• Title/Summary/Keyword: Ion implantation technology

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Formation of Superhydrophobic Surfaces on Fluoropolymer Films Using Ion Implantation

  • Park, Yong-Woon;Jo, Yong-Jun;Jung, Chan-Hee;Hwang, In-Tae;Choi, Jae-Hak
    • Journal of Radiation Industry
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    • v.6 no.4
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    • pp.323-328
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    • 2012
  • In this study, a facile method to fabricate superhydrophobic surfaces on perfluoroalkoxy (PFA) films using ion implantation was developed. PFA films were implanted at 100 keV with a fluence ranging from $4{\times}10^{16}$ to $7{\times}10^{16}ions\;cm^{-2}$. The surface properties of the implanted films were investigated in terms of their surface morphology, wettability, and chemical composition. As the fluence increased to $6{\times}10^{16}ions\;cm^{-2}$, the surface morphology and surface roughness of the PFA films were dramatically changed. The PFA surface implanted at a fluence of $6{\times}10^{16}ions\;cm^{-2}$ showed a maximum contact angle (CA) of $157.1^{\circ}$, while the control CA of the smooth PFA surface was $103.6^{\circ}$. Thus, the superhydrophobic surface was successfully fabricated by ion implantation.

A Study on Development of Advanced Environmental-Resistant Materials Using Metal Ion Processing

  • Fujita Kazuhisa;Kim Hae-Ji
    • Journal of Mechanical Science and Technology
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    • v.20 no.10
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    • pp.1670-1679
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    • 2006
  • The development of the oxidation, wear and corrosion resistant materials that could be used in severe environmental conditions is needed. The elementary technologies for surface modification include ion implantation and/or thin film coating. Furthermore, in order to develop ion implantation technique to the specimens with three-dimensional shapes, plasma-based ion implantation (PBII) techniques were investigated. As a result, it was found that the ion implantation and/or thin film coating used in this study were/was effective for improving the properties of materials, which include implantations of various kinds of ions into TiAl alloy, TiN films formed on surface of base material and coatings in high-temperature steam. The techniques proposed in this study provide useful information for all of the material systems required to use at elevated temperature. For the practical applications, several results will be presented along with laboratory test results.

Development of High Flux Metal Ion Plasma Source for the Ion Implantation and Deposition

  • Kim, Do-Yun;Lee, Eui-Wan
    • Journal of Korean Vacuum Science & Technology
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    • v.7 no.2
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    • pp.45-56
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    • 2003
  • A high flux metal plasma pulse ion source, which can simultaneously perform ion implantation and deposition, was developed and tested to evaluate its performance using the prototype. Flux of ion source was measured to be 5 A and bi-polar pulse power supply with a peak voltage of 250 V, repetition of 20 Hz and width of 100 ${\mu}\textrm{s}$ has an output current of 2 kA and average power of 2 kW. Trigger power supply is a high voltage pulse generator producing a peak voltage of 12 kV, peak current of 50 A and repetition rate of 20 Hz. The acceleration column for providing target energy up to ion implantation is carefully designed and compatible with UHV (ultra high vacuum) application. Prototype systems including various ion sources are fabricated for the performance test in the vacuum and evaluated to be more competitive than the existing equipments through repeated deposition experiments.

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Effects of Nitrogen Ion Implantation on the Surface Properties of 316L Stainless Steel as Bipolar Plate for PEMFC (고분자전해질 연료전지 분리판용 316L 스테인리스강의 표면특성에 미치는 질소 이온주입 효과)

  • Kim, Min Uk;Kim, Do-Hyang;Han, Seung Hee;Kim, Yu-Chan
    • Korean Journal of Metals and Materials
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    • v.47 no.11
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    • pp.722-727
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    • 2009
  • The bipolar plates are not only the major part of the polymer electrolyte membrane fuel cell (PEMFC) stack in weight and volume, but also a significant contributor to the stack costs. Stainless steels are considered to be good candidates for bipolar plate materials of the PEMFC due to their low cost, high strength and easy machining, as well as corrosion resistance. In this paper, 316L stainless steel with and without nitrogen ion implantation were tested in simulated PEMFC environments for application as bipolar plates. The results showed that the nitride formed by nitrogen ion implantation contributed the decrease of the interfacial contact resistance without degradation of corrosion property. The combination of excellent properties indicated that nitrogen ion implanted stainless steel could be potential candidate materials as bipolar plates in PEMFC. Current efforts have focused on optimizing the condition of ion implantation.

Surface Modification of Aluminum by Nitrogen-Ion Implantation

  • Kang Hyuk-Jin;Ahn Sung-Hoon;Lee Jae-Sang;Lee Jae-Hyung
    • International Journal of Precision Engineering and Manufacturing
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    • v.7 no.1
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    • pp.57-61
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    • 2006
  • The research on surface modification technology has been advanced to improve the properties of engineering materials. Ion implantation is a novel surface modification technology that enhances the mechanical, chemical and electrical properties of substrate's surface using accelerated ions. In this research, nitrogen ions were implanted into AC7A aluminum substrates which would be used as molds for rubber molding. The composition of nitrogenion implanted aluminum and distribution of nitrogen ions were analyzed by Auger Electron Spectroscopy (AES). To analyze the modified surface, properties such as hardness, friction coefficient, wear resistance, contact angle, and surface roughness were measured. Hardness of ion implanted specimen was higher than that of untreated specimen. Friction coefficient was reduced, and wear resistance was improved. From the experimental results, it can be expected that implantation of nitrogen ions enhances the mechanical properties of aluminum mold.

Parameter Extraction Procedure for Ion Implantation Profiles to Establish Robust Database based on Tail Function

  • Suzuki, Kunihiro;Kojima, Shuichi
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.10 no.4
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    • pp.251-259
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    • 2010
  • We proposed a tail function parameter extraction procedure for the establishment of a robust ion implantation database. We showed that, for the expression of ion implantation profiles, there are many local minimum values set for the third and fourth moment parameters of $\gamma$ and $\beta$ for the Pearson function that comprises the standard dual Pearson and tail functions. We proposed the use of a joined tail function as a mediate function to extract $\gamma$ and $\beta$, and demonstrated that this enables us to extract the parameters uniquely. Other parameters associated with channeling phenomena can also be simply and uniquely extracted by our procedure.

Monte Carlo Simulation of Ion Implantation Profiles Calibrated for Various Ions over Wide Energy Range

  • Suzuki, Kunihiro;Tada, Yoko;Kataoka, Yuji;Nagayama, Tsutomu
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.9 no.1
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    • pp.67-74
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    • 2009
  • Monte Carlo simulation is widely used for predicting ion implantation profiles in amorphous targets. Here, we compared Monte Carlo simulation results with a vast database of ion implantation secondary ion mass spectrometry (SIMS), and showed that the Monte Carlo data sometimes deviated from the experimental data. We modified the electron stopping power model, calibrated its parameters, and reproduced most of the database. We also demonstrated that Monte Carlo simulation can accurately predict profiles in a low energy range of around 1keV once it is calibrated in the higher energy region.

Surface modification and induced ultra high surface hardness by nitrogen ion implantation of low alloy steel

  • Olofinjana, A.O.;Bell, J.M.;Chen, Z.
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 2002.10b
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    • pp.157-158
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    • 2002
  • A surface hardenable low alloy carbon steel was implanted with medium energy (20 - 50KeV) $N_2^+$ ions to produced a modified hardened surface. The implantation conditions were varied and are given in several doses. The surface hardness of treated and untreated steels were measured using depth sensing ultra micro indentation system (UMIS). It is shown that the hardness of nitrogen ion implanted steels varied from 20 to 50GPa depending on the implantation conditions and the doses of implantation. The structure of the modified surfaces was examined by X-ray photoelectron spectroscopy (XPS). It was found that the high hardness on the implanted surfaces was as a result of formation of non-equilibrium nitrides. High-resolution XPS studies indicated that the nitride formers were essentially C and Si from the alloy steel. The result suggests that the ion implantation provided the conditions for a preferential formation of C and Si nitrides. The combination of evidences from nano-indentation and XPS, provided a strong evidence for the existence of $sp^3$ type of bonding in a suspected $(C,Si)_xN_y$ stoichiometry. The formation of ultra hard surface from relatively cheap low alloy steel has significant implication for wear resistance implanted low alloy steels.

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Corrosion resistance of a carbon-steel surface modified by three-dimensional ion implantation and electric arc.

  • Valbuena-Nino, E.D.;Gil, L.;Hernandez, L.;Sanabria, F.
    • Advances in materials Research
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    • v.9 no.1
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    • pp.1-14
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    • 2020
  • The hybrid method of three-dimensional ion implantation and electric arc is presented as a novel plasma-ion technique that allows by means of high voltage pulsed and electric arc discharges, the bombardment of non-metallic and metallic ions then implanting upon the surface of a solid surface, especially out of metallic nature. In this study AISI/SAE 4140 samples, a tool type steel broadly used in the industry due to its acceptable physicochemical properties, were metallographically prepared then surface modified by implanting titanium and simultaneously titanium and nitrogen particles during 5 min and 10 min. The effect of the ion implantation technique over the substrate surface was analysed by characterization and electrochemical techniques. From the results, the formation of Ti micro-droplets upon the surface after the implantation treatment were observed by micrographs obtained by scanning electron microscopy. The presence of doping particles on the implanted substrates were detected by elemental analysis. The linear polarization resistance, potentiodynamic polarization and total porosity analysis demonstrated that the samples whose implantation treatment with Ti ions for 10 min, offer a better protection against the corrosion compared with non-implanted substrates and implanted at the different conditions in this study.

Silicon On Insulator (SOI) Wafer Development using Plasma Source Ion Implantation (PSII) Technology (플라즈마 이온주입 기술을 이용한 SOI 웨이퍼 제조)

  • Jung, Seung-Jin;Lee, Sung-Bae;Han, Seung-Hee;Lim, Sang-Ho
    • Korean Journal of Metals and Materials
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    • v.46 no.1
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    • pp.39-43
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    • 2008
  • PSII (Plasma Source Ion Implantation) using high density pulsed ICP source was employed to implant oxygen ions in Si wafer. The PSII technique can achieve a nominal oxygen dose of $3 {\times}10^{17}atoms/cm^2$ in implantation time of about 20min. In order to prevent oxidation of SOI layer during high temperature annealing, the wafer was capped with $2,000{\AA}$ $Si_3N_4 $ by PECVD. Cross-sectional TEM showed that continuous $500{\AA}$ thick buried oxide layer was formed with $300{\AA}$ thick top silicon layer in the sample. This study showed the possibility of SOI fabrication using the plasma source ion implantation with pulsed ICP source.