggests the novel method to incorporate deuterium in the MOS structure for the reliability.

• 한국통신학회논문지
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• 제18권2호
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• pp.184-191
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• 1993

최근 MOS 공정기술로 집적화된 연속시간 필터 연구가 주목을 받고 있다. 본 논문에서는 차단주파수 3,400Hz를 갖는 연속시간 5차 타원 저역통과 MOSFET-C 필터를 실현하기 위하여, 먼저 각 블록을 동조할 수 있는 종속연결법으로 능동 RC 필터를 설계하였다. 그리고 능동 RC 회로의 저항들을 triode 영역에서 작동하는 NMOS depletion mode 트랜지스터 선형저항으로 실현하였다. 이러한 연속시간 MOSFET-C 필터는 스윗치드 커패시터 필터에 비하여 구조가 간단하여 칩의 면적을 줄일 수 있다. 설계된 MOSFET-C 필터 특성을 PSPICE 프로그램으로 시뮬레이션 하였다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2007년도 제38회 하계학술대회
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• pp.1353-1354
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• 2007

폴리 실리콘 층의 유무에 따른 금속-옥사이드-반도체(MOS) 구조의 소자를 제작하였다. 터널링 산화막과 블로킹 산화막으로는 $Al_{2}O_{3}$ 층을 증착하였으며, 원자층 증착법을 이용하여 제작하였다. 터널링 산화막 층의 두께에 따른 I-V와 C-V 특성을 측정하였다. 전자들이 폴리 실리콘 층에 저장됨에 따라 N-형의 I-V 특성이 관찰되었다. C-V 측정 시에는 반시계 방향의 히스테리시스 특성을 나타내었으며, 전압이 증가할수록 플랫-밴드 전압 이동 폭이 더욱 증가하였다. 이러한 전기적 특성은 전압의 이동에 따른 전자들이 터널링 산화막 층을 통하여 폴리 실리콘 내부에 저장되기 때문이다. 이를 특성들은 폴리 실리콘의 전하 저장 가능성을 보여주는 것이며, 터널링 산화막 층의 두께에 따른 전기적 특성 변화도 관찰하였다.

• ETRI Journal
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• 제46권3호
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• pp.550-563
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• 2024

A novel inductance simulation circuit employing only two dual-output voltage-differencing buffered amplifiers (DO-VDBAs) and a single capacitance (grounded) is proposed in this paper. The reported configuration is a purely resistor-less realization that provides electronically controllable realized inductance through biasing quantities of DO-VDBAs and does not rely on any constraints related to matched values of parameters. This structure exhibits excellent behavior under the influence of tracking errors in DO-VDBAs and does not exhibit instability at high frequencies. The simple and compact metal-oxide semiconductor (MOS) implementation of the DO-VDBAs (eight MOS per DO-VDBA) and adoption of grounded capacitance make the proposed circuit suitable for on-chip realization from the perspective of chip area consumption. The function of the pure grounded inductance is validated through high pass/bandpass filtering applications. To test the proposed design, simulations were performed in the PSPICE environment. Experimental validation was also conducted using the integrated circuit CA3080 and operational amplifier LF-356.

• 한국전기전자재료학회논문지
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• 제28권6호
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• pp.403-407
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• 2015

Generally, MWCNT, with thermal, chemical and electrical superiority, is manufactured with CVD (chemical vapor deposition). Using MWCNT, it is comonly used as gas sensor of MOS-FET structure. In this study, in order to repeatedly detect gases, the author had to effectively eliminate gases absorbed in a MWCNT sensor. So as to eliminate gases absorbed in a MWCNT sensor, the sensor was applied heat of 423[K], and in order to observe how the applied heat was diffused within the sensor, the author interpreted the diffusion process of heat, using COMSOL interpretation program. In order to interpret the diffusion process of heat, the author progressed modeling with the structure of MWCNT gas sensor in 2-dimension, and defining heat transfer velocity($u={\Delta}T/{\Delta}x$), accorded to governing equation within the sensor, the author proposed heat transfer mechanism.

• 전기학회논문지
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• 제58권7호
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• pp.1363-1374
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• 2009

This paper reviews the characteristics and technical trends in Power MOSFET technology that are leading to improvements in power loss for power electronic system. The silicon bipolar power transistor has been displaced by silicon power MOSFET's in low and high voltage system. The power electronic technology requires the marriage of power device technology with MOS-gated device and bipolar analog circuits. The technology challenges involved in combining power handling capability with finger gate, trench array, super junction structure, and SiC transistor are described, together with examples of solutions for telecommunications, motor control, and switch mode power supplies.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2001년도 하계학술대회 논문집 C
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• pp.1451-1453
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• 2001

An SOI(Silicon-On-Insulator) LD(Lateral Double-diffused)MOS with graded gate and recessed source is proposed. The proposed structure can increase the breakdown voltage by reducing the electric field crowding at the edge of gate. Simulation results by TSUPREM4 and MEDICI have shown that the breakdown voltage of proposed device was found to be 52 V while that of conventional device was 45 V. At the same breakdown voltage of 45 V, the on-resistance of the LDMOS with graded gate and recessed source was 14.4 % lower than that of conventional structure.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.300-300
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• 2011

Si oxidation is a key process in developing silicon devices, such as highly integrated metal-oxide-semiconductor (MOS) transistors and antireflection-coating (ARC) on solar cell substrate. Many experimental and theoritical studies have been carried out for elucidating oxidation processes and adsorption structure using ab initio total energy and electronic structure calcultaions. However, the initial oxidation processes at step edge on vicinal Si surface have not been studied using the ReaxFF reactive force field. In this work, strucutural change, charge distribution of oxidized Si throughout the depth from Si surface were observed during oxidation processes on vicinal Si(001) surface inclined by $10.5^{\circ}$ of miscut angle toward [100]. Adsorption energys of step edge and flat terrace were calculated to compare the oxidation reaction at step edge and flat terrace on Si surface.

• 전자공학회논문지D
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• 제34D권6호
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• pp.43-49
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• 1997

Tungsten poycide has studied gate oxide reliability and dielectric strength charactristics as the composition of gate electrode which applied submicron on CMOS and MOS device for optimizing gate electrode resistivity. The gate oxide reliability has been tested using the TDDB(time dependent dielectric breakdwon) and SCTDDB (stepped current TDDB) and corelation between polysilicon and WSi$_{2}$ layer. iN the case of high intrinsic reliability and good breakdown chracteristics on polysilicon, confirmed that tungsten polycide layer is a better reliabilify properities than polysilicon layer. Also, hole trap is detected on the polysilicon structure meanwhile electron trap is detected on polycide structure. In the case of electron trap, the WSi$_{2}$ layer is larger interface trap genration than polysilicon on large POCL$_{3}$ doping time and high POCL$_{3}$ doping temperature condition. WSi$_{2}$ layer's leakage current is less than 1 order and dielectric strength is a larger than 2MV/cm.