• Title/Summary/Keyword: Indium oxide

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Characteristics of Indium Zinc Oxide thin films deposited on polymer substrate (폴리머 기판상에 제작한 Indium Zinc Oxide 박막의 특성)

  • Rim, You-Seung;Kim, Sang-Mo;Lee, Won-Jae;Kim, Kyung-Hwan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.405-406
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    • 2008
  • The amorphous indium zinc oxide (IZO) thin films were deposited on polyethersulfone (PES) and glass substrates by facing targets sputtering. IZO thin films deposited as functions of gas flow ratio on PES and glass substrates, respectively. The electrical, optical and structural properties of IZO thin films were evaluated by a Hall Effect Measurement, an X-Ray Diffractormeter, UV/VIS spectrometer in visible range and a scanning electron microscopy, respectively. As-deposited IZO thin films exhibited resistivity of $5.4\times10^{-4}$ and $4.5\times10^{-4}$ [$\Omega$-cm] on PES and glass substrates, respectively. The optical transmittance showed over 85% in the visible region on PES and glass substrates.

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Characteristics of Laser Direct Patterned Indium Tin Oxide Layer by Overlapping Rates of Laser Beam

  • Li, Zhao-Hui;Ahn, Min-Hyung;Choi, Kyung-Min;Im, Seung-Hyeok;Jung, Kyung-Seo;Cho, Eou-Sik;Kwon, Sang-Jik
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.1496-1499
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    • 2009
  • A diode-pumped Nd:$YVO_4$ laser was used to obtain indium tin oxide (ITO) patterns on glass substrate with various overlapping rates. The results showed that the overlapping rate of laser beam influences on the edge structure of ITO pattern and the surface roughness of ablated groove bottom. At a laser repetition rate of 40 kHz, the optimized condition of overlapping rate was 75 %.

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Effect of Different Pretreatments on Indium-Tin Oxide Electrodes

  • Choi, Moonjeong;Jo, Kyungmin;Yang, Haesik
    • Bulletin of the Korean Chemical Society
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    • v.34 no.2
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    • pp.421-425
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    • 2013
  • The effect of pretreatment on indium-tin oxide (ITO) electrodes has been rarely studied, although that on metal and carbon electrodes has been enormously done. The electrochemical and surface properties of ITO electrodes are investigated after 6 different pretreatments. The electrochemical behaviors for oxygen reduction, $Ru(NH_3){_6}^{3+}$ reduction, $Fe(CN){_6}^{3-}$ reduction, and p-hydroquinone oxidation are compared, and the surface roughness, hydrophilicity, and surface chemical composition are also compared. Oxygen reduction, $Fe(CN){_6}^{3-}$ reduction, and p-hydroquinone oxidation are highly affected by the type of the pretreatment, whereas $Ru(NH_3){_6}^{3+}$ reduction is almost independent of it. Interestingly, oxygen reduction is significantly suppressed by the treatment in an HCl solution. The changes in surface roughness and composition are not high after each pretreatment, but the change in contact angle is substantial in some pretreatments.

Characteristics and fabrications of high brightness organic light emitting diode(OLED) (고휘도 유기발광소자 제작 및 특성)

  • 장윤기;이준호;남효덕;박진호
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11a
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    • pp.316-319
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    • 2001
  • Organic light emitting diodes(OLEDs) with a hole injection layer inserted between Indium-Tin-Oxide(ITO) anode and hole transport layer were fabricated. The effect of plasma treatment on the surface properties of Indium-Tin-Oxide(ITO) anode were studied. The electrical and optical characteristics of the fabricated organic light emitting diodes(OLEDs) were also studied. The diode including of plasma treated ITO substrate and the hole injection layer, which showed the luminance of 5280 cd/㎡ at 8 V

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Etch characteristics of ITO(Indium Tin Oxide)using ${SF_6}/{O_2}$-gas ECR(Electron Cyclotron Resonance) plasmas (ECR을 이용한 ${SF_6}/{O_2}$ 가스 플라즈마에 의한 ITO의 식각 특성연구)

  • 권광호;강승열;김곤호;염근영
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.13 no.7
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    • pp.563-567
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    • 2000
  • We presented the etch results of indium-tin oxide thin films by using SF$_{6}$/O$_2$gas electron cyclotron resonance plasma and conducted X-ray phtoelectron spectroscopy and quadrupole mass spectrometer analyses for the etch characteristics. The etch rate of the films was greatly dependent on that of oxygen which was the major constituent element of the films. The oxygen was removed by the forms like $O_2$or SOF$_2$. We examined the ratio of atomic content of O and In and the change of this ratio was related to the removal rate of InF$_{x}$ and the S-metal bonding.ing.

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Development of an electrochemical detector using Prussian blue modified indium tin oxide electrode (Prussian blue가 전착된 indium tin oxide전극을 이용한 전기화학적 검출기의 개발)

  • Yi, In-Je;Kim, Ju-Ho;Kang, C.J.;Kim, Yong-Sang
    • Proceedings of the KIEE Conference
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    • 2005.07c
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    • pp.2404-2406
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    • 2005
  • 본 연구에서는 전기촉매제를 사용하여 증가된 감도를 가지는 검출 시스템을 제작하였다. 전극과 검출물질 사이의 산화환원반응을 촉진시키기 위한 물질로 Prussian blue (PB)를 indium tin oxide (ITO) 전극에 전착하였다. 본 실험에서는 분석물질의 이동 및 분리를 위하여 모세관 전기영동방법을 사용하였으며 측정방법은 전류량법을 사용하였다. 전착된 PB 박막의 특성은 원자 현미경으로 분석하여 0.1V, 3min의 전착조건으로 최적화하였다. 전기 촉매제로써의 PB의 특성을 확인하기 위하여 ITO 전극만을 사용한 전기화학적 검출기와 비교하였으며 본 연구에서 제안된 검출기의 감도가 20배정도 더 좋다는 것을 확인하였다.

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Structural study of indium oxide thin films by metal organic chemical vapor deposition (저온화학기상증착에 의한 인듐산화막 구조에 관한 연구)

  • Pammi, S.Venkat.N.;Seong, Nak-Jin;Yoon, Soon-Gil
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.47-47
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    • 2007
  • Indium oxide conducting films were dep9sited on Si(100) substrates at various temperatures by liquid delivery metal organic chemical vapor deposition using Indium (III) tris (2,2,6,6-tetramethyl-3.5-heptanedionato) $(dpm)_3$ precursors. The films deposited at $200{\sim}400^{\circ}C$ were grown with a (111) preferred orientation and exhibit an increase of grain size from 21 to 33nm with increasing deposition temperature. In the range of deposition temperature, there is no metallic indium phase in deposited films.

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Phase transition of indium hydroxide to indium oxide at low temperatures (저온에서의 indium hydroxide에서 indium oxide로의 상전이)

  • Choi, Eun-Kyoung;Lee, Won-Jun;Han, Kyu-Sung;Kim, Ung-Soo;Kim, Jin-Ho;Hwang, wang-Teak;Hwang, Hae-Jin;Shim, Kwang-Bo;Cho, Woo-Seok
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.28 no.2
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    • pp.91-97
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    • 2018
  • Indium hydroxide powder was prepared by precipitation method. The reaction temperature ($150{\sim}250^{\circ}C$) and the holding time at each reaction temperature (1~72 h) were used as experimental variables. The particle size, microstructure and crystal phase of each prepared powder were observed through X-ray diffraction (XRD), Transmission electron microscope (FE-TEM) and BET. In this study, we investigated the phase and microstructural change induced by heat treatment of indium hydroxide nanoparticles at various temperatures for different holding times.

Synthesis of IZTO(Indium Zinc Tin Oxide) particle by spray pyrolysis and post-heat treatment and characterization of deposited IZTO film

  • Lim, Seong Taek;Kim, Sang Hern
    • Journal of the Korean Applied Science and Technology
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    • v.33 no.4
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    • pp.734-740
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    • 2016
  • The micron-sized indium zinc tin oxide (IZTO) particles were prepared by spray pyrolysis from aqueous precursor solution for indium, zinc, and tin and organic additives such as citric acid (CA) and ethylene glycol (EG) were added to aqueous precursor solution for indium, zinc, and tin. The obtained IZTO particles prepared by spray pyrolysis from the aqueous solution without organic additives had spherical and filled morphologies, whereas the IZTO particles obtained with organic additives had more hollow and porous morphologies. The micron-sized IZTO particles with organic additives were changed fully to nano-sized IZTO particles, whereas the micron-sized IZTO particles without organic additives were not changed fully to nano-sized IZTO particle after post-treatment at $700^{\circ}C$ for 2 hours and wet-ball milling for 24 hours. Surface resistances of micron-sized IZTO's before post-heat treatment and wet-ball milling were much higher than those of nano-sized IZTO's after post-heat treatment and wet-ball milling. From IZTO with composition of 80 wt. % $In_2O_3$, 10 wt. % ZnO, and 10 wt. % $SnO_2$ which showed a smallest surface resistance IZTO after post-heat treatment and wet-ball milling, thin films were deposited on glass substrates by pulsed DC magnetron sputtering, and the electrical and optical properties were investigated.

The effect on formation of ITO by magnetic field and applied vol tape in cylindrical magnetron sputtering (원통형 스퍼터링에서 자계와 인가전압이 ITO형성에 미치는 영향)

  • 하홍주;이우근;곽병구;김규섭;조정수;박정후
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1995.11a
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    • pp.302-305
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    • 1995
  • ITO(indium tin oxide) that is both conductive in electricity and transparent to the visible ray is called transparent conducting thin film. Nowaday, according to the development of flat panel display such as LCD(Liquid Crystal display, EL(electolumine- scence display), PDP(plasma display panel), ECD(electrocromic display), the higher quality in the low temperature process has been asked to reduce the production cost and to have a good uniformity on a large substrate. In this study, we prepared indium tin oxide(ITO) by a cylindrical DC magnetron sputtering with Indium-tin (9:1) alloy target instead of indium-tin oxide target. To reduce the defact in ITO, the effect on ITO by varing the magnetic field intensity and the applied voltage ares studied. the resistivity of the film deposited in oxygen partial pressure of 5% and substrate temperature of 140$^{\circ}C$. is 1.6${\times}$10$\^$-1/$\Omega$$.$cm with 85% optical transmission in viaible ray.

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