• Title/Summary/Keyword: Indenter

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Mechanical Behaviour of Non-Oxide Boride Type Ceramics Formed on The AISI 1040 Plain Carbon Steel

  • Sen, Saduman;Usta, Metin;Bindal, Cuma;UciSik, A.Hikmet
    • The Korean Journal of Ceramics
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    • v.6 no.1
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    • pp.27-31
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    • 2000
  • A series experiments were performed to evaluate mechanical behavior of non-oxide boride type ceramics formed on the AISI 1040 plain carbon steel. Boronizing was performed in a slurry salt bath consisting of borax, boric acid, and ferro-silicon at $950^{\circ}C$ for 2-6h. The AISI 1040 steel used as substrate material was containing 0.4%C, 0.13%Si, 0.65%Mn, 0.02%P, 0.014%S. The presence of non-oxide boride type ceramics $Fe_2B $ and FeB formed on the surface of steel was confirmed by metallographic technique and X-ray diffraction (XRD) analysis. The hardness of borides measured via Vickers indenter with a load of 2N reached a microhardness of up to 1800 DPN. The hardness of unborided steel was 185 DPN. The fracture toughness of borides measured by means of Vickers indenter with a load of 10N was about 2.30 MPa.$m^{1/2}$. The thickness of boride layers ranged from 72$\mu\textrm{m}$ to 145$\mu\textrm{m}$. Boride layers have a columnar morphology.

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Contact Damage and Strength Degradation of Yttria doped Tetragonal Zirconia Polycrystal (Y$_2$O$_3$ 를 첨가한 정방정 지르코니아에서의 접촉손상 및 강도저하)

  • 정연길;최성철
    • Journal of the Korean Ceramic Society
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    • v.35 no.5
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    • pp.429-436
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    • 1998
  • The mechanical properties and damage mode of {{{{ {Y}_{2 } {O}_{3} }}-doped tetragonal (Y-TZP) can-didated as biomaterials were performed under indentation stress-strain curve critical load for yield and cracking strength degradation and fatigue behavior with Hertzian indentation tests. This material shows the brittle behavior which is confirmed by indentation stress-strain response. The critical load for cracking(Pc) is much higher than that for yields (Py) indicating crack resistance Strength were strongly dependant on contact area and there were no degradation when the indenter size was ${\gamma}$=3.18 mm suggesting that Y-TZP should be highly damage tolerant to the blunt contacts. Multi-cycle contact were found to be innocuous up to {{{{ {10 }^{6 } }} cycles at 500N and {{{{ {10 }^{5 } }} cycles at 1000N in water. On the other hand contacts at {{{{ {10 }^{6 } }} cycles at 1000 N in water did show some signs of incipient degradation. By contrast contacts with Vickers indenter pro-duced substantial strength losses at much lower loads suggesting that the mechanical integrity of this ma-terial would be compromised by inadvertent sharp contacts.

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RF Magnetron Sputter로 증착 한 HfN 박막의 Plasma Power 변화에 따른 Nano-electroribology 특성 변화 연구

  • Park, Myeong-Jun;Kim, Seong-Jun;Kim, Su-In;Lee, Chang-U
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.354.2-354.2
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    • 2014
  • 최근 반도체 산업의 발전에 따라 반도체 소자 내 배선재료로 사용되던 Aluminium (Al)의 대체물로 Copper (Cu)가 사용되고 있다. Cu는 Al보다 우수한 전도성과 비용이 저렴하다는 장점이 있으나 반도체 기판과의 확산으로 이를 해결해야만 하는 문제점이 있다. 이는 Si와 Cu사이에 확산방지막을 사용하여 해결할 수 있는데 Hafnium Nitride (HfN) 박막은 다른 물질과 비교해 고온에서의 안정성과 낮은 비저항을 가지고 있어 주목을 받고 있다. 본 연구에서는 rf magnetron sputter 방법으로 박막 증착 시에 인가하는 rf power가 박막의 표면 특성에 어떠한 영향을 미치는지 nano-indenter를 사용해 surface hardness와 elastic modulus의 변화를 중심으로 알아보았다. 시료는 rf magnetron sputter로 증착 시 인가하는 plasma power를 60W와 80W로 달리하여 증착하였다. 증착가스는 Ar과 $N_2$를 조절하여 사용하였고 총 유량을 40 sccm 으로 고정하였으며, 이 때 압력은 3mTorr로 유지하였다. 실험결과 plasma power를 80W로 인가하여 증착한 시료의 surface hardness (18.48 GPa)가 60W로 증착한 시료의 surface hardness (12.03 GPa)보다 큰 값을 나타내었다. 이와 마찬가지로 80W로 증착한 시료의 elastic modulus(187.16 GPa)도 60W로 증착한 시료의 탄성계수 (141.15 GPa)보다 큰 값을 나타내었다. 이는 증착 시 인가하는 plasma power의 크기가 증가하면 박막표면에 compressive stress가 생성되어 박막의 surface hardness와 elastic modulus가 상대적으로 높게 측정되는 것으로 생각된다.

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Nano-indenter를 통한 유기발광소자(OLED)용 Ag전극의 표면처리에 따른 물성변화 연구

  • Kim, Ju-Yeong;Kim, Su-In;Lee, Gyu-Yeong;Kim, Hyeong-Geun;Jeon, Jae-Hyeok;Jeong, Yun-Jong;Kim, Mu-Chan;Lee, Jong-Rim;Lee, Chang-U
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.224-224
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    • 2011
  • OLED (Organic Light-Emitting Diode) 디스플레이에서는 반사율이 가장 높은 silver (Ag)가 쓰이고 있지만, 소자에서 요구되는 일함수의 불일치 때문에 전극과 유기물간에 에너지 장벽이 발생하여 발광효율을 낮추는 요인이 되고 있다. 본 논문에서는 Ag 전극의 work function을 조절하기 위한 연구를 진행하였다. Ag를 rf magnetron sputter를 이용해 glass위에 증착한 후 furnace에서 300$^{\circ}C$, 30분간 공기중에서 열처리 하였고. 또 다른 샘플은 산소분위기에서 표면에 상압플라즈마로 처리 시간(30, 60, 90, 120 sec)을 각기 다르게 하여 샘플을 제조하였다. Ag전극은 Nanoindentation을 통해 국부 영역에 대한 물리적 특성의 변화를 측정하였고 Kelvin Probe Force Microscopy (KPFM)을 이용해 샘플의 포텐셜을 측정했다. 그 결과 열처리한 샘플은 포텐셜값은 가장 커졌지만 균일도가 낮아졌다. 30 sec, 120 sec 플라즈마 처리한 샘플은 탄성계수, 경도값, 및 Weibull modulus를 극히 낮게 만들었지만 60s, 90s 플라즈마 처리는 샘플의 경도값 균일도를 증가시켰다.

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Analysis on the Results of the World Wide Rockwell Hardness Round Robin Test with Conical Indenters (로크웰 경도 국제비교교정 결과 분석)

  • Bahng, G.W.;Tak, N.H.;Polzin, T.
    • Journal of the Korean Society for Heat Treatment
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    • v.14 no.6
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    • pp.336-344
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    • 2001
  • For the establishment of the world wide unified scales of the Rockwell hardness test with conical indenters, round robin test was carried from 1998 to 2000. The pilot laboratory was MPA-NRW and 12 laboratories from 11 countries participated In this RRT. Rockwell hardness of 74 specially prepared blocks was measured for the scales of C, A, D, 45N, 30N, and 15N and the results were compared. It was found that the geometric form of indenter affects on the results very significantly and standardization in the measurement and evaluation of indenter should be established in short time for the reliable hardness measurement. KRISS showed good results in general for all of the ranges except 15N scale which showed relatively large difference compare to the mean value. It was concluded that poor control in loading velocity of the dash pot was the major reason.

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Evaluation of Nuclear Plant Cable Aging Through Condition Monitoring

  • Kim, Jong-Seog;Lee, Dong-Ju
    • Nuclear Engineering and Technology
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    • v.36 no.5
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    • pp.475-484
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    • 2004
  • Extending the lifetime of a nuclear power plant [(hereafter referred to simply as NPP)] is one of the most important concerns in the global nuclear industry. Cables are one of the long-life items that have not been considered for replacement during the design life of a NPP. To extend the cable life beyond the design life, it is first necessary to prove that the design life is too conservative compared with actual aging. Condition monitoring is useful means of evaluating the aging condition of cable. In order to simulate natural aging in a nuclear power plant. a study on accelerated aging must first be conducted. In this paper, evaluations of mechanical aging degradation for a neoprene cable jacket were performed after accelerated aging under tcontinuous and intermittent heating conditions. Contrary to general expectations, intermittent heating to the neoprene cable jacket showed low aging degradation, 50% break-elongation, and 60% indenter modulus, compared with continuous heating. With a plant maintenance period of 1 month after every 12 or 18 months operation, we can easily deduce that the life time of the cable jacket of neoprene can be extended much longer than extimated through the general EQ test. which adopts continuous accelerated aging for determining cable life. Therefore, a systematic approach that considers the actual environment conditions of the nuclear power plant is required for determining cable life.

Development of 6-Axis Stiffness Measurement Device for Prosthetic Socket Design (의수 소켓 설계를 위한 6축 인체 탄성도 측정 장치 개발)

  • Oh, Donghoon;Lee, Seulah;Choi, Youngjin
    • The Journal of Korea Robotics Society
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    • v.14 no.1
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    • pp.58-64
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    • 2019
  • The paper proposes a stiffness measurement device composed of a measurement part including six indenters and a fixing part including four fixtures. The device is able to make simultaneously measurements of the stiffness of human arm. The six indenters make use of both position and force control schemes sequentially whenever needed. In addition, the loadcells and the digital encoders are attached to the indenters and electric motors, respectively, so that the data can be provided in real time. On the end of the indenter, two-axis potentiometer is attached in order to measure the angle difference between the applied force axis and the axis normal to the skin of human arm, and to convert the force measured on the loadcell into the actual applied force to skin. For this purpose, the mapping between the voltage output and the angle of potentiometer was obtained by fitting it for each axis. Ultimately, the measurement device was able to measure the stiffnesses of six regions of human arm.

Nano-Mechanical Studies of HfOx Thin Film for Oxygen Outgasing Effect during the Annealing Process (고온 열처리 과정에서 산소 Outgasing 효과에 의한 HfOx 박막의 Nanomechanics 특성 연구)

  • Park, Myung Joon;Kim, Sung Joon;Lee, Si Hong;Kim, Soo In;Lee, Chang Woo
    • Journal of the Korean Vacuum Society
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    • v.22 no.5
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    • pp.245-249
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    • 2013
  • The $HfO_X$ thin film was deposited what it has been paid attention to the next generation oxide thin layer of MOSFET (metal-Oxide semiconductor field-effect-transistor) by rf magnetron sputter on Si (100) substrate. The $HfO_X$ thin film was deposited using a various oxygen gas flows (5, 10, 15 sccm). After deposition, $HfO_X$ thin films were annealed from 400 to $800^{\circ}C$ for 20 min in nitrogen ambient. The electrical characteristics of the $HfO_X$ thin film was improved by leakage current properties, depending on the increase of oxygen gas flow and annealing temperature. In particular, the properties of nano-mechanics of $HfO_X$ thin films were measured by AFM and Nano-indenter. From the results, the maximum indentation depth at the basis of maximum indentation force was increased from 24.9 to 38.8 nm according to increase the annealing temperature. Especially, the indentation depth was increased rapidly at $800^{\circ}C$. The rapid increasement of indentation depth was expected to be due to the change of residual stress in the $HfO_X$ thin film, and this result was caused by relative flux of oxygen outgasing during the annealing process.

Surface Physical Properties of W-N Nano Thin Films by Nanotribological Analysis (나노트라이볼로지 분석을 이용한 W-N 나노박막의 표면 물성 연구)

  • Kim, Soo-In;Lee, Kyu-Young;Kim, Joo-Young;Lee, Chang-Woo
    • Journal of the Korean Vacuum Society
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    • v.20 no.6
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    • pp.456-460
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    • 2011
  • Recently, the size of currently-researched components and devices reduces nano-scale. Thus, it is important and emphasizes the analyses of physical properties in nano scale. Especially, the mechanical properties are not over micro-scale components but nano-scale components with different characteristics that has been reported. However, most analytical methods for currently studying in nano-scale are related to spectroscopy and electronics, affected the limitation of viewing size that these methods give only average information. In this research, the representative nanotribology analyses, nano-indenter study the physical and mechanical properties of W-N thin film for nano region and nano depth within nano-scale that the thickness of W-N diffusion barrier has less than tens of nanometers. The Scanning probe microscopy (SPM) study the surface image. From these results, the hardness of W-N thin film underneath the nano-surface decreased from 57.67 GPa to 9.1 GPa according to the increase of nitrogen gas flow. The elastic modulus of W-N thin film underneath the nano-surface also decreased from 575.53 GPa to 178.1 GPa.

Study of Tungsten Nitride Diffusion Barrier for Various Nitrogen Gas Flow Rate by Employing Nano-Mechanical Analysis (Nano-Mechanics 분석을 통한 질화 텅스텐 확산방지막의 질소 유량에 따른 연구)

  • Kwon, Ku Eun;Kim, Sung Joon;Kim, Soo In;Lee, Chang Woo
    • Journal of the Korean Vacuum Society
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    • v.22 no.4
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    • pp.188-192
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    • 2013
  • Many studies have been conducted for preventing from diffusion between silicon wafer and metallic thin film due to a decrease of line-width and multi-layer thin film for miniaturization and high integration of semiconductor. This paper has focused on the nano-mechanical property of diffusion barrier which sample is prepared for various gas flow rate of nitrogen with tungsten (W) base from 2.5 to 10 sccm. The deposition rate, resistivity and crystallographic properties were measured by a ${\beta}$-ray back-scattering spectroscopy, 4-point probe and x-ray diffraction (XRD), respectively. We also has investigated the nano-mechanical property using the nano-indenter. As a result, the surface hardness of W-N thin film was increased rapidly from 10.07 to 15.55 GPa when the nitrogen gas flow was increased from 2.5 to 5 sccm. And the surface hardness of W-N thin film had 12.65 and 12.77 GPa at the nitrogen gas flow of 7.5 and 10 sccm respectively. These results were decreased by the comparison with the W-N thin film at nitrogen gas flow of 5 sccm. It was inferred that these severe changes were caused by the stoichiometric difference between the crystalline and amorphous state in W-N thin film. In addition, these results were caused by increased compressive stress.