• Proceedings of the Korean Society of Laser Processing Conference
• /
• 2006.11a
• /
• pp.128-132
• /
• 2006

Low-k wafer engraving process has been investigated by using UV pico-second laser with high repetition rate. Wavelength and repetition rate of laser used in this study are 355nm and 80MHz, respectively. Main parameters of low-k wafer engraving processes are laser power, work speed, assist gas flow rate, and protective coating to eliminate debris. Results show that engraving qualities of low-k layer by using UV pico-second pulse width and high repetition rate had better kerf edge and higher work speed, compared to one by conventional laser with nano-second pulse width and low repetition rate in the range of kHz. Assist gas and protective coating to eliminate debris gave effects on the quality of engraving edge. Total engraving width and depth are obtained less than $20{\mu}m$ and $10{\mu}m$ at more than 500mm/sec work speed, respectively. We believe that engraving method by using UV pico-second laser with high repetition rate is useful one to give high work speed of laser material process.

• Journal of the Semiconductor & Display Technology
• /
• v.6 no.1 s.18
• /
• pp.11-15
• /
• 2007

Low-k wafer engraving process has been investigated by using UV pico-second laser with high repetition rate. Wavelength and repetition rate of laser used in this study are 355 nm and 80 MHz, respectively. Main parameters of low-k wafer engraving processes are laser power, work speed, assist gas flow, and protective coating to eliminate debris. Results show that engraving qualities of low-k layer by using a laser with UV pico-second pulse width and high repetition rate had better kerf edge and higher work speed, compared to one by conventional laser with nano-second pulse width and low repletion rate in the range of kHz. Assist gas and protective coating to eliminate debris gave effects on the quality of engraving edge. Total engraving width and depth are obtained less than $20\;{\mu}m$ and $10\;{\mu}m$ at more than 500 mm/sec work speed, respectively. We believe that engraving method by using UV pico-second laser with high repetition rate is useful one to give high work speed in laser material process.

• Journal of the Korean Society for Precision Engineering
• /
• v.14 no.1
• /
• pp.142-149
• /
• 1997

Ceramic-coated anilox roll for printing is resistant to corrosion and wear, and hence has enhanced life and quality. Laser engraving is used typically for machining holes to store ink in this roll. Since engraved hole size and shape are directly related to laser processing parameters, it is necessary to know the rela- tionships among these parameters. In this study, the parameters for engraving of ;oasma sprayed ceramic coatings with Nd:YAG laser were studied. Relationships between hole shape and processing parameters were analyzed. Cr$_{2}$O$_{3}$ceramic was found to be most suitable for Nd:YAG laser engraving. It was found that hole depth can be increased by using higher energy pulses. Effect of using different assistant gases was small to the final results. For better results, it was suggested to use a very stable laser with shorter pulses and higher pulse energy.

• Laser Solutions
• /
• v.10 no.1
• /
• pp.29-34
• /
• 2007

We propose a novel application of laser engraving to patterning of light guide panel (LGP) for backlight. The feasibility of three-dimensional engraved pattern in the LGP was verified by measuring brightness and uniformity. To improve the overall uniformity, we have modified proposed patterns and found improved design for patterns. The tailoring of pattern by using laser engraving method could endow the controllability of uniformity. The proposed LGPs are more efficient in both average brightness and uniformity of illumination than the conventional LGPs which have surface pattern on the panel.

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2006.10a
• /
• pp.115-116
• /
• 2006

• Korean Journal of Computational Design and Engineering
• /
• v.4 no.1
• /
• pp.19-31
• /
• 1999

One of the non-photorealistic rendering method, a drawing technique which uses only fine curves and dashed line, is widely employed in an knots and post stamps printing. Engraving of the curves and lines are traditionally performed by human engravers which leads to low productivity in printing preparation. As an effort to improve productivity and quality, a drawing automation method which can easily produce a portrait composed of vector data for laser or chemical engraving is proposed. The method shows that it is possible to draw a portrait by controling the width and length of predefined fine lines according to the gray scales a the end points of each fine lines. A gradually controled weighting factor method is proposed in addition to the author previous works to prevent undesirable boundaries in an identical texture region. User interface functions of a commercial CAD system are heavily employed to exploit the presented method.

• Laser Solutions
• /
• v.17 no.4
• /
• pp.20-23
• /
• 2014

In printed electronics, printing rolls are used to transfer electronic ink onto a flexible substrate. Generally printing rolls are patterned in microscale by the indirect laser method. Since based on the wet etch process, the indirect method is neither environment-friendly nor suitable for making a printing roll with patterns narrower than $20{\mu}m$. In this paper, we have directly engraved micro-patterns into a Zn-coated metal specimens using a picosecond laser in order both to engrave $10{\mu}m$-wide patterns and to improve the pattern profile. Experiments showed that it is possible to engrave $10{\mu}m$-wide patterns with an a rectangular-shaped profile which is necessary for the dimensionally accurate printing.

• Proceedings of the Korean Society of Laser Processing Conference
• /
• 1999.05a
• /
• pp.39-42
• /
• 1999

• Journal of the Korean Graphic Arts Communication Society
• /
• v.16 no.2
• /
• pp.1-10
• /
• 1998

Even if some kinds of software for halftoning such as raster image process program are on the market, most of them couldn`t apply to the new laser gravure cylinder making machine because they are closed the source program. In order to develop new laser gravure engraving machine, we were investigated new suitable halftoning software based on the mapping and equal density expansion algorithm that we are mapped. As the results of actual practice with Microsoft Visiul C++2.0 in 133Khz 64M ram IBM personal computer, we found that the new software for halftone generation for laser gravure engraving machine are available in new machine, and easily load and processing the graphic image for gravure hardcopy.

• Proceedings of the KWS Conference
• /
• 1994.05a
• /
• pp.167-170
• /
• 1994