• Title/Summary/Keyword: MEMC

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Case study of analysing the manufacturing process of silicon wafers based on a large set of data to identify the causes of nonconformities (대 용량 데이터를 사용한 실리콘 웨이퍼 제조공정의 품질특성 불량원인분석 사례)

  • Kwon You-Jin;Kwon Hyuck-Moo;Lee Jong-Kyong
    • Proceedings of the Korean Operations and Management Science Society Conference
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    • 2006.05a
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    • pp.86-91
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    • 2006
  • 본 연구는 M사의 제조공정에서 얻어진 대 용량 데이터를 사용하여 실리콘 웨이퍼의 중요 품질특성 중 하나인 Warp 불량원인을 분석한 사례이다. 이론적으로는 많은 양의 데이터를 확보하고 있을 경우 검출력의 향상으로 공정의 미세한 변화를 보다 민감하게 탐지할 수 있을 것으로 생각된다. 그러나 현실적으로는 불필요한 정보 혹은 많은 잡음 요인들의 개입으로 인하여 공정에 대한 올바른 이해가 더 어려울 수도 있다. 본 연구는 공정에 대한 경험과 기술적인 지식을 활용하여 분석의 기본 방향을 설정하고 많은 양의 데이터를 체계적으로 분석한 후 분석 결과를 실질적인 측면에서 재검토하여 의미 있는 결과를 도출하는 순서로 진행되었다. 데이터 분석의 과정 및 결과는 공정의 자동화로 수많은 데이터가 실시간으로 기록되는 상황에서 잡음요인들로 인한 영향을 배제하고 핵심요인에 의한 영향을 파악하는데 참고할 수 있을 것으로 사료된다.

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Study for Gas Flow Uniformity Through Changing of Shape At the High Density Plasma CVD (HDP CVD) Chamber (HDP CVD 챔버 형상 변화에 따른 가스 유동 균일성에 대한 연구)

  • Jang, Kyung-Min;Kim, Jin-Tae;Hong, Soon-Il;Kim, Kwang-Sun
    • Journal of the Semiconductor & Display Technology
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    • v.9 no.4
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    • pp.39-43
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    • 2010
  • According to recent changes in industry for the semiconductor device, a gap between patterns in wafer is getting narrow. And this narrow gap makes a failure of uniform deposition between center and edge on the wafer. In this paper, for solving this problem, we analyze and manipulate the gas flow inside of the HDP CVD chamber by using CFD(Computational Fluid Dynamics). This simulation includes design manipulations in heights of the chamber and shape of center nozzle in the upper side of the chamber. The result of simulation shows 1.28 uniformity which is lower 3% than original uniformity.

Fault Detection, Diagnosis, and Optimization of Wafer Manufacturing Processes utilizing Knowledge Creation

  • Bae Hyeon;Kim Sung-Shin;Woo Kwang-Bang;May Gary S.;Lee Duk-Kwon
    • International Journal of Control, Automation, and Systems
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    • v.4 no.3
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    • pp.372-381
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    • 2006
  • The purpose of this study was to develop a process management system to manage ingot fabrication and improve ingot quality. The ingot is the first manufactured material of wafers. Trace parameters were collected on-line but measurement parameters were measured by sampling inspection. The quality parameters were applied to evaluate the quality. Therefore, preprocessing was necessary to extract useful information from the quality data. First, statistical methods were used for data generation. Then, modeling was performed, using the generated data, to improve the performance of the models. The function of the models is to predict the quality corresponding to control parameters. Secondly, rule extraction was performed to find the relation between the production quality and control conditions. The extracted rules can give important information concerning how to handle the process correctly. The dynamic polynomial neural network (DPNN) and decision tree were applied for data modeling and rule extraction, respectively, from the ingot fabrication data.