• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.529-530
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• 2006

$Bi_2Sr_2CuO_x$ thin films have been fabricated by atomic layer-by-layer deposition using the ion beam sputtering method. During the deposition, 10 and 90 wt%-ozone/oxygen mixture gas of typical pressure of $1{\sim}9{\times}10^{-5}\;Torr$ are supplied with ultraviolet light irradiation for oxidation. XRD and RHEED investigations reveal out that a buffer layer with some different compositions is formed at the early deposition stage of less than 10 units cell and then Bi-2201 oriented along the c-axis is grown.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2014.11a
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• pp.12-12
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• 2014

Atomic layer etching system를 이용하여 $MoS_2$를 layer by layer control를 하였다. 이 방법이 전통적인 에칭에 비해서 low damage 층간 식각이 가능하였다.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.22 no.1
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• pp.142-147
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• 1998

Rotary bending fatigue tests were carried out on the nitrided titanium in order to investigate the effect of nitriding layer on fatigue limit. Main results obtained are as follows. (1) The fatigue limit of nitrided pure titanium is remarkably reduced because of enlargement of grain size at high heat treating temperature and high stress field created from the elastic interaction in the compound layer. (2) Further test using specimen which was removed nitrified layer gradually, were also conducted and it was found that by removing the compound layer the fatigue limit recovered as the level of basic material and rather increased by coming of a diffusion layer. Therefore it is concluded that the surface compound layer generated by nitriding treatment reduced the fatigue limit but diffusion layer increased it.

• Progress in Superconductivity
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• v.1 no.1
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• pp.51-55
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• 1999

A Ni/Ag/Stainless steel 310S(SS310S) multi-layer sheet has been fabricated by a combination of vacuum brazing, cold rolling and texture annealing processes. After heat-treating the thin Ni/Ag/SS310S multi-layer sheet at $900^{\circ}C$ for 2h, development of (100)<001>cube texture on Ni surface was revealed by (111) pole figure. Quantitative chemical analysis was made by EPMA for the cross-section of the Ni/Ag/SS310S multi-layer sheet. EPMA results showed that Ag diffusion into the Ni layer, which may suppress the cube texture development, was negligible. A small amount of Cr atoms were detected in the Ni layer. It showed that Ag can be used as a chemical barrier of alloying element atoms in Ni layer for the Ni/Ag/SS310S multi-layer sheet and a strong cube texture was developed for the Ni layer in the Ni/Ag/SS310S multi-layer sheet.

• Journal of Electrochemical Science and Technology
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• v.12 no.2
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• pp.225-229
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• 2021

Commercially available continuous glucose sensors require the operation stability for more than two weeks. Typically, the sensor comprises a sensing layer and an over-coating layer for the stable operation inside the body. In the sensing layer, enzymes and mediators are cross-linked together for the effective sensing of the glucose. The over-coating layer limits the flux of glucose and works as a biocompatible layer to the body fluids. Here, we report the simple preparation of the flux-limiting layer by the condensation of polyethyleneimine (PEI), tri-epoxide linker, and trimethylolpropane triglycidyl ether (PTGE). The sensor is constructed by a layer-by-layer drop-coating of the sensing layer containing glucose dehydrogenase and the PEI-derived blocking layer. It is stable for more than 14 days, which is enough for the sensor in the continuous monitor glucose monitoring (CGM) system.

• Journal of the Microelectronics and Packaging Society
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• v.18 no.1
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• pp.23-27
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• 2011

Fabrication of porous silicon(PS) double layer by electrochemical etching is the first step in process of ultrathin solar cell using PS layer transfer process. The porosity of the porous silicon layer can be controlled by regulating the formation parameters such as current density and HF concentration. PS layer is fabricated by electrochemical etching in a chemical mixture of HF and ethanol. For electrochemical etching, highly boron doped (100) oriented monocrystalline Si substrates was used. Ths resistivity of silicon is $0.01-0.02\;{\Omega}{\cdot}cm$. The solution composition for electrochemical etching was HF (40%) : $C_2H_5OH$(99 %) : $H_2O$ = 1 : 1 : 2 (by volume). In order to fabricate porous silicon double layer, current density was switched. By switching current density from low to high level, a high-porosity layer was fabricated beneath a low-porosity layer. Etching time affects only the depth of porous silicon layer.

• Journal of information and communication convergence engineering
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• v.4 no.4
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• pp.158-161
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• 2006

[ $Bi_2Sr_2Ca_nCu_{n+1}O_y(n{\geq}0)$ ] thin film is fabricatedvia two different processes using an ion beam sputtering method i.e. co-deposition and layer-by-layer deposition. A single phase of Bi2212 can be fabricated via the co-deposition process. While it cannot be obtained by the layer-by-layer process. Ultra-low growth rate in our ion beam sputtering system brings out the difference in Bi element adsorption between the two processes and results in only 30% adsorption against total incident Bi amount by layer-by-layer deposition, in contrast to enough Bi adsorption by co-deposition.

• Corrosion Science and Technology
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• v.19 no.2
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• pp.51-56
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• 2020

The objective of this study was to improve properties of plasma sprayed HAp layer to titanium substrate by introducing an intermediate layer with two different methods. Before applying Zn doped HAp coating on titanium substrate, an intermediate layer was introduced by titanium plasma spray or titanium anodization. Heat treatments were conducted for some samples after titanium intermediate layer was formed. Zn doped HAp top layer was applied by plasma spraying. Three-point bending test and pull-off adhesion test were performed to determine the adhesion of Zn doped HAp coatings to substrates. Long-term credibility of Zn doped HAp plasma sprayed coatings on titanium was assessed by electrochemical impedance measurements in Hanks' solution. It was found that both titanium plasma sprayed and titanium anodized intermediate layer had excellent credibility. Strong adhesion to the titanium substrate was confirmed after 12 weeks of immersion for coating samples with titanium plasma sprayed intermediate layer. Samples with titanium anodized intermediate layer showed good bending strength. However, they showed relatively poor resistance against pulling off. The thickness of titanium anodized intermediate layer can be controlled much more precisely than that of plasma sprayed one, which is important for practical application.

• Journal of the Korean Electrochemical Society
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• v.17 no.3
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• pp.139-148
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• 2014

Electrochemical energy-storage devices such as batteries and supercapacitors are important components in emerging portable electronic device, electric vehicle, and clean energy storage and supply technologies. This review describes recent progress in the development of nanostructured electrodes, the main component of the electrochemical energy-storage device, prepared by layer-by-layer (LbL) electrostatic assembly. Major advantages associated with, and challenges to, the fabrication of LbL electrodes, as well as the future outlook for expanding the application of LbL techniques, are discussed.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2002.05a
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• pp.627-630
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• 2002

Bi$_2$Sr$_2$CuOx(Bi-2201) thin films were fabricated by atomic layer-by-layer deposition using an ion bean sputtering method. 10 wt% and 90 wt% ozone mired with oxygen were used with ultraviolet light irradiation to assist oxidation. XRD and RHEED investigations revealed that a buffer layer is formed at the early stage of deposition (less than 10 unit cell), and then c-axis oriented Bi-2201 grows on top of it.