• 전기전자학회논문지
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• 제28권1호
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• pp.78-89
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• 2024

차량용 반도체에서 사용되는 BCD 공정 기반의 PMIC 칩은 아날로그 회로를 트리밍하기 위해 추가 마스크가 필요없는 MTP(Multi-Time Programmable) IP(Intellectual Property)를 요구한다. 본 논문에서는 저면적 MTP IP 설계를 위해 2개의 트랜지스터와 1개의 MOS 커패시터를 갖는 single poly EEPROM 셀인 MTP 셀에서 NCAP(NMOS Capacitor) 대신 PCAP(PMOS Capacitor)을 사용한 MTP 셀을 사용하여 MTP 셀 사이즈를 18.4% 정도 줄였다. 그리고 MTP IP 회로 설계 관점에서 MTP IP 설계의 CG 구동회로와 TG 구동회로에 2-stage voltage shifter 회로를 적용하였고, DC-DC 변환기 회로의 면적을 줄이기 위해 전하 펌핑 방식을 사용하는 VPP(=7.75V), VNN(=-7.75V)와 VNNL(=-2.5V) 전하 펌프 회로에서 각각의 전하 펌프마다 별도로 두고 있는 ring oscillator 회로를 하나만 둔 회로를 제안하였으며, VPPL(=2.5V)은 전하펌프 대신 voltage regulator 회로를 사용하는 방식을 제안하였다. 180nm BCD 공정 기반으로 설계된 4Kb MTP IP 사이즈는 0.493mm²이다.

• Transactions on Electrical and Electronic Materials
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• 제17권3호
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• pp.172-177
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• 2016

Miller feedback compensation is introduced in a low dropout regulator (LDO) in order to obtain a capacitor-free regulator and improve the fast transient response. The conventional LDO has a limited bandwidth because of the large-size output capacitor and parasitic gate capacitance in the power MOSFET. In order to obtain a stable frequency response without the output capacitor, LDO is designed with resistor-capacitor (R-C) compensation and this is achieved with a connection between the gain-stage and the power MOS. An R-C compensator is suggested to provide a pole and zero to improve the stability. The proposed LDO is designed with the 0.35 μm CMOS process. Simulation testing shows that the phase margin in the Bode plot indicates a stable response, which is over 100^o. In the load regulation, the transient time is within 55 μs when the load current changes from 0.1 to 1 mA.

• 대한전자공학회논문지
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• 제26권11호
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• pp.1666-1671
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• 1989

A novel switched-capacitor circuit for interfacing capacitive microtransducers with a digital system is developed based on the dual-slope integration. It consists of a differential integrator and a comparator. Driven by the teo phase clock, the circuit first senses the capacitance difference between the transducer and the reference capacitor in the form of charge, and accumulates it into the feedback capabitor of the integrator for a fixed period of time. The resulant accumulated charge is next extracted by the known reference charge until the integrator output voltage refurns to zero. The length of time required for the integrator output to return to zero, as measured by the number of clock cycle gated into a counter is proportional to the capacitance difference, averaged over the integration period. The whole operation is insensitive to the reference voltage and the capacitor values involved in the circuit, Thus the proposed circuit permits an accurate differental capacitance measurement. An error analysis has showh that the resolution as high as 8 bits can be expected by realizing the circuit in a monolithic MOS IC form. Besides the accuracy, it features the small device count integrable onto a small chip area. The circuit is thus particularly suitadble for the on-chip interface.

• 한국전기전자재료학회논문지
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• 제22권2호
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• pp.101-106
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• 2009

In this paper, Thin films of $HfO_2$/Hf were deposited on p-type wafer by Atomic Layer Deposition (ALD). We studied the electrical and material characteristics of $HfO_2$/Hf/Si MOS capacitor depending on thickness of Hf metal layer. $HfO_2$ films were deposited using TEMAH and $O_3$ at $350^{\circ}C$. Samples were then annealed using furnace heating to $500^{\circ}C$. Round-type MOS capacitors have been fabricated on Si substrates with $2000\;{\AA}$-thick Pt top electrodes. The composition rate of the dielectric material was analyzed using TEM (Transmission Electron Microscopy), XRD (X-ray Diffraction) and XPS (X-ray Photoelectron Spectroscopy). Also the capacitance-voltage (C-V), conductance-voltage (G-V), and current-voltage (I-V) characteristics were measured. We calculated the density of oxide trap charges and interface trap charges in our MOS device. At the interface between $HfO_2$ and Si, both Hf-Si and Hf-Si-O bonds were observed, instead of Si-O bond. The sandwiched Hf metal layer suppressed the growing of $SiO_x$ layer so that $HfSi_xO_y$ layer was achieved. And finally, the generation of both oxide trap charge and interface trap charge in $HfO_2$ film was reduced effectively by using Hf metal layer.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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• pp.207-209
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• 2004

Currently, for satisfying the needs of scaled MOSFET's a high quality thin oxide dielectric is desired because the properties of conventional $SiO_2$ film are not acceptable for these very small sized transistors. As an alternative gate dielectric have drawn considerable alternation due to their superior performance and reliability properties over conventional $SiO_2$, to obtain the superior characteristics of ultra thin dielectric films, $N_2O$ grown thin oxynitride has been proposed as a dielectric growtuanneal ambient. In this study the authors observed process characteristics of $N_2O$ grown thin dielectric. In view points of the process characteristics of MOS capacitor, the sheet resistance of 4.07$[\Omega/sq.]$, the film stress of $1.009e^{10}[dyne/cm^2]$, the threshold voltage$(V_t)$ of 0.39[V], the breakdown voltage(BV[V]) of 11.45[V] was measured in PMOS. I could achieve improved electrical characteristics and reliability for deep submicron MOSFET devices with $N_2O$ thin oxide.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2004년도 ICEIC The International Conference on Electronics Informations and Communications
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• pp.343-347
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• 2004

High oxidation temperature of SiC shows a tendency of carbide formation at the interface which results in poor MOSFET transfer characteristics. Thus we developed oxidation processes in order to get low interface charge densities. N-type 6H-SiC MOS capacitors were fabricated by different oxidation processes: dry, wet, and dry­reoxidation. Gate oxidation and Ar anneal temperature was $1150^{\circ}C.$ Ar annealing was performed after gate oxidation for 30 minutes. Dry-reoxidation condition was $950^{\circ}C,$ H2O ambient for 2 hours. Gate oxide thickness of dry, wet and dry-reoxidation samples were 38.0 nm, 38.7 nm, 38.5 nm, respectively. Mo was adopted for gate electrode. To investigate quality of these gate oxide films, high frequency C- V measurement, gate oxide leakage current, and interface trapped charge densities (Dit) were measured. The interface trapped charge densities (Dit) measured by conductance method was about $4\times10^{10}[cm^{-1}eV^{-1}]$ for dry and wet oxidation, the lowest ever reported, and $1\times10^{11}[cm^{-1}eV^{-1}]$ for dry-reoxidation

• 한국전기전자재료학회논문지
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• 제17권6호
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• pp.602-607
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• 2004

This paper describes the characteristics of Ru-Zr alloy gate electrodes deposited by co-sputtering. The various atomic composition was made possible by controlling sputtering power of Ru and Zr. Thermal stability was examined through 600 and 700 $^{\circ}C$ RTA annealing. Variation of oxide thickness and X-ray diffraction(XRD) pattern after annealing were employed to determine the reaction at interface. Low and relatively stable sheet resistances were observed for Ru-Zr alloy after annealing. Electrical properties of alloy film were measured from MOS capacitor and specific atomic composition of Zr and Ru was found to yield compatible work function for nMOS. Ru-Zr alloy was stable up to $700^{\circ}C$ while maintaining appropriate work function and oxide thickness.

• 전기학회논문지P
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• 제59권4호
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• pp.401-404
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• 2010

In multibit Sigma-Delta Modulator, DWA(Data Weighted Averaging) among the DEM(Dynamic Element Matching) techniques was widely used to get rid of non-linearity that caused by mismatching of unit capacitor in feedback DAC path. this paper proposed the improved DWA architecture by adjusting clock timing of the existing DWA architecture. 2n Register block used for output was replaced with 2n S-R latch block. As a result of this, MOS Tr. can be reduced and extra clock can also be removed. Moreover, two n-bit Register block used to delay n-bit data code is decreased to one n-bit Register. In order to confirm characteristics, DWA for the 3-bit output with the proposed DWA architecture was designed on 0.18um process under 1.8V supply. Compared with the existing architecture. It was able to reduce the number of 222 MOS Tr.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2000년도 하계종합학술대회 논문집(2)
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• pp.318-321
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• 2000

We showed that the change of Ar to $N_2$flow during the TiN deposition by the reactive sputtering decides the crystallinity of LPCVD W, as well as the electrical properties of the W-TiN/SiO$_2$Si capacitor. In particular, the threshold voltage can be controlled by the Ar to $N_2$ratio. As compared to the results obtained from the LPCVD W/SiO$_2$/Si MOS capacitor, the insertion of approximately 50 nm TiN film effectively prohibits the fluorine diffusion during the deposition and annealing of W films, resulting in negligible leakage currents at the low electric fields.

• 한국통신학회논문지
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• 제4권1호
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• pp.25-31
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• 1979

All the resitors in the active RC filter networks can be relplaced by the switched capacitors. Therefore, An SC filter circuit can be fully integrated using MOS technology. A switched capacitor is much better than a resistor in temperature and linearity characteristics, and the former can be fabricated on the much smaller area then the latter. In this paper, It is given the generalized disign method of the active SC filter from the active RC filter using Bilinear Z-transformation. By SC filtering Techniques using Bilinear Z-transform, It enalbes us to realize the FDNR and Gyrator filters, which could not be realized in the exsisting designs, and it permits the processing of signals at much higher frequenies that many previous designs do. Experiments show that the response of the SC active filter is similiar to that of its prototype active RC filter.