• 제목/요약/키워드: KrT excimer laser

검색결과 7건 처리시간 0.025초

ITO Thin Film Ablation Using KrF Excimer Laser and its Characteristics

  • Lee, Kyoung-Chel;Lee, Cheon;Le, Yong-Feng
    • Transactions on Electrical and Electronic Materials
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    • 제1권4호
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    • pp.20-24
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    • 2000
  • This study aimed to develop ITO(Indium Tim Oxide) tin films ablation with a pulsed type KrF excimer laser required for the electrode patterning application in flat panel display into small geometry on a large substrate are. The threshold fluence for ablating ITO on glass substrate is about 0.1 J/㎠. And its value is much smaller than that using 3 .sup rd/ harmonic Nd:YAG laser. Through the optical microscope measurement the surface color of the ablated ITO is changed into dark brown due to increase of surface roughness and transformation of chemical composition by the laser light. The laser-irradiated regions were all found to be electrically isolating from the original surroundings. The XPS analysis showed that the relative surface concentration of Sn and In was essentially unchanged (In:Sn=5:1)after irradiating the KrF excimer laser. Using Al foil made by 2$\^$nd/ harmonic Na:YAG laser, the various ITO patterning is carried out.

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엑시머 레이저를 이용한 파이렉스 유리의 미세 구멍 가공 (The Experimental Study in the Micro Drilling of Excimer Laser on Pyrex Glass)

  • 이철재;김하나;정윤상;전찬봉;박영철;강정호
    • 한국기계가공학회지
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    • 제11권5호
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    • pp.99-103
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    • 2012
  • Presently, A glass is widely used in telecommunication system, optoelectronic devices and micro electro mechanical systems. Micro drilling of glass using the laser can save processing cost and improve the accuracy. This paper experiments micro drilling using KrF excimer laser on the pyrex glass of $500{\mu}m$ thickness. We have experiment to find out optimum laser machining conditions of micro drilling of glass and ablation depth and influence by processing parameter suc'h pulse repetition rate, energy density and number of pulses. Pulse repetition rate don't influence ablation depth at the micro drilling of pyrex glass. Energy density influence micro drilling of parallelism and maximum thickness that can be drilled. Ablation depth is most influenced by number of pulses.

Development of Computer Simulation Code of Excimer Lasers and Experimental Confirmation

  • Maeda, M.;Okada, T.;Muraoka, K.;Chino, K.U.
    • 한국조명전기설비학회:학술대회논문집
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    • 한국조명전기설비학회 1999년도 학술대회논문집-국제 전기방전 및 플라즈마 심포지엄 Proceedings of 1999 KIIEE Annual Conference-International Symposium of Electrical Discharge and Plasma
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    • pp.58-63
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    • 1999
  • In order to analyze the discharge-pumped KrF excimer laser, computer simulation code is developed. On the other hand, the electron velocity distribution in a discharge plasma, measured by the Thomson scattering method, showed the Maxwellian, while the code predicted non-Maxwellian. This disagreement was solved by introducing the electron-electron collision into the simulation code. We also developed a simulation code on the CO2 laser-heated plasma in high-pressure Ar gas, and estimated the formation process of Ar2 excimer. The code predicted the possibility of the Ar2 laser action at 126 nm.

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폴리머의 어블레이션 시 소거성 잉크를 이용한 잔유물 제거공정 개발 (Development of Debris-free Process using Erasable Ink for Polymer Ablation)

  • 신동식;이제훈;서정;김도훈
    • 한국레이저가공학회지
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    • 제8권2호
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    • pp.21-32
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    • 2005
  • The excimer laser ablation of a polymer occurs by the excitation of chemical bonds to energy levels that are above the dissociation energy. In this process, however, fragmented debris is finally ejected explosively by the scission of bonds and accumulates on the material surface. In the present work, a process for eliminating surface debris contamination generated by the laser ablation of a polymer is developed. The proposed approach for removing surface debris utilizes an erasable ink pasted on a polymide. The ink pasted polyimide is ablated by KrF excimer laser. The surface debris ejected from the polyimide is then combined with the ink layer on the polymer. Finally, both the surface debris and the ink layer are removed using adhesive tape or alcohol solvent. The results suggest that the erasable ink method is a simple, low cost, and extremely effective debris eliminating process.

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PLD 법에 의한 c-사파이어 기판위의 MnS 박막성장 (Growth of MnS Thin Film on c-Sapphire by Pulsed Laser Deposition)

  • 송정환
    • 한국재료학회지
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    • 제17권9호
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    • pp.475-479
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    • 2007
  • Pulsed laser deposition was utilized to grow MnS thin films on c-sapphire substrate using a KrF excimer laser at growth temperatures that ranged from room temperature to $700^{\circ}C$. The results of X-ray diffraction (XRD) and UV-visible spectroscopy were employed to investigate the structural and optical properties of the MnS films. While the growth rate decreased as $T_s$ increased, the overall quality of the film improved. The highest quality MnS film was obtained at $700^{\circ}C$. Variations in the $T_s$ resulted in the MnS films exhibiting different growth mechanisms. The oriented (200) rocksalt MnS film was grown at room temperature. In the case of higher $T_s,\;200{\sim}500^{\circ}C$, the films consisted of mixed phases of rocksalt and wurtzite. The main structure of the films was altered to (111) rocksalt when the temperature was increased to in excess of $600^{\circ}C$. This behavior may very well be the result of elements such as surface energy and atomic arrangement during the growth process. The optical band gap of the obtained ${\alpha}-MnS$ film was estimated to be 3.32 eV.

UV beam parameter가 광섬유 격자 형성에 미치는 영향 (Effects of the UV beam parameters on the fiber Bragg gratings fabricated)

  • 임종훈;조상연;김상엽;박광노;이종훈;박봉옥;송정태;이경식;전찬오
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1997년도 추계학술대회 논문집 학회본부
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    • pp.665-668
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    • 1997
  • We fabricated a number of optical fiber Bragg gratings by varying the UV beam parameters such as the laser energy density, pulse repetition rate and exposing time. The reflectance and the Bragg wavelength shift of the fiber Bragg gratings formed with a KrF excimer laser in real time depend strongly on the UV beam parameters. The index changes in the gratings during the exposing time are well fitted to the well known equations.

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Deep UV 마이크로 리소그라피를 위한 새로운 4-반사경 광학계에 관한 수차해석

  • 김종태;이상수
    • 한국광학회지
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    • 제4권1호
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    • pp.1-8
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    • 1993
  • 축소배율(5$\times$)을 갖고, Seidel 1차 수차중 4개의 비축수차인 코마(coma), 비점수차(astigmatism), 상면만곡(field curvature) 그리고 왜곡수차(distortion)가 제거된 마이크로 리소그라피를 위한 4-구면 반사경 광학계를 해석적으로 구하였다. 이때, $t=d_1+d_2+d_3$<0, (di는 반사거울 $c_i$$c_{i+1}$ 사이의 거리)이고, 축상 수차인 구면수차와 잔류고차수차는 반사거울 $c_3$$c_4$를 비구면화 하므로서 제거하였다. 이렇게 설계된 4-반사경 광학계의 N.A.는 0.4로서 Rayleigh분해능은 0.38 $\mu\textrm{m}$이다.

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