• Title/Summary/Keyword: Intermediate-Inversion Region

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Small CMOS Temperature Sensor Using MOSFETs in the Intermediate-Inversion Region

  • Park, Tai-Soon;Park, Sang-Gyu
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.1086-1087
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    • 2009
  • A small temperature sensor is designed in a 0.35um CMOS process. Transistors operating in the intermediate inversion region are employed in the core of the sensor. This temperature sensor operates in $-50^{\circ}C{\sim}120^{\circ}C$ with ${\pm}2^{\circ}C$ of accuracy after two-point calibration. This temperature sensor can be placed in the active pixel area of a display panel to measure the temperature of the display panel for temperature compensation.

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MAGNETIC HELICITY INJECTION DURING THE FORMATION OF AN INTERMEDIATE FILAMENT

  • Jeong, Hye-Won;Chae, Jong-Chul;Moon, Y.J.
    • Journal of The Korean Astronomical Society
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    • v.42 no.1
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    • pp.9-15
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    • 2009
  • A necessary condition for the formation of a filament is magnetic helicity. In the present paper we seek the origin of magnetic helicity of intermediate filaments. We observed the formation of a sinistral filament at the boundary of a decaying active region using full-disk $H_{\alpha}$ images obtained from Bi Bear Solar Observatory. We have measured the rate of helicity injection during the formation of the filament using full-disk 96 minute-cadence magnetograms taken by SOHO MDI. As a result we found that 1) no significant helicity was injected around the region (polarity inversion line; PIL) of filament formation and 2) negative helicity was injected in the decaying active region. The negative sign of the injected helicity was opposite to that of the filament helicity. On the other hand, at earlier times when the associated active region emerged and grew, positive helicity was intensively injected. Our results suggest that the magnetic helicity of the intermediate filament may have originated from the helicity accumulated during the period of the growth of its associated active region.

Growth and characterization of periodically polarity-inverted ZnO structures grown on Cr-compound buffer layers

  • Park, J.S.;Goto, T.;Hong, S.K.;Chang, J.H.;Yoon, E.;Yao, T.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.259-259
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    • 2010
  • Periodically polarity inverted (PPI) ZnO structures on (0001) Al2O3 substrates are demonstrated by plasmas assisted molecular beam epitaxy. The patterning and re-growth methods are used to realize the PPI ZnO by employing the polarity controlling method. For the in-situ polarity controlling of ZnO films, Cr-compound buffer layers are used.[1, 2] The region with the CrN intermediate layer and the region with the Cr2O3 and Al2O3 substrate were used to grow the Zn- and O-polar ZnO films, respectively. The growth behaviors with anisotropic properties of PPI ZnO heterostructures are investigated. The periodical polarity inversion is evaluated by contrast images of piezo-response microscopy. Structural and optical interface properties of PPI ZnO are investigated by the transmission electron microcopy (TEM) and micro photoluminescence ($\mu$-PL). The inversion domain boundaries (IDBs) between the Zn and the O-polar ZnO regions were clearly observed by TEM. Moreover, the investigation of spatially resolved local photoluminescence characteristics of PPI ZnO revealed stronger excitonic emission at the interfacial region with the IDBs compared to the Zn-polar or the O-polar ZnO region. The possible mechanisms will be discussed with the consideration of the atomic configuration, carrier life time, and geometrical effects. The successful realization of PPI structures with nanometer scale period indicates the possibility for the application to the photonic band-gap structures or waveguide fabrication. The details of application and results will be discussed.

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Observation of saturation transfer characteristics in solution processed vertical organic field-effect transistors (VOFETs) with high leakage current

  • Sarjidan, M.A. Mohd;Shuhaimi, Ahmad;Majid, W.H. Abd.
    • Current Applied Physics
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    • v.18 no.11
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    • pp.1415-1421
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    • 2018
  • Unlike ordinary organic field-effect transistors (OFETs), saturation current is hardly to be found in vertical OFETs (VOFETs). Moreover, the fabrication process of patterned sourced for VOFETs is quite complex. In this current work, a simple solution processed VOFET with directly deposited intermediate silver source electrode has been demonstrated. The VOFET exhibits a high leakage current that induces an inversion polarity of its transistor behavior. Interestingly, a well-defined saturation current was observed in the linear scale of transfer characteristic. The VOFET operated with high-current density > $280mA/cm^2$ at $V_d=5V$. Overview potential of the fabricated device in display application is also presented. This preliminary work does open-up a new direction in VOFET fabrication and their application.