• Title/Summary/Keyword: Laser micro patterning

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Micro-pattern Fabrication of Amorphous Alloy by Laser Beam Machining (비정질 합금의 마이크로 패턴 레이저 가공)

  • Kim, Haan;Park, Jong Wuk
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.21 no.4
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    • pp.77-83
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    • 2022
  • Amorphous alloys exhibit excellent mechanical properties; therefore, application technology development is being attempted in various fields. However, industrial use of application technology is limited owing to the limitations in fabrication. In this study, micropattern fabrication of an amorphous alloy was conducted using laser beam machining. Although microhole fabrication is possible without the deformation of the amorphous phase through nanosecond pulsed laser beam machining, there are limitations in the generation of recast layers and spatters. In cover plate laser beam machining (c-LBM), a cover plate is used to reduce the thermal deformation and processing area. Therefore, it is possible to fabricate holes at the level of several micrometers. In this study, it was confirmed that recast layers are hardly generated in c-LBM. Furthermore, square-shaped micropatterns were successfully fabricated using c-LBM.

Development of Laser Typing Process for the High Density Recording (고밀도 기록을 위한 레이저 타이핑 공정 개발)

  • 주영철;송오성;정영순
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.4 no.3
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    • pp.317-321
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    • 2003
  • A conventional typewriter types letters by hammering a carbon ribbon which is attached at a paper. The laser typing process which write a micro pattern of Chrome on a silicon wafer has been developed. A glass that is coated with 100 nm Chrome (Carbon ribbon) is attached on a silicon wafer (paper). An Nd-Yag laser (hammer) is irradiated on the glass, and the Chrome is transferred on the silicon wafer. Micro patterns are made by controlling laser beam trajectory. The suggested micro pattering can be used at the high density data storage of TeraBit/in$^2$ or at the improvement of productivity of semiconductor manufacturing procedure.

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Effect of buffer layer on the microstructure and magnetic properties of NdFeB thin films (NdFeB 박막의 자기적 특성 및 미세구조에 미치는 buffer layer의 영향)

  • ;;;G. A. Kapustin
    • Proceedings of the Korean Magnestics Society Conference
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    • 2002.12a
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    • pp.234-235
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    • 2002
  • NdFeB 박막자석은 Sputtering, MBE, Laser ablation법에 의해 제조되고 있으며[1-3] milli-size motor[4], magnetic recording media[5], micro-patterning[3]등에 응용될 수 있다. 최근에는 MEMS(Micro-electro mechanical system)분야에서도 잠재적 응용가능성을 지니고 있는 것으로 알려져 있다. 최근에는 NdFeB 박막 제조 시 자성층의 산화방지 및 자기 특성을 향상을 위하여 buffer layer를 이용한 많은 연구가 이루어지고 있다.[6] (중략)

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Micro patterning of conductor line by laser induced forward transfer(LIFT) (LIFT 방법에 의한 전도성 미세 패터닝 공정 연구)

  • 이제훈;한유희
    • Laser Solutions
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    • v.2 no.3
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    • pp.52-61
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    • 1999
  • The laser induced forward transfer(LIFT) technique employs a pulsed laser to transfer parts of a thin metal film from an optically transparent target onto an arbitrary substrate in close proximity to the metal film on the target. In this work, a two-step method, the combination of LIFT process, in which a Au film deposited on the $Al_2$O$_3$ substrate by Nd:YAG laser and subsequent Au electroless metal plating on the by LIFT process generated Au seed, was presented. The influence of laser parameters, wavelength, laser power, film thickness and overlap ratio of pulse tracks, on the shapes of deposit and conductor line after electroless plating is experimentally studied. As a results, the threshold power densities for ablation, deposition and metallization were determined and comparison of threshold value between the wave length 1064nm and the second harmonic generated 532nm. In odor to determine a possible application in the electronic industry, a smallest conduct spot size, line width and isolated line space were generated.

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Laser Head Design and Heat Transfer Analysis for 3D Patterning (3차원 패터닝을 위한 레이저 헤드설계 및 열해석)

  • Ye, Kang-Hyun;Choi, Hae-Woon
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.15 no.4
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    • pp.46-50
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    • 2016
  • A laser head was designed for micro-scale patterning and joining applications. The target feature size of the pattern was $100{\mu}m$, and optics were designed to perform the target. Two singlet lenses were combined to minimize the chromatic aberration, and the geometry of the lenses was calculated by using the raytracing method with a commercial software program. As a restriction of lens design, the focal length was set at 100mm, and the maximum diameter of the lens or beam size was limited to 10mm for the assembly in the limited cage size. The maximum temperatures were calculated to be $1367^{\circ}C$, $1508^{\circ}C$, and $1905^{\circ}C$ for 10, 12, and 15 Watts of power, respectively. A specially designed laser head was used to compensate for the distance between the object and the lens. The detailed design mechanism and 3D data were presented. The optics design and detailed performance of the lens were analyzed by using MTF and spot diagram calculation.

Micromachined Properties of a polyimide by a femtosecond laser (펨토초 레이저에 의한 폴리이마이드 가공 특성)

  • Min, Chul-Ki;Lee, Man-Seop
    • Laser Solutions
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    • v.11 no.2
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    • pp.20-25
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    • 2008
  • Polyimide is one of the useful materials in industry. The surface treatment of polyimide by a femtosecond laser can help accurate and fine fabrication of microstructure. And it can change the transmittance and reflectance of polyimide, too. We put femtosecond laser pulses on polyimide for rectangular or square type surface treaments and observe the change of transmittance and reflectance. Pulsewidth is 172 fs, laser power changes for fabrication are from 5 mW to 20 mW, and transmittance and reflectance are measured under 20m W, 300m W, and 920 mW. Pulse patterning is stable and almost no unwanted surface damage is shown. As power increases, working depth increases but working line width does not increase significantly. As speed changes, they also have same results. It shows the efficiency of a femtosecond laser is good and thermal damage is small for polyimide.

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Investigation into direct fabrication of nano-patterns using nano-stereolithography (NSL) process (나노 스테레오리소그래피 공정을 이용한 무(無)마스크 나노 패턴제작에 관한 연구)

  • Park Sang Hu;Lim Tae-Woo;Yang Dong-Yol
    • Journal of the Korean Society for Precision Engineering
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    • v.23 no.3 s.180
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    • pp.156-162
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    • 2006
  • Direct fabrication of nano patterns has been studied employing a nano-stereolithography (NSL) process. The needs of nano patterning techniques have been intensively increased for diverse applications for nano/micro-devices; micro-fluidic channels, micro-molds. and other novel micro-objects. For fabrication of high-aspect-ratio (HAR) patterns, a thick spin coating of SU-8 process is generally used in the conventional photolithography, however, additional processes such as pre- and post-baking processes and expansive precise photomasks are inevitably required. In this work, direct fabrication of HAR patterns with a high spatial resolution is tried employing two-photon polymerization in the NSL process. The precision and aspect ratio of patterns can be controlled using process parameters of laser power, exposure time, and numerical aperture of objective lens. It is also feasible to control the aspect ratio of patterns by truncation amounts of patterns, and a layer-by-layer piling up technique is attempted to achieve HAR patterns. Through the fabrication of several patterns using the NSL process, the possibility of effective patterning technique fer various N/MEMS applications has been demonstrated.

Investigation of friction effects between needles patterned using laser and elastomer (레이저에 의해 패터닝 된 바늘과 탄성중합체와의 마찰 효과)

  • Kim, Jae-Gu;Ro, Seung-Kook;Park, Jong-Kweon;Cho, Sung-Hak;Whang, Kyung-Hyun
    • Laser Solutions
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    • v.15 no.3
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    • pp.1-6
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    • 2012
  • The friction force of patterned needle in elastomer have been investigated to verify the application for bio and plastic industry. The micro pattern on the needle surface were prepared by 266 nm, 20 ns laser and 800 nm, 220 fs laser, which were able to generate the different surface roughness. The friction force was measured by the load cell of 10 N capacity. As the results, the friction force of no patterned needle is almost constant during the needle penetrates the silicone rubber sample. However, the needle having asperities shows the variation of the friction force. The higher the surface roughness is, the smaller the friction force is until the surface roughness is very high. In our experiment conditions, the reduction of the friction force by 20 % compared to no pattern needle was achieved with straight and $50{\mu}m$ discrete line generated by 266 nm, 20 ns laser.

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Laser-Induced Direct Copper Patterning Using Focused $Ar^+$ Laser Beam (집속 아르곤 이온 레이저 빔을 이용한 레이저 유도 직접 구리 패터닝)

  • Lee, Hong-Kyu;Lee, Kyoung-Cheol;Ahn, Min-Young;Lee, Cheon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.13 no.11
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    • pp.969-975
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    • 2000
  • Laser direct writing of micro-patterned copper lines has been achieved by pyrolytic decomposition of copper formate films (Cu(HCOO)$_2$.4$H_2O$), as a metallo-organic precursor, using a focused CW Ar$^{+}$ laser beam (λ=514nm) on PCB boards and glass substrates. The linewidth and thickness of the lines wee investigated as a functin of laser power and scan speed. The profiles of the lines were measured by scanning electron microscope (SEM), surface profiler ($\alpha$-step) and atomic force measured by scanning electron microscope (SEM), surface profiler ($\alpha$-step) and atomic force microscopy (AFM). The electrical resistivities of the patterned lines were also investigated as a function of laser parameters using probe station and semiconductor analyzer. We compared resistivities of the patterned copper lines with these of the Cu bulk. Resistivities decreased due to changes in morphology and porosity of the deposit, which were about 3.8 $\mu$$\Omega$cm and 12$\mu$$\Omega$cm on PCB and glass substrates after annealing at 30$0^{\circ}C$ for 5 minutes.s.

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Micromachining of the Si Wafer Surface Using Femtoseocond Laser Pulses (펨토초 레이저를 이용한 실리콘 웨이퍼 표면 미세가공 특성)

  • Kim, Jae-Gu;Chang, Won-Seok;Cho, Sung-Hak;Whang, Kyung-Hyun;Na, Suck-Joo
    • Journal of the Korean Society for Precision Engineering
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    • v.22 no.12 s.177
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    • pp.184-189
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    • 2005
  • An experimental study of the femtosecond laser machining of Si materials was carried out. Direct laser machining of the materials for the feature size of a few micron scale has the advantage of low cost and simple process comparing to the semiconductor process, E-beam lithography, ECM and other machining process. Further, the femtosecond laser is the better tool to machine the micro parts due to its characteristics of minimizing the heat affected zone(HAZ). As a result of line cutting of Si, the optimal condition had the region of the effective energy of 2mJ/mm-2.5mJ/mm with the power of 0.5mW-1.5mW. The polarization effects of the incident beam existed in the machining qualities, therefore the sample motion should be perpendicular to the projection of the electric vector. We also observed the periodic ripple patterns which come out in condition of the pulse overlap with the threshold energy. Finally, we could machined the groove with the linewidth of below $2{\mu}m$ for the application of MEMS device repairing, scribing and arbitrary patterning.