• Title/Summary/Keyword: Korean mask

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Creep-Induced Tension Loosening of CRT Tension Mask (크리프에 따른 CRT 텐션 마스크의 장력 이완)

  • Chung, Il-Sup
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.27 no.6
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    • pp.1034-1040
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    • 2003
  • Tension mask is a part of CRT type devices, which is installed right behind glass-made front panel. Numerous slits on the thin metal sheet enable the electron beams emitted from posterior gun to be focused, resulting in enhanced definition. Flattened and enlarged displays necessitate the imposition of pretension on the masks, in order to improve the robustness of display quality against vibration or impact. High temperature assembly process subsequent to pretensioning, however, degenerates creep resistance of mask material, and common mask may become susceptible to undesirable elongation due to creep. Once tensile stress becomes high enough to induce creep deformation, pretension is substantially loosened. In this study, tension mask assembly is modeled as a combined structure of beams and wire array, and a numerical simulation is attempted for pretensioning followed by high temperature process. Based on a model study, creep occurrence is found to be probable and its adverse influence is quantified. As fur maintaining high tensile force, simply increasing pretension does not seem to be helpful. Instead, the structure of frame needs to be modified somehow, or material for mask needs to be selected properly.

Deformation Analysis of a Metal Mask for the Screen Printing of Micro Bumps (스크린 인쇄용 미세 범프 금속마스크의 변형특성 해석)

  • Lee, K.Y.;Lee, H.J.;Kim, J.B.;Park, K.
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.21 no.3
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    • pp.408-414
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    • 2012
  • Screen printing is a printing method that uses a woven mesh to support an ink-blocking stencil by transferring ink or other printable materials in order to form an image onto a substrate. Recently, the screen printing method has applied to micro-electronic packaging by using solder paste as a printable material. For the screen printing of solder paste, metal masks containing a number of micro-holes are used as a stencil material. The metal mask undergoes deformation when it is installed in the screen printing machine, which results in the deformation of micro-holes. In the present study, finite element (FE) analysis was performed to predict the amount of deformation of a metal mask. For an efficient calculation of the micro-holes of the metal mask, the sub-domain analysis method was applied to perform FE analyses connecting the global domain (the metal mask) and the local domain (micro-holes). The FE analyses were then performed to evaluate the effects of slot designs on the deformation characteristics, from which more uniform and adjustable deformation of the metal mask can be obtained.

A Novel Fabrication Method of the High-Aspect-Ratio Nano Structure (HAR-Nano Structure) Using a Nano X-Ray Shadow Mask (나노 X-선 쉐도우 마스크를 이용한 고폭비의 나노 구조물 제작)

  • Kim Jong-Hyun;Lee Seung-S.;Kim Yong-Chul
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.30 no.10 s.253
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    • pp.1314-1319
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    • 2006
  • This paper describes the novel fabrication method of the high-aspect-ratio nano structure which is impossible by conventional method using a shadow mask and a Deep X-ray Lithography (DXRL). The shadow mask with $1{\mu}m-sized$ apertures is fabricated on the silicon membrane using a conventional UV-lithography. The size of aperture is reduced to 200nm by accumulated low stress silicon nitride using a LPCVD (low pressure chemical vapor deposition) process. The X-ray mask is fabricated by depositing absorber layer (Au, $3{\mu}m$) on the back side of nano shadow mask. The thickness of an absorber layer must deposit dozens micrometers to obtain contrast more than 100 for a conventional DXRL process. The thickness of $3{\mu}m-absorber$ layer can get sufficient contrast using a central beam stop method, blocking high energy X-rays. The nano circle and nano line, 200nm in diameter in width, respectively, were demonstrated 700nm in height with a negative photoresist of SU-8.

Research on railroad track object detection and classification based on mask R-CNN (mask R-CNN 기반의 철도선로 객체검출 및 분류에 관한 연구)

  • Seung-Shin Lee;Jong-Won Choi;Ryum-Duck Oh
    • Proceedings of the Korean Society of Computer Information Conference
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    • 2024.01a
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    • pp.81-83
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    • 2024
  • 본 논문에서는 mask R-CNN의 이미지 세그먼테이션(Image Segmentation) 기법을 이용하여 철도의 선로를 식별하고 분류하는 방법을 제안한다. mask R-CNN의 이미지 세그먼테이션은 바운딩 박스(Bounding Box)를 통해 이미지에서 객체를 식별하는 R-CNN 알고리즘과는 달리 픽셀 단위로 관심 있는 객체를 검출하고 분류하는 기법으로서 오브젝트 디텍션(Object Detection)보다 더욱 정교한 객체 식별이 가능하다. 본 연구에서는 Pascal VOC 형태의 고속철도 데이터 24,205셋의 데이터를 전처리하고 MS COCO 데이터셋으로 변환하여, MMDetection의 mask R-CNN을 통해 픽셀 단위로 철도선로를 식별하고 정상/불량 상태를 분류하는 연구를 수행하였다. 선행연구에서는 YOLO를 활용하여 Polygon형태의 좌표를 바운딩 박스로 분류하였는데, 본 연구에서는 mask R-CNN을 활용함으로써 철도 선로를 더욱 정교하게 식별하였으며 정상/불량의 상태 분류는 YOLO와 유사한 성능을 보였다.

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Improvement of Slit Photolithography Process Reliability for Four-Mask Fabrication process in TFT LCDs

  • Min, Tae-Yup;Qiu, Haijun;Wang, Zhangtao;Gao, Wenbao;Choi, Sang-Un;Lee, Sung-Kyu
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.851-854
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    • 2008
  • In order to reduce the manufacturing cost of TFT LCDs and cut down an amount facilities invested, there are many LCD panel makers contributes to convert the current Five-mask manufacturing process into the noble Four-mask fabrication process. We optimized the slit mask to improve the poor process reliability.

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A Study on Optimization of Mask Filter and Reduction in Respiratory Resistance (마스크 필터의 효율 최적화 및 호흡 저항 감소에 관한 연구)

  • Kwon, Sehyun;Hong, Jayoung;Jeong, Sang Bin;Heo, Ki Joon;Lee, Byung Uk
    • Particle and aerosol research
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    • v.12 no.3
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    • pp.103-107
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    • 2016
  • We conducted experiments on mask filters. We measured filtering efficiencies of several new mask filters which were manufactured by disassembling and reassembling of one type of mask filter. New filter (A+C: combination of the first layer and the third layer of the tested mask filter) showed the highest efficiency (97.7%) with the respiratory resistance of 98 pa.

Single-Channel Speech Separation Using the Time-Frequency Smoothed Soft Mask Filter (시간-주파수 스무딩이 적용된 소프트 마스크 필터를 이용한 단일 채널 음성 분리)

  • Lee, Yun-Kyung;Kwon, Oh-Wook
    • MALSORI
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    • no.67
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    • pp.195-216
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    • 2008
  • This paper addresses the problem of single-channel speech separation to extract the speech signal uttered by the speaker of interest from a mixture of speech signals. We propose to apply time-frequency smoothing to the existing statistical single-channel speech separation algorithms: The soft mask and the minimum-mean-square-error (MMSE) algorithms. In the proposed method, we use the two smoothing later. One is the uniform mask filter whose filter length is uniform at the time-Sequency domain, and the other is the met-scale filter whose filter length is met-scaled at the time domain. In our speech separation experiments, the uniform mask filter improves speaker-to-interference ratio (SIR) by 2.1dB and 1dB for the soft mask algorithm and the MMSE algorithm, respectively, whereas the mel-scale filter achieves 1.1dB and 0.8dB for the same algorithms.

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Analysis of Thermal Deformations of Shadow Mask and Electronic Beam Mislanding (쉐도우마스크의 열변형과 전자빔의 오차 해석)

  • 김현규;박영호;김상기;임세영
    • Journal of the Korean Institute of Telematics and Electronics B
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    • v.31B no.6
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    • pp.81-90
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    • 1994
  • Finite element analysis is performed for transient thermal deformation of a shadow mask inside the Braun tube and the landing shift or mislanding of the electronic beam is calclated. The shadow mask has numerous slits through which the electronic beams are guided to land on the designed phosphor. Its thermal deformations therefore cause the mislanding of the electronic beam and result in decolorization of a screen. For realistic finite element analysis, firstly the effective thermal conductivity and the effective elastric modulus are calculated, and the shadow mask is modeled as shell without slits. Next the nonlinear finite element formulation is developed for transient heat transfer on the shadow mask, wherein thermal radiation is a major heat transfer mechanism. Analysis of the resulting thermoelastic deformations is followed, from which the mislanding of the electronic beam is obtained. The present finite element scheme may be efficiently used for thermal deformation design of a shadow mask.

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Vibration Analysis and Design of CRT for Reduction of Moire Phenomena (CRT 모아레 현상의 억제를 위한 진동 해석 및 설계)

  • 이규헌;유홍희
    • Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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    • 2001.11a
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    • pp.413-418
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    • 2001
  • The moire phenomena, which are induced by mask vibration due to the excitation of speakers, degrades the color purity of CRT. So it is important to eliminate this phenomena to obtain a good CRT design. In this study we analyze the mask vibration by experiment as well as finite element method. To obtain the finite element solutions efficiently, an equivalent model was employed. The experimental and analysis results show reasonable agreements. An enhanced design configuration of mask welding points are suggested through this study.

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A Study on the Stage-Structure of the Korean Traditional Mask Drama (가면극(假面劇)의 고유무대(固有舞臺) 구성(構成)에 관(關)한 연구(硏究))

  • Pahk, Kyung-Rip
    • Journal of Industrial Technology
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    • v.1
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    • pp.3-8
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    • 1981
  • The aim of the study is to find out the proper stage of the Korean traditional Mask Drama. For this purpose, the study investigates into the traditional Mask Dramas representative in Korea. It discusses the nature and the form of the stage of them, and through the analysis of the stage, extracts a unique elements for the stage of the traditional Mask Drama.

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