• Title/Summary/Keyword: Layer Growth

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Density control of ZnO nanorod arrays using ultrathin seed layer by atomic layer deposition

  • Shin, Seokyoon;Park, Joohyun;Lee, Juhyun;Choi, Hyeongsu;Park, Hyunwoo;Bang, Minwook;Lim, Kyungpil;Kim, Hyunjun;Jeon, Hyeongtag
    • Journal of Ceramic Processing Research
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    • v.19 no.5
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    • pp.401-406
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    • 2018
  • We investigated the effect of ZnO seed layer thickness on the density of ZnO nanorod arrays. ZnO has been deposited using two distinct processes consisting of the seed layer deposition using ALD and subsequent hydrothermal ZnO growth. Due to the coexistence of the growth and dissociation during ZnO hydrothermal growth process on the seed layer, the thickness of seed layer plays a critical role in determining the nanorod growth and morphology. The optimized thickness resulted in the regular ZnO nanorod growth. Moreover, the introduction of ALD to form the seed layer facilitates the growth of the nanorods on ultrathin seed layer and enables the densification of nanorods with a narrow change in the seed layer thickness. This study demonstrates that ALD technique can produce densely packed, virtually defect-free, and highly uniform seed layers and two distinctive processes may form ZnO as the final product via the initial nucleation step consisting of the reaction between $Zn^{2+}$ ions from respective zinc precursors and $OH^-$ ions from $H_2O$.

Density control of ZnO nanorod arrays using ultrathin seed layer by atomic layer deposition

  • Seokyoon Shin;Joohyun Park;Juhyun Lee;Hyeongsu Choi;Hyunwoo Park;Minwook Bang;Kyungpil Lim;Hyunjun Kim;Hyeongtag Jeon
    • Journal of Ceramic Processing Research
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    • v.19 no.5
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    • pp.401-406
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    • 2018
  • We investigated the effect of ZnO seed layer thickness on the density of ZnO nanorod arrays. ZnO has been deposited using two distinct processes consisting of the seed layer deposition using ALD and subsequent hydrothermal ZnO growth. Due to the coexistence of the growth and dissociation during ZnO hydrothermal growth process on the seed layer, the thickness of seed layer plays a critical role in determining the nanorod growth and morphology. The optimized thickness resulted in the regular ZnO nanorod growth. Moreover, the introduction of ALD to form the seed layer facilitates the growth of the nanorods on ultrathin seed layer and enables the densification of nanorods with a narrow change in the seed layer thickness. This study demonstrates that ALD technique can produce densely packed, virtually defect-free, and highly uniform seed layers and two distinctive processes may form ZnO as the final product via the initial nucleation step consisting of the reaction between Zn2+ions from respective zinc precursors and OH- ions from H2O.

The Ecological Vegetation by the Neutralizing Treatment Techniques of the Acid Sulfate Soil (특이산성토의 중화처리기법에 따른 생태적 녹화)

  • Cho, Sung-Rok;Kim, Jae-Hwan
    • Journal of the Korean Society of Environmental Restoration Technology
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    • v.22 no.1
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    • pp.47-59
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    • 2019
  • This study was composed of four treatments [no treatment, phosphate + limestone layer treatment, phosphate + sodium bicarbonate + cement layer treatment, and phosphate + sodium bicarbonate + limestone layer treatment] for figuring out vegetation effects on the acid drainage slope. Treated acid neutralizing techniques were effective for neutralizing acidity and vegetative growth in order of [first: phosphate + sodium bicarbonate + limestone layer treatment, second: phosphate + sodium bicarbonate+cement layer treatment, third: phosphate + limestone layer treatment and fourth: no treatment] on the acid drainage slope. We found out that sodium bicarbonate treatment was additory effect on neutralizing acidity and increasing vegetaive growth besides phosphate and neutralizing layer treatments. In neutralizing layer treatments, Limestone layer was more effective for vegetation and acidity compared to cement layer treatment. Cement layer showed negative initial vegetative growth probably due to high soil hardness and toxicity in spite of acid neutralizing effect. Concerning plants growth characteristics, The surface coverage rates of herbaceous plants, namely as Lotus corniculatus var. japonicus and Coreopsis drummondii L were high in the phosphate + sodium bicarbonate + limestone layer treatment while Festuca arundinacea was high in the phosphate + sodium bicarbonate + cement layer treatment. We also figured out that soil acidity affected more on root than top vegetative growth.

Influence of Growth Temperature for Active Layer and Buffer Layer Thickness on ZnO Nanocrystalline Thin Films Synthesized Via PA-MBE

  • Park, Hyunggil;Kim, Younggyu;Ji, Iksoo;Kim, Soaram;Lee, Sang-Heon;Kim, Jong Su;Leem, Jae-Young
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.203.1-203.1
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    • 2013
  • Zinc oxide (ZnO) nanocrystalline thin films on various growth temperatures for active layer and different buffer layer thickness were grown by plasma-assisted molecular beam epitaxy (PA-MBE) on Si substrates. The ZnO active layer were grown with various growth temperature from 500 to $800^{\circ}C$ and the ZnO buffer layer were grown for different time from 5 to 40 minutes. To investigate the structural and optical properties of the ZnO thin films, scanning electron microscope (SEM), X-ray diffractometer (XRD), and photoluminescence (PL) spectroscopy were used, respectively. In the SEM images, the ZnO thin films have high densification of grains and good roughness and uniformity at $800^{\circ}C$ for active layer growth temperature and 20 minutes for buffer layer growth time, respectively. The PL spectra of ZnO buffer layers and active layers display sharp near band edge (NBE) emissions in UV range and broad deep level emissions (DLE) in visible range. The intensity of NBE peaks for the ZnO thin films significantly increase with increase in the active layer growth temperature. In addition, the NBE peak at 20 minutes for buffer layer growth time has the largest emission intensity and the intensity of DLE peaks decrease with increase in the growth time.

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Prediction of Frost Layer Growth on a Cold Plate (저온 평판에서의 서리층 성장 예측)

  • Jhee, Sung;Lee, Kwan-Soo;Yeo, Moon-Su
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.26 no.9
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    • pp.1325-1331
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    • 2002
  • This study presents a numerical model to predict the behavior of frost layer growth. The characteristics of the heat and mass transfer inside the frost layer are analyzed by coupling the air flow with the frost layer. The present model is validated by comparing with the several other analytical models. It has been known that most of the previous models cause considerable errors depending on the working conditions or correlations used in predicting the frost thickness growth, whereas the model in this work estimates the thickness of the frost layer more accurately within an error of 10% in comparison with the experimental data. Simulation results are presented for variations of heat and mass transfer during the frost formation and for the behavior of frost layer growth along the direction of air flow.

Low-temperature Epitaxial Growth of a Uniform Polycrystalline Si Film with Large Grains on SiO2 Substrate by Al-assisted Crystal Growth

  • Ahn, Kyung Min;Kang, Seung Mo;Moon, Seon Hong;Kwon, HyukSang;Ahn, Byung Tae
    • Current Photovoltaic Research
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    • v.1 no.2
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    • pp.103-108
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    • 2013
  • Epitaxial growth of a high-quality thin Si film is essential for the application to low-cost thin-film Si solar cells. A polycrystalline Si film was grown on a $SiO_2$ substrate at $450^{\circ}C$ by a Al-assisted crystal growth process. For the purpose, a thin Al layer was deposited on the $SiO_2$ substrate for Al-assisted crystal growth. However, the epitaxial growth of Si film resulted in a rough surface with humps. Then, we introduced a thin amorphous Si seed layer on the Al film to minimize the initial roughness of Si film. With the help of the Si seed layer, the surface of the epitaxial Si film was smooth and the crystallinity of the Si film was much improved. The grain size of the $1.5-{\mu}m$-thick Si film was as large as 1 mm. The Al content in the Si film was 3.7% and the hole concentration was estimated to be $3{\times}10^{17}/cm^3$, which was one order of magnitude higher than desirable value for Si base layer. The results suggest that Al-doped Si layer could be use as a seed layer for additional epitaxial growth of intrinsic or boron-doped Si layer because the Al-doped Si layer has large grains.

Structural Control of the Compound Layers formed during Nitrocarburising in NH3-Air-C3H8 Atmospheres (NH3-Air-C3H8 분위기에서 Nitrocarburisng시 형성된 Compound Layer의 조직제어)

  • Kim, Y.H.;Choi, K.W.
    • Journal of the Korean Society for Heat Treatment
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    • v.8 no.4
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    • pp.289-301
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    • 1995
  • The effect of Air/$C_3H_8$ gas addition on the compound layer growth of steels nitrocarburised in $NH_3+Air+C_3H_8$ mixed gas atmospheres was investigated. It is considered that amount of residual $NH_3$ was varied according to alternation of Air/$C_3H_8$ mixing ratio and volume content. The compound layer formed from nitrocarburising was composed of ${\varepsilon}-Fe_{2-3}$(C, N) and ${\gamma}^{\prime}-Fe_4$(C, N). According as Air/$C_3H_8$ mixing ratio increased, the superficial content of ${\gamma}^{\prime}-Fe_4$(C, N) within the compound layer was increased, at the same time the growth rate of compound layer and porous layer was increased. In the case of alloy steel at the fixed gas composition, the growth rate of compound layer and porous layer was worse than carbon steel and compound layer phase composition structure primarily consisted of E phase. As the carbon content of materials was increasing in the given gas atmospheres, the growth rate of compound layer and porous layer was increased and the superficial content of ${\varepsilon}-Fe_{2-3}$(C, N) within the compound layer was increased.

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A Study on the Effect of the $CO_2$ Gas on the Growth Mechanism of the Nitrocarburized Layer (연질화층의 성장기구에 미치는 $CO_2$가스의 영향에 관한 연구)

  • Lee, Gu-Hyeon
    • 연구논문집
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    • s.25
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    • pp.175-184
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    • 1995
  • Mechanical properties of the gas nitrocarburized product depend on the surface compound layer and the diffusion zone formed. The compound layer improves the wear resistance, and the corrosion resistance. Though phase composition, pore layer and growth rate of the compound layer varies according to the treatment time, temperature and the kind of the steel substrate, they are strongly influenced by the environmental gas composition. In the current study, the growth behavior of the compound layer and diffusion zone of the carbon steel and the alloy steel upon nitrocarburizing treatment at $570^{\circ}C$, and the phase composition and the variation in the growth rate of the compound layer according to the variation of the gas environment which was the medium of the nitriding and carburizing reaction were investigated.

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A Study on the Epitaxial Growth of Superconducting Thin Film (초전도 박막의 에피택셜 성장에 관한 연구)

  • Lee, Hee-Kab;Park, Yong-Pil;Kim, Gwi-Yeol
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.05c
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    • pp.208-211
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    • 2002
  • $Bi_2Sr_2CuO_x$(Bi-2201) thin films were fabricated by atomic layer-by-layer deposition using an ion beam sputtering method. 10 wt% and 90 wt% ozone mixed with oxygen were used with ultraviolet light irradiation to assist oxidation. At early stages of the atomic layer by layer deposition, two dimensional epitaxial growth which covers the substrate surface would be suppressed by the stress and strain caused by the lattice misfit, then three dimensional growth takes place. Since Cu element is the most difficult to oxidize, only Sr and Bi react with each other predominantly, and forms a buffer layer on the substrate in an amorphous-like structure, which is changed to $SrBi_2O_4$ by in-situ anneal.

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Growth of Interfacial Reaction Layer by the Isothermal Heat Treatment of Cast-Bonded Fe-C-(Si)/Nb/Fe-C-(Si) (Nb/Fe-C-(Si) 주조접합재에서 등온열처리시 계면반응층의 성장에 관한 연구)

  • Jung, B.H.;Kim, M.G.;Jeong, S.H.;Park, H.I.;Ahn, Y.S.;Lee, S.Y.
    • Journal of the Korean Society for Heat Treatment
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    • v.16 no.5
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    • pp.260-266
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    • 2003
  • In order to study the interfacial reaction between Nb thin sheet and Fe-C-(Si) alloy with different Chemical compositions, they were cast-bonded. The growth of carbide layer formed at the interface after isothermal heat treatment at 1173K, 1223K, 1273K and 1323K for various times was investigated. The carbide formed at the interface was NbC and the thickness of NbC layer was increased linearly in proportional to the heat treating time. Therefore, It was found that the growth of NbC layer was controlled by the interfacial reaction. The growth rate constant of NbC layer was slightly increased with increase of carbon content when the silicon content is similar in the cast irons. However, as silicon content increases with no great difference in carbon content, the growth of NbC layer was greatly retarded. The calculated activation energy for the growth of NbC layer was varied in the range of 447.4~549.3 kJ/moI with the compositions of cast irons.