• Title/Summary/Keyword: Liquid Phase deposition

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Modeling and simulation of air-water upward annular flow characteristics in a vertical tube using CFD

  • Anadi Mondal;Subash L Sharma
    • Nuclear Engineering and Technology
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    • v.56 no.7
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    • pp.2881-2892
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    • 2024
  • Annular flow refers to a special type of two-phase flow pattern in which liquid flows as a thin film at the periphery of a pipe, tube, or conduit, and gas with relatively high velocity flows at the center of the flow section. This gas also includes dispersed liquid droplets. The liquid film flow rate continuously changes inside the tube due to two processes-entrainment and deposition. To determine the liquid holdup, pressure drop, the onset of dryout, and heat transfer characteristics in annular flow, it is important to have proper knowledge of flow characteristics. Especially a better understanding of entrainment fraction is important for the heat transfer and safe operation of two-phase flow systems operating in an annular two-phase flow regime. Therefore, the objective of this work is to develop a computational model for the simulation of the annular two-phase flow regime and assess the various existing models for the entrainment rate. In this work, Computational Fluid Dynamics (CFD) in ANSYS FLUENT has been applied to determine annular flow characteristics such as liquid film thickness, film velocity, entrainment rate, deposition rate, and entrainment fraction for various gas-liquid flow conditions in a vertical upward tube. The gas core with droplets was simulated using the Discrete Phase Model (DPM) which is based on the Eulerian-Lagrangian approach. The Eulerian Wall Film (EWF) model was utilized to simulate liquid film on the tube wall. Three different models of Entrainment rate were implemented and assessed through user-defined functions (UDF) in ANSYS. Finally, entrainment for fully developed flow was determined and compared with the experimental data available in the literature. From the simulations, it was obtained that the Bertodano correlation performed best in predicting entrainment fraction and the results were within the ±30 % limit when compared to experimental data.

Band Gap Energy of SrTiO3Thin Film Prepared by the Liquid Phase Deposition Method

  • Gao, Yanfeng;Masuda, Yoshitake;Koumoto, Kunihito
    • Journal of the Korean Ceramic Society
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    • v.40 no.3
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    • pp.213-218
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    • 2003
  • Band gap energies of SrTiO$_3$(STO) thin film on glass substrates were studied in terms of annealing temperature. The STO thin film was fabricated by our newly developed method based on the combination of the Self-Assembled Monolayer(SAM) technique and the Liquid Phase Deposition(LPD) method. The as-deposited film demonstrated a direct band gap energy of about 3.65 eV, which further increased to 3.73 eV and 3.78 eV by annealing at 40$0^{\circ}C$ and 50$0^{\circ}C$, respectively. The band gap energy saturated at about 3.70 eV for the crystallized film which was obtained by annealing at 600-$700^{\circ}C$. The relatively large band gap energies of our crystallized films were due to the presence of minor amorphous phase, grain boundaries and oxygen vacancies generated by annealing in air.

Effect of Cubic Liquid Crystalline Systems on Skin Localization of Oregonin and Hirsutanonol

  • Im, Tae-Jong;Kang, Myung-Joo;Seo, Dong-Woo;Lee, Jae-Hwi
    • Biomolecules & Therapeutics
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    • v.16 no.3
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    • pp.226-230
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    • 2008
  • Monoolein-based cubic liquid crystalline systems were formulated for the local delivery of oregonin and hirsutanonol for the treatment of atopic dermatitis. The liquid crystalline phase and its nanodispersion containing drugs were prepared. The skin permeation and deposition properties of the drugs were examined in normal and delipidized rat skin. The proportion of oregonin (%) deposited in normal skin after topical administration of the drugs in the form of aqueous solution, cubic phase or cubic nanodispersions were $1.53\;{\pm}\;0.46$, $3.62\;{\pm}\;0.17$ and $5.13\;{\pm}\;0.73$, and those of hirsutanonol were $2.46\;{\pm}\;0.02$, $5.44\;{\pm}\;0.27$ and $17.28\;{\pm}\;2.19$, respectively. The greater lipophilicity and thus greater skin affinity of hirsutanonol than oregonin contributed the greater amount of skin deposition. The monoolein-based liquid crystalline phases significantly increased the amount of both drugs permeated and deposited. Approximately 3.2, 2.1 and 3.0 times greater amount of oregonin, and 3.4, 2.1 and 2.2 times greater amount of hirsutanonol were deposited in delipidized skin after administration of each drug in the form of aqueous solution, cubic phase and cubic nanodispersions system, respectively, because of lowered barrier function of the delipidized skin. In this study, the effects of drug property, vehicles type and skin condition on skin deposition and permeation properties of drug were examined and concluded that monoolein-based liquid crystalline systems would be a promising formulation for the local delivery of drugs.

EFFECTS OF GRID SPACER WITH MIXING VANE ON ENTRAINMENTS AND DEPOSITIONS IN TWO-PHASE ANNULAR FLOWS

  • KAWAHARA, AKIMARO;SADATOMI, MICHIO;IMAMURA, SHOGO;SHIMOHARAI, YUTA;HIRAKATA, YUDAI;ENDO, MASATO
    • Nuclear Engineering and Technology
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    • v.47 no.4
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    • pp.389-397
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    • 2015
  • The effects of mixing vanes (MVs) attached to a grid spacer on the characteristics of air-water annular flows were experimentally investigated. To know the effects, a grid spacer with or without MV was inserted in a vertical circular pipe of 16-mm internal diameter. For three cases (i.e., no spacer, spacer without MV, and spacer with MV), the liquid film thickness, liquid entrainment fraction, and deposition rate were measured by the constant current method, single liquid film extraction method, and double liquid film extraction method, respectively. The MVs significantly promote the re-deposition of liquid droplets in the gas core flow into the liquid film on the channel walls. The deposition mass transfer coefficient is three times higher for the spacer with MV than for the spacer without MV, even for cases 0.3-m downstream from the spacer. The liquid film thickness becomes thicker upstream and downstream for the spacer with MV, compared with the thickness for the spacer without MV and for the case with no spacer.

Analysis of Sticking Coefficient in BSCCO Superconductor Thin Film Fabricated by Co-deposition (공증착법으로 제작한 BSCCO 초전도 박막의 부착계수 해석)

  • An, In-Soon;Chun, Min-Woo;Park, Yong-Pil
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.300-303
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    • 2001
  • BSCCO thin films are fabricated via a co-deposition process by an ion beam sputtering with an ultra-low growth rate, and sticking coefficients of the respective elements are evaluated. The sticking coefficient of Bi element exhibits a characteristic temperature dependence : almost a constant value of 0.49 below $730^{\circ}C$ and decreases linearly with temperature over $730^{\circ}C$. This temperature dependence can be elucidated from the evaporation and sublimation rates of bismuth oxide, $Bi_{2}O_{3}$, from the film surface. It is considered that the liquid phase of the bismuth oxide plays an important role in the Bi 2212 phase formation in the co-deposition process.

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Analysis of Sticking Coefficient in BSCCO Superconductor Thin Film Fabricated by Co-deposition (공증착법으로 제작한 BSCCO 초전도 박막의 부착계수 해석)

  • 안인순;천민우;박용필
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11a
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    • pp.300-303
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    • 2001
  • BSCCO thin films are fabricated via a co-deposition process by an ion beam sputtering with an ultra-low growth rate, and sticking coefficients of the respective elements are evaluated. The sticking coefficient of Bi element exhibits a characteristic temperature dependence : almost a constant value of 0.49 below 730$^{\circ}C$ and decreases linearly with temperature over 730$^{\circ}C$. This temperature dependence can be elucidated from the evaporation and sublimation rates of bismuth oxide, Bi$_2$O$_3$, from the film surface. It is considered that the liquid phase of the bismuth oxide plays an important role in the Bi 2212 phase formation in the co-deposition process.

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Liquid Phase Deposition of Transition Metal Ferrite Thin Films: Synthesis and Magnetic Properties

  • Caruntu Gabriel;O'Connor Charles J.
    • Journal of the Korean Ceramic Society
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    • v.43 no.11 s.294
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    • pp.703-709
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    • 2006
  • We report on the synthesis of highly uniform, single phase zinc and cobalt thin films prepared by the Liquid Phase Deposition (LPD) method. X-Ray diffraction, TGA and EDX measurements support the assumption that the as deposited films are constituted by a mixture of crystallized FeOOH and amorphous M(OH)$_2$ (M=Co, Zn) which is converted upon heat treatment in air at 600?C into the corresponding zinc ferrites. The films with adjustable chemical compositions are identified with a crystal structure as spinel-type and present a spherical or rod-like microstructure, depending on the both the nature and concentration of the divalent transition metal ions. Zinc ferrite thin films present a superparamagnetic behavior above blocking temperatures which decrease with increasing the Zn content and are ferromagnetic at 5 K with coercivities ranging between 797.8 and 948.5 Oe, whereas the cobalt ferrite films are ferromagnetic at room temperature with magnetic characteristics strongly dependent on the chemical composition.

Evaluation of Sticking Coefficient in BSCCO Thin Film Fabricated by Co-sputtering

  • Lee, Hee-Kab;Park, Yong-Pil;Lee, Kwon-Hyun;Lee, Joon-Ung
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.13 no.1
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    • pp.80-84
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    • 2000
  • BSCCO thin films are fabricated via a co-deposition process by an ion beam sputtering with an ultra-low growth rate, and sticking coefficients of the respective elements are evaluated. The sticking coeffi-cient of Bi element exhibits a characteristic temperature dependence : almost a constant value of 0.49 below 73$0^{\circ}C$ and decreases linearly with temperature over 73$0^{\circ}C$. This temperature dependence can be elucidated from the evaporation and sublimation rates of bismuth oxide, Bi\ulcornerO\ulcorner, from the film surface. It is considered that the liquid phase of the bismuth oxide plays an important role in the Bi(2212) phase formation in the co-deposition process.

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Bi-sticking Coefficient of Bi-superconducting Thin Film Prepared by IBS Method

  • Lee, Hee-Kab;Lee, Joon-Ung;Park, Yong-Pil
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.11a
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    • pp.213-216
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    • 1999
  • BSCCO thin films are fabricated via a co-deposition process by an ion beam sputtering with an ultra-low growth rate, and sticking coefficients of the respective elements are evaluated. The sticking coefficient of Bi element exhibits a characteristics temperature dependence : almost a constant value of 0.49 below 730$^{\circ}C$ and decreases linearly with temperature over 730$^{\circ}C$. This temperature dependence can be elucidated from the evaporation and sublimation rates of bismuth oxide, Bi$_2$O$_3$ from the film surface. It is considered that the liquid phase of the bismuth oxide plays an important role in the Bi(2212) phase formation in the co-deposition process.

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Sticking Coefficient in Bi-thin Film Prepared by IBS Method

  • Yang, Sung-Ho;Park, Yong-Pil;Chun, Min-Woo;Park, Sung-Gyun;Park, Woon-Shik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.193-197
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    • 2000
  • BSCCO thin films are fabricated via a co-deposition process by an ion beam sputtering with an ultra-low growth rate, and sticking coefficients of the respective elements are evaluated. The sticking coefficient of Bi element exhibits a characteristic temperature dependence : almost a constant value of 0.49 below 73$0^{\circ}C$ and decreases linearly with temperature over 73$0^{\circ}C$. This temperature dependence can be elucidated from the evaporation and sublimation rates of bismuth oxide, Bi$_2$O$_3$, from the film surface. It is considered that the liquid phase of the bismuth oxide plays an important role in the Bi(2212) phase formation in the co-deposition process.

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