• 제목/요약/키워드: MEVVA

검색결과 5건 처리시간 0.018초

Filtered Plasma Deposition and MEVVA Ion Implantation

  • Liu, A.D.;Zhang, H.X.;Zhang, T.H.
    • 한국진공학회지
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    • 제12권S1호
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    • pp.46-48
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    • 2003
  • The modification of metal surface by ion implantation with MEVVA ion implanter and thin film deposition with filtered vacuum arc plasma device is introduced in this paper. The combination of ion implantation and thin film deposition is proved as a better method to improve properties of metal surface.

SURFACE PROCESSING OF TOOLS AND COMPONENTS BY MEVVA SOURCE ION IMPLANTATION

  • Lin, W.L.;Sang, J.M.;Ding, X.J.;Yuan, X.M.;Xu, J.;Zhang, H.X.;Zhang, X.J.
    • 한국진공학회지
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    • 제4권S2호
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    • pp.106-114
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    • 1995
  • Direct implantation of metallic ion species has been employed in surface processing of industrial components and tools with very encouraging improvements in recent years. In spite of high technicla effectiveness, this new surface processing technique has not been extensively accepted by industries mainly because of high cost(capital and operating) compared with other competitive surface processing techniques. High current and large implantation area with eliminating the mass analyzer and the beam-scanning unit make metal vapor vacuum are(MEVVA)source ion implantation versatile, simple and cheap to operate and well suited to commercial surface processing. In this paper, the recent development of MEVVA source ion implantation technique ar Beijing Normal University has been reviewed and the results of production trials of several industrial components and tools implanted by MEVVA source ion implantation have been presented and discussed.

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MEVVA ion Source And Filtered Thin-Film Deposition System

  • Liu, A.D.;Zhang, H.X.;Zhang, T.H.;Zhang, X.Y.;Wu, X.Y.;Zhang, S.J.;Li, Q.
    • Journal of Korean Vacuum Science & Technology
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    • 제6권2호
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    • pp.55-57
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    • 2002
  • Metal-vapor-vacuum-arc ion source is an ideal source for both high current metal ion implanter and high current plasma thin-film deposition systems. It uses the direct evaporation of metal from surface of cathode by vacuum arc to produce a very high flux of ion plasmas. The MEVVA ion source, the high-current metal-ion implanter and high-current magnetic-field-filtered plasma thin-film deposition systems developed in Beijing Normal University are introduced in this paper.

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Droplet가 냉연 롤러용 강의 마모 특성에 미치는 영향 (Effect of the Droplets on the Wear Characteristics of Steel for the Cold Working Roller)

  • 문봉호
    • Tribology and Lubricants
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    • 제20권3호
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    • pp.145-151
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    • 2004
  • A modified surface layer by ion implantation is very thin (under 1 $\mu\textrm{m}$) but has superior mechanical characteristics. therefore ion implantation has been used successfully as a surface treatment technology to improve the wear, fatigue, and corrosion resistances of materials. MEVVA which is a kind of ion beam apparatus has merits of low cost and is usable to various metals, but occurs a droplet ranging from micron to tens of micron on the implanted surface at ion implantations. wear is a dynamic phenomenon on interacting surfaces with rotative motion. Since wear changes in condition of the surface, we should control to surface. In order to improve a wear resistance of Ti ion implanted 1C-3Cr steel(material for roller in the cold working process), it is essential to investigate the effect of the droplets on the wear characteristics. In this study, we investigate the effect of the droplets on the wear characteristics of 1C-3Cr steel using SEM Tribosystem as in-situ system. Results show that the droplet occurred at ion implantation becomes the cause of severe wear. Therefore, the ion-implanted surface should be removed the droplet to improve wear resistance.