• Title/Summary/Keyword: Ion diffusion

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Study of Boron Doping Feasibility with Atmospheric Pressure Plasma for p-n Junction Formation on Silicon Wafer for Semiconductor (p-n 접합 형성을 위한 반도체 실리콘 웨이퍼 대기압 플라즈마 붕소 확산 가능성 연구)

  • Kim, Woo Jae;Lee, Hwan Hee;Kwon, Hee Tae;Shin, Gi Won;Yang, Chang Sil;Kwon, Gi-Chung
    • Journal of the Semiconductor & Display Technology
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    • v.16 no.4
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    • pp.20-24
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    • 2017
  • Currently, techniques mainly used in semiconductor impurity diffusion processes include furnace thermal diffusion, ion implantation, and vacuum plasma doping. However, there is a disadvantage that the process equipment and the unit cost are expensive. In this study, boron diffusion process using relatively inexpensive atmospheric plasma was conducted to solve this problem. With controlling parameters of Boron diffusion process, the doping characteristics were analyzed by using secondary ion mass spectrometry. As a result, the influence of each variable in the doping process was analyzed and the feasibility of atmospheric plasma doping was confirmed.

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Electrochemical Properties and Synthesis of Poly(ether)tailed Cobalt(II)bipyridine Complex (폴리(에테르)사슬이 결합된 Cobalt(II)bipyridine 착물의 합성과 전기화학적 성질)

  • Kim, II Kwang;Jun, II Chul;Murray, Royce W.
    • Analytical Science and Technology
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    • v.9 no.3
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    • pp.292-301
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    • 1996
  • The synthesis of poly(ether)tailed bipyridine complex as redox reaction probes has advanced attempts to interpret very slow diffusion and heterogeneous electron transfer. Diffusion coefficients as low as $1.5{\times}10^{-15}cm^2/s$ have been observed for the oxidation of neat $Co(bpy(ppgm)_2)_{3^-}(ClO_4)_2$ with $LiClO_4$ electrolyte. Heterogeneous electron transfer rate constants of materials were found to vary with diffusion coefficient. The decrease in k as the diffusion coefficient decreases was actually caused by the decreasing D. Diffusion coefficient for compound of strong ion pairing anion($ClO{_4}^-$) was much smaller than the diffusion coefficient for compound of weak ion pairing anion($CF_3COO^-$).

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Removal of Cs and Sr Ions by Absorbent Immobilized Zeolite with PVA (제올라이트를 PVA로 고정화한 흡착제에 의한 Cs과 Sr 이온 제거)

  • Lee, Chang-Han;Lee, Min-Gyu
    • Journal of Korean Society of Environmental Engineers
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    • v.37 no.8
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    • pp.450-457
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    • 2015
  • In this research a adsorbent, PVA-Zeolite bead, was prepared by immobilizing zeolite with PVA. The results of XRD and SEM analysis showed that the prepared PVA-Zeolite beads had porous structure and the zeolite particles were in mobilized within the internal matrix of the beads. The adsorption properties of Sr ion and Cs ion with the adsorbent were studied by different parameters such as effect of pH, adsorption rate, and adsorption isotherm. The adsorption of Sr ion and Cs ion reached equilibrium after 540 minutes. The adsorption kinetics of both ions by the PVA-Zeolite beads were fitted well by the pseudo-second-order model more than pseudo-first-order model. The equilibrium data fitted well with Langmuir isotherm model. The maximum adsorption capacities of Sr ion and Cs ion calculated from Langmuir isotherm model were 52.08 mg/g and 58.14 mg/g, respectively. The external mass transfer step was very fast compared to the intra-particle diffusion step in the adsorption process of Cs ion and Sr ion by the PVA-Zeolite beads. This result implied that the rate controlling step was the intra-particle diffusion step.

A Study on the Approximation analytical Model of PECVD Topography simulator considering the effect of the presheath (플라즈마 증착 형상 모의 실험기의 앞덮개 효과를 고려한 근사 해석적 모델에 관한 연구)

  • Lee, Kang-Whan;Son, Myung-Sik;Hwang, Ho-Jung
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.36D no.1
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    • pp.90-99
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    • 1999
  • In this work, we consider the effect of the presheath on the ion angular distribution. The recent shows the ion-neutral collision in the presheath and the calculated energy flux with the ion angular distribution at the presheath edge in plasma reactor. We also propose a new approximation analytical model for the ion angular distribution and the energy flux distribution with ion temperature. The ion passing the presheath region, Shows a ion scattering effect without ion-neutral collisions. This because the kinetic energy by the ambipolar diffusion field is changed by the gas collision,. Using the proposed approximation analytical model, we show the simulated results of a deposit profile on variable trench shape.

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A Study on the Diffusion of Ions in Hardened Blended Cement (혼합시멘트 경화체에서의 이온확산에 관한 연구)

  • 방완근;이승헌;김창은
    • Journal of the Korean Ceramic Society
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    • v.36 no.3
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    • pp.260-265
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    • 1999
  • 보통 포틀랜드 시멘트와 플라이애쉬, 슬래그를 혼합한 혼합시멘트 경화체를 이용하여 이온 확산에 미치는 혼합재의 영향과 양이온 공존시 염소이온의 확산에 대하여 고찰하였다. 겉보기 이온확산계수가 보통 포틀랜드의 시멘트보다 플라이애쉬와 슬래그를 혼합한 시멘트 경화체가 약 10-3배로 매우 낮은 값을 나타내었다. 이것은 포졸란 반응에 의해 많은 CSH 수화물이 capillary pore에 형성되어 macro pore가 감소되고 micro pore가 증가되어 이온 확산에 대한 저항이 커졌기 때문이다. 또한, Mg2+이온 공존시에 염소이온의 확산은 증가되었다.

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A Study on the Effects of Concrete Mixing Properties on Chloride Diffusion Coefficients (콘크리트의 배합특성이 염화물 확산계수에 미치는 영향에 관한 연구)

  • 김도겸;박승범;조광연;이종석;김성욱
    • Proceedings of the Korea Concrete Institute Conference
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    • 1999.10a
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    • pp.747-750
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    • 1999
  • Chloride ions are considered to be the major cause of steel corrosion in concrete structures exposed to seashore environments. Thus, estimating chloride ion concentrations by ages is needed to predict service life of seashore structures. Experimentally measured chloride profiles were used in this study for estimating chloride diffusion coefficients, and a relationship between mixing properties and chloride diffusion coefficients is proposed for predicting chloride penetrations.

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A theoretical approach to the preferred orientation formation of MgO protection layer using adatom diffusion

  • Yu, Hak-Ki;Lee, Jong-Lam
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.713-715
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    • 2009
  • Preferred orientation of MgO protection layer is controlled via adjusting diffusion of adatom between (111) plane with highest neighbor atoms and (200) plane with lowest neighbor atoms. The diffusion of adatom could be modulated by the factors such as substrate temperature, deposition rate, and extra energy applied on adatom like ion beam energy.

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Enhanced Reaction Kinetic of Fe3O4-graphite Nanofiber Composite Electrode for Lithium Ion Batteries

  • Wang, Wan Lin;Park, Ju-Young;Gu, Hal-Bon
    • Transactions on Electrical and Electronic Materials
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    • v.15 no.6
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    • pp.338-343
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    • 2014
  • A $Fe_3O_4$-graphite nanofiber composite for use as an anode material was successfully synthesized by calcining $Fe_3O_4$ and graphite nanofiber (GNF) together in a $N_2$ atmosphere. Using this $Fe_3O_4$-GNF composite in a lithium ion battery resulted in a higher lithium storage capacity than that obtained using $Fe_3O_4$-graphite ($Fe_3O_4$-G). The $Fe_3O_4$-GNF (10 wt%) electrode exhibited a higher lithium ion diffusion coefficient ($2.29{\times}10^{-9}cm^2s^{-1}$) than did the $Fe_3O_4$-G (10%) ($3.17{\times}10^{-10}cm^2s^{-1}$). At a current density of $100mA\;g^{-1}$, the $Fe_3O_4$-GNF (10 wt%) anode showed a higher reversible capacity ($1,031mAh\;g^{-1}$) than did the $Fe_3O_4$-G (10%) anode ($799mAh\;g^{-1}$). Moreover, the $Fe_3O_4GNF$ electrodes showed good cycling performance without the addition of a conductive material.

Computer Simulation for the Growth of Cr-nitride Formed on Electroplated Cr during ion-Nitriding (이온 질화에 의해 크롬 도금 층 위에 형성된 크롬 질화물의 성장에 관한 전산 모사)

  • 엄지용;이병주;남기석;권식철;권혁상
    • Journal of the Korean institute of surface engineering
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    • v.34 no.3
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    • pp.231-239
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    • 2001
  • The structure and composition of Cr-nitrides formed on an electroplated hard Cr layer during an ionnitriding process was analyzed, and the growth kinetics of the Cr-nitrides was examined as a function of the ion-nitriding temperature and time in order to establish a computer simulation model prediction the growth behavior of the Cr-nitride layer. The Cr-nitrides formed during the ion-nitriding at $550~770^{\circ}C$ were composed of outer CrN and inner $Cr_2$N layers. A nitrogen diffusion model in the multi-layer based on fixed grid FDM (Finite Difference Method) was applied to simulate the growth kinetics of Cr-nitride layers. By measuring the thickness of each Cr-nitride layer as a function of the ion-nitriding temperature and time, the activation energy for growth of each Cr-nitride was determined; 82.26 KJ/mol for CrN and 83.36 Kj/mol for $Cr_2$N. Further, the nitrogen diffusion constant was determined in each layer; $9.70$\times$10^{-12}$ /$m^2$/s in CrN and $2.46$\times$10^{-12}$ $m^2$/s in $Cr_2$N. The simulation on the growth kinetics of Cr-nitride layers was in good agreements with the experimental results at 550~72$0^{\circ}C$.

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