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Synthesis of Copolymers Composed of 1H,1H,2H,2H-perfluorodecylmethacrylate and tert-butylmethacrylate and Their Lithographic Properties in Carbon Dioxide  

Hwang, Ha Soo (Division of Image and Information Engineering, Pukyong National University)
Lee, Jin-kyun (Department of Materials Science and Engineering, Cornell University)
Park, In (Green Materials Team, Environment and Energy Division, Korea Institute of Industrial Technology (KITECH))
Huh, Hoon (Green Materials Team, Environment and Energy Division, Korea Institute of Industrial Technology (KITECH))
Lim, Kwon Taek (Division of Image and Information Engineering, Pukyong National University)
Publication Information
Applied Chemistry for Engineering / v.19, no.4, 2008 , pp. 402-406 More about this Journal
Abstract
A series of random copolymers, composed of 1H,1H,2H,2H-perfluoro decyl methacrylate (FDMA) as a $CO_2$-philic monomer and tert-butyl methacrylate (TBMA) as an acid labile monomer, were synthesized by free radical polymerization. The solubility of copolymers in carbon dioxide, light sensitivity at 365 nm exposure, and photoresist pattern formation properties were investigated. Furthermore, sub micron-sized poly(styrenesulfonate) : poly(3,4-ethylenedioxythiophene) (PSS : PEDOT) conducting polymer patterns were successfully prepared by pattern transfer.
Keywords
supercritical carbon dioxide; photoresist; copolymer; conducting polymer;
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