• 한국광학회지
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• 제11권5호
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• pp.365-370
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• 2000

편광특성을 이용하여 일직선 위에서 네 번 통과하는 Ti:sapphire 레이저 증폭기를 구성하였다. 증폭기를 펌핑하는 Q-스위칭된 Nd:YAG 레이저의 제2차 고조파 에너지가 188mJ일 때 450mW의 연속 발진 Ti:sapphire 레이저가 34mJ의 에너지, 25ns의 반치폭을 갖는 펄스로 증폭되었다. 한편 Ti:sapphire 결정의 방향을 조절하는 간단한 방법으로 자발방출에 의한 증폭을 최소화할 수 있었다.

• 한국정보통신학회논문지
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• 제16권3호
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• pp.565-570
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• 2012

본 논문은 LTE-Advanced 시스템을 위한 멀티채널을 선택할 수 있는 저역통과 필터를 제안한다. 제안하는 저역통과 필터는 5 MHz, 10 MHz, 그리고 40 MHz의 3가지 모드의 차단주파수를 제공하며 Active-RC 5차 Chebyshev 구조로 설계되었다. 저전력을 확보하면서 40 MHz의 높은 차단 주파수를 확보하기 위해서 부성 저항을 가지는 PMOS Cross-Connection Load를 사용한 연산증폭기를 필터에 적용하였다. 더불어 공정, 전압, 그리고 온도에 의한 각각의 차단주파수 변화에 대응할 수 있도록 각각 3-bit 제어 가능한 튜닝회로를 추가하였다. 제안하는 필터는 0.13-${\mu}m$ CMOS 공정을 사용하여 설계하였으며 1.2 V 전압에서 총 20.9 mW 전력을 소모한다.

• 소성∙가공
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• 제21권5호
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• pp.291-297
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• 2012

In this paper, the effect of back tension in multi-pass drawing or wiredrawing on the central bursting defect is investigated using finite element predictions. A rigid-plastic finite element method was used together with the McClintock damage model. Central bursting defects under different back tension stress values ranging from 0% to 20% of the yield strength of the material were predicted and they were compared to understand the effect of the back tension stress values on the central bursting defect. It is found that the level of back tension has a strong influence on the cumulative damage. Thus, higher back tension raises the possibility of the central bursting defect occurring, even though it decreases the interfacial pressure between the die and the work piece.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 추계학술대회 논문집
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• pp.183-186
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• 1999

A 900 71Hz RF band-pass amplifier for wireless communication systems is designed and fabricated. HSPICE simulation results show that the amplifier can achieve a tunable center frequency between 880 MHz and 920 MHz. The gain of designed amplifier is 19 dB at Q=88, and the power dissipation is about 61 mW under 3 V power supply by using the spiral inductor with negative-7m circuit and center frequency tunning circuit. The designed band-pass amplifier is implemented by using 0.6 um 2-poly-3-metal standard CMOS process.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2008년도 춘계학술대회 논문집
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• pp.419-422
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• 2008

It is most important to design the roll pass in shape rolling process. However, roll pass design has been accomplished by experience and intuition of a skilled engineer up to now. And it has being produced throughout a lot of trial and error. Thus, in this study, we tried to analysis the rolling process of H-beam by using FEM program for the quantitative evaluation of the plastic deformation. It could be predicted that rolling load, torque, shape of cross section and distribution of effective strain each pass by the analysis of rolling from break down mill(2 Hi rolling) to finishing rolling(Universal rolling) considering the heat transfer.

• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 2002년도 추계학술대회논문초록집
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• pp.376.1-376
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• 2002

Reduction of the propagation noise generated during pass-by of KTX by noise barrier was measured and analysed fur the two kinds of top-shaped noise reduction devices; one as a plywood board and the other as a PVC pipe were placed periodically. The height and length of reference noise barrier are 2.4 m and 50 m, respectively. The noise reduction with and without noise reduction devices was investigated. (omitted)

• JSTS:Journal of Semiconductor Technology and Science
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• 제17권3호
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• pp.438-445
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• 2017

This paper presents a low-power high-resolution band-pass ${\Sigma}{\Delta}$ ADC for accelerometer applications. The proposed band-pass ${\Sigma}{\Delta}$ ADC consists of a high-performance 6-th order feed-forward ${\Sigma}{\Delta}$ modulator with 1-bit quantization and a low-power, area-efficient digital filter. The ADC is fabricated in 180 nm 1P6M mixed-signal CMOS process with a die area of $5mm^2$. This high-resolution ADC got 90 dB peak signal to noise plus distortion ratio (SNDR) and 96 dB dynamic range (DR) over 4 kHz bandwidth, while the intermediate frequency (IF) is shifting from 100 KHz to 200 KHz. The power dissipation of the chip is 5.6 mW under 1.8 V (digital)/3.3 V (analog) power supply.

• 한국광학회지
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• 제14권4호
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• pp.460-465
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• 2003

Double-pass forward(DPF) 방식으로 구성되고 0.98 $\mu$m 파장 대역으로 펌핑된 자이로스코프용 erbium 첨가 광섬유(EDF) 광원의 출력광 특성을 수치계산을 이용하여 분석하였다. EDF길이, 펌프 power, 그리고 펌프 파장 등의 변화에 따른 출력광 power, 파장선폭, 중심파장 안정성 둥을 분석하였으며 일부 특성에 대하여 실험결과와 비교ㆍ검증하였다. 그 결과, DPF 방식의 EDF 광원에서 광원의 특성이 EDF 길이에 크게 의존함을 알 수 있었으며 펌프 power와 펌프 파장의 변화에 대해서 안정된 중심파장을 얻을 수 있는 최적 동작조건도 존재함을 알 수 있었다.

• 소성∙가공
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• 제24권5호
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• pp.340-347
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• 2015

Multi-pass shape drawing is used to manufacture long products of arbitrary cross-sectional shapes. This process allows smooth surface finishes and closely controlled dimensions of the cross-sectional shape. Tube shape drawing for hollow type products provides material savings and weight reduction. The intermediate die shapes are very important in multi-pass tube shape drawing. In the current paper, the design method for the intermediate dies in a tube shape drawing process is developed using a die offset for corner filling (DOCF) method. Underfill defects are related to the radial velocity distribution of each divided section in the deformation zone. The developed intermediate die shape design was applied to the two-pass tube shape drawing with fixed mandrel for manufacturing a hollow linear motion (LM) guide rail. The proposed design method led to uniform and steady metal flow at each divided section. FE-simulations and experiments were conducted to validate the effectiveness of the proposed method in multi-pass tube shape drawing process.

• 소성∙가공
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• 제18권4호
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• pp.283-289
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• 2009

The multi-stage shape drawing is used to obtain long shaped products with high levels of dimensional accuracy and quality. It is important to design the cross sectional shapes of the intermediate passes to meet the required dimensional accuracy of the final product in the multi-stage shape drawing. Until now, the cross sectional shapes of the intermediate passes have been designed by the experiences. It is still remained unsolved problem to design the cross sectional shapes of intermediate pass drawing dies in the multi-pass shape drawing. In this study, a new technique is proposed to design the cross sectional shapes of intermediate passes. The proposed method is applied to a multi-stage shape drawing for a LM-guide which is one of the representative shape drawing products. In order to verify the effectiveness of the proposed method, FE-simulation and experiments have been carried out. The dimensional accuracy of the proposed method is compared with that of the conventional shape drawing process designed by the industrial engineers.