• 한국초전도학회:학술대회논문집
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• 한국초전도학회 1999년도 High Temperature Superconductivity Vol.IX
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• pp.352-357
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• 1999

The Cu sheets were selected for the substrate of the superconductor films. Pure Cu sheets with the thickness of 50${\mu}$m were fabricated using hot and cold rolling. The Cu sheets were heat treated to induce the biaxial texturing. The z-axis and x-y plane texturing of Cu sheets heat treated at different conditions were analyzed using XRD and a best heat treatment condition for the texturing was selected. ZrO$_2$ film was dip coated on Cu sheets heat treated at the best condition to prevent possible reaction between Cu sheets and YBCO superconductors, to reduce possible cracking due to thermal expansion mismatch and to decrease the lattice mismatch for biaxial texturing. The texturing of the oxide buffer layers were also studied.

• 대한전자공학회논문지
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• 제26권11호
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• pp.1672-1678
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• 1989

Major problems preventing the device-quality GaAs/Si heterostructure are the lattice mismatch of about 4% and difference in thermal expansion coefficient by a factor of 2.64 between Si and GaAs. Ge is a good candidate for the buffer layer because its lattice parameter and thermal expansion coefficient are almost the same as those of GaAs. As a first step toward developing heterostructure such as GaAs/Ge/Si entirely by a home-built PAE (plasma-assisted epitaxy), Ge films have been deposited on p-type Si (100)substrate by the plasma assisted evaporation of solid Ge source. The characteristics of these Ge/Si heterostructure were determined by X-ray diffraction, SEM and Auge electron spectroscope. PAE system has been successfully applied to quality-good Ge layer on Si substrate at relatively low temperature. Furthermore, this system can remove the native oxide(SiO2) on Si substrate with in-situ cleaning procedure. Ge layer grown on Si substrate by PAE at substrate temperature of 450\ulcorner in hydrogen partial pressure of 10mTorr was expected with a good buffer layer for GaAs/Ge/Si heterostructure.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1999년도 추계학술대회 논문집 학회본부 C
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• pp.873-875
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• 1999

We have fabricated good quality superconducting $YBa_{2}Cu_{3}O_{7-\delta}$ thin films on Hastelloy(Ni-Cr-Mo alloys) metallic substrate with $CeO_2$ and $BaTiO_3$ buffer layers in-situ by pulsed laser deposition in a multi-target processing chamber. We have chosen $CeO_2$ as a buffer layer which has cubic structure of $5.41{\AA}$ lattice parameter and only 0.2% of lattice mismatch with YBCO. $CeO_2$ layer may be helpful for power transmission due to its conducting property. In order to enhance the crystallization of YBCO films on metallic substrates. we deposited $CeO_2$ and $BaTiO_3$ buffer layers at various temperatures. The YBCO superconducting tape fabricated with $BaTiO_3$ and $CeO_2$ buffer layers shows 85K of transition temperature and about $8.4{\times}10^4A/cm^2$ of critical current density at 77K.

• 한국자기학회지
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• 제17권6호
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• pp.246-252
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• 2007

본 논문에서는 출발원료 배합비 및 육성 파라미터가 LPE(Liquid Phase Epitaxy)법으로 육성된 자성 가넷 막의 특성에 미치는 영향을 조사하며, 광 CT의 페러데이 회전자용으로서 적합한 막의 육성 조건을 제시한다. 막을 평가하기 위하여 조사한 특성은 막후, 표면 모폴로지, X선 회절, 격자상수, 막과 기판(단결정 비자성 가넷 웨이퍼)사이의 격자상수의 부정합, 페러데이 회전각 등이었다. 또한, 육성된 자성 가넷 막을 이용하여 광 CT를 제작하고, 성능을 평가했다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1999년도 하계학술대회 논문집 D
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• pp.1590-1592
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• 1999

We have fabricated good quality superconducting $YBa_2Cu_3O_{7-{\delta}}$ thin films on Hastelloy(Ni-Cr-Mo alloys) with $CeO_2$ buffer layers by in-situ pulsed laser deposition in a multi-target processing chamber. Using one of electrical properties of YBCO superconducting which the resistance approaches to zero dramatically on transition temperature, we have researched to make power transmission line, we have deposited YBCO thin film on flexible metallic substrate. However, it is difficult to make films on flexible metallic substrates due to both interdiffusion problem between metallic substrate and superconducting layer and non-crystallization of YBCO on amorphous substrate. From early research, two ways-using textured metallic substrate and buffer layer-were proposed to overcome theses difficulties. We have chosen $CeO_2$ as a buffer layer which has cubic structure of $5.41{\AA}$ lattice parameter and only 0.2% of lattice mismatch with $3.82{\AA}$ of a-axis lattice parameter of YBCO on (110) direction of $CeO_2$. In order to enhance the crystallization of YBCO films on metallic substrates we deposited $CeO_2$ buffer layers at varying temperature $700^{\circ}C$ to $800^{\circ}C$ and $O_2$ pressure. By X-ray diffraction, we found that each domination of (200) and (111) orientations were strongly relied upon the deposition temperature in $CeO_2$ layer and the change of the domination of orientation affects the crystallization of YBCO upper layer.

• 한국자기학회지
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• 제2권3호
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• pp.251-256
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• 1992

고주파 마그네트론 스퍼터링에 의해 Co /Pd 인공초격자를 형성하였다. 형성시킨 Co /Pd 인공초격자의 조성변조를 소각 X-선회절 분석으로 확인하였으며, XRD 분석 결과 두 원소의 격자상수 차이로 인해 Co 격자 팽창이 일어남을 알 수 있었다. Co 층 두께가 8${\AA}$ 이하가 되면 Co /Pd 인공초격자는 수직자기이방성을 띠었으며, 특히 Co가 단원자층인 경우에는 보자력이 2350 Oe이었고, 자기이력곡선의 각형도 우수하였다. Co /Pd 인공초격자가 수직자기이방성을 가지는 원인은 Pd에 의해 Co 격자가 팽창되는 현상과 관계가 있으며, Pd 두께가 증가할수록 수직자기이방성이 커지는 것을 확인하였다. Co /Pd 인공초격자의 수직자기이방성 에너지와 Co 두께의 관계로부터 계면이방성 에너지와 부피이방성 에너지를 계산하였으며 이는 각각 0.29 ergs/$cm^2$와 -$6.9{\times}10^6$ ergs/$cm^3$이었다.

• 한국초전도학회:학술대회논문집
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• 한국초전도학회 1999년도 High Temperature Superconductivity Vol.IX
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• pp.392-396
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• 1999

Superconducting YBa$_2Cu_3O_{7-{\delta}}$(YBCO) thin films were grown on Hastelloy(Ni-Cr-Mo alloys) with CeO$_2$ buffer layer in-situ by pulsed laser deposition in a multi-target processing chamber. To apply superconducting property on power transmission line, we have deposited YBCO thin film on flexible metallic substrate. However, it is difficult to grow the YBCO films on flexible metallic substrates due to both interdiffusion problem between metallic substrate and superconducting overlayers and non-crystallization of YBCO on amorphous substrate. It is necessary to use a buffer layer to overcome the difficulties. We have chosen CeO$_2$ as a buffer layer which has cubic structure of 5.41 ${\AA}$ lattice parameter and only 0.2% of lattice mismatch with 3.82 ${\AA}$ of a-axis lattice parameter of YBCO on [110] direction of CeO$_2$ In order to enhance the crystallization of YBCO films on metallic substrates, we deposited CeO$_2$ buffer layers with varying temperature and 02 pressure. By XRD, it is observed that dominated film orientation is strongly depending on the deposition temperature of CeO$_2$ layer. The dominated orientation of CeO$_2$ buffer layer is changed from (200) to(111) by increasing the deposition temperature and this transition affects the crystallization of YBCO superconducting film on CeO$_2$ buffered Hastelloy.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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• pp.469-472
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• 1999

CeO$_2$ thin films have used in wide applications such as SOI, buffer layer, antirflection coating, and gate dielectric layer. CeO$_2$takes one of the cubic system of fluorite structure and shows similar lattice constant (a=0.541nm) to silicon (a=0.543nm). We investigated CeO$_2$films as buffer layer material for nonvolatile memory device application of a single transistor. Aiming at the single transistor FRAM device with a gate region configuration of PZT/CeO$_2$ /P-Si , this paper focused on CeO$_2$-Si interface properties. CeO$_2$ films were grown on P-type Si(100) substrates by 13.56MHz RF magnetron sputtering system using a 2 inch Ce metal target. To characterize the CeO$_2$ films, we employed an XRD, AFM, C-V, and I-V for structural, surface morphological, and electrical property investigations, respectively. This paper demonstrates the best lattice mismatch as low as 0.2 % and average surface roughness down to 6.8 $\AA$. MIS structure of CeO$_2$ shows that breakdown electric field of 1.2 MV/cm, dielectric constant around 13.6 at growth temperature of 200 $^{\circ}C$, and interface state densities as low as 1.84$\times$10$^{11}$ cm $^{-1}$ eV$^{-1}$ . We probes the material properties of CeO$_2$ films for a buffer layer of FRAM applications.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2010년도 춘계학술대회 초록집
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• pp.102.1-102.1
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• 2010

고효율 멀티정션박막태양전지의 바텀셀 적용을 목적으로, 반응성CVD(Reactive thermal CVD)기술을 이용, $Si_2H_6+GeF_4$를 원료가스로, 이들이 가진 산화환원반응을 이용하여 400도 이하의 저온에서 Ge 및 Si 기판에 Ge을 에피성장 시켰다. Ge 기판위의 호모에피막의 경우, $2.5{\AA}/sec$의 성장속도와 99%의 Ge조성을 보였고, RHEED 및 HR-XRD를 통한 결정성 평가 결과, 고품질의 Ge 에피막의 성장이 확인되었다. 동일한 성장조건을 Si기판에 헤테로에피성장 시켰을 경우, 4% 격자불일치에 의해 막품질이 저하되는 것을 확인하였다. 이를 개선하기 위하여 저온에서 제작한 버퍼층에 대한 논의를 하고자 한다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 추계학술대회 논문집
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• pp.142-142
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• 2009

Bismuth-substituted yttrium iron garnet(Bi-YIG; $Bi_xY_{3-x}Fe_5O_{12}$, x=0, 0.5, 1.0, 1.5, 2.0) thin films were fabricated on glass substrates using a metal organic decomposition (MOD) method. The dielectric property was measured by NSMM(Near-field scanning microwave microscopy) system that operating frequency is 4 Ghz. The obtained reflection coefficient $S_{11}$ of the Bi:YIG thin films with different bismuth concentration was increased as the bismuth concentration increased due to the lattice mismatch and vacancy of ions because of a lager ionic radius of bismuth ion than yttrium ion.