• Title/Summary/Keyword: Korean Films

Search Result 15,174, Processing Time 0.049 seconds

Adaptive Data Hiding Techniques for Secure Communication of Images (영상 보안통신을 위한 적응적인 데이터 은닉 기술)

  • 서영호;김수민;김동욱
    • The Journal of Korean Institute of Communications and Information Sciences
    • /
    • v.29 no.5C
    • /
    • pp.664-672
    • /
    • 2004
  • Widespread popularity of wireless data communication devices, coupled with the availability of higher bandwidths, has led to an increased user demand for content-rich media such as images and videos. Since such content often tends to be private, sensitive, or paid for, there exists a requirement for securing such communication. However, solutions that rely only on traditional compute-intensive security mechanisms are unsuitable for resource-constrained wireless and embedded devices. In this paper, we propose a selective partial image encryption scheme for image data hiding , which enables highly efficient secure communication of image data to and from resource constrained wireless devices. The encryption scheme is invoked during the image compression process, with the encryption being performed between the quantizer and the entropy coder stages. Three data selection schemes are proposed: subband selection, data bit selection and random selection. We show that these schemes make secure communication of images feasible for constrained embed-ded devices. In addition we demonstrate how these schemes can be dynamically configured to trade-off the amount of ded devices. In addition we demonstrate how these schemes can be dynamically configured to trade-off the amount of data hiding achieved with the computation requirements imposed on the wireless devices. Experiments conducted on over 500 test images reveal that, by using our techniques, the fraction of data to be encrypted with our scheme varies between 0.0244% and 0.39% of the original image size. The peak signal to noise ratios (PSNR) of the encrypted image were observed to vary between about 9.5㏈ to 7.5㏈. In addition, visual test indicate that our schemes are capable of providing a high degree of data hiding with much lower computational costs.

Reactivities of Di-iso-butylnitrosoamine by Anodic Film Formed on Metals (산화피막전극을 이용한 디이소부틸니트로소아민의 전극반응)

  • Hwang Kum-Sho
    • Korean Journal of Fisheries and Aquatic Sciences
    • /
    • v.14 no.2
    • /
    • pp.94-102
    • /
    • 1981
  • To investigate the characteristics of anodic film formed on metals and the reactivities of organic inhibitor Di-iso-butylnitrosoamine (DBNA) in sea water. the cathodic reactions of anodic film formed on metals were carried out by using the potential drop method and galvanostatic method at $25^{\circ}C$. The investigated results are as follows: The anodic films formed on aluminum and zinc in 60mM $DBNA+9\%_{\circ}$ sea water did not show-changes of potential drop. However, those formed on lead and copper were reasonable electrodes. It was concluded that cathodic reactivities of proton through the anodic film in aqueous solution were constant without regard to the kinds of metals used with anodic film electrode at operated current density ranges, because the values of transition time obtained in 0.5M sodium chloride solution and $9\%_{\circ}$ sea water nearly coincided. The values of transition time of the first step by the galvanostatic method were obtained from 0.22 to 1.40 sec ranges far less than one minute. Therefore, it suggested that cathodic reactions of proton through the anodic film were mainly controlled by diffusion/adsorption process. The differences of between $\tau_{1}/4$ in $9\%_{\circ}$ sea water and $\tau_{1}/4$ in 60mM $DBNA+9\%_{\circ}$ sea water, and between $E_{1}/4$ in sea water and $E_{1}/4$ in 60mM $DBNA+9\%_{\circ}$ sea water at the constant current density with $1.9\times10^{-4}\sim5.0{\times}10^{-6}\;amp/cm^2$ were 0.06 sec and 0.53 v. respectively and cathodic reactions of DBNA on the anodic film electrodes were chiefly controlled by adsorption/diffusion process. The reason that adsorption quantities of proton on anodic film formed on aluminum and zinc in aqueous solutions were much more than those on lead and copper, seems to lie due mostly to the number of porosity produced on anodic film used.

  • PDF

An Analysis of the Use of Media Materials in School Health Education and Related Factors in Korea (학과보건교육에서의 매체활용실태 및 영향요인 분석)

  • Kim, Young-Im;Jung, Hye-Sun;Ahn, Ji-Young;Park, Jung-Young;Park, Eun-Ok
    • Journal of the Korean Society of School Health
    • /
    • v.12 no.2
    • /
    • pp.207-215
    • /
    • 1999
  • The objectives of this study are to explain the use of media materials in school health education with other related factors in elementary, middle, and high schools in Korea. The data were collected by questionnaires from June to September in 1998. The number of subjects were 294 school nurses. The PC-SAS program was used for statistical analysis such as percent distribution, chi-squared test, spearman correlation test, and logistic regression. The use of media materials in health education has become extremely common. Unfortunately, much of the early materials were of poor production quality, reflected low levels of interest, and generally did little to enhance health education programming. A recent trend in media materials is a move away from the fact filled production to a more affective, process-oriented approach. There is an obvious need for health educators to use high-quality, polished productions in order to counteract the same levels of quality used by commercial agencies that often promote "unhealthy" lifestyles. Health educators need to be aware of the advantages and disadvantages of the various forms of media. Selecting media materials should be based on more than cost, availability, and personal preference. Selection should be based on the goal of achieving behavioral objectives formulated before the review process begins. The decision to use no media materials rather than something of dubious quality usually be the right decision. Poor-quality, outdated, or boring materials will usually have a detrimental effect on the presentation. Media materials should be viewed as vehicles to enhance learning, not products that will stand in isolation. Process of materials is an essential part of the educational process. The major results were as follows : 1. The elementary schools used the materials more frequently. But the production rate of media materials was not enough. The budget was too small for a wide use of media materials in school health education. These findings suggest that all schools have to increase the budget of health education programs. 2. Computers offer an incredibly diverse set of possibilities for use in health education, ranging from complicated statistical analysis to elementary-school-level health education games. But the use rate of this material was not high. The development of related software is essential. Health educators would be well advised to develop a basic operating knowledge of media equipment. 3. In this study, the most effective materials were films in elementary school and videotapes in middle and high school. Film tends to be a more emotive medium than videotape. The difficulties of media selection involved the small amount of extant educational materials. Media selection is a multifaceted process and should be based on a combination of sound principles. 4. The review of material use following student levels showed that the more the contents were various, the more the use rate was high. 5. Health education videotapes and overhead projectors proved the most plentiful and widest media tools. The information depicted was more likely to be current. As a means to display both text and graphic information, this instructional medium has proven to be both effective and enduring. 6. An analysis of how effective the quality of school nurse and school use of media materials shows a result that is not complete (p=0.1113). But, the budget of health education is a significant variable. The increase of the budget therefore is essential to effective use of media materials. From these results it is recommended that various media materials be developed and be wide used.

  • PDF

Study of Stress Changes in Nanocrystalline CoW Thin/Thick Film Alloys Eletrodeposited from Citrate Baths (Citrate Baths로부터 전기도금된 나노결정립 CoW 합금 박막/후막의 응력변화에 대한 연구)

  • Cho, Ik-Jong;Park, Deok-Yong;Ihn, Hyun-Man
    • Journal of the Korean Electrochemical Society
    • /
    • v.9 no.4
    • /
    • pp.141-150
    • /
    • 2006
  • Nanocrystalline CoW thin/thick film alloys were electodeposited from citrate baths to investigate the influences of metal ion concentration, current density and solution pH on chemical composition, current efficiency, residual stress, surface morphology, and microstructure of the film. Deposit W (tungsten) content in CoW thin/thick film increased with increasing W ion concentration, current density, and solution pH in the plating bath. It was observed that residual stress in CoW thin/thick film decreased with increasing W ion concentration and solution pH. CoW thin film exhibited mixed phases of hop Co [(100) and (002)] and hcp $Co_3W$ [(002) and (201)] at W ion concentration with 0.02 to 0.08 M. The microstructure of CoW thin film at W ion concentration of 0.1 to 0.2 M was close to amorphous phase. The dominant phases were found to be hop Co (002) and hop $Co_3W$ [(200), (002) and (201)] at the current densities of 5, 10, 25, and $100mA{\cdot}cm^{-2}$ CoW thin film at the current densities of 50 and $75mA{\cdot}cm^{-2}$ was close to amorphous phase. At solution pH 8.7, CoW thin film exhibited hcp Co (002) and hop $Co_3W$ [(200), (002) and (201)]. Below solution pH 8.7, CoW thin film exhibited amorphous microstructure. The optimum electrodeposition conditions for CoW thin/thick film were found to be W ion concentration of 0.08 M, current density of $10mA{\cdot}cm^{-2}$, and solution pH 8.7.

Introduction and feasibility study of the HD-270 MLC (HD-270 MLC의 소개 및 유용성평가)

  • Kim Dae Young;Kim Won Taek;Lee Hwa Jung;Lee Kang Hyeok
    • The Journal of Korean Society for Radiation Therapy
    • /
    • v.15 no.1
    • /
    • pp.1-9
    • /
    • 2003
  • I. Purpose The multileaf collimator(MLC) has many advantages, but use of the MLC increased effective penumbra and isodose undulation in dose distribution compared with that of an alloy block. In this work, we introduced the HD-270 MLC, which can improve the above disadvantages of MLC, and reported its feasibility study. II. Method and Materials The HD-270 MLC is a technique which combines the use of the existing Siemens multileaf collimator(3D MLC) with patient translation perpendicular to the leaf plane. The technique produces a smoothed isodose distribution with the reduced isodose undulation and effective penumbra. To assess the efficacy of the HD-270 technique and determine the appropriate resolution, a polygonal shaped MLC field was made to produce field edge angles from 0 degree to 75 degree with a step of 15 degree. Each HD-270 group was generated according to the allowed resolution, i. e., 5, 3, and 2mm. The experiment was carried out on Primus, a Siemens linear accelerator configured with HD-270 MLC. The total 60 MU of 6 MV photon beam was delivered to X-Omat film(Kodak, USA) at a SAD of 100 cm and 1.5 cm depth in solid water phantom. Exposed films were scanned by Lumiscan75(LUMISYS) and analyzed using RIT113 software(Radiological Imaging Technology Inc., USA). To test the mechanical accuracy of table movement, the transverse, longitudinal, and vertical positions were controlled by a consol with ${\pm}5\;mm,\;{\pm}4\;mm,\;{\pm}3\;mm,\;and\;{\pm}2\;mm$ steps, and then measured using a dial gauge with an accuracy of 0.001 inch. During the experiments, the table loaded with about 50Kg human phantom to simulate the real treatment situation. III. Results The effective penumbra and isodose undulation became larger with increase the resolution and field edge angle. The accuracy of the table movement on each direction is good within the ${\pm}1\;mm$. IV. Conclusion Clinical use of the MLC can be increased by using of the HD-270 MLC which complements to the disadvantages of the MLC.

  • PDF

The Design and Fabrication of Conversion Layer for Application of Direct-Detection Type Flat Panel Detector (직접 검출형 평판 검출기 적용을 위한 변환층 설계 및 제작)

  • Noh, Si-Cheol;Kang, Sang-Sik;Jung, Bong-Jae;Choi, Il-Hong;Cho, Chang-Hoon;Heo, Ye-Ji;Yoon, Ju-Seon;Park, Ji-Koon
    • Journal of the Korean Society of Radiology
    • /
    • v.6 no.1
    • /
    • pp.73-77
    • /
    • 2012
  • Recently, Interest to the photoconductor, which is used to flat form X-ray detector such as a-Se, $HgI_2$, PbO, CdTe, $PbI_2$ etc. is increasing. In this study, the film layer by using the photoconductive material with particle sedimentation was fabricated and evaluated. The quantization efficiency of the continuous X-ray with the 70 kVp energy bandwidth was analyzed by using the Monte Carlo simulation. With the results, the thickness of film with 64 % quantization efficiency was 180 ${\mu}m$ which is similar to the efficiency of 500 ${\mu}m$ a-Se film. And $HIg_2$ film has the high quantization efficiency of 74 % on 240 ${\mu}m$ thickness. The electrical characteristics of the 239 ${\mu}m$ $Hgl_2$ films produced by particle sedimentation were shown as very low dark current(under 10 $pA/mm^2$), and high sensitivity(19.8 mC/mR-sec) with 1 $V/{\mu}m$ input voltage. The SNR, which is influence to the contrast of X-ray image, was shown highly as 3,125 in low driving voltage on 0.8 $V/{\mu}m$. With the results of this study, the development of the low-cost, high-performance image detector with film could be possible by replacing the film produced by particle sedimentation instead to a-Se detector.

New Approaches for Overcoming Current Issues of Plasma Sputtering Process During Organic-electronics Device Fabrication: Plasma Damage Free and Room Temperature Process for High Quality Metal Oxide Thin Film

  • Hong, Mun-Pyo
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2012.02a
    • /
    • pp.100-101
    • /
    • 2012
  • The plasma damage free and room temperature processedthin film deposition technology is essential for realization of various next generation organic microelectronic devices such as flexible AMOLED display, flexible OLED lighting, and organic photovoltaic cells because characteristics of fragile organic materials in the plasma process and low glass transition temperatures (Tg) of polymer substrate. In case of directly deposition of metal oxide thin films (including transparent conductive oxide (TCO) and amorphous oxide semiconductor (AOS)) on the organic layers, plasma damages against to the organic materials is fatal. This damage is believed to be originated mainly from high energy energetic particles during the sputtering process such as negative oxygen ions, reflected neutrals by reflection of plasma background gas at the target surface, sputtered atoms, bulk plasma ions, and secondary electrons. To solve this problem, we developed the NBAS (Neutral Beam Assisted Sputtering) process as a plasma damage free and room temperature processed sputtering technology. As a result, electro-optical properties of NBAS processed ITO thin film showed resistivity of $4.0{\times}10^{-4}{\Omega}{\cdot}m$ and high transmittance (>90% at 550 nm) with nano- crystalline structure at room temperature process. Furthermore, in the experiment result of directly deposition of TCO top anode on the inverted structure OLED cell, it is verified that NBAS TCO deposition process does not damages to the underlying organic layers. In case of deposition of transparent conductive oxide (TCO) thin film on the plastic polymer substrate, the room temperature processed sputtering coating of high quality TCO thin film is required. During the sputtering process with higher density plasma, the energetic particles contribute self supplying of activation & crystallization energy without any additional heating and post-annealing and forminga high quality TCO thin film. However, negative oxygen ions which generated from sputteringtarget surface by electron attachment are accelerated to high energy by induced cathode self-bias. Thus the high energy negative oxygen ions can lead to critical physical bombardment damages to forming oxide thin film and this effect does not recover in room temperature process without post thermal annealing. To salve the inherent limitation of plasma sputtering, we have been developed the Magnetic Field Shielded Sputtering (MFSS) process as the high quality oxide thin film deposition process at room temperature. The MFSS process is effectively eliminate or suppress the negative oxygen ions bombardment damage by the plasma limiter which composed permanent magnet array. As a result, electro-optical properties of MFSS processed ITO thin film (resistivity $3.9{\times}10^{-4}{\Omega}{\cdot}cm$, transmittance 95% at 550 nm) have approachedthose of a high temperature DC magnetron sputtering (DMS) ITO thin film were. Also, AOS (a-IGZO) TFTs fabricated by MFSS process without higher temperature post annealing showed very comparable electrical performance with those by DMS process with $400^{\circ}C$ post annealing. They are important to note that the bombardment of a negative oxygen ion which is accelerated by dc self-bias during rf sputtering could degrade the electrical performance of ITO electrodes and a-IGZO TFTs. Finally, we found that reduction of damage from the high energy negative oxygen ions bombardment drives improvement of crystalline structure in the ITO thin film and suppression of the sub-gab states in a-IGZO semiconductor thin film. For realization of organic flexible electronic devices based on plastic substrates, gas barrier coatings are required to prevent the permeation of water and oxygen because organic materials are highly susceptible to water and oxygen. In particular, high efficiency flexible AMOLEDs needs an extremely low water vapor transition rate (WVTR) of $1{\times}10^{-6}gm^{-2}day^{-1}$. The key factor in high quality inorganic gas barrier formation for achieving the very low WVTR required (under ${\sim}10^{-6}gm^{-2}day^{-1}$) is the suppression of nano-sized defect sites and gas diffusion pathways among the grain boundaries. For formation of high quality single inorganic gas barrier layer, we developed high density nano-structured Al2O3 single gas barrier layer usinga NBAS process. The NBAS process can continuously change crystalline structures from an amorphous phase to a nano- crystalline phase with various grain sizes in a single inorganic thin film. As a result, the water vapor transmission rates (WVTR) of the NBAS processed $Al_2O_3$ gas barrier film have improved order of magnitude compared with that of conventional $Al_2O_3$ layers made by the RF magnetron sputteringprocess under the same sputtering conditions; the WVTR of the NBAS processed $Al_2O_3$ gas barrier film was about $5{\times}10^{-6}g/m^2/day$ by just single layer.

  • PDF

Groundwater and Soil Environment of Plastic Film House Fields around Central Part of Korea (우리나라 중부지방의 시설원예 토양 및 지하수 환경)

  • Kim, Jin-Ho;Lee, Jong-Sik;Kim, Won-Il;Jung, Goo-Bok;Yun, Sun-Gang;Jung, Yeun-Tae;Kwun, Soon-Kuk
    • Korean Journal of Environmental Agriculture
    • /
    • v.21 no.2
    • /
    • pp.109-116
    • /
    • 2002
  • The objective of this study was to know the qualities of soil and shallow groundwater in plastic film house fields around Central Part of Korea. The study was conducted at 11 sites in Suweon, Hwasung, Pyungtaek, Yongin and Chuncheon through May to August in 1999. Soil textures of plastic films house were mainly sandy loam or loam. Electric conductivity and organic matter content of surface soils mostly exceeded the critical levels for crop production. Average concentration of $NO_3-N$ in the sha]low groundwater was 19.1 mg/L, and it reached almost the limiting level of agricultural groundwater quality (20 mg/L). Moreover about 36% of survey sites exceeded the limiting level of agricultural groundwater quality. Sulfate concentrations also at some sites exceeded agricultural groundwater quality limit level (50 mg/L). Nitrate-N, one of the most important factors in the groundwater quality, had positive correlations with other ions in foundwater.

Anti-corrosion properties for cross section of Mg films on galvalume steel coated by PVD process (PVD법에 의해 Mg 코팅된 갈바륨 도금강판의 단면부 내식특성)

  • Park, Jae-Hyeok;Kim, Sun-Ho;Park, Gi-Dong;Jeong, Jae-In;Yang, Ji-Hun;Lee, Gyeong-Hwang;Lee, Myeong-Hun
    • Proceedings of the Korean Institute of Surface Engineering Conference
    • /
    • 2018.06a
    • /
    • pp.65-65
    • /
    • 2018
  • 갈바륨 도금강판은 알루미늄의 우수한 차폐 특성과 내열성, 열 반사성을 가지며 아연의 희생방식 특성을 겸비하여 동일 부착량의 용융 아연도금 및 알루미늄 도금강판에 비해 우수한 내식성을 나타낸다고 알려져 있다. 또한 이것은 표면이 미려하고 경제성이 높아 건자재 용도로 현재까지도 세계적으로 널리 이용되고 있다. 여기서 지칭하는 바륨 도금강판(galvalume steel)은 아연과 알루미늄 도금강판의 장점을 접목하기 위해 55 Al-43.4 Zn-1.6 Si (wt.%)로 구성되어 개발된 3원계 성분의 합금도금강판이다. 한편, 최근에는 강재의 내식성을 향상시키기 위한 다양한 연구 결과에 의해 Zn-Al-Mg의 3원계 합금도금강판도 개발되어 사용되고 있다. 이것은 기존의 아연도금 강판 보다 10배 정도의 우수한 내식성을 나타내는 것으로 보고되고 있다. 특히, 이것은 도금된 평판부의 내식성은 물론 절단된 도금 단면부의 내식성도 매우 우수하다고 알려져 있다. 그러나 상기한 갈바륨 도금강판의 경우에는 도금된 표면부에 비해 단면부의 내식성이 상대적으로 취약한 것으로 알려져 있다. 따라서 본 연구에서는 갈바륨 도금강판의 내식성을 종합적으로 향상시키기 위하여 이 갈바륨 도금강판 상에 PVD 스퍼터링법에 의해 Mg 코팅막의 제작을 시도하였다. 여기서 Mg 코팅막은 후처리 된 갈바륨 도금강판 상에 Ar 공정압력 2 및 20 mTorr 조건 중 1.5 및 $3{\mu}m$ 두께로 제작하였다. 또한 제작한 코팅막에 대해서는 모폴로지 관찰(SEM) 및 결정구조 분석(XRD)을 하였고, 분극측정, 염수분무 시험(SST) 및 복합부식 시험(CCT)에 의해 표면 및 단면부의 내식성평가를 수행하였다. 또한 여기서는 염수분무 및 복합부식 시험 후의 시험편도 채취 하여 표면 및 단면부위에 대한 원소조성 분석(EPMA)과 결정구조 분석(XRD)을 실시하였다. 이상의 실험 결과에 의하면, 본 실험에서 제작한 Mg 코팅막은 그 두께가 두꺼울수록 표면 Mg 결정립의 크기가 증가하였고, 그 부식속도가 증가하는 경향을 나타내었다. 또한 여기서는 공정압력이 높은 조건에서 제작한 막일수록 Mg(002)면 피크 강도가 감소하고 Mg(101)면 피크의 배향성이 증가하였다. 그때 그 막의 내식성은 향상되는 경향을 나타내었다. 그리고 종합적으로 염수분무 및 복합부식 시험 결과에 의하면 Mg이 코팅된 갈바륨 도금강판은 기존 갈바륨 도금강판 보다 내식성이 현저히 향상되었다. 특히, 단면부 내식성의 경우에는 기존 대비 5배 이상 향상되는 경향을 나타내었다. 여기서 단면부 내식특성 분석을 위한 EPMA 원소조성 분석 결과에 의거하면, 부식 초기에는 마그네슘의 부식생성물에 의해 단면부가 치밀하게 보호되고 있음을 확인할 수 있었다. 그 이후에는 부식이 지속적으로 진행됨에 따라 갈바륨 도금층에서 용출된 알루미늄 및 아연 성분이 마그네슘과 함께 치밀한 부식생성물을 형성하여 단면부를 차폐함에 따라 단면부의 내식성이 크게 향상된 것으로 생각된다. 이러한 부식생성물의 결정구조 분석 결과에 따르면, 염수분무와 복합부식 시험에서는 공통적으로 MgO, $Mg(OH)_2$ 이외에도 Simonkolleite상 등이 형성되었다. 또한 건-습 반복 부식시험인 복합부식시험 후에는 $Mg_5(CO_3)_4(OH)_24H_2O$(Hydromagnesite)상 등이 형성됨을 확인할 수 있었다. 즉, 본 실험에서 후처리된 갈바륨 도금강판 상에 제작한 마그네슘 코팅막의 경우에는 상기와 같은 다양한 부식반응에 의해 표면 및 단면부에 형성된 Mg계 부식생성물과 $Zn_5(OH)_8Cl_2H_2O$(Simonkolleite)상에 의해서 표면은 물론 단면부 내식성이 크게 향상된 것으로 사료된다.

  • PDF

Degradation evaluation of paint films on surface treated steel by electrochemical impedance spectroscopy (전기화학적 임피던스 분광법에 의한 표면처리한 강재 도장의 부식-도막 열화도 평가)

  • Park, Jun-Mu;Park, Jae-Hyeok;Kim, Sun-Ho;U, Sang-Gyun;Gwon, Yong-Min;Mun, Gyeong-Man;Lee, Myeong-Hun
    • Proceedings of the Korean Institute of Surface Engineering Conference
    • /
    • 2018.06a
    • /
    • pp.95-95
    • /
    • 2018
  • 강재의 방식법 중 도장은 부식을 억제하는데 효과적이고 편리한 방법으로 선박 및 해양 강 구조물의 방식법으로 사용되고 있다. 한편, 강 구조물의 효율적인 유지관리를 위해서는 방식 도장의 도막 열화도를 평가하고 잔존 수명을 예측하여 최적 시기에 보수도장 혹은 재도장하는 것이 필요하다. 일반적으로 선박 및 해양구조물에 적용되는 도막의 방식 성능 평가 방법으로 해수 침지 시험, 염수 분무 시험, 옥외 폭로 시험 등이 있다. 그러나 이러한 시험들은 그 시험 방법에 따라서 정량적인 평가에 한계가 있음은 물론 장기간 소요되는 등 곤란한 문제점이 있다. 그러므로 선박 및 해양구조물을 비롯하여 교량, 각종 강 구조물의 도장 방식에 사용되는 방식용 도료의 성능을 단기간에 적절하게 평가할 수 있는 가속시험법이 제시되며 연구-사용되고 있다. 그 중 도막 방식 성능을 보다 효율적, 비파괴적, 정량적으로 평가할 수 있는 임피던스 분광법(EIS)과 같은 전기화학적 방법은 상대적으로 시험 기간을 크게 단축시킬 수 있고, 대상 방식 도장의 미세한 성능 차이도 분별 가능하다는 장점이 있다[1]. 따라서 본 연구에서는 선박 및 해양구조물 등 가혹한 부식환경에서 강력한 내구성을 가질 수 있도록 다양한 종류의 표면처리 도장 시편을 제작하여 자외선 조사-염수분무-침지환경 등의 열악한 환경조건 하에서 부식-열화 촉진 시험을 실시하였다. 그리고 그 촉진 열화 과정에서 도막의 외관 상태를 관찰 분석함은 물론 전기화학적 임피던스 분광법을 병행 측정하며 그 표면막의 부식 및 도막 열화도를 비교-종합 평가하였다.본 연구에 사용된 시편은 Al 및 Zn 도금 강판에 에폭시, 에폭시-실리콘 우레탄, 에폭시-우레탄 도장 시편으로 Scribe, No Scribe 및 비교재 Al 및 Zn 도금 시편으로 분류하여 각각 실험을 진행하였다. 즉, 도막 열화 시험은 복합 노화 시험법으로 UV 조사 36 시간(ASTM G53), 염수분무 32 시간(ISO 7253), 수분 응축 10 시간을 1 Cycle로 100 Cycle(7800 시간) 동안 실험을 진행하였다. 이때 도막 열화도 평가는 전기화학적 임피던스 분광법을 이용하여 각 실험 조건별로 주파수에 따른 임피던스(Z) 값을 평가하였다. 즉, 상온 $25^{\circ}C$의 3.5% NaCl 100 ml 수용액에 작동 전극(Working Electrode)과 구리 도선을 통해 연결하였고, 노출 면적은 $1cm^2$로 일정하게 유지 하였으며, 상대 전극(Counter Electrode)은 탄소봉, 기준 전극(Reference Electrode)으로 포화카로멜전극(Saturated Calomel Electrode)을 사용하여 측정하였다. No Scribe 시편의 경우에는 Al 기판 에폭시-실리콘 우레탄 도장 시편이 우수한 도막 저항성을 나타내었으며, 에폭시-우레탄 도장시편은 23사이클 이후의 저항값이 가장 낮게 나타났다. Zn 기판의 경우는 에폭시, 에폭시-실리콘 우레탄, 에폭시-우레탄 도장 시편 모두 저항 값이 유사하였으며, Al 및 Zn 도금 시편은 도장 처리된 시편에 비해 훨씬 낮은 저항 값을 보였다. 또한 Scribe 시편의 경우에는 Al 기판 에폭시-실리콘 우레탄 도장 시편에서 높은 초기 저항 값을 보였으며, 23 사이클 후의 저항 값은 세 종류의 도막에서 약 1~0.1 Gohm 으로 나타났다. 그리고 Zn 기판 에폭시-실리콘 우레탄 도장 시편에서 가장 낮은 도막 저항 값이 나타났다. 이상의 실험을 통해서 본 연구 내용은 실내촉진시험으로 선박 및 해양 강 구조물에 사용되는 다양한 종류의 도막의 열화도를 평가하는 기초 설계 지침으로 응용될 수 있을 것으로 사료된다. 한편, 도막은 노출 환경에 따라 방식 성능이 다르므로 실제 도막의 사용환경을 고려하여 도장 사양별 적용 부위에 따른 적정 가속 실험 방법을 선정할 필요가 있다고 사료된다.

  • PDF