• Title/Summary/Keyword: Laser pulse energy

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Pulse Energy Utilization in Space (우주에서의 펄스 에너지 활용)

  • Choi, Soo-Jin;Han, Tae-Hee;Lee, Hyun-Hee;Lee, Kyung-Cheol;Yoh, Jai-Ick
    • Journal of the Korean Society of Propulsion Engineers
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    • v.13 no.1
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    • pp.58-71
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    • 2009
  • The blast wave released during the initiation of energetic materials gives rise to pulse energy generation, characterized by a sudden increase of potential energy. A highly efficient energy source, sought from pulse-type lasers, may be utilized in various space propulsion and power applications. This paper introduces a scheme of utilizing the laser energy in 1) attitude control of a satellite requiring of a low thrust, 2) innovative laser-induced drug delivery, 3) implosion-based micro piston development, 4) deflecting and zapping of space debris for laser kill purpose, and 5) finally lunar detection using laser induced breakdown spectroscopy.

Ultrashort Pulsed Laser Machining for Biomolecule Trapping

  • Choi, Hae-Woon;Farson, Dave F.;Lee, L.James;Lee, Ho
    • Journal of the Optical Society of Korea
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    • v.13 no.3
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    • pp.335-340
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    • 2009
  • Ultrashort pulse laser drilling of polycarbonate track-etched membrane (pTEM) material was used to fabricate a mouse embryo cell trapping device. Holes with a diameter of $2{\mu}m$ to $5{\mu}m$ were fabricated on a $10{\mu}m$ thick membrane using a femtosecond laser with a 150 fs pulse width and 775 nm wavelength and multiple-pulse irradiation. In cell trapping tests, the overall cell occupancy of the machined holes in the fabricated pTEM was found to be more than 80%. The results of a single pulse and multiple pulse irradiation were compared in terms of the surface quality. It was generally found that a single pulse with high energy was less desirable than irradiation with multiple pulses of lower energy.

Design of a Femtosecond Ti:sapphire Laser for Generation and Temporal Optimization of 0.5-PW Laser Pulses at a 0.1-Hz Repetition Rate

  • Sung, Jae-Hee;Yu, Tae-Jun;Lee, Seong-Ku;Jeong, Tae-Moon;Choi, Il-Woo;Ko, Do-Kyeong;Lee, Jong-Min
    • Journal of the Optical Society of Korea
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    • v.13 no.1
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    • pp.53-59
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    • 2009
  • A chirped-pulse amplification Ti:sapphire laser system has been designed using a 10-Hz 100-TW Ti:sapphire laser to generate 0.1-Hz 0.5-PW laser pulses and optimize their temporal qualities such as temporal contrast and pulse duration. A high-energy booster amplifier to be added is expected to produce an energy above 30 J through the parasitic lasing suppression and the efficient amplification. To improve the temporal contrast of the laser pulses, a high-contrast 1-kHz amplifier system is used as a front-end. A grating stretcher which makes the laser pulse have 1-ns duration is used to prevent optical damages due to high pulse energy during amplification. A grating compressor has been designed with group delay analysis to obtain the recompressed pulse duration close to the transform-limited pulse duration. The final laser pulses are expected to have energy above 20 J and duration below 40 fs.

Ablation of Cr Thin Film on Glass Using Ultrashort Pulse Laser (극초단펄스 레이저에 의한 크롬박막 미세가공)

  • 김재구;신보성;장원석;최지연;장정원
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.620-623
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    • 2003
  • The material processing by using ultrashort pulse laser, in recently, is actively applying into the micro machining and nano-machining technology since ultrashort pulse has so faster than the time which the electrons energy absorbing photon energy is transmitted to surrounding lattice-phonon that it has many advantages in point of machining. The micro machining of metallic thin film on the plain glass is widely used in the fields such as mask repairing for semiconductor, fabrication of photonic crystal, MEMS devices and data storage devices. Therefore, it is important to secure the machining technology of the sub-micron size. In this research, we set up the machining system by using ultrashort pulse laser and conduct on the Cr 200nm thin film ablation experiments of spot and line with the variables such as energy, pulse number, speed, and so on. And we observed the characteristics of surrounding heat-affected zone and by-products appeared in critical energy density and higher energy density through SEM, and also examined the machining features between in He gas atmosphere which make pulse change minimized by nonlinear effect and in the air. Finally, the pit size of 0.8${\mu}{\textrm}{m}$ diameter and the line width of 1${\mu}{\textrm}{m}$ could be obtained.

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The effect of erbium-doped: yttrium, aluminium and garnet laser irradiation on the surface microstructure and roughness of double acid-etched implants

  • Kim, Ji-Hyun;Herr, Yeek;Chung, Jong-Hyuk;Shin, Seung-Il;Kwon, Young-Hyuk
    • Journal of Periodontal and Implant Science
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    • v.41 no.5
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    • pp.234-241
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    • 2011
  • Purpose: One of the most frequent complications related to dental implants is peri-implantitis, and the characteristics of implant surfaces are closely related to the progression and resolution of inflammation. Therefore, a technical modality that can effectively detoxify the implant surface without modification to the surface is needed. The purpose of this study was to evaluate the effect of erbium-doped: yttrium, aluminium and garnet (Er:YAG) laser irradiation on the microstructural changes in double acid-etched implant surfaces according to the laser energy and the application duration. Methods: The implant surface was irradiated using an Er:YAG laser with different application energy levels (100 mJ/pulse, 140 mJ/pulse, and 180 mJ/pulse) and time periods (1 minute, 1.5 minutes, and 2 minutes). We then examined the change in surface roughness value and microstructure. Results: In a scanning electron microscopy evaluation, the double acid-etched implant surface was not altered by Er:YAG laser irradiation under the condition of 100 mJ/pulse at 10 Hz for any of the irradiation times. However, we investigated the reduced sharpness of the specific ridge microstructure that resulted under the 140 mJ/pulse and 180 mJ/pulse conditions. The reduction in sharpness became more severe as laser energy and application duration increased. In the roughness measurement, the double acid-etched implants showed a low roughness value on the valley area before the laser irradiation. Under all experimental conditions, Er:YAG laser irradiation led to a minor decrease in surface roughness, which was not statistically significant. Conclusions: The recommended application settings for Er:YAG laser irradiation on double acid-etched implant surface is less than a 100 mJ/pulse at 10 Hz, and for less than two minutes in order to detoxify the implant surface without causing surface modification.

The Real-Time Temporal and Spatial Diagnostics of Ultrashort High-Power Laser Pulses using an All-Reflective Single-Shot Autocorrelator

  • Kim, Ha-Na;Park, Seong Hee;Kim, Kyung Nam;Han, Byungheon;Shin, Jae Sung;Lee, Kitae;Cha, Yong-Ho;Jang, Kyu-Ha;Jeon, Min Yong;Miginsky, Sergei V.;Jeong, Young Uk;Vinokurov, Nikolay A.
    • Journal of the Optical Society of Korea
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    • v.18 no.4
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    • pp.382-387
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    • 2014
  • An all-reflective, simple noncollinear second harmonic (SH) autocorrelator is described for monitoring the shot-to-shot behavior of ultrashort high-power laser pulses. Two mirrors are used for the dispersion-free splitting of a pulse into two halves. One of the mirrors is able to adjust the delay time and angle between two halves of the laser pulse in a nonlinear crystal. We present the possibility of real-time measurement of the pulse duration, peak intensity (or energy), and the pointing jitters of a laser pulse, by analyzing the spatial profile of the SH autocorrelation signal measured by a CCD camera. The measurement of the shot-to-shot variation of those parameters will be important for the detailed characterization of laser accelerated electrons or protons.

Laser Etching Characteristics of ITO/Ag/ITO Conductive Films on Forward/Reverse Sides of Flexible Substrates (플렉서블 기판 전/후면에서의 레이저를 이용한 ITO/Ag/ITO 전극층의 식각 특성)

  • Nam, Hanyeob;Kwon, Sang Jik;Cho, Eou-Sik
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.29 no.11
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    • pp.707-711
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    • 2016
  • ITO/Ag/ITO conductive films on PET (polyethylene terephthalate) was etched by a Q-switched diode-pumped neodymiun-doped yttrium vanadate (Nd:YVO4, ${\lambda}=1064nm$) laser. During the laser direct etching, the laser beam was incident on the two different directions of PET and the etching patterns were investigated and analyzed. At a lower repetition rate of laser pulse, the larger laser etched patterns were obtained by laser beam incident on reverse side of PET substrate. On the contrary, at a higher repetition rate, it was possible to find the larger etched patterns in case of the laser beam incidence on forward side of PET substrate. For the laser beam incidence on reverse side, the laser beam is expected to be transferred and scattered through the PET substrate and the laser beam energy is thought to be dependent on the etch laser pulse beam energy.

Study on Implant Cleaning Effect of Lasers of Different Wavelengths (파장이 다른 레이저의 임플란트 세정 효과에 관한 연구)

  • Park, Eun Kyeong;Yang, Yun Seok;Lee, Ka Ram;Yoo, Young Tae
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.22 no.4
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    • pp.643-651
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    • 2013
  • This study applied a laser cleaning method (dry cleaning) that is used for cleaning semiconductor elements to dental implant cleaning. The lasers used in this study were pulsed fiber lasers with wavelengths of 1,064 and 532 nm. The peak output, energy per pulse, energy density per pulse, time of pulse experiment, and number of pulse experiments served as process variables for this study, and the variables were changed for each experiment. As a result, a laser with a wavelength of 532 nm showed much higher cleaning efficiency than its 1,064 nm counterpart. As the wavelength range decreased, the quantized energy increased and the reflection rate of the titanium used for the implant decreased; consequently, the energy absorption rate increased. Therefore, it is proposed that the energy density by wavelength has a greater influence on cleaning than does the output size.

Theoretical analysis on the maximum volume ablation rate for copper ablation with a 515nm picosecond laser (515nm 피코초 레이저를 이용한 구리 어블레이션 공정의 최대 가공율에 대한 이론적 분석)

  • Shin, Dongsig;Cho, Yongkwon;Sohn, Hyonkee;Suh, Jeong
    • Laser Solutions
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    • v.16 no.2
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    • pp.1-6
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    • 2013
  • Picosecond lasers are a very effective tool for micromachining metals, especially when high accuracy, high surface roughness and no heat affected zone are required. However, low productivity has been a limit to broadening the spectrum of their industrial applications. Recently it was reported that in the micromachining of copper with a 1064nm picosecond laser, there exist the optimal pulse energy and repetition rate to achieve the maximum volume ablation rate. In this paper, we used a 515nm picosecond laser, which is more efficient for micromachining copper in terms of laser energy absorption, to obtain its optimal pulse energy and repetition rate. Theoretical analysis based on the experimental data on copper ablation showed that using a 515nm picosecond laser instead of a 1064nm picosecond laser is more favorable in that the calculated threshold fluence is 75% lower and optical penetration depth is 50% deeper.

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Various Pulse Forming of Pulsed $CO_2$ laser using Multi-pulse Superposition Technique

  • Chung, Hyun-Ju;Kim, Hee-Je
    • KIEE International Transactions on Electrophysics and Applications
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    • v.11C no.4
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    • pp.127-132
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    • 2001
  • We describe the pulse forming of pulsed $CO_2$laser using multi-pulse superposition technique. A various pulse length, high duty cycle pulse forming network(PFN) is constructed by time sequence. That is, this study shows a technology that makes it possible to make various pulse shapes by turning on SCRs of three PFN modules consecutively at a desirable delay time with the aid of PIC one-chip microprocessor. The power supply for this experiment consists of three PFN modules. Each PFN module uses a capacitor, a pulse forming inductor, a SCR, a High voltage pulse transformer, and a bridge rectifier on each transformer secondary. The PFN modules operate at low voltage and drive the primary of HV pulse transformer. The secondary of the transformer has a full-wave rectifier, which passes the pulse energy to the load in a continuous sequence. We investigated laser pulse shape and duration as various trigger time intervals of SCRs among three PFN modules. As a result, we can obtain laser beam with various pulse shapes and durations from about 250 $mutextrm{s}$ to 600 $mutextrm{s}$.

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