• Journal of the Semiconductor & Display Technology
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• v.3 no.2
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• pp.5-9
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• 2004

Microcircuit fabrication requires precise control of impurities in tiny regions of the silicon. These regions must be interconnected to create components and VLSI circuits. The patterns to define such regions are created by lithographic processes. In order to image features smaller than 70 nm, it is necessary to employ non-optical technology (or next generation lithography: NGL). One such NGL is extreme ultra-violet lithography (EUVL). EUVL transmits the pattern on the wafer surface after reflecting ultra-violet through mask pattern. If particles exist on the blank mask, it can't transmit the accurate pattern on the wafer and decrease the reflectivity. It is important to care the blank mask. We removed the particles on the wafer using focused ion beam (FIB). During removal, FIB beam caused damage the multi layer mask and it decreased the reflectivity. The relationship between particle removal and reflectivity is examined: i) transmission electron microscope (TEM) observation after particle removal, ii) reflectivity simulation. It is found that the image mode of FIB is more effective for particle removal than spot and bar mode.

• Journal of the Korean Vacuum Society
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• v.16 no.1
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• pp.65-73
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• 2007

The control of surface properties and spatial presentation of functional molecules within a microfluidic channel is important for the development of diagnostic assays, microreactors, and for performing fundamental studies of cell biology and fluid mechanics. Here, we present soft lithographic methods to create robust microchannels with patterned microstructures inside the channel. The patterned regions were protected from oxygen plasma by controlling the dimensions of the poly(dimethylsiloxane)(PDMS) mold as well as the sequence of fabrication steps. The approach was used to pattern a non-biofouling polyethylene glycol(PEG)-based copolymer or the polysaccharide hyaluronic acid(HA) within microfluidic channels. These non-biofouling patterns were then used to fabricate arrays of fibronectin(FN) and bovine serum albumin(BSA) as well as mammalian cells.

• Journal of Integrative Natural Science
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• v.2 no.4
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• pp.252-264
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• 2009

Lithographic data obtained from PHS(polyhydroxy styrene) having various functionalities were investigated by using a photoacid generator based on diazo and onium type. Chemically amplified photoresist based on the KrF type photoresist was developed by using a photoacid generator and multi-functional resin. Thermal stability for the photoacid generator showed that the increase of loading amount of photoacid generator resulted in the decrease of glass transintion temperature (Tg). The photoacid generators having methyl, ethyl, or propyl group in their cationic structure produced T-top structure in pattern profile due to the effect of acid diffusion during the generation of acid in the resist. The increase of carbon chain length in the anionic structure of photoacid generators resulted in lower pattern resolution due to the interruption of acid diffusion.

• Proceedings of the KIEE Conference
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• 1999.07d
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• pp.1858-1860
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• 1999

To fabricate superconducting multiplexers with narrow pass band characteristics and reduce the physical size of device, we have designed multiplexer using hair-pin type filters with the center frequency of 13.6 GHz. Multiplexers have been fabricated superconductor(HTS), because It has low surface resistance. The $YBa_2Cu_3O_{7-{\delta}}$(YBCO) films were deposited on MgO substrates$(20{\times}20{\times}0.5mm^3)$ by using pulsed laser deposition and conventional photo-lithographic methods were used to pattern the multiplexer. Epitaxial YBCO films were grown on(100) MgO substrates and showed strongly c_axis orientations observed by X-ray diffraction technique. Superconducting transition temperatures were measured to be about 89K. Simulated results of superconducting multiplexer consisting of hair-pin type filters show the insertion loss of about 1.2dB. The measured frequency response will be compared with the simulated results.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 1996.04a
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• pp.592-596
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• 1996

The CAD/CAM System oriented to StereoLithographic Rapid Prototyping was constructed and developed. The software architecture uses a 586PC running the windows NT operating system. An .STL file brought into the software program can be verified in divers view points and focused for a detail of concern. A variety of Entity was applied to define an array of triangular facets and sliced loops. The system provides Edit, Scale, Orient, Copy and Divide commands to modify .STL model. The NC codes are created according to various laser beam scan pattern and the software show the parts on the platform before they are constructed. This system is written in Visual C and has been proved as a powerful tool for producing solid parts directly from a CAD modelling, using actual applications.

• Journal of Information Display
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• v.9 no.1
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• pp.14-19
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• 2008

We demonstrated the capillary force lithography (CFL) method for controlling the azimuthal anchoring energy of a liquid crystal (LC) alignment layer. When a thermoplastic polymer film is heated to over the glass transition temperature, the melted polymer is filled into the mold structure by the capillary action and the aspect ratio of the pattern is determined by the dewetting time of the CFL process. Here, the proposed method showed that the azimuthal anchoring energy of the LC alignment layer could be simply controlled by the surface relief patterns which were determined by the dewetting times during the CFL patterning.

• Proceedings of the KIEE Conference
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• 1994.07b
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• pp.1268-1270
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• 1994

Fine lithographic technology in a submicron design regime is necessary for the fabrication of VLSI circuits. In such lithography, fine pattern delineation is performed by electron beam, ion beam and X-ray lithography instead of photolithography. Therefore, the new resist materials and development method have been required. So, we are investigating another positive E-beam resists which have high sensitivity and dry etching resistance, Plasma co-polymerized resist was prepared using an interelectrode gas-flow-type reacter. Methymethacrylate, tetramethyltin and styrene were chosen as the monomer to be used. The delineated pattern in the resist was developed with gas-flow-type reactor using an argon and 02 as etching gas. We studied about the effects of discharge power and mixing rate of the co-polymerized thin :film. The molecular structure of thin film was investigated by ESCA and IR, and then was discussed in relation to its quality as a resist.

• Macromolecular Research
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• v.15 no.2
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• pp.142-146
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• 2007

Poly[(1-(9-carbazoly1)ethylene)-co-(3-cinnamoyloxyoctyl-9-carbazolyl)] ethylene (PVK-Cin) was prepared by tethering cinnamate pendants to a carbazole group via an octylene spacer. The photopatternability of the new PVK based-polymer was investigated using a photocrosslinking reaction under UV light illumination $(\lambda=254nm)$. Blends of the PVK-Cin and a soluble poly(phenylene vinylene) (CzEh-PPV) were employed to study the photocrosslinking behavior. Well resolved lithographic patterns were observed in these polymer systems. PVK-Cin produced a blue light emitting pattern both before and after the photocrosslinking reaction. The blends of PVK-Cin and CzEh-PPV also showed corresponding emissions at 398 and 525 (560) nm in the film state.

• Transactions on Electrical and Electronic Materials
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• v.10 no.3
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• pp.85-88
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• 2009

This report demonstrates the immobilization of uniformly sized gold nanoparticles (AuNPs) on UV cross-linked poly(4-vinylpyridine) (P4VP) polymer thin films and the preparation of micropatterned structures of AuNPs on these films. The polymer thin films were prepared by a spin-coating of P4VP onto a cleaned silicon wafer surface. Upon UV irradiation, these films were then photo cross-linked. Gold nanoparticles were immobilized by immersing the polymer surface in a colloidal solution of gold nanoparticles stabilized by citric acid. The morphology of the films and the immobilization of AuNPs were studied by atomic force microscopy (AFM) and UV-visible spectroscopic techniques. The micropatterned gold structures that were produced on the polymer surface are delineated by combining with the photolithographic method. While untreated and simply spin coated films were physisorbed and unstable that could be easily removed by rinsing with a solvent, the cross-linked and AuNPs immobilized P4VP films were found to be highly stable even after repeated solvent extractions.

• Applied Chemistry for Engineering
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• v.19 no.4
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• pp.402-406
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• 2008

A series of random copolymers, composed of 1H,1H,2H,2H-perfluoro decyl methacrylate (FDMA) as a $CO_2$-philic monomer and tert-butyl methacrylate (TBMA) as an acid labile monomer, were synthesized by free radical polymerization. The solubility of copolymers in carbon dioxide, light sensitivity at 365 nm exposure, and photoresist pattern formation properties were investigated. Furthermore, sub micron-sized poly(styrenesulfonate) : poly(3,4-ethylenedioxythiophene) (PSS : PEDOT) conducting polymer patterns were successfully prepared by pattern transfer.