• 제목/요약/키워드: Line Width

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비만체형을 위한 기본 Bodice 원형연구 -중년기 부인을 중심으로- (A Study on the Basic Bodice Pattern for the Fatty Body -The subject of middle-aged women-)

  • 한애미
    • 대한가정학회지
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    • 제25권3호
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    • pp.15-26
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    • 1987
  • The purpose of this study was to develop the pattern drafting method which would be suitable to their physical characteristics for the fatty body of 40∼55 aged Korean women who are more than 1.5 Rohrer's Index and 90㎝ bust girth. The study was composed as follows; 1. Body measurement and statistical analysis: One hundred and thirty women were measured on 29 items. Thirty-four items including 29 measured items and 5 calcutated items were analyzed statistically. 1) Mean, standard deviation, variance, maximum, minimum, range were computed. 2) Correlation coefficients between each items were computed. 2. Development of new bodice pattern drafting method: Measurement items necessary to draft new bodice pattern were bust girth, center back waist length, shoulder width, back width, chest and neck base girth. The new pattern was examined through three wearing tests for completion. 3. Evaluation of the new pattern drafting method: The new pattern was objectively evaluated by the sensory test. The sensory evaluation was applied to evaluate the new pattern for the fatty body women by comparint it with the conventional patterns. The results of sensory tests of the new pattern are as follows: 1) The composite reliability coefficient is 0.7698, and the reliability of sensory test shows high. 2) According to a statistical analysis of the result of the 23 items on the questionaire, all the items showed significant differences(α 0.01) between the two, with the new pattern having higher scores. The new pattern is better conventional pattern as the average mark of the former is 3.901 but that of latter is 2.926. The new pattern drafting method proved to be superior to the conventional one especially in the fitness at the center front neck point, shoulder point, side line, armscye depth, position of bust point, chest width line, under arm dart and the shoulder line.

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Investigation of TaNx diffusion barrier properties using Plasma-Enhanced ALD for copper interconnection

  • 한동석;문대용;권태석;김웅선;황창묵;박종완
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.178-178
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    • 2010
  • With the scaling down of ULSI(Ultra Large Scale Integration) circuit of CMOS(Complementary Metal Oxide Semiconductor)based electronic devices, the electronic devices become more faster and smaller size that are promising field of semiconductor market. However, very narrow line width has some disadvantages. For example, because of narrow line width, deposition of conformal and thin barrier is difficult. Besides, proportion of barrier width is large, thus resistance is high. Conventional PVD(Physical Vapor Deposition) thin films are not able to gain a good quality and conformal layer. Hence, in order to get over these side effects, deposition of thin layer used of ALD(Atomic Layer Deposition) is important factor. Furthermore, it is essential that copper atomic diffusion into dielectric layer such as silicon oxide and hafnium oxide. If copper line is not surrounded by diffusion barrier, it cause the leakage current and devices degradation. There are some possible methods for improving the these secondary effects. In this study, TaNx, is used of Tertiarybutylimido tris (ethylamethlamino) tantalum (TBITEMAT), was deposited on the 24nm sized trench silicon oxide/silicon bi-layer substrate with good step coverage and high quality film using plasma enhanced atomic layer deposition (PEALD). And then copper was deposited on TaNx barrier using same deposition method. The thickness of TaNx was 4~5 nm. TaNx film was deposited the condition of under $300^{\circ}C$ and copper deposition temperature was under $120^{\circ}C$, and feeding time of TaNx and copper were 5 seconds and 5 seconds, relatively. Purge time of TaNx and copper films were 10 seconds and 6 seconds, relatively. XRD, TEM, AFM, I-V measurement(for testing leakage current and stability) were used to analyze this work. With this work, thin barrier layer(4~5nm) with deposited PEALD has good step coverage and good thermal stability. So the barrier properties of PEALD TaNx film are desirable for copper interconnection.

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의복설계를 위한 성인여성의 經部 및 肩部의 유형화 I (A Study on the Shapes of Women′s Neck and Shoulder in Dressmaking I)

  • 김희숙
    • 복식문화연구
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    • 제8권5호
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    • pp.668-680
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    • 2000
  • The study presents the general types and individual differences of the shape of the adult women's neck and shoulder in our country. It is based on the average value, the standard deviation, the maximum value, the standard deviation, the maximum value, the minimum value and c.v. measured from the women at the age of 19 through 64. The results of this study are as follows ; 1. The factors by factor analysis are five. The first is the size factors of the neck and shoulder. The second is shape factor of neck. The third is plane view and length factor of the neck. The fourth is the side view factor of the neck and shoulder. The fifth is the shape factor of shoulder. Therefore the shape of the neck and shoulder should be examined in the shape factors as well as in the size factors as well as in the size factors for the designing body-suitable clothes. 2. The factors of the concrete objects are the solid view of neck and shoulder, the cross-sectional view of neck line, side view of neck and shoulder and length of neck. The explainable measuring items for the factors are the difference of the length between lower neck round line and the 4㎝ above neck round line, the length of neck, the angle of inclination between fore neck and back neck, the angle of inclination of the side shoulder, the difference of the height between fore neck point and back neck point, the width of shoulder, the width of chest and the width of back. 3. The concrete objects of the neck and shoulder have five types ; Type Ⅰ is average type, Type Ⅱ is thick short neck and the drooping shoulder type, Type Ⅲ I is slender long neck and lean-back shoulder type, Type Ⅳ is thick and rising shoulder type and Type Ⅴ is slender and drooping shoulder type.

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Process Characteristics for $YB_{2}Cu_{3}O_{7-d}$ Films Fabricated by Single Target Sputter and Surface Modification Technique

  • Lee, Eue-Jae
    • 한국재료학회지
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    • 제5권5호
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    • pp.598-605
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    • 1995
  • Thin films of $YB_{2}Cu_{3}O_{7-d}$ were prepared on various substrated of MgO(100), $SrTiO_{3}$, and $LaAlO_{3}$ by using off-axis magentron sputtering methods and annealing in-situ. The prarameters of film fabrication processes had been optimized through a "follow the lcoal maxima" strategy to yield good quality films in therms of the critical temperature $T_{c}$ and the critical current density $J_{c}$. Optimizedproecsses employing a plane magndtron and an cylindrical magnetron yielded $T_{c}$>90K along with $J_{c}$$10^{6}$A/$\textrm{cm}^2$ at 77K and > 2${\times}$$10^{7}$A/$\textrm{cm}^2$ at 5K. The sampels, however, showed degradationinthe properties, after chemical etching for fabrication of microbridges with the line width of 2-10 mocrons. In particular, the value of $T_{c}$ for the microbridges of 2microns was as small as 80%. The degradation was strongly dependent on the line width through a formula : $T_{c}$(e)=$T_{c}$)b) [1-a exp(-1000 bL)} where $T_{c}$(e) and $T_{c}$ (b) are the values of $T_{c}$ in the absolute scale measured after and before chemical etching, respectively and L is the line width in mm. By utilizing a best fitting technique, the proper constant values of a and to b were found as exp(-1.2) and 0.22, respectively. This formula was very useful in estimatiing the upper limit of the device operationtemperature.

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자석의 견인력을 이용한 상악골 확대 장치의 효과 (EFFECT OF MAXILLARY EXPANSION APPLIANCE USING MAGNETIC ATTRACTION FORCE)

  • 이원유;장지철;김형돈;한부석
    • 대한치과교정학회지
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    • 제21권3호
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    • pp.603-614
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    • 1991
  • To study the possibility of attraction magnetic forces to expand maxillary arch, we used 2 big adult dogs, 2 small puppies, 1 small adult dog as experiments, and 1 small adult dog as a control. We measured the intercanine width and intermolar width and histologically observed in the suture and cervical and apex region of teeth and took occlusal X-rays to observe separation of suture line in the maxilla. The results were as follows: 1. Expansion velocities of intercanine (0.25mm/day) and intermolar widths (0.23mm/day) in puppies were faster than those (0.135mm/day, 0.09mm/day) in adults. 2. In all experiments in adults (0.135mm/day) and puppies (0.25mm/day), expansion velocity of intercanine widths were faster than those (0.09mm/day, 0.23mm/day) of intermolar width. 3. In all experiments ectatic changes were observed and cellularities of fibroblast increased in the suture line. Only in adults dogs the separations of palatal suture were observed in the occlusal X-ray view. 4. In the puppies bony deposition was particularly observed in the suture line and micro-bony fragments were often observed. 5. In the all experiments no root resorption was observed in the cervical and root area, but normal root resorption due to eruption of permanent teeth was observed in the puppies.

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레이저 직접 패터닝에 의한 그라비아 망점 형성 (Gravure Halftone Dots by Laser Direct Patterning)

  • 서정;한유희;강래혁
    • 한국정밀공학회지
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    • 제17권11호
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    • pp.191-198
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    • 2000
  • Laser direct patterning of the coated photoresist (PMER-NSG31B) layer was studied to make halftone dots on gravure printing roll. The selective laser hardening of photoresist by Ar-ion laser(wavelength: 333.6~363.8nm) was controlled by the A/O modulator. The coating thickness in the range of 5~11$\mu m$ could be obtained by using the up-down directional moving device along the vertically located roll. The width, thickness and hardness of the hardened lines formed under the laser power of 200~260㎽ and irradiation time of 4.4~6.6 $\mu$sec/point were investigated after developing. The hardened width increased as the coating thickness increased. Though the hardened thickness was changed due to the effect of the developing solution, the hardened layer showed good resistance to the scratching of 2H pencil. Also, the hardened minimum line widths of 10$\mu m$ could be obtained. The change of line width was also found after etching, and the minimum line widths of 6$\mu m$ could be obtained. The hardened lines showed the good resistance to the etching solution. Finally, the experimental data could be applied to make gravure halftone dots using the developed imaging process, successfully.

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은이 코팅된 Copper(I) Oxide 나노 입자 및 도전성 페이스트의 제조 특성 (Fabrication and Characterization of Silver Copper(I) Oxide Nanoparticles for a Conductive Paste)

  • 박승우;손재홍;심상보;최연빈;배동식
    • 한국재료학회지
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    • 제29권1호
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    • pp.37-42
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    • 2019
  • This study investigates Ag coated $Cu_2O$ nanoparticles that are produced with a changing molar ratio of Ag and $Cu_2O$. The results of XRD analysis reveal that each nanoparticle has a diffraction pattern peculiar to Ag and $Cu_2O$ determination, and SEM image analysis confirms that Ag is partially coated on the surface of $Cu_2O$ nanoparticles. The conductive paste with Ag coated $Cu_2O$ nanoparticles approaches the specific resistance of $6.4{\Omega}{\cdot}cm$ for silver paste(SP) as $(Ag)/(Cu_2O)$ the molar ratio increases. The paste(containing 70 % content and average a 100 nm particle size for the silver nanoparticles) for commercial use for mounting with a fine line width of $100{\mu}m$ or less has a surface resistance of 5 to $20{\mu}{\Omega}{\cdot}cm$, while in this research an Ag coated $Cu_2O$ paste has a larger surface resistance, which is disadvantageous. Its performance deteriorates as a material required for application of a fine line width electrode for a touch panel. A touch panel module that utilizes a nano imprinting technique of $10{\mu}m$ or less is expected to be used as an electrode material for electric and electronic parts where large precision(mounting with fine line width) is not required.

수직하중에 의한 응력이 CMP 공정의 디싱에 미치는 영향 (Investigation of the Relationship Between Dishing and Mechanical Stress During CMP Process )

  • 김형구;김승현;김민우;임익태
    • 반도체디스플레이기술학회지
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    • 제22권2호
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    • pp.30-34
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    • 2023
  • Since dishing in the CMP process is a major factor that hinders the uniformity of the semiconductor thin film, many studies have focused this issue to improve the non-uniformity of the film due to dishing. In the metal layer, the dishing mainly occurs in the central part of the metal due to a difference in a selection ratio between the metal and the dielectric, thereby generating a step on the surface of the metal layer. Factors that cause dishing include the shape of the thin film, the chemical reaction of the slurry, thermal deformation, and the rotational speed of the pad and head, and dishing occurs due to complex interactions between them. This study analyzed the stress generated on the metal layer surface in the CMP process using ANSYS software, a commercial structure analysis program. The stress caused by the vertical load applied from the pad was analyzed by changing the area density and line width of the dummy metal. As a result of the analysis, the stress in the active region decreased as the pattern density and line width of the dummy metal increased, and it was verified that it was valid compared with the previous study that studied the dishing according to the dummy pattern density and line width of the metal layer. In conclusion, it was confirmed that there is a relationship between dishing and normal stress.

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정모두부방사선사진 촬영시 두부의 수직회전에 따른 투사오차 (Effects of vertical head rotation on the posteroanterior cephalometric measurements)

  • 고은희;이기헌;황현식
    • 대한치과교정학회지
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    • 제33권2호
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    • pp.73-84
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    • 2003
  • 본 연구는 정모두부방사선사진 촬영시 수직적 두부회전이 방사선사진상의 계측치들에 어느 정도의 투사오차를 야기 시키는지 알아보고자 시행되었다. 임상검사를 통하여 두드러진 전후방 골격이상이나 뚜렷한 안면비 대칭을 보이지 않는 성인 25명을 대상으로 natural head position상태를 기준위치$(0^{\circ})$로 정하고 이 위치에 대해 양쪽 ear rod를 연결한 수평축을 중심으로 두부를 상, 하방으로 $5^{\circ},\;10^{\circ}$씩 회전시킨 상태에서 정모두부방사선사진을 각각 촬영하여 투사도를 작성한 다음 7개의 고경항목, 5개의 폭경항목, 6개의 각도항목을 계측하였다. 각 회전각도에서의 계측치를 비교 분석하여 다음과 같은 결과를 얻었다. 1. 고경계측항목의 투사오차가 폭경이나 각도계측항목에 비해 전반적으로 큰 양상을 나타냈다. 2. 고경계측항목 중 회전축으로부터 먼 계측점간의 거리를 나타내는 항목일수록 투사오차가 컸다. 3. 폭경 계측항목 중 비강폭경, 상악폭경, 상악 제1대구치간 폭경은 각 회전각도 간에 통계적 유의차가 없었으나 하악폭 경과 하악 제1대구치간 폭경은 통지적으로 유의차가 있었다. 4. 각도계측항목 중 menton의 편위정도를 나타내는 각도는 각 회전각도 간에 통계적 유의차가 없었으나 crista galli와 maxillare를 연결한 선이나 crista galli와 antegonion을 연결한 선과 수평기준선이 이루는 각도는 통계적으로 유의차가 있었다. 이상의 결과는 수직적 두부회전에 의해 정모두부방사선사진상에 투사오차가 발생하므로 유용한 정모두부방사선사진을 얻기 위해서는 촬영시마다 동일한 두부위치를 유지하기 위한 노력이 필요함을 시사하였다.

사각 나선형 박막 인덕터의 GHz 대역 특성 (GHz Bandwidth Characteristics of Rectangular Spiral type Thin Film Inductors)

  • 김지원;조순철
    • 한국자기학회지
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    • 제14권1호
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    • pp.52-57
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    • 2004
  • 본 연구에서는 ㎓ 대역의 박막 인덕터 특성을 수치해석 하였다. 인덕터의 기본 구조는 390$\mu\textrm{m}$${\times}$390$\mu\textrm{m}$, 5.5턴(turn), 선폭 10$\mu\textrm{m}$와 선간격 10$\mu\textrm{m}$의 사각 나선형이다. 주파수 특성은 10 ㎓까지 시뮬레이션 하였다. 기판은 Si, Sapphire, 유리와 GaAs를 모델로 하였고 도체는 Cu이다. 도체의 두께는 2$\mu\textrm{m}$로 고정하였다. 입력과 출력단자의 위치가 서로 반대가 되도록 하기 위하여 턴수는 n.5로 하였다. 기본 구조 인덕터는 초기 인덕턴스 13.0 nH,최대 인덕턴스 60.0 nH 그리고 공진주파수는 4.25 ㎓이었다. 기판의 유전상수가 증가하면 초기 인덕스는 거의 변화가 없으나 공진 주파수는 감소하였다. 인덕터의 턴수를 1.5에서 9.5로 변화시키면, 초기 인덕턴스는 2.9 nH며 16.9 nH로 포화되었으며 Q factor는 소폭 증가하였다. 인덕터의 선폭과 선간격을 증가시키면 초기와 최대 인덕턴스는 감소하였다. 공진 주파수는 증가하였으며, Q factor는 선폭과 선간격을 증가시키면 각각 증가와 감소를 나타내었다.