• Title/Summary/Keyword: Layer Growth

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Epitaxy of Self-assembled InAs Quantum Dots on Si Substrates by Atmospheric Pressure Metalorganic Chemical Vapor Deposition (대기압 MOCVD 시스템을 이용하여 Si 기판 위에 자발적으로 형성된 InAs 양자점에 대한 연구)

  • Yoo, Choong-Hyun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.6
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    • pp.527-531
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    • 2005
  • Fully coherent self-assembled InAs quantum dots(QDs) grown on Si (100) substrates by atmospheric pressure metalorganic chemical vapor deposition(APMOCVD) were grown and the effect of growth conditions such as growth rate and growth time on quantum dots' morphology such as densities and sizes was investigated. InAs QDs of 30 - 80 nm in diameters with densities in the range of (0.6 - 1.7) x $10^{10}\;cm^{-2}$ were achieved on Si substrates and InAs layer was changed from 2 dimensional growth to 3 dimensional one at a nominal thickness less than 0.48 ML. This is attributed to the higher ambient pressure of APMOCVD suppressing of In segregation from the 2 dimensional InAs layer. This In segregation looked to disturb the dot formation especially when the growth rate was low so that the dots became less dense and bigger as the growth rate was lower.

Formation of $Al_2O_3$-Composites by the Melt Oxidation of an AlZnMg-alloy (AlZnMg-합금의 용융산화에 의한 $Al_2O_3$-복합재료의 형성)

  • 김일수;김상호;강정윤
    • Journal of the Korean Ceramic Society
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    • v.33 no.9
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    • pp.985-994
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    • 1996
  • The initiation and growth of $\alpha$-Al2O3/metal composites by the directed oxidation of molten commercial AlZnMg-alloy at 1223-1423K were investigated. Spontaneous bulk growth did not occur on the alloy alone. but the uniform initiation and growth of the composite were obtained by putting a thin layer of SiO2 particles on the surface of the alloy. Without SiO2 the external surface of the oxide layer was convered by MgO and MgAl2O4. But with the SiO2 reaction initiate the porous ZnO layers were found on the growth surface. The higher process temperature yielded a lower metal content. The oxidation product of $\alpha$-Al2O3 was found to be oriented with c-axis parallel to th growth direction. The growth rates increased with temperature and the apparent activation energy was 111.8 kJ/mol.

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Comparative Analysis of Histological Changes in Ussurian Bullhead, Leiocassis ussuriensis, and Korean Bullhead, Pseudobagrus fulvidraco, in the Early Period of Growth

  • In Bon, Goo;Hyun Woo, Gil;In-Seok, Park
    • Development and Reproduction
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    • v.17 no.4
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    • pp.427-434
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    • 2013
  • The histological changes in the Ussurian bullhead, Leiocassis ussuriensis, and the Korean bullhead, Pseudobagrus fulvidraco, were observed during the early period of growth. The retinas size of both species increased in the 9 days post-hatching (DPH) (p<0.05). In the just-hatched Ussurian bullhead, the retina already consisted of six layers: the epithelial layer, ganglion cell layer, inner nuclear layer, inner plexiform layer, outer limiting membrane layer, and rod and cone layer. The Korean bullhead had the same components. At 50 DPH, the thickness of the retina was $538.0{\pm}7.19{\mu}m$ in the Ussurian bullhead and $558.9{\pm}9.44{\mu}m$ in the Korean bullhead. The relative thickness of each layer of the retina did not differ significantly in the two species. Although the growth of the Korean bullhead's retina was faster, the relative thickness of each layer in the retina did not change during early development. After hatching, some parts of the tissue gradually became denser. Immediately after hatching, the kidney and midgut epithelium of the Ussurian bullhead and Korean bullhead were already formed and grew gradually thereafter. From 0 DPH to 30 DPH, the nuclear height in the midgut epithelium did not differ significantly between the two species, but at 50 DPH, it was $11.4{\pm}2.45{\mu}m$ in the Korean bullhead and $9.9{\pm}2.13{\mu}m$ in the Ussurian bullhead. During the experimental period, the major axes, minor axes, surface areas, and volumes of the proximal tubule cells in the kidney did not differ significantly between the two species. Thus, the early histological development of the Ussurian bullhead is similar to that of the Korean bullhead.

Growth of Non-Polar a-plane ZnO Layer On R-plane (1-102) Sapphire Substrate by Hydrothermal Synthesis (저온 수열 합성법에 의해 (1-102) 사파이어 기판상에 성장된 무분극 ZnO Layer 에 관한 연구)

  • Jang, Jooil;Oh, Tae-Seong;Ha, Jun-Seok
    • Journal of the Microelectronics and Packaging Society
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    • v.21 no.4
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    • pp.45-49
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    • 2014
  • In this study, we grew non-polar ZnO nanostructure on (1-102) R-plane sapphire substrates. As for growth method of ZnO, we used hydrothermal synthesis which is known to have the advantages of low cost and easy process. For growth of non-polar, the deposited AZO seed buffer layer with of 80 nm on R-plane sapphire by radio frequency magnetron sputter was annealed by RTA(rapid thermal annealing) in the argon atmosphere. After that, we grew ZnO nanostructure on AZO seed layer by the added hexamethylenetramine (HMT) solution and sodium citrate at $90^{\circ}C$. With two types of additives into solution, we investigated the structures and shapes of ZnO nanorods. Also, we investigate the possibility of formation of 2D non-polar ZnO layer by changing the ratio of two additives. As a result, we could get the non-polar A-plane ZnO layer with well optimized additives' concentrations.

Reliability evaluation of Pb-free solder joint with immersion Ag-plated Cu substrate (Immersion Ag가 도금된 Cu기판을 가진 Pb-free solder 접합부의 신뢰성 평가)

  • Yun Jeong-Won;Jeong Seung-Bu
    • Proceedings of the KWS Conference
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    • 2006.05a
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    • pp.30-32
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    • 2006
  • The interfacial reaction and reliability of eutectic Sn-Pb and Pb-free eutectic Sn-Ag ball-grid-array (BGA) solders with an immersion Ag-plated Cu substrate were evaluated following isothermal aging at $150^{\circ}C$. During reflowing, the topmost Ag layer was dissolved completely into the molten solder, leaving the Cu layer exposed to the molten solder for both solder systems. A typical scallop-type Cu-Sn intermetallic compound (IMC) layer was formed at both of the solder/Cu interfaces during reflowing. The thickness of the Cu-Sn IMCs for both solders was found to increase linearly with the square root of isothermal aging time. The growth of the $Cu_3Sn$ layer for the Sn-37Pb solder was faster than that for the Sn-3.5Ag solder, In the case of the Sn-37Pb solder, the formation of the Pb-rich layer on the Cu-Sn IMC layer retarded the growth of the $Cu_6Sn_5$ IMC layer, and thereby increased the growth rate of the $Cu_3Sn$ IMC layer. In the ball shear test conducted on the Sn-37Pb/Ag-plated Cu joint after aging for 500h, fracturing occurred at the solder/$Cu_6Sn_5$ interface. The shear failure was significantly related to the interfacial adhesion strength between the Pb-rich and $Cu_6Sn_5$ IMC layers. On the other hand, all fracturing occurred in the bulk solder for the Sn-3.5Ag/Ag-plated Cu joint, which confirmed its desirable joint reliability.

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Differences in Soil Chemical Properties Under Multi-layer System, USGA System and Mono-layer System for a Sports Turf (스포츠용 잔디의 다단구조, USGA구조 및 단층구조 지반에서 토양 화학성 차이)

  • Kim, Kyoung-Nam
    • Journal of the Korean Society of Environmental Restoration Technology
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    • v.9 no.5
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    • pp.50-59
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    • 2006
  • This study was initiated to investigate soil chemical properties under different soil systems. Data such as soil acidity(pH), electrical conductivity(EC), organic matter content(OMC), and cation exchange capacity(CEC) were analyzed with samples from multi-layer, USGA, and mono-layer systems. N, P, K and micronutrients were also measured. Multi-layer system was built up to 60-cm depth with rootzone layer, intermediate layer and two drainage layers. USGA system 45 centimeters deep was constructed with rootzone layer, intermediate layer and drainage layer. Mono-layer system, however, was made only with a 30-cm rootzone layer. Differences were observed in soil pH, EC, OMC, CEC and micronutrients. Soil pH was acceptable for turfgrass growth a year after establishment, being 5.5 to 6.5 in the study. Differences were greatly observed for EC among soil systems. Values of EC for multi-layer, USGA, and mono-layer systems were 39.79, 31.26 and 103.54 uS/em, respectively. The increase rate was approximately 4 to 8 times greater with mono-layer system than those with other two systems. Therefore, it was necessary to avoid micronutrient deficiency such as Fe, Mn etc. through an effective management program in mono-layer system because of its faster potential feasibility of salt accumulation. The greatest OMC was associated with USGA system, being 0.97% which was 11% over that of the other systems. Slight differences were observed for CEC among them. Mono-layer system produced 1.45 me/100g, 10.3% and 8.9% lower in CEC than those of multi-layer and USGA system, respectively. Micronutrients such as Fe, Zn, and Mn etc. were below the level required for turf growth, regardless of soil systems. It was considered that one year after turf establishment was not enough to build up micronutrients in sand-based soil systems to the normal level for a turf growth. These results demonstrate that intensive management program including grow-in concept fertilization should be integrated into sand-based soil systems, even after a year in establishment. Regular nutrient monitoring by soil analyses is a strong necessity to decide the kinds and amount of fertilizer. Also, strategic management program must be selectively employed according to sports turf soil systems.

Molecular Beam Epitaxial Growth of GaAs on Silicon Substrate (실리콘 기판위에 분자선속법으로 생장한 GaAs 에피층)

  • 이동선;우덕하;김대욱;우종천
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.1 no.1
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    • pp.82-91
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    • 1991
  • Molecular beam epitaxial growth of GaAs on Si substrate and the results on its analysis are reported. Epitaxy was performed on two different types of the substrate under various grwth conditions, and was analyzed by scanning and transmission electron microscopes, X-ray diffractometer, photoluminescence and Hall measurements. GaAs epitaxial layer has better crystalline quality when it was grown on a tilt-cut substrate. The stress seems to be releaxed more easily when multi-quantum well was introduced in the buffer layer. The epilayer was doped unintentionally with Si during growth due to the diffusion of the substrate. Also observed is that the quantum efficiency of excitonic radiative recombination of the heteroepitaxy is not as good as that of the homoepitaxy in the same doping level.

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Growth of Oriented Thick Films of BaFe12O19 by Reactive Diffusion

  • Fisher, John G.;Vu, Hung;Farooq, Muhammad Umer
    • Journal of Magnetics
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    • v.19 no.4
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    • pp.333-339
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    • 2014
  • Single crystal growth of $BaFe_{12}O_{19}$ by the solid state crystal growth method was attempted. Seed crystals of ${\alpha}-Fe_2O_3$ were pressed into pellets of $BaFe_{12}O_{19}$ + 2 wt% $BaCO_3$ and heat-treated at temperatures between $1150^{\circ}C$ and $1250^{\circ}C$ for up to 100 hours. Instead of single crystal growth taking place on the seed crystal, BaO diffused into the seed crystal and reacted with it to form a polycrystalline reaction layer of $BaFe_{12}O_{19}$. The microstructure, chemical composition and structure of the reaction layer were studied using scanning electron microscopy-energy dispersive spectroscopy (SEM-EDS), x-ray Diffraction (XRD) and micro-Raman scattering and confirmed to be that of $BaFe_{12}O_{19}$. XRD showed that the reaction layer shows a strong degree of orientation in the (h00)/(hk0) planes in the sample sintered at $1200^{\circ}C$. $BaFe_{12}O_{19}$ layers with a degree of orientation in the (hk0) planes could also be grown by heat-treating an ${\alpha}-Fe_2O_3$ seed crystal buried in $BaCO_3$ powder.

Movpe Growth of InP/GaAs and GalnAs/GaAs from EDMln, TBP and TBAs (EDMln, TBP와 TBAs를 이용한 InP/GaAs와 GalnAs/GaAs의 MOVPE 성장)

  • 유충현
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.11 no.1
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    • pp.12-17
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    • 1998
  • The heteroepitaxial growth of InP and GaInAs on GaAs substrates has been studied by using a new combination of source materials: ethyldimethylindium (EDMIn) and trimethylgallium (TMGa) as group III sources, and tertiarybutylarsine (TBAs) and tertiarybutylphosphine (TBP) as group V sources. Device quality InP heteroepitaxial layers were obtained by using a two-step growth process under atmospheric pressure, involving a growth of an initial nucleation layer at low temperature followed by high temperature annealing and the deposition of epitaxial layer at a growth temperature. The continuity and thickness of nucleation layer were important parameters. The InP layers deposited at 500$^{\circ}$- 55$0^{\circ}C$ are all n-type, and the electron concentration decreases with decreasing TBP/EDMIn molar ratio. The excellent optical quality was revealed by the 4.4 K photoluminescence (PL) measurement with the full width at half maximum (FWHM) of 4.94 meV. Epitaxial Ga\ulcorner\ulcorner\ulcornerIn\ulcorner\ulcorner\ulcornerAs layers have been deposited on GaAs substrates at 500$^{\circ}$ - 55$0^{\circ}C$ by using InP buffer layers. The composition of GaInAs was determined by optical absorption measurements.

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Growth Behavior and Thermal Stability of CoSi2 Layer on Poly-Si Substrate Using Reactive Chemical Vapor Deposition (반응성 CVD를 이용한 다결정 실리콘 기판에서의 CoSi2 layer의 성장거동과 열적 안정성에 관한 연구)

  • Kim, Sun-Il;Lee, Heui-Seung;Park, Jong-Ho;Ahn, Byung-Tae
    • Korean Journal of Materials Research
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    • v.13 no.1
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    • pp.1-5
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    • 2003
  • Uniform polycrystalline $CoSi_2$layers have been grown in situ on a polycrystalline Si substrate at temperature near $625^{\circ}C$ by reactive chemical vapor deposition of cyclopentadienyl dicarbonyl cobalt, Co(η$^{5}$ -C$_{5}$ H$_{5}$ )(CO)$_2$. The growth behavior and thermal stability of $CoSi_2$layer grown on polycrystalline Si substrates were investigated. The plate-like CoSi$_2$was initially formed with either (111), (220) or (311) interface on polycrystalline Si substrate. As deposition time was increasing, a uniform epitaxial $CoSi_2$layer was grown from the discrete $CoSi_2$plate, where the orientation of the$ CoSi_2$layer is same as the orientation of polycrystalline Si grain. The interface between $CoSi_2$layer and polycrystalline Si substrate was always (111) coherent. The growth of the uniform $CoSi_2$layer had a parabolic relationship with the deposition time. Therefore we confirmed that the growth of $CoSi_2$layer was controlled by diffusion of cobalt. The thermal stability of $CoSi_2$layer on small grain-sized polycrystalline Si substrate has been investigated using sheet resistance measurement at temperature from $600^{\circ}C$ to $900^{\circ}C$. The $CoSi_2$layer was degraded at $900^{\circ}C$. Inserting a TiN interlayer between polycrystalline Si and $_CoSi2$layers improved the thermal stability of $CoSi_2$layer up to $900^{\circ}C$ due to the suppression of the Co diffusion.