• 제목/요약/키워드: Light Flatness

검색결과 27건 처리시간 0.029초

방송조명에서 LED광원의 색 재현성과 평탄도 연구 (A Study on Color Reproduction and Flatness of the LED Light Source in Broadcasting Lighting)

  • 김영진;박구만
    • 방송공학회논문지
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    • 제21권4호
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    • pp.538-551
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    • 2016
  • 방송 제작현장에서는 영상 이미지 표현의 광원으로 Tungsten Halogen 광원이 주 광원으로 사용 되어 왔다. Tungsten Halogen 광원은 그동안 개발된 다른 광원보다 태양광원과 유사한 색 재현성으로 각광받아 왔지만 에너지 효율성의 문제점을 가지고 있었다. 최근 대체 광원으로 고효율의 에너지와 긴 수명의 LED광원이 방송 광원으로 주목받기 시작했다. LED광원은 독특한 발광원리 때문에 카메라를 통한 영상 이미지의 색 재현성과 광원에서 투사되는 빛의 질에 있어서 Tungsten Halogen광원과 다른 특성을 가지고 있다. 이런 특성은 LED광원이 방송 광원으로서 도입이 늦어지는 이유이다. 이에 본 연구에서는 LED 광원의 색 재현성과 빛의 질 특성인 평탄도를 측정하여 기준광원인 Tungsten Halogen과 비교하여 방송 광원으로써의 적합성에 대한 실험 데이터를 제시할 것이다. 또한 LED광원이 방송 광원으로서의 확산되기 위해서 필요한 점이 무엇인지 향후 과제와 기준을 제시하고자 한다.

마이크로 UV성형을 통한 초소형 광픽업용 마이크로 미러 어레이 제작 (Fabrication of Micro Mirror Array for Small Form Factor Optical Pick-up by Micro UV-Molding)

  • 최용;임지석;김석민;손진승;김해성;강신일
    • 소성∙가공
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    • 제14권5호
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    • pp.477-481
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    • 2005
  • Wafer scale micro mirror array with high surface quality for small form factor (SFF) optical pick-up was fabricated by micro UV-molding. To replicate micro mirror array for SFF optical pick-up, a high- precision mold was fabricated using micro-machining technology. Wafer scale micro mirror array was UV-molded using the mold and then the process was optimized experimentally. The surface flatness and roughness of UV-molded micro mirror array were measured by white light scanning interferomety system and analyzed the transcribing characteristics. Finally, the measured flatness of UV-molded micro mirror away for SFF optical pick-up, which was fabricated in the optimum processing condition, was less than 70nm.

마이크로 UV 성형을 통한 초소형 광픽업용 마이크로 미러 어레이 제작 (Fabrication of micro mirror array for small form factor optical pick-up by micro UV-molding)

  • 최용;임지석;김석민;손진승;김해성;강신일
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2005년도 춘계학술대회 논문집
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    • pp.47-50
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    • 2005
  • In this study, micro mirror array for small form factor optical pick-up was replicated by micro UV-molding. First, mold for micro mirror array was fabricated using micromachining. Also, to analyze the characteristics of the surface quality, flatness of replicated mirror surface were measured by white light scanning inteferometry system. The results show that the micro mirror array with a sufficient surface quality can be obtained by polymer replication process.

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Effects of Form Errors of a Micromirror Surface on the Optical System of the TMATM(Thin-film Micromirror ArrayTM) Projector

  • Jo, Yong-Shik;Kim, Byoung-Chang;Kim, Seung-Woo;Hwang, Kyu-Ho
    • International Journal of Precision Engineering and Manufacturing
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    • 제1권1호
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    • pp.98-105
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    • 2000
  • The projectors using liquid crystal display(LCD) have faults such as low optical efficiency, low brightness and even heat generation. To solve these problems reflective-type spatial light modulators based on MEMS (Microelectromechanical Systems) technology have emerged. Digital Micromirror DeviceTM(DMDTM), which was already developed by Texas Instruments Inc., and Thin-film Micromirror ArrayTM(TMATM), which has been recently developed by Daewoo Electronics Co., are the representative examples. The display using TMATM has particularly much higher optical efficiency than other projectors. But the micromirrors manufactured by semiconductor processes have inevitable distortion because of the limitations of the manufacturing processes, so that the distortions of their surfaces have great influence on the optical efficiency of the projector. This study investigated the effects of mirror flatness on the optical performance, including the optical efficiency, of the TMATM projector. That is to say, as a part of the efforts to enhance the performance of the TMATM projector, how much influence the form errors of a micromirror surface exert on the optical efficiency and the modulation of gray scale of the projector were analyzed through a pertinent modeling and simulations.

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Nd:YCOB 단결정 성장과 RGB 레이저 소자 제조 (Crystal Growth of Nd;YCOB and Fabrication of RGB Laser Device)

  • 김충렬;석상일;장원권;김도진;유영문
    • 한국결정학회지
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    • 제12권1호
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    • pp.5-9
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    • 2001
  • Nd/sub 0.05/Y/sub 0.95/Ca₄O(BO₃)₃(Nd:YCOB) single crystals were grown by the Czochralski method using a iridium crucible under N₂ atmosphere. Optimum growth parameters to get high quality of single crystals were 1.5∼2 mm/hr of growth rate and 10∼20 rpm of rotation rate. The grown crystals were transparent with light purple color and well-developed in cleavage planes. The crystal structure of Nd;YCOB were identified to monoclinic by XRD method. Crystal defects acting as light scattering centers, such as micro-pores, secondary phases, inclusions and cracks were not observed under the He-Ne laser illuminations. Three red, green, blue laser devices for the RGB laser oscillations were designed and then fabricated from the grown Nd:YCOB crystals according to the phase-matching angles of negative type-I which were φ=16.40°, 33.95° and θ=22.59° with the flatness of λ/6 at least, respectively.

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Photogrammetry 기법을 활용한 MSC 설치면의 정밀 측정

  • 우성현;김홍배;문상무;임종민
    • 항공우주기술
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    • 제3권1호
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    • pp.126-133
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    • 2004
  • 사진측량법(Photogrammetry)는 서로 다른 촬영각을 가지는 다수의 2차원 이미지로부터 대상물의 정밀한 3차원 형상을 얻어내는 기법이다. 본 연구에서는 사진측량법을 활용하여 다목적 실용위성 2호 비행모델 하부 탑재체 플랫폼(Low Payload Platform)의 고해상도 카메라 접합면에 대한 편평도(Flatness) 측정 작업을 수행하였으며, 정밀하게 교정된 2개의 스케일바(Scale Bar)를 사용하여 절대적인 길이 값을 3차원 모델에 부과함과 동시에 측정정확도를 계산하여 내었다. 또한 측정된 편평도 결과는 고해상도 카메라 납품 업체에서 제시한 편평도 요구조건과 비교되었다.

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UV임프린트 공정에서 임프린팅 가압력 및 가압시간에 따른 레진 잔막 두께형성에 대한 실험연구 (Study on the Formation of Residual Layer Thickness by Changing Magnitude and Period of UV Imprinting Pressure)

  • 신동혁;장시열
    • Tribology and Lubricants
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    • 제26권5호
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    • pp.297-302
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    • 2010
  • This study is focused on the resin layer formation of UV imprinting process by changing imprinting pressure and period. The mold shape is made for the process of window open over the pattern transfer area and the imprinting period is assigned as the time just before the UV light curing. The residual layer is measured by changing the imprinting period and pressure magnitude, and the measured data of residual layer provides useful information for the design of the process conditions of imprinting processes.

식각액에 따른 용융실리카의 레이저 습식 식각 특성 비교 연구 (A Comparative Study on the Influence of Etchant upon the Etching Rate and Quality in Laser Induced Wet Etching of Fused Silica)

  • 이종호;이종길;전병희
    • 소성∙가공
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    • 제13권3호
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    • pp.268-272
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    • 2004
  • Transparent materials such as fused silica are widely utilized in optical and optoelectronics field because of its outstanding properties, such as transparency in a wide wavelength range, strong damage resistance for laser irradiation, and high thermal and chemical stability. In this study, we made a few micro patterns on the surface of fused silica plate using laser induced wet etching. KrF excimer laser was used as a light source. There were no burrs and micro cracks on the etched surface of fused silica and the flatness of the etched surface was fairly good. We investigated the influence of etchant upon the etch rate and quality in laser induced wet etching. Pyrene-acetone solution and toluene were used as etchant. In the side of etch rate, toluene solution was better than pyrene-acetone solution. But we made in wider range of energy density using pyrene-acetone solution. But pyrene-acetone solution gave us wider window of energy density for successful micro patterning.

식각액에 따른 용융실리카의 레이저 습식 식각가공 (Laser Induced Wet Etching of Fused Silica according to Etchant)

  • 이종호;이종길;전병희
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2004년도 춘계학술대회 논문집
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    • pp.245-249
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    • 2004
  • Transparent materials such as fused silica are important materials in optical and optoelectronics field because of its outstanding properties, such as transparency in a wide wavelength range, strong damage resistance for laser irradiation, and high thermal and chemical stability. However, these properties make it difficult to micromachine silica in micro-sized quantities. In this study, we fabricated a micro patterns on the surface of fused silica plate using laser induced wet etching. KrF excimer laser was used as a light source. There were no burrs and micro cracks on the etched surface of fused silica and the flatness of the etched surface was fairly good. We investigated the influence of etchant upon the etch rate and quality in laser induced wet etching. Pyrene-acetone, toluene, and pyrene-toluene solution were used as etchant. In the side of etch rate, toluene and pyrene-toluene solution were better than pyrene-acetone solution.

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Effect of Thermal Heat Treatment on the Characteristics of Vertical Type Organic Thin Film Transistor Using Alq3 as Active Layer and Its Application for OLET

  • Oh, Se-Young;Kim, Young-Do;Hwang, Sun-Kak
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.644-647
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    • 2007
  • We have fabricated vertical type organic thin film transistor using tris-8-hydroxyquinoline aluminum $(Alq_3)$. The effects of the growth control of $Alq_3$ thin layer on the grain structure and the flatness of film surface have been investigated. In addition, we have fabricated light emitting transistor and then investigated electroluminescent properties.

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