• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.1277-1280
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• 2005

A high-aspect-ratio and high-resolution stainless steel shadow mask for organic thin-film transistors (OTFTs) circuit has been fabricated by a new method which combines photochemical machining, micro-electrical discharge machining (micro-EDM), and electrochemical etching (ECE). First, connection lines and source-drain holes are roughly machined by photochemical etching, and then the part of source and drain holes is finished by the combination of micro-EDM and ECE processes. Using this method a $100\;\mu{m}$ thick stainless steel (AISI 304) shadow mask for inverter can be fabricated with the channel length of $30\;\mu{m}\;and\;10\;\mu{m}\;respectively.\;The\;width\;of\;connection line\;is\;150\;\mu{m}$. The aspect ratio of the wall is about 5 and 15, respectively. Metal lines and source-drain electrodes of OTFTs were successfully deposited through the fabricated shadow mask.

• Journal of the Korean Society for Precision Engineering
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• v.22 no.1
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• pp.199-206
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• 2005

Mask manufacturing is a high COC and COO process in developing of semiconductor devices because of mask production tool with high resolution. Direct writing has been thought to be the one of the patterning method to cope with development or small-lot production of the device. This study consists two categories. One is the additional process of the direct and maskless patterning generation using SLA for easy and convenient application and the other is a removal process using wet-etching process. In this study, cured status of epoxy pattern is most important parameter because of the beer-lambert law according to the diffusion of UV light. In order to improve the contact force between patterns and substrate, prime process was performed and to remove the semi-cured resin which makes a bad effects to the pattern, spin cleaning process using TPM was also performed. At a removal process, contact force between photo-curable resin as an etching mask and Si wafer is important parameter.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 1999.08a
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• pp.403-411
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• 1999

The steel plate for shadow mask is used in a Cathode-ray tube of TV monitor and is the strictest product in surface quality because hundreds thousand of holes are perforated in a plane of 25 ${\times}$25 inches. To mass-produce this product, a reversible cold rolling mill for silicon steel was used and the rolling technology and the activity for quality improvement are described in this work. Because the steel plate is a mild steel, which is very sensitive to strip-breakage even in a low tension, we reset the minimum tension values matching to the operating conditions. The roll mark due to the multi-segmented araangement of shape controlling roll was prevented by hardening the intermediate shape controlling roll and by changing the existing working-roll into a HSS (Hig Speed Steel) roll. The scratch caused by the speed difference between a idle roll and a strip was prevented by increasing the roll roughness. With these activities, the steel plate for shadow mask can be stable. The continuous improvement of quality is, however, required for the customer satisfaction both of domestic and overseas market.

• Journal of the Korean Society of Laryngology, Phoniatrics and Logopedics
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• v.19 no.1
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• pp.54-57
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• 2008

Non-visualization of larynx is one of the reasons for failure of vocal fold surgery. Many otorhinolaryngologists may have a trouble in choice of alternative treatment if they experience this situation. The laryngeal mask airway could be alternative approach for this situation. We report a glottal papillomatous patient who was treated by pulsed dye laser via laryngeal mask airway after failure of vocal fold surgery via endotracheal intubation. The patient was a 73-year-old man. Laryngoscopy revealed a severe diffuse papillomatous lesion on right true vocal cord, anterior commissure, and partial left true vocal cord. The patient was refered for difficult laryngeal exposure during laryngomicrosurgey under general endotracheal anesthesia.

• Transactions of the Korean Society for Noise and Vibration Engineering
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• v.15 no.5 s.98
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• pp.595-603
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• 2005

In this work, the multiple dynamic absorber( MDA ) is introduced to reduce several vibration modes of shadow mask simultaneously and its design method is developed from the theory of the simple dynamic absorber. When designing the dynamic absorber, there are three significant design parameters such as mass, damping ratio and tuning frequency. Therefore the sensitivity analysis for those parameters has been executed in order to find out the design criteria of multiple dynamic absorber using the finite element model of shadow mask. The multiple dynamic absorber(MDA) designed by the proposed method is tested theoretically and experimentally to estimate the efficiency of vibration reduction. From the results, it is verified that the method is feasible to apply the system having the multiple nitration modes and more efficient than the thin wire-type damper used commercially to reduce the vibration of shadow mask.

• The Journal of Korean Institute of Communications and Information Sciences
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• v.35 no.8B
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• pp.1188-1196
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• 2010

In this paper, worldwide standards and regulations on in-band/out-of-band emission characteristics of DMB broadcasting equipments are reviewed, and emission mask requirements of terrestrial low power DMB repeater under 10mW/MHz are analyzed. Out-of-band emission mask drafts suitable for single/multiple block low power repeaters are proposed. Validity and usefulness of the proposed drafts is evaluated and verified in the several experiments. Using the proposed standard, small-sized and cost-effective DMB repeater can be easily implemented to broaden DMB broadcasting coverage by reducing weak signal areas.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.20 no.11
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• pp.925-931
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• 2007

We successively fabricated the Ni metal mask by additive method and evaluated the effects of wetting agents addition on the microstructure, hardness, and friction coefficient. In the process, the additive patterns with fine hole and pitch were made by photolithography technique and subsequently Ni plate was electroformed on the patterns. We found that the microstructure and mechanical properties were significantly varied when the different combinations of the wetting agents were used. When the wetting agents of both SF-1 and SF-2 were added, the microstructure consisted of crystal and amorphous phases, the grain size reduced to 5-40 nm, the RMS value decreased to 11.4 nm and the wear resistance improved. In addition, the hardness was as high as 638 Hv which is higher than that of commercial stainless steel mask and this improvement is probably due to the presence of amorphous Phase and fine grain size. The improvement of the wear resistance can provide a higher reliability and a longer service life.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.8 s.185
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• pp.39-46
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• 2006

Nano-scale fabrication of silicon substrate based on the use of atomic force microscopy (AFM) was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of damaged layer on silicon substrate by a simple scratching process, has been applied instead of conventional silicon cantilever for scanning. A thin mask layer forms in the substrate at the diamond tip-sample junction along scanning path of the tip. The mask layer withstands against wet chemical etching in aqueous KOH solution. Diamond tip acts as a patterning tool like mask film for lithography process. Hence these sequential processes, called tribo-nanolithography, TNL, can fabricate 2D or 3D micro structures in nanometer range. This study demonstrates the novel fabrication processes of the micro cantilever and diamond tip as a tool for TNL using micro-patterning, wet chemical etching and CVD. The developed TNL tools show outstanding machinability against single crystal silicon wafer. Hence, they are expected to have a possibility for industrial applications as a micro-to-nano machining tool.

• Journal of the Korean Society for Precision Engineering
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• v.17 no.8
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• pp.100-105
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• 2000

In this study the structural design concepts of main parameters of a Cathode Ray Tube(CRT) such as frame spring and shadow mask were proposed to guarantee a failure-proof CRT under mechanical shock. With computer simulation and experiments some information on the structural design concept was obtained as followings: the frame and the shadow mask of the CRT needed designing to increase strength so double-beads shape at the corner of frame was newly designed for it, And the spring which interconnected frame with panel glass was required to deform elastically for the purpose of absorbing the shock energy in the direction of drop. A new type of spring 'twisting spring' was designed to achieve the flexibility in that direction. By using it the deformation energy of a shadow mask could reduced to some degree. To accomplish those simulations commerical codes Pam-Crash and I-DEAS were used and a typical CRT was analyzed as an example to prove the usefulness of this study.

• Journal of the Korean Society of Clothing and Textiles
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• v.45 no.5
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• pp.825-839
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• 2021

This study aims to develop jacquard fashion masks using traditional patterns and investigates the preference and emotions of consumers for them. Nine patterns were designed with the motifs of plum flower, turtle, and geometric patterns using an Adobe Illustrator program. After that, 20 kinds of jacquard fabrics were developed using those patterns, and prototype masks were made. Furthermore, data were collected using a survey of 231 adult consumers to understand the emotional images evoked by jacquard fashion masks with traditional patterns. The results of the research show that the emotional dimension derived from jacquard fashion masks with traditional patterns consists of seven factors: luxurious image, frugal image, feminine image, oriental image, sporty image, geometrical image, generous image. We found that consumers preferred the M6 with the plum flower pattern as the motif as the most preferred design, while M13 with the geometric pattern as the motif was the lowest preferred.