• 제목/요약/키워드: Index fabrication

검색결과 200건 처리시간 0.026초

Use of temporary filling material for index fabrication in Class IV resin composite restoration

  • Kim, Kun-Young;Kim, Sun-Young;Kim, Duck-Su;Choi, Kyoung-Kyu
    • Restorative Dentistry and Endodontics
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    • 제38권2호
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    • pp.85-89
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    • 2013
  • When a patient with a fractured anterior tooth visits the clinic, clinician has to restore the tooth esthetically and quickly. For esthetic resin restoration, clinician can use 'Natural Layering technique' and an index for palatal wall may be needed. In this case report, we introduce pre-restoration index technique on a Class IV defect, in which a temporary filling material is used for easy restoration. Chair-side index fabrication for Class IV restoration is convenient and makes a single-visit treatment possible.

PLC-기반의 마흐-젠더 간섭계 센서 제작 및 특성 평가 (Fabrication and Characterization of PLC-based Mach-Zehnder Interferometer Sensor)

  • 김준형;양회영;이현용
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.390-390
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    • 2008
  • In this paper, we have designed and fabricated optical waveguides based on the Mach-Zehnder Interferometer (MZI) for application to sensor. The evanecent-wave sensor based on the MZI principle has sufficiently high sensitivity to measure the change of the refractive index on surface of a waveguide. The waveguides were optimized at a wavelength of 1550 nm and fabricated according to the design rule of 0.45 delta%, which is the difference of refractive index between the core and clad. The fabrication of MZI optical waveguides was performed by a conventional Planar Lightwave Circuit (PLC) fabrication process. The fabricated MZI optical waveguide device was measured. According to the measurement result, the insertion loss of MZI optical waveguide device was below 3.5 dB and the polarization dependent loss (PDL) was within 0.1dB. In addition, we analyzed optical properties of MZI sensor according to the refractive index change of the sensor arm.

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나노 광소자용 나노스탬프 제조공정 연구 (Nano stamp fabrication for photonic crystal waveguides)

  • 정명영;정은택;김창석
    • 한국정밀공학회지
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    • 제22권12호
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    • pp.16-21
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    • 2005
  • Photonic crystals, periodic structure with a high refractive index contrast modulation, have recently become very interesting platform for the manipulation of light. The existence of a photonic bandgap, a frequency range in which the propagation of light is prevented in all directions, makes photonic crystal very useful in application where the spatial localization of light is required, for example waveguide, beam splitter, and cavity. However, the fabrication of 3 dimensional photonic crystals is still difficult process. A concept that has recently attracted a lot of attention is a planar photonic crystal based on a dielectric membrane, suspended in the air and perforated with two dimensional lattice of hole. The fabrication of Si master with pillar structure using hot embossing process is investigated for two dimensional, low-index-contrast photonic crystal waveguide. From our research we show that the multiple stamp copy process proved to be feasible and useful.

나노 임프린트 공정에 의한 광자결정 도파로 제조공정 (Nano imprinting lithography fabrication for photonic crystal waveguides)

  • 정은택;김창석;정명영
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 추계학술대회 논문집
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    • pp.498-501
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    • 2005
  • Photonic crystals, periodic structure with a high refractive index contrast modulation, have recently become very interesting platform for manipulation of light. The existence of a photonic bandgap, a frequency range in which propagation of light is prevented in all direction, makes photonic crystal very useful in application where spatial localization of light is required for waveguide, beam splitter, and cavity. But fabrication of 3 dimensional photonic crystal is still difficult process. a concept that has recently attracted a lot of attention is a planar photonic crystal based on a dielectric membrane, suspended in the air, and perforated with 2 dimensional lattice of hole. We show that the polymer slabs suspended in air with triangular lattice of air hole can exhibit the in-plane photonic bandgap for TE-like modes. The fabrication of Si master with pillar structure using hot embossing process was investigated for 2 dimensional low-index-contrast photonic crystal waveguide.

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MCVD법을 이용한 광섬유 모재의 제작 (Fabrication of Optical Fiber Preform by MCVD Method)

  • 이기완;홍봉식
    • 한국통신학회논문지
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    • 제14권4호
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    • pp.307-320
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    • 1989
  • 본 논문은 모재 제작을 위한 Modified Chemical Vapor Deposition(MCVD) 장치의 새로운 설계를 제안하였다. MCVD 공정의 기본 장치로는 선반장치와 원료가스공급 장치가 포함되고, 언덕형 광섬유 설계, 공정의 특성 및 MCVD 모재의 굴정율 형태를 측정하는 실험장치를 각기 실현하였다. 연구결과, 중심부 딥(dip)이나 범프(bump) 가 보이지 않는 이상적 언덕형 굴절율 광섬유 모재를 얻었다.

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InGaAsP/InP RWG MQW-LD의 최적 설계 (The optimum design of InGaAsP/InP RWG MQW-LD)

  • 하홍춘;오수환;이석정;박윤호;오종환;홍창희
    • 한국광학회지
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    • 제7권4호
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    • pp.375-385
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    • 1996
  • 본 연구에서는 InGaAsP/InP RWG MQW-LD를 제작하기 앞서 이론해석으로부터 RWG MQW-LD의 도파로규격에 따른 측방향 유효굴절율차와 index-guided LD로 동작하는 임계 유효굴절율차의 값, 그리고 이러한 굴절율차에 따른 측방향에서의 단일모드 발진조건과 임계전류를 최소로 하기 위한 ridge 폭을 구하여 도파로를 설계하였다. 이론해석으로 부터는 순수한 index-guided LD로 동작하기 위한 측방향 임계 유효굴절율차 값은 일반적인 bulk층 보다는 약 2배 정도 큰 값인 약 0.015이었으며 도파로 설계에 있어서는 유효굴절율차가 0.015이며 측방향단일모드로 동작하기 위해서는 ridge 폭은 약 4.mu.m이하가 되어야 함을 알 수 있었다. 그리고 이때 임계전류값이 최소가 됨을 지적하였다.

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랜덤 제조 오차를 고려한 모드 편재계수를 최소화하는 반복 배열 마이크로 공진기의 최적설계 (Design of MEMS Resonator Array for Minimization of Mode Localization Factor Subject to Random Fabrication Error)

  • 김욱태;이종원
    • 한국소음진동공학회:학술대회논문집
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    • 한국소음진동공학회 2005년도 춘계학술대회논문집
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    • pp.840-845
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    • 2005
  • This paper presents a robust optimal design method for a periodic structure type of MEMS resonator that is vulnerable to mode localization. The robust configuration of such a MEMS resonator to fabrication error is implemented by changing the regularity of periodic structure. For the mathematical convenience, the MEMS resonator is first modeled as a multi pendulum system. The index representing the measure of mode variation is then introduced using the perturbation method and the concept of modal assurance criterion. Finally, the optimal intentional mistuning, minimizing the expectation of the irregularity measure for each substructure, is determined for the normal distributed fabrication error and its robustness in the design of MEMS resonator to the fabrication error is demonstrated with numerical examples.

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랜덤 제조 오차를 고려한 모드 편재계수를 최소화하는 반복 배열 마이크로 공진기의 최적설계 (Design of MEMS Resonator Array for Minimization of Mode Localization Factor Subject to Random Fabrication Error)

  • 김욱태;이종원
    • 한국소음진동공학회논문집
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    • 제15권8호
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    • pp.931-938
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    • 2005
  • This paper presents a robust optimal design method for a periodic structure type of MEMS resonator that is vulnerable to mode localization. The robust configuration of such a MEMS resonator to fabrication error is implemented by changing the regularity of periodic structure For the mathematical convenience, the MEMS resonator is first modeled as a multi-pendulum system. The index representing the measure of mode variation is then introduced using the perturbation method and the concept of modal assurance criterion. Finally, the optimal intentional mistuning, minimizing the expectation of the irregularity measure for each substructure, is determined for the normal distributed fabrication error and its robustness in the design of MEMS resonator to the fabrication error is demonstrated with numerical examples.

광변조기용 CPW 전극제작 및 특성 (Fabrication and Properties of CPW Electrode for Optical Modulator)

  • 임영삼;김영준;박계춘
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 1999년도 하계종합학술대회 논문집
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    • pp.962-965
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    • 1999
  • We designed and fabricated a travelingwave CPW(coplanar waveguide) electrode for LiNbO$_3$ optical modulator. To Investigate the variation of microwave refractive index of these electrodes, we prepared the CPW electrode samples as a function of electrode thickness and measured the TDR and S-parameter. From this results, we could know the electrode conditions of index matching to 2.20 for 1550nm optical wave index for applying LiNbO$_3$ optical modulator and described. Also, we discussed the some properties of CPW electrode for applying LiNbO$_3$ optical modulator.

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