• 대한방사선치료학회지
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• 제26권2호
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• pp.355-362
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• 2014

목 적 : 두경부 치료 시 환자의 고정을 위해 고정용 열성형가면(Thermoplastic mask, mask)을 사용한다. 치료 중 변동의 오차가 적은 정위적방사선수술에 사용되는 특수 제작된 마스크를 토모치료에 적용 했을 때 표면선량의 변화의 경향을 알아보고 유용성을 평가해보고자 한다. 대상 및 방법 : 일반적인 마스크(conventional mask, C-mask)와 정위적방사선수술 마스크(SRS mask, S-mask)를 이용하여 인체팬텀(rando phantom)을 동일한 중심선으로 고정한 후 모의 치료를 실시하였다. 획득한 영상은 치료계획시스템(treatment planning system, TPS)을 이용하여 안와부와 침샘부위를 치료 부위로 설정하여 각 각의 토모치료계획을 세웠다. 마스크의 특성에 따른 표면선량 측정을 위해 정위적방사선수술 마스크를 기준으로 치료부위에 주변에 위치한 두꺼운 부분과 얇은 부분을 관심영역으로 설정하여 마스크의 종류에 따른 동일한 위치의 표면 선량을 비교해보았다. 그리고 토모치료기를 이용하여 모의치료와 동일한 조건으로 인체팬텀을 위치시키고 치료계획에서 설정된 관심영역의 위치에 Gafchromic EBT3 필름을 팬텀 표면에 부착 하여 마스크를 착용한 후 치료 조사하였다. 선량 농도 분석 시스템(RIT)을 이용하여 조사된 필름의 표면선량을 측정하여 마스크의 종류에 따른 표면선량 변화의 양상을 비교해보았다. 결 과 : TPS에서 마스크의 종류에 의한 표면선량 변화는 안와에서 0.65~2.53 Gy, 타액선에서 0.85~1.84 Gy의 측정 변화값을 보여주었다. Gafchromic EBT3 필름을 이용한 표면선량 측정에서는 안와에서 -0.2~+3.46 Gy, 타액선에서 1.04~3.02 Gy의 측정 변화값을 보여 주었다. Smask를 적용하였을 때 C-mask를 기준으로 하였을 때 TPS에서 최대 4.26% Gafchromic EBT3 필름에서 최대 5.82%의 각 각의 표면선량 증가 경향을 나타내었다. 결 론 : S-mask의 사용으로 인한 표면선량은 무작위적으로 변하였으나 대체적으로 유효한 범위 안에 들어옴을 알 수 있었다. 본 연구에서는 표면선량의 변화값을 극대화 하기 위해 표면에 위치한 표적을 실험 하였으며 치료 표적이 심부에 위치할 경우와 치료 계획의 조건에 따라 표면 선량은 더 감소할 것으로 생각되어지며 이는 마스크에 따른 표면선량의 차이는 피부 부작용에 영향을 미치지 않을 것으로 사료된다. 그리고 치료 중 또는 치료 간 위치변화 감소의 장점은 치료 표적이 작고 결정 장기가 밀접한 경우 S-mask의 두경부 치료 적용은 유용할 것으로 사료된다.

• Transactions on Electrical and Electronic Materials
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• 제16권6호
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• pp.312-316
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• 2015

Through silicon via (TSV) technology holds the promise of chip-to-chip or chip-to-package interconnections for higher performance with reduced signal delay and power consumption. It includes high aspect ratio silicon etching, insulation liner deposition, and seamless metal filling. The desired etch profile should be straightforward, but high aspect ratio silicon etching is still a challenge. In this paper, we investigate the use of etch hard mask for finer TSVs etching to have clear definition of etched via pattern. Conventionally employed photoresist methods were initially evaluated as reference processes, and oxide and metal hard mask were investigated. We admit that pure metal mask is rarely employed in industry, but the etch result of metal mask support why hard mask are more realistic for finer TSV etching than conventional photoresist and oxide mask.

• 한국광학회지
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• 제8권4호
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• pp.345-352
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• 1997

최신(4GDRAM)의 MASK design에서는 전자기파의 산란에 의한 효과를 고려해 주는 것이 매우 중요하다. 이를 위하여 시간 영역에서의 요한 차분법을 도입하여 직접 마스크 함수를 계산하였다. 새롭게 도입한 마스크 함수를 사용함으로써 마스크와 렌즈의 효과뿐만 아니라, submicron 노광용 위상 변이 마스크의 식각된 옆벽에서의 산란효과를 정확하게 설명할 수 있었다. 산란효과를 줄이기 위해 변형된 마스크의 형태에 따른 특성을 살펴보았고, dual etch back에 의한 마스크 변형이 가장 좋은 공정 여유도를 제공함을 확인하였다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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• pp.1071-1074
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• 2007

6Mask CMOS process in low temperature polycrystalline silicon thin film transistors (poly-Si TFTs) has been developed and verified by manufacturing a 6Mask CMOS AMLCD panel. The novel 6Mask CMOS process is realized by eliminating the storage mask, gate mask and via open mask of conventional structure.

• 반도체디스플레이기술학회지
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• 제3권2호
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• pp.5-9
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• 2004

Microcircuit fabrication requires precise control of impurities in tiny regions of the silicon. These regions must be interconnected to create components and VLSI circuits. The patterns to define such regions are created by lithographic processes. In order to image features smaller than 70 nm, it is necessary to employ non-optical technology (or next generation lithography: NGL). One such NGL is extreme ultra-violet lithography (EUVL). EUVL transmits the pattern on the wafer surface after reflecting ultra-violet through mask pattern. If particles exist on the blank mask, it can't transmit the accurate pattern on the wafer and decrease the reflectivity. It is important to care the blank mask. We removed the particles on the wafer using focused ion beam (FIB). During removal, FIB beam caused damage the multi layer mask and it decreased the reflectivity. The relationship between particle removal and reflectivity is examined: i) transmission electron microscope (TEM) observation after particle removal, ii) reflectivity simulation. It is found that the image mode of FIB is more effective for particle removal than spot and bar mode.

• Journal of Information Display
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• 제2권1호
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• pp.34-37
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• 2001

We developed the tension mask of which thickness increased from 25 urn to 50 urn to reduce the mask cost and improve the vibration property. First of all, the limitation by which rail structure can support is calculated and the optimal thickness of mask is determined. To prevent the reduction of brightness and brightness uniformity, the dimensions of mask was reassigned. As a result, the increase of mask thickness brought about a reduction in cost and improvement of howling property which had been a weak point of flat CRTs.

• 소성∙가공
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• 제12권5호
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• pp.487-492
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• 2003

Tension variations with heat treatment in shadow mask for flat braun tubes are investigated in this study. In CRT, landing shift of the electron beam due to thermal deformation of the tension mask made the color purity of screen worse. In order to get the final results of thermal deformation, the tensile force within the mask and the welding processes between the rail and the extended mask have to be analysed sequentially. In this study, the effect of heat treatment is studied in terms of tension variations of shadow mask during its manufacturing process.

• 반도체디스플레이기술학회지
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• 제16권4호
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• pp.16-19
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• 2017

For the economical and environmental-friendly fabrication of polisher, Mo mask layer were sputtered on glass substrate instead of Cr mask material. Mo mask layers were sputtered by pulsed-DC sputtering and Photoresist patterns were formed on Mo mask layer for different develop times and optimized. After Mo mask layer were patterned and exposed glass was wet etched by HF solution for different etching times, the remaining Mo mask was stripped by using Al etchant. Develop time of 30 sec and HF wet etching time of 3 min were selected as optimized process condition and applied to the fabrication of polisher.

• Asia Marketing Journal
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• 제21권2호
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• pp.51-71
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• 2019

L&P Cosmetic, the leading company selling mask packs on the global market, produces MEDIHEAL, the number-one best-selling mask pack brand in Korea and the best-selling imported mask pack brand in China (2017). The company pioneered the premium market for mask packs through its launch of premium mask packs in 2009, and has subsequently achieved outstanding success in Korea and China. Three key factors have contributed to the success of L&P Cosmetic: product leadership with R&D capability, strategic marketing programs tailored for each market segment, and operational excellence focusing on strategic outsourcing and partnership management. Nonetheless, globalization beyond the Chinese market remains a major challenge for the potential of L&P Cosmetic. The company has embarked upon a collaboration with BTS, the world's top K-pop stars, as an optimally effective way to achieve its goals and a highly efficient strategy to manage the risks of globalization. The global branding collaboration project with BTS has succeeded in generating primary demand for mask packs on the global market, spreading brand awareness of MEDIHEAL, and establishing global channel networks. L&P Cosmetic will continue to grow worldwide on the basis of this outstanding performance.

• 한국의류학회지
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• 제44권4호
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• pp.626-638
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• 2020

In this study, protective masks were designed in varying internal volume and analyzed in regards to wearing effect. Masks were measured by surface temperature and subjective wear evaluation. Four experimental masks were created with an increasing distance between the mask center line and nose in increments. The distances were set at 0.0 cm (M0), 2.0 cm (M2), 4.0 cm (M4), and 6.0 cm (M6). The area and volume of each experimental mask was measured and both measurements had a positive correlation with the set distances. Among the experimental masks, M2 was the most breathable. The heat between the face and the mask created by exhalation was able to escape from the mask and provided the highest comfort sensation when worn. Conversely, an internal volume that is too large would decrease its comfort because repetitive breathing deforms the appearance of the mask and adversely affects its fit. Therefore, creating and maintaining the optimal internal volume of the M2 mask is important to achieve maximum thermal sensation and ease of wear.