• Journal of the Korean Institute of Telematics and Electronics
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• v.23 no.6
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• pp.820-832
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• 1986

In contrast to conventional liquid phase epitaxy of GaAs, surface kinetics limited growth is predominant in selective liquid phase epitaxy. For the stripe openings in the high-index crystal-lographic directions, the well-known facet formations and the decompositions into the low index planes or smooth circular surfaces are observed depending on the growth kinetics. For the low index direction stripe, surface kinetics limited growth is evident. By a numerical calcualtion we show that these phenomena are due to the enhanced masstransport by two dimensional diffusion and growth rate anisotropy which is found to be very stdrong with cusped minima for some singular planes in the solution growth as well as in vapor phase epitaxy. Morphological stability is briefly treated in terms of diffusion and its implications on device application are stated. Tese phenomena may be common to III-V compound semiconductors as well as GaAs.

• Proceedings of the Korean Institute of Navigation and Port Research Conference
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• 2000.11a
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• pp.89-92
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• 2000

Liquid Phase Epitaxy 법을 이용하여 La이 첨가된 YIG(Yitrium Ion Garnet)막을 성장시켰다. X선 회절 분석을 이용하여 La의 첨가량을 변화시키며 제조된 막의 격자상수를 조사한 결과, La의 첨가량이 증가함에 따라 성장된 막의 격자상수도 증가하였으며 Y/La이 20인 경우, 막의 격자상수가 기판으로 사용한 GGG의 격자상수와 일치하였다. VSM(Vibration Sample Magnetometer)를 이용하여 구한 막의 포화자화 값은 La의 첨가량과 관계없이 순수한 YIG의 경우와 같은 값인 1750정도로 거의 일정하였다. FMR(FerroMagnetic Resonance) 측정장치를 이용한 막의 강자성 공명선폭을 측정결과 막의 공명선폭은 La의 첨가량과 관계없이 모든 경우에 순수한 YIG보다 감소하였다. 실험범위내의 La의 첨가에 대해서 기판과의 격자불일치가 순수한 YIG의 경우보다 감소하기 때문이다. La의 첨가량이 많은 조건에서 성장시킨 막은 공명선폭이 크고 두께의 증가에 따라서 선폭이 증가하였으며, YLa가 20과 30일 때 성장시킨 막에서는 공명선폭의 절대값도 작고 두께에 따른 공명선폭의 변화도 관찰되지 않았다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.14 no.3
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• pp.257-262
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• 2001

Single crystalline films of La doped YIG(yttrium iron garnet) were grown by the liquid phase epitaxy. The lattice constants of films obtained by DCD(double crystalline diffractometer) measurement increased with increasing La contents in films. In particular, lattice constants of films grown wiht Y/La=20 solution were nearly same as those of GGG (gadolinium gallium garnet) substrate. The saturation magnetization measured with VSM (vibrating sample magnetometer) was about 1750Gauss which is the same as that of pure YIG irrespective of La contents in films. FMR(ferromagnetic resonance) linewidth of La doped YIG was smaller than that of pure YIG. Since appropriate La doping decreases the lattice mismatch between film and substrate, the FMR linewidth was Y/La=20 in this experiment.

• Electrical & Electronic Materials
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• v.7 no.4
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• pp.300-305
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• 1994

We determined the alloy composition of the liquid-phase epitaxy(LPE) grown $Al_{x}$G $a_{1-x}$ As by the photoreflectance(PR), and observed the variation of PR signal by changing the condition of annealing and thickness of epilayer. As the measuring temperature was decreased, the broadening parameter was decreased, and the amplitude of PR signal was increased. When the temperature of annealing was increased, the surface carrier concentration was decreased and then the shape and amplitude of PR signal were affected by the surface electric field. The structure change was observed when the specimen was annealed for long time at a high temperature. We found that the surface electric field increased when the thickness of epilayer was decreased by etching, because the band bending was increased by the decreased of the width of depletion layer....

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.11a
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• pp.89-92
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• 2000

Liquid Phase Epitaxy 법을 이용하여 La이 첨가된 YIG(Yitrium Ion Garnet)막을 성장시켰다. X선 회절 분석을 이용하여 La의 첨가량을 변화시키며 제조된 막의 격자상수를 조사한 결과, La의 첨가량이 증가함에 따라 성장된 막의 격자상수도 증가하였으며 Y/La이 20인 경우, 막의 격자상수가 기판으로 사용한 GGG의 격자상수와 일치하였다. VSM(Vibration Sample Magnetometer)를 이용하여 구한 막의 포화자화 값은 La의 첨가량과 관계없이 순수한 YIG의 경우와 같은 값인 1750정도로 거의 일정하였다. FMR(Ferro Magnetic Resonance) 측정장치를 이용한 막의 강자성 공명선폭을 측정결과 막의 공명선폭은 La의 첨가량과 관계없이 모든 경우에 순수한 YIG보다 감소하였다. 실험범위내의 La의 첨가에 대해서 기판과의 격자불일치가 순수한 YIG의 경우보다 감소하기 때문이다. La의 첨가량이 많은 조건에서 성장시킨 막은 공명선폭이 크고 두께의 증가에 따라서 선폭이 증가하였으며, Y/La가 20과 30일 때 성장시킨 막에서는 공명선폭의 절대값도 작고 두께에 따른 공명선폭의 변화도 관찰되지 않았다.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.12 no.1
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• pp.27-30
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• 2002

ZnO co-doped Er:$LiNbO_3$ single crystal thin films have been grown on $LiNbO_3$ (001) substrate by liquid phase epitaxy (LPE) method. The melts of ZnO co-doped Er:$LiNbO_3$ was fixed $Er_2O_3$, concentration (1 mol%) and different ZnO concentrations 3 and 5 mol%. The crystallinity of ZnO co-doped Er :$LiNbO_3$ films became better than the $LiNbO_3$ substrate. At ZnO 5 mol% concentration, the surface of ZnO co-doped Er:$LiNbO_3$ film is affected by compressive stress along both the perpendicular and the parallel direction. Also the surface of ZnO 3 mol% co-doped Er:$LiNbO_3$film is smoother than the original $LiNbO_3$ substrate surface.

• Journal of the Korean Institute of Telematics and Electronics
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• v.10 no.3
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• pp.1-9
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• 1973

Gallium phosphide light emitting diode (LED) has been fabricated first time for pilot lamp and numeric display purposes. Bright red light is obtained in forward bias at very low current of one to five mA. A typical p-n junction is formed by liquid phase epitaxial growth on a n-type gallium physphide substrate. The crystal growth is achieved at about 1300$^{\circ}$K after the equilibrium of the gallium solution followed by tipping operation. The ohmic contact is made by wire bonding by thermal compression technique. The entire process is well fit for laboratory scale to fabricate a few hundred diodes for mainly demonstration purpose. For mass production, a large sum of the capital investment is required. The great merit of gallium phosphide LED is at low current operation, and green light emission is also obtainable by nitrogen doping.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.4 no.2
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• pp.131-133
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• 1994

Deposition of silicon on pretreated sapphire substrates has been investigated by the liquid phase epitaxy method at low temperatures. An average 14 $\mu\textrm{m}$ thickness of silicon was grown over a large area on sapphire substrate originally coated with a much thinner silicon layer $[0.5 \mu\textrm{m} (100) Si/(1102) sapphire]$ at low temperatures from $(380^{\circ}C to 460^{\circ}C)$.

• Journal of the Korean Institute of Telematics and Electronics
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• v.21 no.5
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• pp.11-16
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• 1984

In this paper, the construction of the Liquid Phase Epitaxy system for fabricating III-V compound semiconductor devices and the method of growing AIGaAs/GaAs Double-Hetero-structure are discussed. The possibility of this Double-Heterostructure for the Light Emitting Diode is confirmed also.

• Proceedings of the KIEE Conference
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• 1986.07a
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• pp.595-598
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• 1986