• Title/Summary/Keyword: Lens fabrication

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Development of Large-area Two-photon Stereolithography Process for the Fabrication of Large Three-dimensional Microstructures (대면적 3 차원 마이크로 형상제작을 위한 스테이지 스캐닝 시스템을 이용한 이광자 흡수 광조형 공정 개발)

  • Lim, Tae-Woo;Son, Yong;Yi, Shin-Wook;Kong, Hong-Jin;Park, Sang-Hu;Yang, Dong-Yol
    • Journal of the Korean Society for Precision Engineering
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    • v.25 no.1
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    • pp.122-129
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    • 2008
  • Two-photon stereolithography is recognized as a promising process for the fabrication of three-dimensional (3D) microstructures with 100 nm resolution. Generally, beam-scanning system has been used in the conventional process of two-photon stereolithography, which is limited to the fabrication of micro-prototypes in small area of several tens micrometers. For the applications to 3D high-functional micro-devices, the fabrication area of the process is required to be enlarged. In this paper, large-area two-photon stereolithography (L-TPS) employing stage scanning system has been developed. Continuous scanning method is suggested to improve the fabrication speed and parameter study is conducted. An objective lens of high numerical aperture (N.A.) and high strength material were employed in this system. Through this work, 3D microstructures of $600*600*100\;{\mu}m$ were fabricated.

Polymerization of HEMA by Electron beam Irradiation and Fabrication of Soft contact lens (전자빔조사에 의한 HEMA의 중합과 소프트콘택트렌즈 제조)

  • Hwang, Kwang-Ha;Shin, Joong-Hyeok;Sung, Yu-Jin;Jeong, Keun-Seung;Jun, Jin
    • Journal of Korean Ophthalmic Optics Society
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    • v.17 no.2
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    • pp.135-141
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    • 2012
  • Purpose: Polymerization of HEMA(2-hydroxyethyl methacrylate) which can be used in the soft contact lens has been performed by using electron beam(EB) irradiation, and examined the best condition for the polymerization. Comparing the physical properties of the contact lenses to the one fabricated by thermal polymerization method, we check the use possibility of the EB irradiation to the fabrication of the soft contact lens. Methods: We investigated the degree of polymerization of the HEMA according to the composition of the monomer, the additive ratio and the dose of electron beam (0~120 kGy). The degree of polymerization was measured depending on the EB dose to research the best synthetic condition under the EB irradiation. The physical properties of the contact lens such as water content(%), oxygen transmissibility(Dk/t) and optical transmittance were analysed by using the FT-IR results with comparing the two different polymerization method (thermal and electron beam polymerization) with same additive ratio. Results: When the dose of electron beam was above 100 kGy, the degree of polymerization of HEMA was above 99% with regardless using cross-linker and initiator. The water content of the lens fabricated by EB method showed 10% higher than the one by the thermal method which was 40%. The lens fabricated by EB method also showed higher oxygen transmissibility(Dk/t) as same with the water content, and showed twice higher value in the lens fabricated by pure HEMA. According to the FT-IR results, hydrophilic property of the lens fabricated by EB method was increased due to increasing the intermolecular hydrogen bonding. It showed above 90% optical transmittance in the visible range of wavelength on the contact lenses fabricated by the both of two different polymerization method. Conclusions: The polymerization of HEMA without cross-linker and initiator was successful above 100 kGy of EB irradiation. Moreover the lens fabricated from the polymer synthesized by pure HEMA with 100 kGy of EB showed the highest water content and oxygen transmissibility. Therefore EB irradiation is another possible method to synthesize the polymer which can be used for the soft contact lens.

Research on Fabrication of Silicon Lens for Optical Communication by Photolithography Process (포토리소그래피를 통한 광통신용 실리콘 렌즈 제작 및 특성 연구)

  • Park, Junseong;Lee, Daejang;Rho, Hokyun;Kim, Sunggeun;Heo, Jaeyeong;Ryu, Sangwan;Kang, Sung-Ju;Ha, Jun-Seok
    • Journal of the Microelectronics and Packaging Society
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    • v.25 no.2
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    • pp.35-39
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    • 2018
  • In order to improve the coupling efficiency, a collimator lens that collects the light emitted from the laser diode at a wide angle to the core of the optical fiber is essential. Glass mold method using a mold is widely used as a collimator lens currently used. Although this method is inexpensive to produce, it is difficult to form precisely and quality problems such as spherical aberration. In this study, the precision of surface processing was improved by replacing the existing glass mold method with the semiconductor process, and the material of the lens was changed to silicon suitable for the semiconductor process. The semiconductor process consists of a photolithography process using PR and a dry etching process using plasma. The optical coupling efficiency was measured using an ultra-precision alignment system for the evaluation of the optical characteristics of the silicon lens. As a result, the optical coupling efficiency was 50% when the lens diameter was $220{\mu}m$, and the optical coupling property was 5% or less with respect to the maximum optical coupling efficiency in the lens diameter range of $210-240{\mu}m$.

A Study on the Effect of Optical Characteristics in 2 inch LCD-BLU by Aspect Ratio of Optical Pattern : I. Optical Analysis and Design (휴대폰용 2인치 LCD-BLU의 광특성에 미치는 광학패턴 세장비의 영향 연구 : I. 광학 해석 및 설계)

  • Hwang, C.J.;Ko, Y.B.;Kim, J.S.;Yoon, K.H.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2006.05a
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    • pp.239-242
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    • 2006
  • LCD-BLU (Liquid Crystal Display - Back Light Unit) is one of kernel parts of LCD unit and it consists of several optical sheets(such as prism, diffuser and protector sheets), LGP (Light Guiding Plate), light source (CCFL or LED) and mold frame. The LGP of LCD-BLU is usually manufactured by forming numerous dots with $50{\sim}200$ um in diameter on it by etching process. But the surface of the etched dots of LGP is very rough due to the characteristics of the etching process during the mold fabrication, so that its light loss is high along with the dispersion of light into the surface. Accordingly, there is a limit in raising the luminance of LCD-BLU. In order to overcome the limit of current etched dot patterned LGP, optical pattern design with 50um micro-lens was applied in the present study. The micro-lens pattern fabricated by modified LiGA with thermal reflow process was applied to the optical design of LGP. The attention was paid to the effects of different aspect ratio (i.e. $0.2{\sim}0.5$) of optical pattern conditions to the brightness distribution of BLU with micro-lens patterned LGP. Finally, high aspect ratio micro-lens patterned LGP showed superior results to the one made by low aspect ratio in average luminance.

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A clindrical post dipping method to fabricate PDMS microlens array (CPD 방식을 통한 PDMS lens의 제작)

  • Lee, Kyoung-Gun;Jang, Yun-Ho;Yoo, Byung-Wook;Jin, Joo-Young;Ha, Joon-Geun;Park, Jae-Hyoung;Kim, Yong-Kweon
    • Proceedings of the KIEE Conference
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    • 2009.07a
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    • pp.1495_1496
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    • 2009
  • A cylindrical post dipping (CPD) method to fabricate the PDMS microlens arrays is presented in this paper. The proposed CPD method is based on the surface tension effect. 2 mm gap and gapless lenses with 2 mm diameter are fabricated and characterized geometically. Both profiles of the fabricated microlens are well-fitted with ideal lens profile. The surface roughness average of the fabricated lens is measured to be 1.953 nm. The focal length of 2mm gap lenses and the gapless lenses is calculated to be 17.00 mm with 0.65 mm standard deviation and 29.88 mm with 2.58 mm standard deviation, respectively. The proposed CPD method can be applied to wafer level lens fabrication due to its simplicity and versatility.

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Design and Fabrication of Holographic Collimating Lens for Semiconductor Laser (반도체 레이저용 홀로그래픽 시준 렌즈 설계 제작)

  • 임용석;곽종훈;최옥식
    • Korean Journal of Optics and Photonics
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    • v.9 no.3
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    • pp.191-198
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    • 1998
  • A method is described to produce off-axis hologram lenses without astigmatism for semiconductor lasers. We fabricated a holographic collimating lens by using dichromated gelatin film with high diffraction efficiency and without astigmatism which makes a collimated off-axis beam of semiconductor laser. We have designed the holographic collimating lens by applying the classical ray-tracing method to holographic diffraction. The elimination of astigmatism is obtained by choosing appropriate angles of recording and reconstruction beams. The hologram is recorded by use of Ar^{+}$ laser (488nm wavelength) and reconstructed by semiconductor laser(670nm wavelength). The physical parameters of recording and reconstruction angles, wavelength, and astigmatism are analytically calculated and experimentally confirmed.

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Focal Reducer for CQUEAN

  • Lim, Ju-Hee;Chang, Seung-Hyuk;Kim, Young-Ju;Kim, Jin-Young;Park, Won-Kee;Im, Myung-Shin;Pak, Soo-Jong
    • The Bulletin of The Korean Astronomical Society
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    • v.35 no.2
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    • pp.62.2-62.2
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    • 2010
  • The CQUEAN (Camera for QUasars in EArly uNiverse) is an optical CCD camera optimized for the observation of high redshift QSOs to understand the nature of early universe. The focal reducer, which is composed of four spherical lens, is allowed to secure a wider field of view for CQUEAN, by reducing the focal length of the system by one third. We designed the lens configuration, the lens barrel, and the adapters to assemble to attach focal reducer to the CCD camera system. We performed tolerance analysis using ZEMAX. The manufacturing of the focal reducer system and its lab test of optical performance were already finished. It turned out that the performance can meet the original requirement, with the aberration and alignment error taken into account. We successfully attached the focal reducer and CQUEAN to the cassegrain focus of 2.1m telescope at McDonald Observatory, USA, and several tests of CQUEAN system were carried out. In this presentation, I will show the process of focal reducer fabrication and the result of performance test.

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Study on nano-level mirror surface finishing on mold core to glass lens molding (유리렌즈 성형 금형의 나노 경면가공)

  • Kwak, Tae-Soo;Kim, Cyung-Nyun;Lee, Yong-Chul
    • Journal of the Korean Society for Precision Engineering
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    • v.23 no.1 s.178
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    • pp.97-104
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    • 2006
  • ELID(Electrolytic In-process Dressing) grinding is an excellent technique for mirror grinding of various advanced metallic or nonmetallic materials. A polishing process is also required for elimination of scratches present on ELID grinded surfaces. MAP(Magnetic Assisted Polishing) has been used as polishing method due to its high polishing efficiency and to its resulting in a superior surface quality. This study is describing an effective fabrication method combining ELID and MAP of nano-precision mirror grinding for glass-lens molding mould. It also presents some techniques for achieving the nanometer roughness of the hard metals, such as WC-Co, which are extensively used in precision tooling material.

Establishment of Column Unit for Electron Beam Machining System (전자빔 가공시스템용 경통의 구축)

  • 강재훈;이찬홍;최종호
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.10a
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    • pp.1017-1020
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    • 2004
  • It is not efficient and scarcely out of the question to use commercial expensive electron beam lithography system widely used for semiconductor fabrication process for the manufacturing application field of various devices in the small business scope. Then scanning electron microscope based electron beam machining system is maybe regarded as a powerful model can be used for it simply. To get a complete suite of thus proper system, column unit build up with several electo-magnetic lens is necessarily required more than anything else to modify scanning electron microscope. In this study, various components included several electro-magnetic lens and main body which are essentially constructed for column unit are designed and manufactured. And this established column unit will be used for next connected study in the development step of scanning electron microscope based electron beam machining system.

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A study of multiple-exposure nanosphere lithography for photonic quasi-crystals fabrication (광자 준결정 제작을 위한 다중 노광 나노구 리소그라피 연구)

  • Yeo, Jong-Bin;Lee, Hyun-Yong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.62-62
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    • 2010
  • Photonic quasi-crystals(PQCs) have been fabricated by a multiple-exposure nanosphere lithography (MENSL) method using the self-assembled nanospheres as lens-mask patterns. The multiple-exposing source is collimated laser beam and rotation, tilting system. The arrays of the PQCs exhibited variable lattice structures and shape the control of ratating angle ($\theta$), tilting angle ($\gamma$) and the exposure conditions. The used nanosphere size is upto the $1\;{\mu}m$. Images of prepared 2D PQCs were observed by SEM. We believe that the MENSL method is a suitable useful tool to realize the PQCs arrays of large area.

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