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Development of Large-area Two-photon Stereolithography Process for the Fabrication of Large Three-dimensional Microstructures  

Lim, Tae-Woo (한국과학기술원 기계공학과)
Son, Yong (한국과학기술원 기계공학과)
Yi, Shin-Wook (한국과학기술원 물리학과)
Kong, Hong-Jin (한국과학기술원 물리학과)
Park, Sang-Hu (부산대학교 기계공학부)
Yang, Dong-Yol (한국과학기술원 기계공학과)
Publication Information
Journal of the Korean Society for Precision Engineering / v.25, no.1, 2008 , pp. 122-129 More about this Journal
Abstract
Two-photon stereolithography is recognized as a promising process for the fabrication of three-dimensional (3D) microstructures with 100 nm resolution. Generally, beam-scanning system has been used in the conventional process of two-photon stereolithography, which is limited to the fabrication of micro-prototypes in small area of several tens micrometers. For the applications to 3D high-functional micro-devices, the fabrication area of the process is required to be enlarged. In this paper, large-area two-photon stereolithography (L-TPS) employing stage scanning system has been developed. Continuous scanning method is suggested to improve the fabrication speed and parameter study is conducted. An objective lens of high numerical aperture (N.A.) and high strength material were employed in this system. Through this work, 3D microstructures of $600*600*100\;{\mu}m$ were fabricated.
Keywords
Large-area two-photon stereolithography; 3D microstructures; Stage scanning system;
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Times Cited By KSCI : 3  (Citation Analysis)
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