• Proceedings of the Korean Society of Medical Physics Conference
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• 2002.09a
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• pp.418-421
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• 2002

Fundamental study on quasi-monochromatic parallel radiography using a polycapillary plate and a plane-focus x-ray tube is described. The x-ray generator consists of a negative high-voltage power supply, a filament (hot cathode) power supply, and an x-ray tube. The negative high-voltage is applied to the cathode electrode, and the transmission type target (anode) is connected to the ground potential. The maximum voltage and current of the power supply were -100 kV (peak value) and 3.0 mA, respectively. In this experiment, the tube voltage was regulated from 20 to 25 kV, and the tube current was regulated by the filament temperature and ranged from 1.0 to 3.0 mA. The exposure time is controlled in order to obtain optimum film density, and the focal spot diameter was about 10 mm. The polycapillary plate is J5022-21 made by Hamamatsu Photonics Inc., and the outside and effective diameters are 87 and 77 mm, respectively. The thickness and the hole diameter of the polycapillary are 1.0 mm and 25 ${\mu}$m, respectively. The x-rays from the tube are formed into parallel beam by the polycapillary, and the radiogram is taken using an industrial x-ray film of Fuji IX 100 without using a screen. In the measurement of image resolution, we employed three brass spacers of 2, 30, and 60 mm in height. By the test chart, the resolution fell according to increases in the spacer height without using a polycapillary. In contrast, the resolution slightly fell with corresponding increases in the height by the polycapillary. In angiography, fine blood vessels of about 100 ${\mu}$m are clearly visible.

• Journal of the Korean Society of Surveying, Geodesy, Photogrammetry and Cartography
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• v.34 no.5
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• pp.535-544
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• 2016

Even though existing methods for orthophoto production using expensive aircraft are effective in large areas, they are drawbacks when dealing with renew quickly according to geographic features. But, as UAV(Unmanned Aerial Vehicle) technology has advanced rapidly, and also by loading sensors such as GPS and IMU, they are evaluates that these UAV and sensor technology can substitute expensive traditional aerial photogrammetry. Orthophoto production by using UAV has advantages that spatial information of small area can be updated quickly. But in the case of existing researches, images of same altitude are used in orthophoto generation, they are drawbacks about repetition of data and renewal of data. In this study, we targeted about small slope area, and by using low-end UAV, generated orthophoto and DEM(Digital Elevation Model) through different altitudinal images. The RMSE of the check points is σ_h = 0.023m on a horizontal plane and σ_v = 0.049m on a vertical plane. This maximum value and mean RMSE are in accordance with the working rule agreement for the aerial photogrammetry of the National Geographic Information Institute(NGII) on a 1/500 scale digital map. This paper suggests that generate orthophoto of high accuracy using a different altitude images. Reducing the repetition of data through images of different altitude and provide the informations about the spatial information quickly.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2001.04a
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• pp.865-868
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• 2001

We designed and fabricated a planner-type thermoelastic microactuator with a latch-up operation for optical switching. Latch-up actuation is prerequisite to implement an optical switch with low power consumption and high reliability. The proposed microactuator consists of four cantilever-shaped thermal actuators, four displacement linkages, two shallow arch-shaped leaf springs, a mobile shuttle mass with a micromirror, and four elastic boundaries. The structural layer of the planar microactuator is phosphorous-doped 12$\mu\textrm{m}$-thick polysilicon, and the sacrificial layer is LTO(Low Temperature Oxide) of 3$\mu\textrm{m}$thickness. The displacement of actuator is as large as 3$\mu\textrm{m}$when the length of actuation bar is 100$\mu\textrm{m}$in length at 5V input voltage. The proposed microactuators have advantages of easy assembly with other optical component by way of fiber alignment in the substrate plane, and its fabrication process features simplicity while retaining batch-fabrication economy.

• Proceedings of the IEEK Conference
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• 2007.07a
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• pp.341-342
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• 2007

The IRFPA (InfraRed Focal Plane Array) ROIC (ReadOut Integrated Circuit) was designed in folded-cascode Op-Amp using $0.35{\mu}m$ CMOS technology. As the folded-cascode has high open-loop voltage gain and fast settling time, that used in many analog circuit designs. In this paper, folded-cascode Op-Amp for ROIC of the $32{\times}32$ IRFPA has been designed. HSPICE simulation results are unit gain bandwidth of 13.0MHz, 90.6 dB open loop gain, 8 V/${\mu}m$ slew rate, 600 ns settling time and $66^{\circ}$ phase margin.

• Bulletin of the Korean Chemical Society
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• v.18 no.10
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• pp.1050-1052
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• 1997

The complexes M(CO)4-1,2-(PPh2)2-1,2-C2B10H10 (M=Cr 2a, Mo 2b, W 2c) have been prepared in good yields from readily available bis-diphenylphosphino-o-carboranyl ligand, closo-1,2-(PPh2)2-1,2-C2B10H10 (1), by direct reaction with Group Ⅵ metal carbonyls. The infrared spectra of the complexes indicate that there is an octahedral disposition of chelate bis-diphenylphosphino-o-carboranyl ligand around the metal atom. The crystal structure of 2a was determined by X-ray diffraction. Complex 2a crystallizes in the monoclinic space group P21/n with cell parameters a = 12.2360(7), b = 17.156(1), c = 16.2040(6) Å, V = 3354.1(3) Å3, and Z =4. Of the reflections measured a total of 2514 unique reflections with F2 > 3σ(F2) was used during subsequent structure refinement. Refinement converged to R1 = 0.066 and R2 = 0.071. Structural studies showed that the chromium atom had a slightly distorted pseudo-octahedral configuration about the metal center with two phosphine groups of o-carborane occupying the equatorial plane cis-orientation to each other. These metal carbonyl complexes are rapidly converted to the corresponding metal carbene complexes, [(CO)3M=C(OCH3)(CH3)]-1,2-(PPh2)2-1,2-C2B10H10 (M= Cr 3a, Mo 3b, W 3c), via alkylation with methyllithium followed by O-methylation with CF3SO3CH3.

• Proceedings of the Korean Vacuum Society Conference
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• 1998.02a
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• pp.109-109
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• 1998

최근 들어 MOCVD 법으로 성장시킨 GaN, InGaN, AIGaN를 이용한 광소자 ( (LED, LD)와 전자소자(FET, MODFET)에 대한 관심이 고조되면서, MOCVD 법 을 이용한 GaN 중심의 질화물 반도체 성장에 관심이 집중되고 있다. 금번 실험에 사용된 MOCVD 장비는 수직형 MOCVD 장비이다. 특히, wafer c carner를 1$\alpha$)() rpm이상의 고속으로 회전시킬 수 있는 장치로서 원료 가스의 반웅 기 내에서의 흐름을 균일하게 하여 uniformity가 높은 질화물 반도체를 성장시킬 수 있다 .. GaN 에피충은 c-plane 사파이어를 기판으로 하여 11 00 "C 이상의 고온 에서 수소를 이용하여 기판을 cleaning하고, 500 "C 부근에서 핵생성충올 성장시 킨 후 1050 "C에서 trimethylgallium(TMGa)과 NI-h를 이용하여 성장시켰다. n n -GaN를 성장시키기 위해서는 SiH4을 사용하였으며, InGaN의 경우는 t trimethylindium(TMIn)을 In원 료 가스로 하여 635 - 725 "C 범 위 에 서 성 장시 켰 다. 성 장된 undoped GaN, n-GaN, InGaN는 X -ray di잔raction(XRD), H떠l m measurement, Photoluminescence(PU동올 이용하여 결정성과 전기적 및 광학적 특성올 고찰하였다 .. 2ttm 두께로 성장된 undoped G값V박막의 경우 Hall 측정결과 6 6 X lOI6/e며 정도의 낮은 도핑 농도를 보였으며, V!lII ratio(2500 - 5000)증가에 따라 결정성이 향상됨을 GaN (102)면의 X -ray e -rocking분석올 통하여 확인하 였다 .. n-GaN의 경우 SiH4양올 3 - 13 sccm으로 증가시킴에 따라 n -type 도명농 도가 선형적으로 증가하였고, 1017/c며 범위 내로 도평이 된 경우 상온에서 300 e마 N Ns 이상의 high mobility를 얻올 수 있었다 .. PL 관측 결과로부터 Si 도핑으로 인 하여 GaN bandedge emission이 강화됨을 알 수 있었다 .. InGaN 박막의 경우 성 장온도를 낮춤에 따라서 m의 양을 증가시킬 수 있었다. 또한 유량비(TMIn I T TMGa)가 1에 가까운 경 우에서도 온도를 635 "C 정도로 낮훈 경우 410 nm정도에 서 PL bandedge peak올 얻을 수 있었으며, 이 때의 반치폭은 50 meV정도의 낮 은 값을 보였다. 반치폭은 50 meV정도의 낮 은 값을 보였다.

• Plant Journal
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• v.16 no.4
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• pp.40-44
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• 2020

In this study, after supplying a pulse wave to the 2 V Industrial Lead-Acid Battery electrode plate and repeating the charging and discharging, the discharging time per voltage was analyzed. According to the result of experiment, while the lead-acid Battery that a pulse wave is not supplied decreased about 18 % of discharging capacity than the beginning, the lead-acid Battery that a pulse wave is supplied decreased a little amount much lower than 18 %, of discharging capacity and recorded the 0.56 % decrease, at a minimum, from discharging capacity at the 20 kHz frequency. This means that the sulfate on electrode plate is detached and the positive and negative charge transfer is highly activated at the 20 kHz frequency

• Journal of Sensor Science and Technology
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• v.16 no.6
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• pp.475-483
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• 2007

This paper proposes a readout integrated circuit (ROIC) for $32{\times}32$ infrared focal plane array (IRFPA) detector, which consist of reference resistor, detector resistor, reset switch, integrated capacitor and operational amplifier. Proposed ROIC is designed using $0.35{\;}{\mu}m$ 2P-4M (double poly four metal) n-well CMOS process parameters. Low noise folded cascode operational amplifier which is a key element in the ROIC showed 12.8 MHz unity-gain bandwidth and open-gain 89 dB, phase margin $67^{\circ}$, SNR 82 dB. From proposed circuit, we gained output voltage variation ${\Delta}17{\};mV/^{\circ}C$ when the detector resistor varied according to the temperature.

• Korean Journal of Materials Research
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• v.15 no.9
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• pp.566-576
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• 2005

This paper describes an ab Initio study on interface energies, misfit strain energies, and electron structures at coherent interfaces Fe(bcc structure)/MCs(NaCl structure M=Ti, Zr, Hf). The interface energies at relaxed interfaces Fe/TiC, Fe/ZrC and Fe/HfC were 0.263, 0.153 and $0.271 J/m^2$, respectively. It was understood that the dependence of interface energy on the type of carbide was closely related to changes of the binding energies between Fe, M and C atoms before and after formation of the interfaces Fe/MCs with the help of the DLP/NNBB (Discrete Lattice Plane/ Nearest Neighbour Broken Bond) model and data of the electron structures. The misfit strain energies in Fe/TiC, Fe/ZrC and Fe/HfC systems were 0.390, 1.692 and 1.408 eV per 16 atoms(Fe: 8 atoms and MC; 8 atoms). More misfit energy was generated as difference of lattice parameters between the bulk Fe and the bulk MCs increased.

• Advances in Energy Research
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• v.3 no.2
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• pp.117-124
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• 2015

In this paper, we have reported an enhancement in thermoelectric properties of un-doped zinc oxide (ZnO) grown by molecular beam epitaxy (MBE) on silicon (001) substrate by annealing treatment. The grown ZnO thin films were annealed in oxygen environment at $500^{\circ}C-800^{\circ}C$, keeping a step of $100^{\circ}C$ for one hour. Room temperature Seekbeck measurements showed that Seebeck coefficient and power factor increased from 222 to $510{\mu}V/K$ and $8.8{\times}10^{-6}$ to $2.6{\times}10^{-4}Wm^{-1}K^{-2}$ as annealing temperature increased from 500 to $800^{\circ}C$ respectively. This observation was related with the improvement of crystal structure of grown films with annealing temperature. X-ray diffraction (XRD) results demonstrated that full width half maximum (FWHM) of ZnO (002) plane decreased and crystalline size increased as the annealing temperature increased. Photoluminescence study revealed that the intensity of band edge emission increased and defect emission decreased as annealing temperature increased because the density of oxygen vacancy related donor defects decreased with annealing temperature. This argument was further justified by the Hall measurements which showed a decreasing trend of carrier concentration with annealing temperature.