Study of Boron Doping Feasibility with Atmospheric Pressure Plasma for p-n Junction Formation on Silicon Wafer for Semiconductor (p-n 접합 형성을 위한 반도체 실리콘 웨이퍼 대기압 플라즈마 붕소 확산 가능성 연구)
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- Journal of the Semiconductor & Display Technology
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- v.16 no.4
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- pp.20-24
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- 2017