• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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• pp.1454-1456
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• 2007

The electrical and the optical properties of blue organic light-emitting devices (OLEDs) with a multiple emitting layer (EML) acting as electron and hole trapping layers were investigated. While the luminance efficiency of the OLEDs with a multiple EML was very stable, regardless of variations in the applied voltage.

• 대한화학회지
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• 제28권4호
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• pp.251-258
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• 1984

색소를 흡착시킨 산화아연의 표면상태를 광기전력측정법을 이용하여 색소증감기구 및 바인더(binder)효과에 대한 연구를 수행하였다. 산화아연의 에너지트랩준위는 1.12eV이며, 색소흡착에 의해 0.99eV로 에너지준위가 낮아짐을 알았다. 바인더효과는 표면광기전력의 효율을 커지게 하나 에너지트랩준위에는 변화를 주지 않는다. 또한 색소증감기구로 흡착력이 강한 산형색소는 전자 이동(electron transfer)이며, 산화아연 고유흡수광에 減感작용이 있는 나트륨염형색소는 에너지이동(energy transfer)로써 추측된다. 근적외부인 1,100~1,350nm에 걸쳐 광기전력감도가 나타나므로 적외선에 의한 전자사진용 畵像材料로서 가능성을 제시하였다.

• 한국결정성장학회지
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• 제13권6호
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• pp.279-283
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• 2003

본 연구에서는 ZnTe에 S 원자를 소량 첨가한 ZnTe : S 단결정 박막이 열적적층법에 의하여 GaAs(100) 기판 위에 성장되었다. S 원자에 의한 효과를 알기 위하여 ZnTe : S 단결정 박막의 광발광 특성을 조사하였다. 저온 광발광 스펙트럼에서 등전자적 중심(isoelectronic center)으로 보이는 2.339 eV의 피크가 관측되었고, ZnTe 단결정 박막의 광발광 스펙트럼에서 근원을 알 수 없었던 발광 스펙트럼은 관측되지 않았다. 온도에 따른 가벼운 양공 자유 엑시톤의 세기 변화는 외부자기포획(extrinsic self-trapping)으로 설명하였다. 그리고 상온에서 에너지 띠간격 흡수단 근처의 발광선이 관측되었다.

• 한국광학회지
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• 제17권1호
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• pp.1-6
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• 2006

우리는 6.7 kPa의 네온 버퍼가스가 포함된 루비듐 증기셀을 이용하여 $^{87}Rb$원자 $D_1$ 전이선에서 레이저의 세기, 증기 셀의 온도, 전이 선에 따른 비선형 광자기 신호(NMOE)의 특성을 조사하였다. 비선형 광자기 신호는 레이저의 세기와 증기셀의 온도가 증가함에 따라 F=2$\to$F'=2 전이선에서는 광자기 신호의 크기와 선폭이 증가하였지만, F=2$\to$F'=1 전이선에서는 확대 없이 신호의 크기만 증가됨으로써 자장 측정 민감도가 향상되는 것을 확인하였으며, 이러한 효과를 자기부준위 사이에서의 원자결맞음 구도의 차이로 설명하였다. 관측된 최적 조건에서 자기장변화에 대한 민감도는 $70pT/\sqrt{Hz}$ 이하로 계산되었다.

• 한국윤활학회:학술대회논문집
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• 한국윤활학회 1999년도 제29회 춘계학술대회
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• pp.47-52
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• 1999

In recent years, the micro-tribological behavior of silicon has been the topic of much interest. peformance of thin film under light load is important for potential applications in MEMS. In this work under light load and various humidity, the tribological behavior of undulated surface with various width and shape was Investigated. The results show that undulated surface of linear type had good tribological properties abrasive wear occur depending on the sliding condition. Also the effect of humidity on friction and wear was not important if exist undulation. Finally, undulations on HDD were found to be effective in trapping wear particles.

• 한국윤활학회:학술대회논문집
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• 한국윤활학회 1998년도 제27회 춘계학술대회
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• pp.91-96
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• 1998

In recent years, the tribological behavior of coated ceramic material has been the topic of much interest. Particularly, the understanding of the tribological performance of thin film under light load is important for potential applications in MEMS. In this work under light load and low speed, the tribological behavior of coated silicon was investigated. The results show that both adhesive and abrasive wear occur depending on the sliding condition. Also the effect of humidity on friction was influenced by the apparent ares of contact between the two surfaces. Finally, undulations on the silicon wafer were found to be effective in trapping wear particles.

• Current Optics and Photonics
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• 제2권1호
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• pp.85-89
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• 2018

This paper presents a new, efficient hybrid photonic-plasmonic structure. The proposed structure efficiently and with very high accuracy combines the resonant mode of a low-mode-volume photonic-crystal nanocavity with a bowtie nanoantenna's plasmonic resonance. The resulting enormous enhancement of light intensity of about $1.1{\times}10^7$ in the gap region of the bowtie nanoantenna, due to the effective optical-resonance combination, is realized by subtle optimization of the nanocavity's optical characteristics. This coupled structure holds great promise for many applications relying on strong confinement and enhancement of optical field in nanoscale volumes, including antennas (communication and information), optical trapping and manipulation, sensors, data storage, nonlinear optics, and lasers.

• Journal of Information Display
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• 제6권1호
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• pp.33-36
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• 2005

To obtain various colors from the blue emitting poly(fluorene)s, two different approaches are introduced. One is copolymerization with low band gap comonomers and the other is molecular doping with various dyes. As fast and efficient exciton migration and trapping and/or energy transfer between the chromorphoric segments or doped dyes in conjugated polymers can shift the emission to longer wavelengths, these phenomena can be utilized to obtain various colors from the intrinsically blue light emitting poly(fluorene)s.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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• pp.127-128
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• 2000

Organic light-emitting diodes(OLEDs) are constructed using multilayer organic thin films. The hole-transport layer is PVK and the emitting material is rubrene and $Alq_3$. The emitting layer is doped with rubrene partially. As the partially-doped layer migrate from the interface PVK/emitting layer, the emission peak of rubrene decrease and diminish. By comparing with the previous reports, we propose the zero-field hole injection barrier at ITO/PVK interface and hole-trapping effect of rubrene in host materials as predominant factor to determine the emission zone.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.454-454
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• 2014

Silicon microwire array is one of the promising platforms as a means for developing highly efficient solar cells thanks to the enhanced light trapping efficiency. Among the various fabrication methods of microstructures, deep reactive ion etching (DRIE) process has been extensively used in fabrication of high aspect ratio microwire arrays. In this presentation, we show precisely controlled Si microwire arrays by tuning the DRIE process conditions. A periodic microdisk arrays were patterned on 4-inch Si wafer (p-type, $1{\sim}10{\Omega}cm$) using photolithography. After developing the pattern, 150-nm-thick Al was deposited and lifted-off to leave Al microdisk arrays on the starting Si wafer. Periodic Al microdisk arrays (diameter of $2{\mu}m$ and periodic distance of $2{\mu}m$) were used as an etch mask. A DRIE process (Tegal 200) is used for anisotropic deep silicon etching at room temperature. During the process, $SF_6$ and $C_4F_8$ gases were used for the etching and surface passivation, respectively. The length and shape of microwire arrays were controlled by etching time and $SF_6/C_4F_8$ ratio. By adjusting $SF_6/C_4F_8$ gas ratio, the shape of Si microwire can be controlled, resulting in the formation of tapered or vertical microwires. After DRIE process, the residual polymer and etching damage on the surface of the microwires were removed using piranha solution ($H_2SO_4:H_2O_2=4:1$) followed by thermal oxidation ($900^{\circ}C$, 40 min). The oxide layer formed through the thermal oxidation was etched by diluted hydrofluoric acid (1 wt% HF). The surface morphology of a Si microwire arrays was characterized by field-emission scanning electron microscopy (FE-SEM, Hitachi S-4800). Optical reflection measurements were performed over 300~1100 nm wavelengths using a UV-Vis/NIR spectrophotometer (Cary 5000, Agilent) in which a 60 mm integrating sphere (Labsphere) is equipped to account for total light (diffuse and specular) reflected from the samples. The total reflection by the microwire arrays sample was reduced from 20 % to 10 % of the incident light over the visible region when the length of the microwire was increased from $10{\mu}m$ to $30{\mu}m$.