• Title/Summary/Keyword: Ion-deposition

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The advancing techniques and sputtering effects of oxide films fabricated by Stationary Plasma Thruster (SPT) with Ar and $O_2$ gases

  • Jung Cho;Yury Ermakov;Yoon, Ki-Hyun;Koh, Seok-Keun
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.216-216
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    • 1999

  • The usage of a stationary plasma thruster (SPT) ion source, invented previously for space application in Russia, in experiments with surface modifications and film deposition systems is reported here. Plasma in the SPT is formed and accelerated in electric discharge taking place in the crossed axial electric and radial magnetic fields. Brief description of the construction of specific model of SPT used in the experiments is presented. With gas flow rate 39ml/min, ion current distributions at several distances from the source are obtained. These was equal to 1~3 mA/$\textrm{cm}^2$ within an ion beam ejection angle of $\pm$20$^{\circ}$with discharge voltage 160V for Ar as a working gas. Such an extremely high ion current density allows us to obtain the Ti metal films with deposition rate of $\AA$/sec by sputtering of Ti target. It is shown a possibility of using of reactive gases in SPT (O2 and N2) along with high purity inert gases used for cathode to prevent the latter contamination. It is shown the SPT can be operated at the discharge and accelerating boltages up to 600V. The results of presented experiments show high promises of the SPT in sputtering and surface modification systems for deposition of oxide thin films on Si or polymer substrates for semiconductor devices, optical coatings and metal corrosion barrier layers. Also, we have been tried to establish in application of the modeling expertise gained in electric and ionic propulsion to permit numerical simulation of additional processing systems. In this mechanism, it will be compared with conventional DC sputtering for film microstructure, chemical composition and crystallographic considerations.

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Microstructure Analysis of Fe Thin Films Prepared by Ion Beam Deposition (이온빔 증착법에 의해 제조된 철박막의 미세조직 분석)

  • Kim, Ka Hee;Yang, Jun-Mo;Ahn, Chi Won;Seo, Hyun Sang;Kang, Il-Suk;Hwang, Wook-Jung
    • Korean Journal of Metals and Materials
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    • v.46 no.7
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    • pp.458-463
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    • 2008

  • High purity Fe thin films were prepared by the ion beam deposition method with $^{56}Fe^{+}$ions on the Si substrate at the room temperature. The Fe thin films were deposited at the ion energy of 50 eV and 100 eV. Microstructural properties were investigated on the atomic scale using high-resolution transmission electron microscopy (HRTEM). It was found that the Fe thin film obtained with the energy of 50 eV having an excellent corrosion resistance consists of the amorphous layer of ~15 nm in thickness and the bcc crystalline layer of about 30 nm in grain size, while the thin film obtained with the energy of 100 eV having a poor corrosion resistance consists of little amorphous layer and the defective crystalline layer. Furthermore the crystal structures and arrangements of the oxide layers formed on the Fe thin films were analyzed by processing of the HRTEM images. It was concluded that the corrosion behavior of Fe thin films relates to the surface morphology and the crystalline structure as well as the degree of purification.

  • KSCI

PIII&D (Plasma immersion ion implantation & deposition) 기술을 이용하여 제조된 NbN 박막이 인공관절용 UHMWPE 소재의 마모에 미치는 영향 평가

  • Park, Won-Ung;Kim, Eun-Gyeom;Mun, Seon-U;Kim, Gyeong-Hun;Im, Sang-Ho;Han, Seung-Hui
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.228-228
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    • 2012

  • 인공관절은 노인성 질환이나 자가 면역질환, 신체적인 외상 등으로 인하여 발생하는 관절의 손상 부위를 대체하기 위하여 고안된 관절의 인공 대용물이다. 인공 관절 중 인공 고관절의 경우 관절 운동을 하는 라이너(Liner)와 헤드(Head) 부분이 마모에 관여하여 인공관절의 수명에 영향을 미치게 되는데, 헤드 소재로서는 Co-Cr-Mo 합금이, 라이너 소재로서는 고분자 소재인 UHMWPE (Ultra High Molecular Weight Polyethylene)가 주로 사용되고 있다. 이러한 MOP (Metal-On-Polymer) 구조의 인공관절의 경우, 충격흡수의 장점이 있는 반면, 관절 운동시 발생하는 UHMWPE의 wear debris에 의한 골용해로 인하여 관절이 느슨해지는 문제점이 발생하여 재시술을 필요로 하게 된다. 또한 메탈 헤드의 마모로 인한 금속이온의 용출은 세포 독성의 문제를 야기하여 인공관절의 수명을 낮추는 또 하나의 요인이 되고 있다. 이러한 문제점들을 해결 하기 위하여, 본 연구에서는 PIII&D (Plasma Immersion Ion Implantation & Deposition)공정을 이용하여 Co-Cr-Mo 합금 소재 위에 niobium nitride (NbN) 박막을 증착하여 상대재인 UHMWPE의 마모를 줄이고자 하는 연구를 진행하였다. 마모량의 감소를 위하여, 박막을 증착하기 전에 Co-Cr-Mo 합금 위에 질소를 이온주입 하는 pre-ion implantation 공정을 도입하였으며, Co-Cr-Mo 합금과 NbN박막 사이의 접착력을 증가시키기 위하여 박막의 증착 초기에 이온주입과 증착을 동시에 수행하는 dynamic ion mixing공정을 수행하였다. 실험 결과 pre-ion implantation 공정을 도입한 경우 현재 상용화 되어있는 Co-Cr-Mo 합금에 비하여 마모량을 2배 이상 감소시키는 것을 확인 할 수 있었으며, dynamic ion mixing 공정을 도입한 경우 장시간의 마모 시험에서도 UHMWPE의 마모량을 2배 가까이 줄일 수 있었다.

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