• Title/Summary/Keyword: Ito Junji

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Study on Cruelty in the Horror Comics : Focusing on of Ito Junji (공포만화의 잔혹성에 관한 연구 : 이토준지의 <토미에>를 중심으로)

  • An, So-Mi
    • Cartoon and Animation Studies
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    • s.23
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    • pp.19-33
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    • 2011
  • There are the various genres such as current affairs, romance, academy, Wuxia, sports, psychology, learning, living and horror in cartoons. Among them, the horror comics are based on the story full of real or realistic subject or exaggerated imagination. The horror comic by Ito Junji have gone through the various printings for the classes of readers since it was introduced in this country. This study has begun from necessity of research on the effect of the horror comics genre on the readers by analysis. among Ito Junji's horror comics makes its own cruel horror image by giving a very unrealistic situation to the usual structure of horror genre. The cruel horror comics rouse significance of the analysis of the genre as one genre of the comics. has the 'catastrophe' effect for the readers who want to enjoy and deny it at the same time by stubbornly describing aspect of 'cruelty' of the horror things. This study aims to research 'cruelty of portrayal' of in terms of human psychology.

Gas phase diagnostics of high-density $SiH_4/H_2$ microwave plasma

  • Toyoda, Hirotaka;Kuroda, Toshiyuki;Ikeda, Masahira;Sakai, Junji;Ito, Yuki;Ishijima, Tatsuo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.94-94
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    • 2010
  • As a new plasma source for the plasma enhanced chemical vapor deposition (PCVD) of ${\mu}c$-Si deposition, we have demonstrated a microwave-excited plasma source, which can produce high density (${\sim}10^{12}\;cm^{-3}$) plasma with low electron temperature (~1 eV) and low plasma potential (~10 V). In this plasma source, microwave power radiated from slot antenna is distributed along the plasma-dielectric interface in large area and this enables us to produce uniform high-density plasma in large area. To optimize deposition conditions, deep understanding of gas phase chemistry is indispensable. In this presentation, we will discuss on the gas phase diagnostics of microwave $SiH_4/H_2$ plasma such as $SiH_4$ dissociation or $SiH_3$ radical profile as well as deposited film properties.

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