• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.04a
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• pp.43-43
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• 2008

Recently, it is widely studied to liquid crystal (LC) alignment using ion-beam exposure. Because conventional rubbing method has some problems such as defects from dust and electrostatic charges and rubbing scratch during rubbing process. Moreover rubbing method needs cleaning process to remove these defects. Therefore rubbing-free techniques like ion-beam method are strongly required. We studied LC alignment by controlling ion-beam irradiation angles and electro-optical (EO) characteristics of twisted nematic LC on the polyimide surface. In this experiment, a good uniform alignment of the nematic liquid crystal (NLC) with the ion-beam exposure on the polyimide (PI) surface was observed. We also achieved low pretilt angle as function of ion-beam irradiation angles. X-ray photoelectron spectroscopic (XPS) analysis provided chemical evidence for LC alignment by controlling ion-beam irradiation angles. In addition, it can be achieved the good EO properties of the ion-beam-aligned twisted nematic liquid crystal display (TN-LCD) on PI surface. Some other experiments results and discussion will be included in the presentation.

• Proceedings of the KIEE Conference
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• 1997.07d
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• pp.1582-1584
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• 1997

We investigated the transcription of liquid crystal (LC) alignment method by using memory effect of nematic (N) LC on polyimide (PI) surface with side chain as for non-rubbing alignment techniques. That the monodomain alignment of aligned NLC is observed by polarizing microscope textures in the cells on PI surface with side chain, We obtained that the pretilt angle of NLC are generated about 3.7 degree on PI surface. We suggest that the LC alignment by using transcription aligngnment method is attributed to memory effect of NLC on PI surface.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1997.04a
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• pp.123-126
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• 1997

In this study, we investigated the Pretilt ang1e generation in nematic liquid crystal (NLC) by using the transcription, alignment on polyimide(Pl) surfaces. That the uniform alignment of NLC is observed by microphotograph textures in LC cells on Pl surface. We obtained that the pretilt angle of NLC are generated about 3.6$^{\circ}$on Pl surface. It is considered that the LC alignment by transcription alignment method is attributed to memory effect of LC on Pl surface.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.11 no.6
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• pp.477-480
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• 1998

In this paper, we investigated the liquid crystal(LC) alignment and generation of pretilt angle by using photo-alignment techniques on two kinds of polyimide(PI) surface, It was found that the uniform alignment for nematic(N) LC is obtained in a cell with slanted UV light irradiation on PI surface without side chain. We successfully observed that the pretilt angle of NLC is generated about $3^{\circ}$ with an incident angle of 70 degree on the PI surface without side chain. It is considered that the pretilt angle generation in NLC is attributed to interaction between the LC molecules and the polymer surfaces.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1997.11a
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• pp.112-115
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• 1997

In this paper, we investigated the liquid crystal(LC) alignment and generation of pretilt angle by using photo-alignment techniques on two kinds of polyimide(Pl) surface. It was found that the uniform alignment for nematic(N) LC is obtained in a cell with slanted UV light irradiation on PI surface without side-chain. We successfully observed that the pretilt angle of NLC is generated about 3.3 degrees in a cell with an incidence angle of 70 degrees on PI surface without side chain. It is considered that the pretilt angle generation in NLC is attributed to interaction between the LC molecular and the polymer.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.11
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• pp.1014-1018
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• 2003

A photoalignment material of a PGMAcr, poly[3-(acryloyloxy)-2-hydroxypropyl methacrylate] using a photopolymerized the acrylate unit by photo-initiator and a PGMA4Ch, poly[3(4-chalconyloxy)-2-hydroxypropyl methacrylate] using a photodimerization by chalcone group were synthesized. Also, the liquid crystal (LC) aligning capabilities on the photopolymer layers were studied. A good LC alignment with UV exposure on the PGMAcr surface can be obtained. However, the LC alignment defects were observed on the PGMA4Ch surface. The LC aligning capabilities of the PGMAcr surface by photo-initiator were better than that of the PGMA4Ch surface by chalcone group as photosensitive moiety.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.11a
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• pp.280-281
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• 2006

We studied the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of a Titanium dioxide ($TiO_2$) thin film by rf magnetron sputtering system for 15min under various rf power. A very low pretilt angle by ion beam exposure on the $TiO_2$ thin film was measured. A good LC alignment by the ion beam alignment method on the $TiO_2$ thin film surface was observed at annealing temperature of $200^{\circ}C$, and the alignment defect of the NLC was observed above annealing temperature of $250^{\circ}C$. Consequently, the low NLC pretilt angle and the good thermal stability of LC alignment by the ion beam alignment method on the $TiO_2$ thin film by sputter method as various rf power condition can be achieved.

• Transactions on Electrical and Electronic Materials
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• v.5 no.1
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• pp.15-18
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• 2004

We studied the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of a-C:H thin film by plasma enhanced chemical vapor deposition (PECVD) system for 30 sec under 30W rf power at a gas pressure of 1.4＊10$\^$-1/ torr. A high pretilt angle of about 5 by ion beam exposure on the a-C:H thin film surface was measured. A good LC alignment by the ion beam alignment method on the a-C:H thin film surface was observed at annealing temperature of 250$^{\circ}C$, and the alignment defect of NLC was observed above annealing temperature of 300$^{\circ}C$. Consequently, the high LC pretilt angle and the good thermal stability of LC alignment by the ion beam alignment method on the a-C:H thin film by PECVD method as working gas at 30W rf bias condition can be achieved.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.11
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• pp.1024-1027
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• 2005

By using $45^{\circ}$ obliqued evaporation method with electron beam system, uniformly vertical liquid crystal (LC) alignment was achieved. And a high pretilt angles of about $2.5^{\circ}$ were measured. Also, it was verified that there are no variations of pretilt angle as a function of $SiO_x$ thin film thickness 20 nm and 50 nm. A good LC alignment states were observed at annealing temperature of $250^{\circ}C$. Consequently, the high pretilt angle and the good thermal stability of LC alignment by $45^{\circ}$ obliqued electron beam evaporation method on the $SiO_x$ thin film can be achieved.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.378-378
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• 2007

In this study, liquid crystal (LC) aligning capabilities for homeotropic alignment on the $ZrO_x$ thin film by electron beam evaporation method were investigated. Also, the control of pretilt angles and thermal stabilities of the NLC treated on $ZrO_x$ thin film were investigated. The uniform LC alignment on the $ZrO_x$ thin film surfaces and good thermal stabilities with electron beam evaporation can be achieved. It is considerated that the LC alignment on the $ZrO_x$ thin film by electron beam evaporation is attributed to elastic interaction between LC molecules and micro-grooves at the $ZrO_x$ thin film surface created by evaporation. In addition, it can be achieved the good electro-optical (EO) properties of the VA-LCD on $ZrO_x$ thin film layer with. oblique electron beam evaporation.